KR102575019B1 - Core-shell compound, photosensitive resin composition comprising the same, photosensitive resin layer, color filter and cmos image sensor - Google Patents
Core-shell compound, photosensitive resin composition comprising the same, photosensitive resin layer, color filter and cmos image sensor Download PDFInfo
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- KR102575019B1 KR102575019B1 KR1020200022394A KR20200022394A KR102575019B1 KR 102575019 B1 KR102575019 B1 KR 102575019B1 KR 1020200022394 A KR1020200022394 A KR 1020200022394A KR 20200022394 A KR20200022394 A KR 20200022394A KR 102575019 B1 KR102575019 B1 KR 102575019B1
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- formula
- substituted
- photosensitive resin
- unsubstituted
- compound
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 162
- 239000011342 resin composition Substances 0.000 title claims abstract description 74
- 229920005989 resin Polymers 0.000 title claims abstract description 28
- 239000011347 resin Substances 0.000 title claims abstract description 28
- 239000011258 core-shell material Substances 0.000 title claims abstract description 21
- 238000002834 transmittance Methods 0.000 claims description 33
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- 238000010521 absorption reaction Methods 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000001046 green dye Substances 0.000 claims description 4
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 description 76
- 238000003786 synthesis reaction Methods 0.000 description 75
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 40
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 32
- 239000000126 substance Substances 0.000 description 26
- -1 aromatic vinyl compound Chemical class 0.000 description 23
- 239000002904 solvent Substances 0.000 description 22
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- 238000004440 column chromatography Methods 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 20
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 12
- 239000011230 binding agent Substances 0.000 description 11
- 239000003999 initiator Substances 0.000 description 11
- 239000000376 reactant Substances 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 10
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 10
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 10
- 238000004821 distillation Methods 0.000 description 10
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 10
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- 150000002148 esters Chemical class 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
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- 230000005540 biological transmission Effects 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 6
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- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
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- 239000006087 Silane Coupling Agent Substances 0.000 description 4
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- 229920005822 acrylic binder Polymers 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
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- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
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- 238000011156 evaluation Methods 0.000 description 4
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- 229940017219 methyl propionate Drugs 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 235000019260 propionic acid Nutrition 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
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- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
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- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- SFAMKDPMPDEXGH-UHFFFAOYSA-N 2-hydroxyethyl propanoate Chemical compound CCC(=O)OCCO SFAMKDPMPDEXGH-UHFFFAOYSA-N 0.000 description 2
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
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- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- UVWBCPGUUNAHFY-UHFFFAOYSA-N FC1=CC=C2C=CN(C2=C1)C1=CC=C(C=C1)OC Chemical compound FC1=CC=C2C=CN(C2=C1)C1=CC=C(C=C1)OC UVWBCPGUUNAHFY-UHFFFAOYSA-N 0.000 description 2
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- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
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- 125000005907 alkyl ester group Chemical group 0.000 description 2
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 125000000753 cycloalkyl group Chemical group 0.000 description 2
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- 150000002576 ketones Chemical class 0.000 description 2
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- 125000001424 substituent group Chemical group 0.000 description 2
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- 238000000411 transmission spectrum Methods 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- 239000001052 yellow pigment Substances 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- FJKOQFIGFHTRRW-UHFFFAOYSA-N (2-methoxy-3-methylphenyl)-(3-methylphenyl)methanone Chemical compound COC1=C(C)C=CC=C1C(=O)C1=CC=CC(C)=C1 FJKOQFIGFHTRRW-UHFFFAOYSA-N 0.000 description 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
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- BUZYGTVTZYSBCU-UHFFFAOYSA-N 1-(4-chlorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Cl)C=C1 BUZYGTVTZYSBCU-UHFFFAOYSA-N 0.000 description 1
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- PYKHTOHGCVJJMZ-UHFFFAOYSA-N 1-(4-phenylsulfanylphenyl)butan-1-one Chemical compound C1=CC(C(=O)CCC)=CC=C1SC1=CC=CC=C1 PYKHTOHGCVJJMZ-UHFFFAOYSA-N 0.000 description 1
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- VQYUAFDBUVMFKD-UHFFFAOYSA-N 1-(4-phenylsulfanylphenyl)octane-1,2-dione Chemical compound C1=CC(C(=O)C(=O)CCCCCC)=CC=C1SC1=CC=CC=C1 VQYUAFDBUVMFKD-UHFFFAOYSA-N 0.000 description 1
- IMDHDEPPVWETOI-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2,2-trichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)(Cl)Cl)C=C1 IMDHDEPPVWETOI-UHFFFAOYSA-N 0.000 description 1
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- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
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- 239000003960 organic solvent Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
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- CWHJLNJICCBAOK-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-6-yl)ethyl]silane Chemical compound C1CCCC2OC21CC[Si](OC)(OC)OC CWHJLNJICCBAOK-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
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Abstract
코어-쉘 화합물, 이를 포함하는 감광성 수지 조성물, 상기 감광성 수지 조성물을 이용하여 제조되는 감광성 수지막, 상기 감광성 수지막을 포함하는 컬러필터 및 상기 컬러필터를 포함하는 CMOS 이미지 센서가 제공된다.A core-shell compound, a photosensitive resin composition including the same, a photosensitive resin film prepared using the photosensitive resin composition, a color filter including the photosensitive resin film, and a CMOS image sensor including the color filter are provided.
Description
본 기재는 코어-쉘 화합물, 이를 포함하는 감광성 수지 조성물, 상기 감광성 수지 조성물을 이용하여 제조되는 감광성 수지막, 상기 감광성 수지막을 포함하는 컬러필터 및 상기 컬러필터를 포함하는 CMOS 이미지 센서에 관한 것이다.The present disclosure relates to a core-shell compound, a photosensitive resin composition including the same, a photosensitive resin film prepared using the photosensitive resin composition, a color filter including the photosensitive resin film, and a CMOS image sensor including the color filter.
최근 컴퓨터 산업과 통신 산업의 발달에 따라 디지털카메라, 캠코더, PCS(Personal Communication System), 게임기기, 경비용 카메라, 의료용 마이크로 카메라 등 다양한 분야에서 성능이 향상된 이미지 센서의 수요가 증대하고 있다. 이미지 센서로는 전하 결합 소자(CCD: Charge Coupled Device) 및 CMOS 이미지 센서가 있는데, 여기서 CMOS 이미지 센서(이하 CIS) 는 구동방식이 간편하고, 신호처리 회로를 단일칩에 집적할 수 있어 제품의 소형화가 가능하다. 또한 전력소모가 매우 낮아 배터리 용량이 제한적인 제품에 적용이 용이한 장점이 있다. CIS는 기술 개발과 함께 고해상도가 구현 가능함에 따라 사용이 급격하게 늘고 있다.Recently, with the development of the computer industry and the communication industry, demand for image sensors with improved performance is increasing in various fields such as digital cameras, camcorders, personal communication systems (PCS), game devices, security cameras, and medical micro cameras. Image sensors include charge coupled devices (CCD) and CMOS image sensors. Here, CMOS image sensors (hereinafter referred to as CIS) are easy to drive and can integrate signal processing circuits into a single chip, miniaturizing the product. is possible In addition, it has the advantage of being easily applied to products with limited battery capacity due to very low power consumption. The use of CIS is rapidly increasing as high resolution can be realized along with technology development.
