KR102709082B1 - 높은 증착 링 및 증착 링 클램프를 갖는 프로세스 키트 - Google Patents
높은 증착 링 및 증착 링 클램프를 갖는 프로세스 키트 Download PDFInfo
- Publication number
- KR102709082B1 KR102709082B1 KR1020187003405A KR20187003405A KR102709082B1 KR 102709082 B1 KR102709082 B1 KR 102709082B1 KR 1020187003405 A KR1020187003405 A KR 1020187003405A KR 20187003405 A KR20187003405 A KR 20187003405A KR 102709082 B1 KR102709082 B1 KR 102709082B1
- Authority
- KR
- South Korea
- Prior art keywords
- deposition ring
- process kit
- substrate support
- deposition
- annular band
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 111
- 230000008569 process Effects 0.000 title claims abstract description 111
- 230000008021 deposition Effects 0.000 title claims abstract description 104
- 239000000758 substrate Substances 0.000 claims abstract description 115
- 238000000151 deposition Methods 0.000 claims description 101
- 238000005477 sputtering target Methods 0.000 claims description 29
- 238000004544 sputter deposition Methods 0.000 description 34
- 239000007789 gas Substances 0.000 description 31
- 239000000463 material Substances 0.000 description 28
- 230000002093 peripheral effect Effects 0.000 description 12
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000005240 physical vapour deposition Methods 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 238000009825 accumulation Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- -1 tungsten nitride Chemical class 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 241000894007 species Species 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 230000013011 mating Effects 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 208000000659 Autoimmune lymphoproliferative syndrome Diseases 0.000 description 1
- 241000287828 Gallus gallus Species 0.000 description 1
- GXDVEXJTVGRLNW-UHFFFAOYSA-N [Cr].[Cu] Chemical compound [Cr].[Cu] GXDVEXJTVGRLNW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229940082150 encore Drugs 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000013529 heat transfer fluid Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Clamps And Clips (AREA)
- Chemical Vapour Deposition (AREA)
- General Chemical & Material Sciences (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IN2029/DEL/2015 | 2015-07-03 | ||
| IN2029DE2015 | 2015-07-03 | ||
| US15/201,019 | 2016-07-01 | ||
| PCT/US2016/040847 WO2017007729A1 (en) | 2015-07-03 | 2016-07-01 | Process kit having tall deposition ring and deposition ring clamp |
| US15/201,019 US9909206B2 (en) | 2015-07-03 | 2016-07-01 | Process kit having tall deposition ring and deposition ring clamp |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20180016628A KR20180016628A (ko) | 2018-02-14 |
| KR102709082B1 true KR102709082B1 (ko) | 2024-09-23 |
Family
ID=57683629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187003405A Active KR102709082B1 (ko) | 2015-07-03 | 2016-07-01 | 높은 증착 링 및 증착 링 클램프를 갖는 프로세스 키트 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9909206B2 (enExample) |
| JP (2) | JP6976925B2 (enExample) |
| KR (1) | KR102709082B1 (enExample) |
| CN (3) | CN117867462A (enExample) |
| SG (1) | SG10202108705SA (enExample) |
| TW (2) | TWI713543B (enExample) |
| WO (1) | WO2017007729A1 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI653885B (zh) * | 2017-03-03 | 2019-03-11 | 宏碁股份有限公司 | 影像輸出方法及影像擷取裝置 |
| JPWO2019053869A1 (ja) * | 2017-09-15 | 2020-10-01 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 基板処理装置、半導体装置の製造方法およびプログラム |
| US11056325B2 (en) | 2017-12-20 | 2021-07-06 | Applied Materials, Inc. | Methods and apparatus for substrate edge uniformity |
| CN110468377B (zh) * | 2018-05-11 | 2022-04-22 | 北京北方华创微电子装备有限公司 | 腔室及半导体加工设备 |
| JP7093850B2 (ja) * | 2018-12-03 | 2022-06-30 | 株式会社アルバック | 成膜装置及び成膜方法 |
| US11961723B2 (en) * | 2018-12-17 | 2024-04-16 | Applied Materials, Inc. | Process kit having tall deposition ring for PVD chamber |
| USD888903S1 (en) | 2018-12-17 | 2020-06-30 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
| US11361982B2 (en) * | 2019-12-10 | 2022-06-14 | Applied Materials, Inc. | Methods and apparatus for in-situ cleaning of electrostatic chucks |
| CN111235535B (zh) * | 2020-01-22 | 2021-11-16 | 北京北方华创微电子装备有限公司 | 一种溅射反应腔室的工艺组件及其溅射反应腔室 |
| US11935728B2 (en) * | 2020-01-31 | 2024-03-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method of manufacturing a semiconductor device |
| US11339466B2 (en) * | 2020-03-20 | 2022-05-24 | Applied Materials, Inc. | Heated shield for physical vapor deposition chamber |