CIS 관련 기술동향으로, 고화질 및 기기 소형화 구현을 위한 pixel 수 증가 및 size가 감소되고 있으며, 이에 따라 고투과형 CIS용 감광성 수지 조성물 개발이 진행되고 있다. 녹색, 적색, 청색 컬러필터를 갖는 CIS용 감광성 수지 조성물 중, 일반적으로 녹색 화소는 특정 파장 또는 특정 파장범위에서 만족되어야 하는 투과도가 있다. As a CIS-related technology trend, the number of pixels and the size of pixels are increasing and decreasing in order to implement high-definition and miniaturized devices. Accordingly, development of photosensitive resin compositions for high-permeability CIS is in progress. Among the photosensitive resin compositions for CIS having green, red, and blue color filters, green pixels generally have transmittance that must be satisfied at a specific wavelength or a specific wavelength range.
그러나 현재까지 개발된 CIS용 녹색 감광성 수지 조성물의 경우, 540nm에서의 투과도 및 600nm 내지 640nm에서의 투과도를 동시에 만족시키지 못하고 있어, 혼색 문제가 개선되지 못하고 있으며, 무엇보다도 고투과형 CIS의 제공이 불가하였다.However, in the case of the green photosensitive resin composition for CIS developed so far, the transmittance at 540 nm and the transmittance at 600 nm to 640 nm have not been satisfied at the same time, so the color mixing problem has not been improved, and above all, it has been impossible to provide a high transmittance type CIS. .
일 구현예는 CIS용 컬러필터 내 녹색 화소를 구성하는 코어-쉘 화합물을 제공하기 위한 것이다.One embodiment is to provide a core-shell compound constituting a green pixel in a color filter for CIS.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공하기 위한 것이다.Another embodiment is to provide a photosensitive resin composition containing the compound.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조된 감광성 수지막을 제공하기 위한 것이다.Another embodiment is to provide a photosensitive resin film prepared using the photosensitive resin composition.
또 다른 일 구현예는 상기 감광성 수지막을 포함하는 컬러필터를 제공하기 위한 것이다.Another embodiment is to provide a color filter including the photosensitive resin film.
또 다른 일 구현예는 상기 컬러필터를 포함하는 CIS를 제공하기 위한 것이다.Another embodiment is to provide a CIS including the color filter.
본 발명의 일 구현예는 하기 화학식 1로 표시되는 코어 및 상기 코어를 둘러싸며, 하기 화학식 2로 표시되는 쉘로 이루어진 코어-쉘 화합물을 제공한다.One embodiment of the present invention provides a core-shell compound consisting of a core represented by Formula 1 below and a shell surrounding the core and represented by Formula 2 below.
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 및 화학식 2에서,In Formula 1 and Formula 2,
R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or A substituted or unsubstituted C6 to C20 aryl group,
R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or may be fused with each other to form a fused ring;
R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring;
La 및 Lb는 각각 독립적으로 단일결합 또는 치환 또는 비치환된 C1 내지 C10 알킬렌기이다.L a and L b are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group.
상기 화학식 1로 표시되는 코어는 하기 화학식 1-1로 표시될 수 있다.The core represented by Formula 1 may be represented by Formula 1-1 below.
[화학식 1-1][Formula 1-1]
상기 화학식 1-1에서,In Formula 1-1,
R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or A substituted or unsubstituted C6 to C20 aryl group,
R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or may be fused with each other to form a fused ring;
R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있다.R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring.
상기 화학식 1-1로 표시되는 코어는 하기 화학식 1-1-1 또는 화학식 1-1-2로 표시될 수 있다.The core represented by Chemical Formula 1-1 may be represented by Chemical Formula 1-1-1 or Chemical Formula 1-1-2.
[화학식 1-1-1][Formula 1-1-1]
[화학식 1-1-2][Formula 1-1-2]
상기 화학식 1-1-1 및 화학식 1-1-2에서,In Formula 1-1-1 and Formula 1-1-2,
R1 내지 R3 및 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.R 1 to R 3 and R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 An alkoxy group or a substituted or unsubstituted C6 to C20 aryl group.
상기 R1은 치환 또는 비치환된 C1 내지 C20 알콕시기일 수 있다.R 1 may be a substituted or unsubstituted C1 to C20 alkoxy group.
상기 R2는 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 예컨대 알콕시기로 치환된 C3 내지 C20 사이클로알킬기일 수 있다.R 2 may be a substituted or unsubstituted C3 to C20 cycloalkyl group, for example, a C3 to C20 cycloalkyl group substituted with an alkoxy group.
상기 R3은 치환 또는 비치환된 C6 내지 C20 아릴기, 예컨대 하나 이상의 알킬기로 치환된 C6 내지 C20 아릴기일 수 있다. R 3 may be a substituted or unsubstituted C6 to C20 aryl group, for example, a C6 to C20 aryl group substituted with one or more alkyl groups.
상기 R6는 수소 원자, 할로겐 원자, 시아노기 또는 치환 또는 비치환된 C1 내지 C20 알콕시기일 수 있다.R 6 may be a hydrogen atom, a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group.
상기 화학식 1로 표시되는 코어는 610nm 내지 640nm에서 최대흡광파장을 가질 수 있다.The core represented by Chemical Formula 1 may have a maximum absorption wavelength at 610 nm to 640 nm.
상기 화학식 2로 표시되는 쉘은 하기 화학식 2-1로 표시될 수 있다.The shell represented by Chemical Formula 2 may be represented by Chemical Formula 2-1 below.
[화학식 2-1][Formula 2-1]
상기 코어-쉘 화합물은 하기 화학식 A 내지 화학식 I 중 어느 하나로 표시될 수 있다.The core-shell compound may be represented by any one of Formula A to Formula I below.
[화학식 A][Formula A]
[화학식 B][Formula B]
[화학식 C][Formula C]
[화학식 D][Formula D]
[화학식 E][Formula E]
[화학식 F][Formula F]
[화학식 G][Formula G]
[화학식 H][Formula H]
[화학식 I][Formula I]
상기 코어-쉘 화합물은 녹색 염료일 수 있다.The core-shell compound may be a green dye.
다른 일 구현예는 상기 코어-쉘 화합물을 포함하는 감광성 수지 조성물을 제공한다.Another embodiment provides a photosensitive resin composition including the core-shell compound.
상기 감광성 수지 조성물은 540nm에서 90% 이상의 투과도를 가지고, 600nm 내지 640nm에서 10% 이하의 투과도를 가질 수 있다.The photosensitive resin composition may have transmittance of 90% or more at 540 nm and transmittance of 10% or less at 600 nm to 640 nm.
상기 감광성 수지 조성물은 450nm에서 5% 이하의 투과도를 가질 수 있다.The photosensitive resin composition may have transmittance of 5% or less at 450 nm.
상기 감광성 수지 조성물은 CMOS 이미지 센서용일 수 있다.The photosensitive resin composition may be used for a CMOS image sensor.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조되는 감광성 수지막을 제공한다.Another embodiment provides a photosensitive resin film prepared using the photosensitive resin composition.
또 다른 일 구현예는 상기 감광성 수지막을 포함하는 컬러필터를 제공한다.Another embodiment provides a color filter including the photosensitive resin film.
또 다른 일 구현예는 상기 컬러필터를 포함하는 CMOS 이미지 센서를 제공한다.Another embodiment provides a CMOS image sensor including the color filter.
기타 본 발명의 측면들의 구체적인 사항은 이하의 상세한 설명에 포함되어 있다.The specific details of other aspects of the present invention are included in the detailed description below.
일 구현예에 따른 코어-쉘 화합물을 포함하는 감광성 수지 조성물은 녹색 화소를 형성하여, 고투과도를 가지는 CMOS 이미지 센서용 컬러필터를 제공할 수 있다.The photosensitive resin composition including the core-shell compound according to an embodiment may form a green pixel to provide a color filter for a CMOS image sensor having high transmittance.
도 1은 실시예 1 및 비교예 2에 사용된 녹색 염료(합성예 1 및 비교 합성예 1)의 파장에 따른 흡광도 그래프이다.
도 2는 실시예 1, 비교예 1 및 비교예 2에 따른 감광성 수지 조성물의 파장에 따른 투과도 그래프이다.1 is a graph of absorbance according to wavelength of green dyes (Synthesis Example 1 and Comparative Synthesis Example 1) used in Example 1 and Comparative Example 2.
2 is a graph of transmittance according to wavelength of the photosensitive resin composition according to Example 1, Comparative Example 1, and Comparative Example 2.
이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다. Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, and the present invention is not limited thereby, and the present invention is only defined by the scope of the claims to be described later.
본 명세서에서 특별한 언급이 없는 한, "치환" 내지 "치환된"이란, 본 발명의 작용기 중의 하나 이상의 수소 원자가 할로겐 원자(F, Br, Cl 또는 I), 히드록시기, 니트로기, 시아노기, 아미노기(NH2, NH(R200) 또는 N(R201)(R202)이고, 여기서 R200, R201 및 R202는 동일하거나 서로 상이하며, 각각 독립적으로 C1 내지 C10 알킬기임), 아미디노기, 하이드라진기, 하이드라존기, 카르복실기, 치환 또는 비치환된 알킬기, 치환 또는 비치환된 알케닐기, 치환 또는 비치환된 알키닐기, 치환 또는 비치환된 지환족 유기기, 치환 또는 비치환된 아릴기 및 치환 또는 비치환된 헤테로고리기로 이루어진 군에서 선택되는 1종 이상의 치환기로 치환된 것을 의미한다.Unless otherwise specified herein, "substituted" to "substituted" means that one or more hydrogen atoms in the functional group of the present invention is a halogen atom (F, Br, Cl or I), a hydroxyl group, a nitro group, a cyano group, an amino group ( NH 2 , NH(R 200 ) or N(R 201 )(R 202 ), wherein R 200 , R 201 and R 202 are the same or different from each other, and are each independently a C1 to C10 alkyl group), an amidino group, A hydrazine group, a hydrazone group, a carboxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted alicyclic organic group, a substituted or unsubstituted aryl group, and It means substituted with one or more substituents selected from the group consisting of substituted or unsubstituted heterocyclic groups.
본 명세서에서 특별한 언급이 없는 한, "알킬기"란 C1 내지 C20 알킬기를 의미하고, 구체적으로는 C1 내지 C15 알킬기를 의미하고, "사이클로알킬기"란 C3 내지 C20 사이클로알킬기를 의미하고, 구체적으로는 C3 내지 C18 사이클로알킬기를 의미하고, "알콕시기"란 C1 내지 C20 알콕시기를 의미하고, 구체적으로는 C1 내지 C18 알콕시기를 의미하고, "아릴기"란 C6 내지 C20 아릴기를 의미하고, 구체적으로는 C6 내지 C18 아릴기를 의미하고, "알케닐기"란 C2 내지 C20 알케닐기를 의미하고, 구체적으로는 C2 내지 C18 알케닐기를 의미하고, "알킬렌기"란 C1 내지 C20 알킬렌기를 의미하고, 구체적으로는 C1 내지 C18 알킬렌기를 의미하고, "아릴렌기"란 C6 내지 C20 아릴렌기를 의미하고, 구체적으로는 C6 내지 C16 아릴렌기를 의미한다.In this specification, unless otherwise specified, "alkyl group" means a C1 to C20 alkyl group, specifically means a C1 to C15 alkyl group, and "cycloalkyl group" means a C3 to C20 cycloalkyl group, specifically C3 to C18 cycloalkyl group, "alkoxy group" means a C1 to C20 alkoxy group, specifically means a C1 to C18 alkoxy group, "aryl group" means a C6 to C20 aryl group, and specifically means a C6 to C20 alkoxy group. Means a C18 aryl group, "alkenyl group" means a C2 to C20 alkenyl group, specifically means a C2 to C18 alkenyl group, "alkylene group" means a C1 to C20 alkylene group, specifically C1 to C18 alkylene group, and "arylene group" means a C6 to C20 arylene group, specifically a C6 to C16 arylene group.
본 명세서에서 특별한 언급이 없는 한, "(메타)아크릴레이트"는 "아크릴레이트"와 "메타크릴레이트" 둘 다 가능함을 의미하며, "(메타)아크릴산"은 "아크릴산"과 "메타크릴산" 둘 다 가능함을 의미한다.Unless otherwise specified herein, "(meth)acrylate" means both "acrylate" and "methacrylate", and "(meth)acrylic acid" means "acrylic acid" and "methacrylic acid". Which means both are possible.
본 명세서에서 별도의 정의가 없는 한, "조합"이란 혼합 또는 공중합을 의미한다. 또한 "공중합"이란 블록 공중합 내지 랜덤 공중합을 의미하고, "공중합체"란 블록 공중합체 내지 랜덤 공중합체를 의미한다.Unless otherwise defined herein, "combination" means mixing or copolymerization. Further, "copolymerization" means block copolymerization or random copolymerization, and "copolymer" means block copolymer or random copolymer.
본 명세서 내 화학식에서 별도의 정의가 없는 한, 화학 결합이 그려져야 하는 위치에 화학결합이 그려져 있지 않은 경우는 상기 위치에 수소 원자가 결합되어 있음을 의미한다.Unless otherwise defined in the chemical formula within this specification, if a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.
또한, 본 명세서에서 별도의 정의가 없는 한, "*"는 동일하거나 상이한 원자 또는 화학식과 연결되는 부분을 의미한다.In addition, unless otherwise defined in this specification, "*" means a part connected to the same or different atom or chemical formula.
일 구현예는 하기 화학식 1로 표시되는 코어 및 상기 코어를 둘러싸며, 하기 화학식 2로 표시되는 쉘로 이루어진 코어-쉘 화합물을 제공한다.One embodiment provides a core-shell compound consisting of a core represented by Formula 1 below and a shell surrounding the core and represented by Formula 2 below.
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 및 화학식 2에서,In Formula 1 and Formula 2,
R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or A substituted or unsubstituted C6 to C20 aryl group,
R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or may be fused with each other to form a fused ring;
R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring;
La 및 Lb는 각각 독립적으로 단일결합 또는 치환 또는 비치환된 C1 내지 C10 알킬렌기이다.L a and L b are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group.