| USD934315S1 (en) | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD941372S1 (en) | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD941371S1 (en) | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| US11380575B2 (en) | 2020-07-27 | 2022-07-05 | Applied Materials, Inc. | Film thickness uniformity improvement using edge ring and bias electrode geometry |
| USD1034491S1 (en) | 2020-07-27 | 2024-07-09 | Applied Materials, Inc. | Edge ring |
| JP7223738B2 (ja) | 2020-11-12 | 2023-02-16 | 株式会社アルバック | スパッタリング装置 |
| US11670493B2 (en) * | 2020-11-13 | 2023-06-06 | Applied Materials, Inc. | Isolator ring clamp and physical vapor deposition chamber incorporating same |
| US11581167B2 (en) | 2021-06-18 | 2023-02-14 | Applied Materials, Inc. | Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber |
| US11915918B2 (en) | 2021-06-29 | 2024-02-27 | Applied Materials, Inc. | Cleaning of sin with CCP plasma or RPS clean |
| US12183559B2 (en) | 2021-10-22 | 2024-12-31 | Applied Materials, Inc. | Apparatus for temperature control in a substrate processing chamber |
| USD1059312S1 (en) * | 2022-08-04 | 2025-01-28 | Applied Materials, Inc. | Deposition ring of a process kit for semiconductor substrate processing |
| USD1069863S1 (en) | 2022-08-04 | 2025-04-08 | Applied Materials, Inc. | Deposition ring of a process kit for semiconductor substrate processing |
| USD1064005S1 (en) | 2022-08-04 | 2025-02-25 | Applied Materials, Inc. | Grounding ring of a process kit for semiconductor substrate processing |
| US20240068086A1 (en) * | 2022-08-29 | 2024-02-29 | Applied Materials, Inc. | Physical Vapor Deposition (PVD) Chamber Titanium-Tungsten (TiW) Target For Particle Improvement |
| CN119968474A (zh) * | 2022-10-05 | 2025-05-09 | 应用材料公司 | 用于基板的掩模、基板支撑件、基板处理设备、用于在基板上进行层沉积的方法和制造一个或多个装置的方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101007833B1 (ko) | 2006-03-07 | 2011-01-13 | 어플라이드 머티어리얼스, 인코포레이티드 | 노치가 형성된 증착 링 |
| KR101267466B1 (ko) | 2004-11-03 | 2013-05-31 | 어플라이드 머티어리얼스, 인코포레이티드 | 지지 링 조립체 |
| KR101322342B1 (ko) * | 2005-10-31 | 2013-10-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판 프로세싱 챔버용 타겟 및 프로세스 키트 |
| KR101504085B1 (ko) * | 2006-12-19 | 2015-03-19 | 어플라이드 머티어리얼스, 인코포레이티드 | 비접촉 프로세스 키트 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6743340B2 (en) * | 2002-02-05 | 2004-06-01 | Applied Materials, Inc. | Sputtering of aligned magnetic materials and magnetic dipole ring used therefor |
| US8221602B2 (en) * | 2006-12-19 | 2012-07-17 | Applied Materials, Inc. | Non-contact process kit |
| KR101571558B1 (ko) | 2008-04-16 | 2015-11-24 | 어플라이드 머티어리얼스, 인코포레이티드 | 웨이퍼 프로세싱 증착 차폐 컴포넌트들 |
| US9799497B2 (en) * | 2013-08-16 | 2017-10-24 | Taiwan Semiconductor Manufacturing Company Limited | Patterned processing kits for material processing |
| US10546733B2 (en) | 2014-12-31 | 2020-01-28 | Applied Materials, Inc. | One-piece process kit shield |
-
2016
- 2016-07-01 KR KR1020187003405A patent/KR102709082B1/ko active Active
- 2016-07-01 SG SG10202108705SA patent/SG10202108705SA/en unknown
- 2016-07-01 JP JP2018500317A patent/JP6976925B2/ja active Active
- 2016-07-01 US US15/201,019 patent/US9909206B2/en active Active
- 2016-07-01 CN CN202311689865.9A patent/CN117867462A/zh active Pending
- 2016-07-01 CN CN201811141495.4A patent/CN109321890A/zh active Pending
- 2016-07-01 WO PCT/US2016/040847 patent/WO2017007729A1/en not_active Ceased
- 2016-07-01 CN CN201680037325.4A patent/CN107787377A/zh active Pending
- 2016-07-04 TW TW105121124A patent/TWI713543B/zh active
- 2016-07-04 TW TW109140346A patent/TWI770678B/zh active
-
2021
- 2021-11-10 JP JP2021183138A patent/JP7289890B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101267466B1 (ko) | 2004-11-03 | 2013-05-31 | 어플라이드 머티어리얼스, 인코포레이티드 | 지지 링 조립체 |
| KR101322342B1 (ko) * | 2005-10-31 | 2013-10-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판 프로세싱 챔버용 타겟 및 프로세스 키트 |
| KR101007833B1 (ko) | 2006-03-07 | 2011-01-13 | 어플라이드 머티어리얼스, 인코포레이티드 | 노치가 형성된 증착 링 |
| KR101504085B1 (ko) * | 2006-12-19 | 2015-03-19 | 어플라이드 머티어리얼스, 인코포레이티드 | 비접촉 프로세스 키트 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6976925B2 (ja) | 2021-12-08 |
| TWI770678B (zh) | 2022-07-11 |
| JP2022022225A (ja) | 2022-02-03 |
| SG10202108705SA (en) | 2021-09-29 |
| CN107787377A (zh) | 2018-03-09 |
| JP7289890B2 (ja) | 2023-06-12 |
| TW201708588A (zh) | 2017-03-01 |
| JP2018519426A (ja) | 2018-07-19 |
| TWI713543B (zh) | 2020-12-21 |
| TW202124746A (zh) | 2021-07-01 |
| CN117867462A (zh) | 2024-04-12 |
| WO2017007729A1 (en) | 2017-01-12 |
| KR20180016628A (ko) | 2018-02-14 |
| CN109321890A (zh) | 2019-02-12 |
| US20170002461A1 (en) | 2017-01-05 |
| US9909206B2 (en) | 2018-03-06 |
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