녹색 화소의 투과 스펙트럼에서 600nm 내지 640nm의 범위 내 임의 파장에서 광투과율 10% 이하를 만족하게 될 경우, 혼색(crosstalk) 개선이 가능하여 고투과형 CIS용 감광성 수지 조성물을 구현할 수 있으며 이에 따라 고화질 화상을 구현할 수 있다. When the light transmittance of 10% or less is satisfied at any wavelength within the range of 600 nm to 640 nm in the transmission spectrum of the green pixel, crosstalk can be improved to implement a photosensitive resin composition for high transmission type CIS, thereby providing high quality images. can be implemented
이에 단파장 영역에서 다른 흡광을 가지지 않고, 흡광 기준 반치폭을 최소화하여 원하는 파장 영역을 선택적으로 흡수할 수 있는 스쿠아릴륨계 염료를 사용하여 고투과형 CIS용 감광성 수지 조성물을 구현하려는 노력이 계속되고 있는데, 여전히 만족할만한 수준의 조성물 구현은 이루어지지 않고 있다. 이에 본 발명의 발명자들은 상기와 같은 특정 구조의 비대칭형 스쿠아릴륨계 염료를 사용하여 CIS용 감광성 수지 조성물을 제조하여 투과 스펙트럼을 측정하였더니, 고투과형 녹색 감광성 수지 조성물의 투과율 조건(500nm 내지 600nm의 범위 내의 임의의 파장, 예컨대 540nm에서의 파장에서 광투과율이 90% 이상인 조건과 600nm 내지 640nm의 파장범위 내의 임의의 파장에서 광투과율이 10% 이하인 조건)을 만족하였음을 확인하였다. Accordingly, efforts are being made to realize a photosensitive resin composition for high transmission CIS using a squarylium-based dye that does not have other light absorption in the short wavelength region and can selectively absorb a desired wavelength region by minimizing the absorption reference half-width, but still A satisfactory level of composition implementation has not been achieved. Accordingly, the inventors of the present invention prepared a photosensitive resin composition for CIS using the asymmetrical squarylium-based dye having a specific structure as described above and measured the transmission spectrum. It was confirmed that the condition that the light transmittance is 90% or more at any wavelength within the range, for example, the condition that the light transmittance is 10% or less at any wavelength within the wavelength range of 600 nm to 640 nm) was satisfied.
나아가, 상기와 같은 특정 구조의 비대칭형 스쿠아릴륨계 화합물은 610nm 내지 640nm에서 최대흡광파장을 가지는 경우 장파장 영역(600nm 내지 640nm)에서의 투과도가 더욱 개선(10% 이하)됨을 확인할 수 있었다.Furthermore, it was confirmed that the transmittance in the long wavelength region (600 nm to 640 nm) was further improved (less than 10%) when the asymmetric squarylium-based compound having a specific structure as described above had a maximum absorption wavelength at 610 nm to 640 nm.
예컨대, 상기 화학식 1로 표시되는 코어는 하기 화학식 1-1로 표시될 수 있다.For example, the core represented by Chemical Formula 1 may be represented by Chemical Formula 1-1 below.
[화학식 1-1][Formula 1-1]
상기 화학식 1-1에서,In Formula 1-1,
R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or A substituted or unsubstituted C6 to C20 aryl group,
R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or may be fused with each other to form a fused ring;
R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있다.R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring.
예컨대, 상기 화학식 1-1로 표시되는 코어는 하기 화학식 1-1-1 또는 화학식 1-1-2로 표시될 수 있다.For example, the core represented by Chemical Formula 1-1 may be represented by Chemical Formula 1-1-1 or Chemical Formula 1-1-2.
[화학식 1-1-1][Formula 1-1-1]
[화학식 1-1-2][Formula 1-1-2]
상기 화학식 1-1-1 및 화학식 1-1-2에서,In Formula 1-1-1 and Formula 1-1-2,
R1 내지 R3 및 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.R 1 to R 3 and R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 An alkoxy group or a substituted or unsubstituted C6 to C20 aryl group.
예컨대, 상기 R1은 치환 또는 비치환된 C1 내지 C20 알콕시기일 수 있다.For example, R 1 may be a substituted or unsubstituted C1 to C20 alkoxy group.
예컨대, 상기 R2는 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 예컨대 알콕시기로 치환된 C3 내지 C20 사이클로알킬기일 수 있다.For example, R 2 may be a substituted or unsubstituted C3 to C20 cycloalkyl group, for example, a C3 to C20 cycloalkyl group substituted with an alkoxy group.
예컨대, 상기 R3은 치환 또는 비치환된 C6 내지 C20 아릴기, 예컨대 하나 이상의 알킬기로 치환된 C6 내지 C20 아릴기일 수 있다.For example, R 3 may be a substituted or unsubstituted C6 to C20 aryl group, for example, a C6 to C20 aryl group substituted with one or more alkyl groups.
예컨대, 상기 R6는 수소 원자, 할로겐 원자, 시아노기 또는 치환 또는 비치환된 C1 내지 C20 알콕시기일 수 있다.For example, R 6 may be a hydrogen atom, a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group.
예컨대, 상기 화학식 1로 표시되는 코어는 610nm 내지 640nm에서 최대흡광파장을 가질 수 있다. 유기용매에 대한 용해도가 10% 이상으로 우수한 용해도를 가지는 염료 화합물이라 하여도 610nm 내지 640nm에서 최대흡광파장을 가지지 못할 경우, 고투과형 CIS용 녹색 감광성 수지 조성물로 사용되기에 부적합할 수 있다.For example, the core represented by Chemical Formula 1 may have a maximum absorption wavelength at 610 nm to 640 nm. Even if a dye compound having an excellent solubility in an organic solvent of 10% or more does not have a maximum absorption wavelength at 610 nm to 640 nm, it may be unsuitable for use as a high transmission type CIS green photosensitive resin composition.
상기 화학식 2로 표시되는 쉘은 하기 화학식 2-1로 표시될 수 있다.The shell represented by Chemical Formula 2 may be represented by Chemical Formula 2-1 below.
[화학식 2-1][Formula 2-1]
예컨대, 상기 코어-쉘 화합물은 하기 화학식 A 내지 화학식 I 중 어느 하나로 표시될 수 있으나, 반드시 이에 한정되는 것은 아니다.For example, the core-shell compound may be represented by any one of Formulas A to Formula I below, but is not necessarily limited thereto.
[화학식 A][Formula A]
[화학식 B][Formula B]
[화학식 C][Formula C]
[화학식 D][Formula D]
[화학식 E][Formula E]
[화학식 F][Formula F]
[화학식 G][Formula G]
[화학식 H][Formula H]
[화학식 I][Formula I]
예컨대, 상기 코어-쉘 화합물은 녹색 염료일 수 있다.For example, the core-shell compound may be a green dye.
다른 일 구현예에 따르면, 상기 일 구현예에 따른 코어-쉘 화합물을 포함하는 감광성 수지 조성물을 제공한다.According to another embodiment, a photosensitive resin composition including the core-shell compound according to the embodiment is provided.
예컨대, 상기 감광성 수지 조성물은 540nm에서 90% 이상의 투과도를 가질 수 있고, 600nm 내지 640nm에서 10% 이하의 투과도를 가질 수 있고, 450nm에서 5% 이하의 투과도를 가질 수 있어, 고투과형 CIS용 녹색 컬러필터 구현에 적합할 수 있다. 즉, 상기 감광성 수지 조성물은 고투과형 CMOS 이미지 센서용일 수 있다.For example, the photosensitive resin composition may have a transmittance of 90% or more at 540 nm, a transmittance of 10% or less between 600 nm and 640 nm, and a transmittance of 5% or less at 450 nm, which is a green color for high transmission type CIS. May be suitable for filter implementation. That is, the photosensitive resin composition may be used for a high transmission type CMOS image sensor.
상기 감광성 수지 조성물은 상기 코어-쉘 화합물, 바인더 수지, 광중합성 화합물, 광중합 개시제 및 용매를 더 포함할 수 있다.The photosensitive resin composition may further include the core-shell compound, a binder resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
일 구현예에 따른 코어-쉘 화합물은 상기 감광성 수지 조성물 총량에 대해 1 중량% 내지 10 중량%, 예컨대 3 중량% 내지 7 중량%로 포함될 수 있다. 상기 범위로 일 구현예에 따른 코어-쉘 화합물이 포함될 경우 색재현율 및 명암비가 우수해진다. The core-shell compound according to one embodiment may be included in an amount of 1 wt % to 10 wt %, for example, 3 wt % to 7 wt %, based on the total amount of the photosensitive resin composition. When the core-shell compound according to one embodiment is included in the above range, the color gamut and contrast ratio are excellent .
상기 감광성 수지 조성물은 안료, 예컨대 황색 안료, 녹색 안료 또는 이들의 조합을 더 포함할 수 있다.The photosensitive resin composition may further include a pigment such as a yellow pigment, a green pigment, or a combination thereof.
상기 황색 안료는 컬러 인덱스(Color Index) 내에서 C.I. 안료 황색 138, C.I. 안료 황색 139, C.I. 안료 황색 150 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상 혼합하여 사용할 수 있다. The yellow pigment is C.I. Pigment Yellow 138, C.I. Pigment Yellow 139, C.I. Pigment Yellow 150 etc. are mentioned, These can be used individually or in mixture of 2 or more types.
상기 녹색 안료는 컬러 인덱스(Color Index) 내에서 C.I. 안료 녹색 36, C.I. 안료 녹색 58, C.I. 안료 녹색 59 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상 혼합하여 사용할 수 있다.The green pigment is C.I. Pigment Green 36, C.I. Pigment Green 58, C.I. Pigment Green 59 etc. are mentioned, These can be used individually or in mixture of 2 or more types.
상기 안료는 안료분산액의 형태로 상기 감광성 수지 조성물에 포함될 수 있다.The pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
상기 안료분산액은 고형분의 안료, 용제 및 상기 용제 내에 상기 안료를 균일하게 분산시키기 위한 분산제를 포함할 수 있다.The pigment dispersion may include a solid pigment, a solvent, and a dispersant for uniformly dispersing the pigment in the solvent.
상기 고형분의 안료는 안료분산액 총량에 대하여 1 중량%내지 20 중량%, 예컨대 8 중량% 내지 20 중량%, 예컨대 8 중량% 내지 15 중량%, 예컨대 10 중량% 내지 20 중량%, 예컨대 10 중량% 내지 15 중량%로 포함될 수 있다.The solid content of the pigment is 1% to 20% by weight, such as 8% to 20% by weight, such as 8% to 15% by weight, such as 10% to 20% by weight, such as 10% to 20% by weight, based on the total amount of the pigment dispersion. 15% by weight.
상기 분산제로는 비이온성 분산제, 음이온성 분산제, 양이온성 분산제 등을 사용할 수 있다. 상기 분산제의 구체적인 예로는, 폴리알킬렌글리콜 및 이의 에스테르, 폴리옥시알킬렌, 다가알코올 에스테르 알킬렌 옥사이드 부가물, 알코올알킬렌 옥사이드 부가물, 술폰산 에스테르, 술폰산 염, 카르복실산 에스테르, 카르복실산 염, 알킬아미드 알킬렌 옥사이드 부가물, 알킬 아민 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.As the dispersing agent, a nonionic dispersing agent, an anionic dispersing agent, a cationic dispersing agent, and the like may be used. Specific examples of the dispersant include polyalkylene glycols and esters thereof, polyoxyalkylenes, polyhydric alcohol esters, alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, carboxylic acid esters, and carboxylic acids. salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more.
상기 분산제의 시판되는 제품을 예로 들면, BYK社의 DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 등; EFKA 케미칼社의EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 등; Zeneka社의 Solsperse 5000,Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000 등; 또는 Ajinomoto社의 PB711, PB821 등이 있다.For example, commercially available products of the dispersant include DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK from BYK. -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 and the like from EFKA Chemical; Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000 from Zeneka; Or Ajinomoto's PB711, PB821, etc.
상기 분산제는 안료분산액 총량에 대하여 1 중량% 내지 20 중량%로 포함될 수 있다. 분산제가 상기 범위 내로 포함될 경우, 적절한 점도를 유지할 수 있어감광성 수지 조성물의 분산성이 우수하며, 이로 인해 제품 적용시 광학적, 물리적 및 화학적 품질을 유지할 수 있다.The dispersing agent may be included in an amount of 1% to 20% by weight based on the total amount of the pigment dispersion. When the dispersant is included within the above range, an appropriate viscosity can be maintained, and thus the photosensitive resin composition has excellent dispersibility, thereby maintaining optical, physical and chemical qualities during product application.
상기 안료분산액을 형성하는 용제로는 에틸렌글리콜 아세테이트, 에틸셀로솔브, 프로필렌글리콜 메틸에테르아세테이트, 에틸락테이트, 폴리에틸렌글리콜, 사이클로헥사논, 프로필렌글리콜 메틸에테르 등을 사용할 수 있다. Ethylene glycol acetate, ethyl cellosolve, propylene glycol methyl ether acetate, ethyl lactate, polyethylene glycol, cyclohexanone, propylene glycol methyl ether, and the like may be used as the solvent forming the pigment dispersion.
상기 안료분산액은 상기 감광성 수지 조성물 총량에 대하여 10 중량% 내지 20 중량%, 예컨대 12 중량% 내지 18 중량%로 포함될 수 있다. 상기 안료분산액이 상기 범위 내로 포함될 경우, 공정마진 확보에 유리하고, 색재현율 및 명암비가 우수해진다.The pigment dispersion may be included in an amount of 10 wt % to 20 wt %, for example, 12 wt % to 18 wt %, based on the total amount of the photosensitive resin composition. When the pigment dispersion is included within the above range, it is advantageous to secure a process margin, and the color reproduction rate and contrast ratio are excellent.
상기 바인더 수지는 아크릴계 바인더 수지일 수 있다.The binder resin may be an acrylic binder resin.
상기 아크릴계 바인더 수지는 제1 에틸렌성 불포화 단량체 및 이와 공중합 가능한 제2 에틸렌성 불포화 단량체의 공중합체로, 하나 이상의 아크릴계 반복단위를 포함하는 수지이다. The acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and includes one or more acrylic repeating units.
상기 제1 에틸렌성 불포화 단량체는 하나 이상의 카르복시기를 함유하는 에틸렌성 불포화 단량체이며, 이의 구체적인 예로는 아크릴산, 메타크릴산, 말레산, 이타콘산, 푸마르산또는 이들의 조합을 들 수 있다.The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
상기 제1 에틸렌성 불포화 단량체는 상기 아크릴계 바인더 수지 총량에 대하여 5 중량% 내지 50 중량%, 예컨대 10 중량% 내지 40 중량%로 포함될 수 있다.The first ethylenically unsaturated monomer may be included in an amount of 5 wt % to 50 wt %, for example, 10 wt % to 40 wt %, based on the total amount of the acrylic binder resin.
상기 제2 에틸렌성 불포화 단량체는 스티렌, α-메틸스티렌, 비닐톨루엔, 비닐벤질메틸에테르 등의 방향족 비닐 화합물; 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 부틸(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, 2-히드록시 부틸(메타)아크릴레이트, 벤질(메타)아크릴레이트, 사이클로헥실(메타)아크릴레이트, 페닐(메타)아크릴레이트 등의 불포화 카르복시산 에스테르 화합물; 2-아미노에틸(메타)아크릴레이트, 2-디메틸아미노에틸(메타)아크릴레이트 등의 불포화 카르복시산 아미노 알킬 에스테르 화합물; 초산비닐, 안식향산 비닐 등의 카르복시산 비닐 에스테르 화합물; 글리시딜(메타)아크릴레이트 등의 불포화 카르복시산 글리시딜 에스테르 화합물; (메타)아크릴로니트릴 등의 시안화 비닐 화합물; (메타)아크릴아미드 등의 불포화 아미드 화합물; 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, or vinylbenzylmethyl ether; Methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxy butyl (meth)acrylate, benzyl (meth)acrylate, unsaturated carboxylic acid ester compounds such as cyclohexyl (meth)acrylate and phenyl (meth)acrylate; Unsaturated carboxylic acid amino alkyl ester compounds, such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; carboxylic acid vinyl ester compounds such as vinyl acetate and vinyl benzoate; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; vinyl cyanide compounds such as (meth)acrylonitrile; unsaturated amide compounds such as (meth)acrylamide; and the like, and these may be used alone or in combination of two or more.
상기 아크릴계 바인더 수지의 구체적인 예로는 (메타)아크릴산/벤질메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌 공중합체, (메타)아크릴산/벤질메타크릴레이트/2-히드록시에틸메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌/2-히드록시에틸메타크릴레이트 공중합체 등을 들 수 있으나, 이에 한정되는 것은 아니며, 이들을 단독 또는 2종 이상을 배합하여 사용할 수도 있다.Specific examples of the acrylic binder resin include (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/2-hydroxyethyl methacrylate. acrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer, etc., but are not limited thereto, and may be used alone or in combination of two or more thereof. there is.
상기 바인더 수지의 중량평균 분자량은 3,000 g/mol 내지 150,000 g/mol, 예컨대 5,000 g/mol 내지 50,000 g/mol, 예컨대 20,000 g/mol 내지 30,000 g/mol 일 수 있다. 상기 바인더 수지의 중량평균 분자량이 상기 범위 내일 경우, 상기 감광성 수지 조성물의 물리적 및 화학적 물성이 우수하고 점도가 적절하며, 컬러필터 제조 시 기판과의 밀착성이 우수하다. The weight average molecular weight of the binder resin may be 3,000 g/mol to 150,000 g/mol, eg 5,000 g/mol to 50,000 g/mol, eg 20,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the binder resin is within the above range, the photosensitive resin composition has excellent physical and chemical properties, appropriate viscosity, and excellent adhesion to a substrate when manufacturing a color filter.
상기 바인더 수지의 산가는 15 mgKOH/g 내지 60 mgKOH/g, 예컨대 20 mgKOH/g 내지 50 mgKOH/g 일 수 있다. 상기 바인더 수지의 산가가 상기 범위 내일 경우 픽셀 패턴의 해상도가 우수하다.The acid value of the binder resin may be 15 mgKOH/g to 60 mgKOH/g, for example, 20 mgKOH/g to 50 mgKOH/g. When the acid value of the binder resin is within the above range, the pixel pattern resolution is excellent.
상기 바인더 수지는 상기 감광성 수지 조성물 총량에 대하여 1 중량% 내지 30 중량%, 예컨대 1 중량% 내지 20 중량%로 포함될 수 있다. 상기 바인더 수지가 상기 범위 내로 포함될 경우, 컬러필터 제조 시 현상성이 우수하며 가교성이 개선되어 우수한 표면 평활도를 얻을 수 있다.The binder resin may be included in an amount of 1 wt % to 30 wt %, for example, 1 wt % to 20 wt %, based on the total amount of the photosensitive resin composition. When the binder resin is included within the above range, it is possible to obtain excellent surface smoothness due to excellent developability and improved crosslinking property during manufacture of the color filter.
상기 광중합성 화합물은 적어도 1개의 에틸렌성 불포화 이중결합을 가지는 (메타)아크릴산의 일관능 또는 다관능 에스테르가 사용될 수 있다.The photopolymerizable compound may be a monofunctional or multifunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond.
상기 광중합성 화합물은 상기 에틸렌성 불포화 이중결합을 가짐으로써, 패턴 형성 공정에서 노광시 충분한 중합을 일으킴으로써 내열성, 내광성 및 내화학성이 우수한 패턴을 형성할 수 있다.Since the photopolymerizable compound has the ethylenically unsaturated double bond, it can form a pattern having excellent heat resistance, light resistance and chemical resistance by causing sufficient polymerization during exposure in the pattern forming process.
상기 광중합성 화합물의 구체적인 예로는, 에틸렌 글리콜 디(메타)아크릴레이트, 디에틸렌 글리콜 디(메타)아크릴레이트, 트리에틸렌 글리콜 디(메타)아크릴레이트, 프로필렌 글리콜 디(메타)아크릴레이트, 네오펜틸 글리콜 디(메타)아크릴레이트, 1,4-부탄디올 디(메타)아크릴레이트, 1,6-헥산디올 디(메타)아크릴레이트, 비스페놀A 디(메타)아크릴레이트, 펜타에리트리톨 디(메타)아크릴레이트, 펜타에리트리톨 트리(메타)아크릴레이트, 펜타에리트리톨 테트라(메타)아크릴레이트, 펜타에리트리톨 헥사(메타)아크릴레이트, 디펜타에리트리톨 디(메타)아크릴레이트, 디펜타에리트리톨 트리(메타)아크릴레이트, 디펜타에리트리톨 펜타(메타)아크릴레이트, 디펜타에리트리톨 헥사(메타)아크릴레이트, 비스페놀A 에폭시(메타)아크릴레이트, 에틸렌 글리콜 모노메틸에테르 (메타)아크릴레이트, 트리메틸올 프로판 트리(메타)아크릴레이트, 트리스(메타)아크릴로일옥시에틸 포스페이트, 노볼락에폭시 (메타)아크릴레이트등을 들 수 있다. Specific examples of the photopolymerizable compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, neopentyl glycol Di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate , pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate Acrylates, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy(meth)acrylate, ethylene glycol monomethyl ether (meth)acrylate, trimethylol propane tri( meth)acrylate, tris(meth)acryloyloxyethyl phosphate, novolac epoxy (meth)acrylate, and the like.
상기 광중합성 화합물의 시판되는 제품을 예로 들면 다음과 같다. 상기 (메타)아크릴산의 일관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-101®, 동 M-111®, 동 M-114® 등; 니혼 가야꾸(주)社의 KAYARAD TC-110S®, 동 TC-120S® 등; 오사카 유끼 가가꾸 고교(주)社의 V-158®, V-2311® 등을 들 수 있다. 상기 (메타)아크릴산의 이관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-210®, 동 M-240®, 동 M-6200® 등; 니혼 가야꾸(주)社의 KAYARAD HDDA®, 동 HX-220®, 동 R-604® 등; 오사카 유끼 가가꾸 고교(주)社의 V-260®, V-312®, V-335 HP® 등을 들 수 있다. 상기 (메타)아크릴산의 삼관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-309®, 동 M-400®, 동 M-405®, 동 M-450®, 동 M-710®, 동 M-8030®, 동 M-8060® 등; 니혼 가야꾸(주)社의 KAYARAD TMPTA®, 동 DPCA-20®, 동-30®, 동-60®, 동-120® 등; 오사카 유끼 가야꾸 고교(주)社의 V-295®, 동-300®, 동-360®, 동-GPT®, 동-3PA®, 동-400® 등을 들 수 있다. 상기 제품을 단독 사용 또는 2종 이상 함께 사용할 수 있다.Examples of commercially available products of the photopolymerizable compound are as follows. Examples of monofunctional esters of (meth)acrylic acid include Aronix M- 101® , M- 111® , and M- 114® from Toagosei Chemical Industry Co., Ltd.; KAYARAD TC-110S ® of Nippon Kayaku Co., Ltd., the same TC-120S ® , etc.; Osaka Yuki Kagaku Kogyo Co., Ltd.'s V- 158® , V- 2311® , etc. are mentioned. Examples of the bifunctional ester of (meth)acrylic acid include Aronix M- 210® , M- 240® , and M- 6200® of Toagosei Chemical Industry Co., Ltd.; KAYARAD HDDA ® from Nippon Kayaku Co., Ltd., HX-220 ® , R-604 ® , etc.; Examples include V- 260® , V- 312® , and V-335 HP® of Osaka Yuki Kagaku Kogyo Co., Ltd. Examples of the trifunctional ester of (meth)acrylic acid include Aronix M- 309® , M- 400® , M- 405® , M- 450® , and M from Toagosei Chemical Industry Co., Ltd. -710 ® , copper M-8030 ® , copper M-8060 ® , etc.; KAYARAD TMPTA ® from Nippon Kayaku Co., Ltd., Copper DPCA-20 ® , Copper-30 ® , Copper-60 ® , Copper-120 ® , etc.; V-295 ® , Dong-300 ® , Dong-360 ® , Dong-GPT ® , Dong-3PA ® , Dong-400 ® and the like of Osaka Yuki Kayaku Kogyo Co., Ltd. These products may be used alone or in combination of two or more.
상기 광중합성 화합물은 보다 우수한 현상성을 부여하기 위하여 산무수물로 처리하여 사용할 수도 있다.The photopolymerizable compound may be used after being treated with an acid anhydride to impart better developability.
상기 광중합성 화합물은 상기 감광성 수지 조성물 총량에 대하여 1중량% 내지 15중량%, 예컨대 5중량% 내지 10 중량%로 포함될 수 있다. 광중합성 화합물이 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광 시 경화가 충분히 일어나 신뢰성이 우수하며, 알칼리 현상액에의 현상성이 우수하다.The photopolymerizable compound may be included in an amount of 1 wt % to 15 wt %, for example, 5 wt % to 10 wt %, based on the total amount of the photosensitive resin composition. When the photopolymerizable compound is included within the above range, sufficient curing occurs during exposure in the pattern forming process, resulting in excellent reliability and excellent developability with an alkaline developer.
상기 광중합 개시제는 감광성 수지 조성물에 일반적으로 사용되는 개시제로서, 예를 들어 아세토페논계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 벤조인계 화합물, 트리아진계 화합물, 옥심계 화합물, 또는 이들의 조합을 사용할 수 있다. The photopolymerization initiator is an initiator generally used in photosensitive resin compositions, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, or a combination thereof. can be used.
상기 아세토페논계 화합물의 예로는, 2,2'-디에톡시 아세토페논, 2,2'-디부톡시 아세토페논, 2-히드록시-2-메틸프로피오페논, p-t-부틸트리클로로 아세토페논, p-t-부틸디클로로 아세토페논, 4-클로로 아세토페논, 2,2'-디클로로-4-페녹시 아세토페논, 2-메틸-1-(4-(메틸티오)페닐)-2-모폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모폴리노페닐)-부탄-1-온 등을 들 수 있다.Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloro acetophenone, p-t -Butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.
상기 벤조페논계 화합물의 예로는, 벤조페논, 벤조일 안식향산, 벤조일 안식향산 메틸, 4-페닐 벤조페논, 히드록시 벤조페논, 아크릴화 벤조페논, 4,4'-비스(디메틸아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논, 4,4'-디메틸아미노벤조페논, 4,4'-디클로로벤조페논, 3,3'-디메틸-2-메톡시벤조페논 등을 들 수 있다.Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.
상기 티오크산톤계 화합물의 예로는, 티오크산톤, 2-메틸티오크산톤, 이소프로필 티오크산톤, 2,4-디에틸 티오크산톤, 2,4-디이소프로필 티오크산톤, 2-클로로티오크산톤 등을 들 수 있다.Examples of the thioxanthone-based compound include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.
상기 벤조인계 화합물의 예로는, 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르, 벤질디메틸케탈 등을 들 수 있다.Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethylketal.
상기 트리아진계 화합물의 예로는, 2,4,6-트리클로로-s-트리아진, 2-페닐 4,6-비스(트리클로로메틸)-s-트리아진, 2-(3', 4'-디메톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4'-메톡시나프틸)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-톨릴)-4,6-비스(트리클로로 메틸)-s-트리아진, 2-비페닐 4,6-비스(트리클로로 메틸)-s-트리아진, 비스(트리클로로메틸)-6-스티릴-s-트리아진, 2-(나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-4-비스(트리클로로메틸)-6-피페로닐-s-트리아진, 2-4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-s-트리아진 등을 들 수 있다.Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'- Dimethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4'-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)-4, 6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis (trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, and the like.
상기 옥심계 화합물의 예로는, O-아실옥심계 화합물, 2-(o-벤조일옥심)-1-[4-(페닐티오)페닐]-1,2-옥탄디온, 1-(o-아세틸옥심)-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄온, O-에톡시카르보닐-α-옥시아미노-1-페닐프로판-1-온 등을 사용할 수 있다. 상기 O-아실옥심계 화합물의 구체적인 예로는, 1,2-옥탄디온, 2-디메틸아미노-2-(4-메틸벤질)-1-(4-모르폴린-4-일-페닐)-부탄-1-온, 1-(4-페닐술파닐페닐)-부탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1-온옥심-O-아세테이트 및 1-(4-페닐술파닐페닐)-부탄-1-온옥심-O-아세테이트 등을 들 수 있다. Examples of the oxime-based compound include O-acyloxime-based compounds, 2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(o-acetyloxime) )-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one etc. can be used. Specific examples of the O-acyloxime compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione 2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione 2 -Oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octan-1-one oxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butan-1-one oxime-O- Acetate etc. are mentioned.
상기 광중합 개시제는 상기 화합물 이외에도 카바졸계 화합물, 디케톤류 화합물, 술포늄 보레이트계 화합물, 디아조계 화합물, 이미다졸계 화합물, 비이미다졸계 화합물, 플루오렌계 화합물 등을 사용할 수 있다.As the photopolymerization initiator, a carbazole-based compound, a diketone compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, a fluorene-based compound, and the like may be used in addition to the above compounds.
상기 광중합 개시제는 빛을 흡수하여 들뜬 상태가 된 후 그 에너지를 전달함으로써 화학반응을 일으키는 광 증감제와 함께 사용될 수도 있다.The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light, becoming excited, and then transferring the energy thereto.
상기 광 증감제의 예로는, 테트라에틸렌글리콜 비스-3-머캡토 프로피오네이트, 펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트, 디펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트 등을 들 수 있다. Examples of the photosensitizer include tetraethylene glycol bis-3-mercapto propionate, pentaerythritol tetrakis-3-mercapto propionate, dipentaerythritol tetrakis-3-mercapto propionate, and the like. can be heard
상기 광중합 개시제는 상기 감광성 수지 조성물 총량에 대하여 0.01 중량% 내지 10 중량%, 예컨대 0.1 중량% 내지 5 중량%로 포함될 수 있다. 광중합 개시제가 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 충분히 일어나 우수한 신뢰성을 얻을 수 있으며, 패턴의 내열성, 내광성 및 내화학성이 우수하고, 해상도 및 밀착성 또한 우수하며, 미반응 개시제로 인한 투과율의 저하를 막을 수 있다.The photopolymerization initiator may be included in an amount of 0.01 wt % to 10 wt %, for example, 0.1 wt % to 5 wt %, based on the total amount of the photosensitive resin composition. When the photopolymerization initiator is included within the above range, excellent reliability can be obtained due to sufficient curing during exposure in the pattern forming process, excellent heat resistance, light resistance and chemical resistance of the pattern, excellent resolution and adhesion, and due to the unreacted initiator A decrease in transmittance can be prevented.
상기 용매는 일 구현예에 따른 코어-쉘 화합물, 안료, 바인더 수지, 광중합성 화합물 및 광중합 개시제와의 상용성을 가지되 반응하지 않는 물질들이 사용될 수 있다.As the solvent, materials that have compatibility with the core-shell compound, pigment, binder resin, photopolymerizable compound, and photopolymerization initiator according to one embodiment but do not react may be used.
상기 용매의 예로는, 메탄올, 에탄올 등의 알코올류; 디클로로에틸 에테르, n-부틸 에테르, 디이소아밀 에테르, 메틸페닐 에테르, 테트라히드로퓨란 등의 에테르류; 에틸렌 글리콜 모노메틸에테르, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 메틸 셀로솔브 아세테이트, 에틸 셀로솔브 아세테이트, 디에틸 셀로솔브 아세테이트 등의 셀로솔브 아세테이트류; 메틸에틸 카르비톨, 디에틸 카르비톨, 디에틸렌 글리콜 모노메틸에테르, 디에틸렌 글리콜 모노에틸에테르, 디에틸렌 글리콜 디메틸에테르, 디에틸렌 글리콜 메틸에틸에테르, 디에틸렌 글리콜 디에틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 톨루엔, 크실렌 등의 방향족 탄화수소류; 메틸에틸케톤, 사이클로헥사논, 4-히드록시-4-메틸-2-펜타논, 메틸-n-프로필케톤, 메틸-n-부틸케톤, 메틸-n-아밀케톤, 2-헵타논 등의 케톤류; 초산 에틸, 초산-n-부틸, 초산 이소부틸 등의 포화 지방족 모노카르복실산 알킬 에스테르류; 젖산 메틸, 젖산 에틸 등의 젖산 에스테르류; 옥시 초산 메틸, 옥시 초산 에틸, 옥시 초산 부틸 등의 옥시 초산 알킬 에스테르류; 메톡시 초산 메틸, 메톡시 초산 에틸, 메톡시 초산 부틸, 에톡시 초산 메틸, 에톡시 초산 에틸 등의 알콕시 초산 알킬 에스테르류; 3-옥시 프로피온산 메틸, 3-옥시 프로피온산 에틸 등의 3-옥시 프로피온산 알킬에스테르류; 3-메톡시 프로피온산 메틸, 3-메톡시 프로피온산 에틸, 3-에톡시 프로피온산 에틸, 3-에톡시 프로피온산 메틸 등의 3-알콕시 프로피온산 알킬 에스테르류; 2-옥시 프로피온산 메틸, 2-옥시 프로피온산 에틸, 2-옥시 프로피온산 프로필 등의 2-옥시 프로피온산 알킬 에스테르류; 2-메톡시 프로피온산 메틸, 2-메톡시 프로피온산 에틸, 2-에톡시 프로피온산 에틸, 2-에톡시 프로피온산 메틸 등의 2-알콕시 프로피온산 알킬 에스테르류; 2-옥시-2-메틸 프로피온산 메틸, 2-옥시-2-메틸 프로피온산 에틸 등의 2-옥시-2-메틸 프로피온산 에스테르류, 2-메톡시-2-메틸 프로피온산 메틸, 2-에톡시-2-메틸 프로피온산 에틸 등의 2-알콕시-2-메틸 프로피온산 알킬류의 모노옥시 모노카르복실산 알킬 에스테르류; 2-히드록시 프로피온산 에틸, 2-히드록시-2-메틸 프로피온산 에틸, 히드록시 초산 에틸, 2-히드록시-3-메틸 부탄산 메틸 등의 에스테르류; 피루빈산 에틸 등의 케톤산 에스테르류 등이 있으며, 또한, N-메틸포름아미드, N,N-디메틸포름아미드, N-메틸포름아닐라드, N-메틸아세트아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 벤질에틸에테르, 디헥실에테르, 아세틸아세톤, 이소포론, 카프론산, 카프릴산, 1-옥탄올, 1-노난올, 벤질알코올, 초산 벤질, 안식향산 에틸, 옥살산 디에틸, 말레인산 디에틸, γ부티로락톤, 탄산 에틸렌, 탄산 프로필렌, 페닐 셀로솔브 아세테이트 등의 고비점 용매를 들 수 있다.Examples of the solvent include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Cellosolve acetates, such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons, such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate and isobutyl acetate; lactic acid esters such as methyl lactate and ethyl lactate; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; Alkoxy acetic acid alkyl esters, such as methoxy methyl acetate, methoxy ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxy propionic acid alkyl esters such as 3-oxy methyl propionate and 3-oxy ethyl propionate; 3-alkoxy propionic acid alkyl esters such as 3-methoxy methyl propionate, 3-methoxy ethyl propionate, 3-ethoxy ethyl propionate, and 3-ethoxy methyl propionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, and propyl 2-oxypropionate; 2-alkoxy propionic acid alkyl esters such as 2-methoxy methyl propionate, 2-methoxy ethyl propionate, 2-ethoxy ethyl propionate, and 2-ethoxy methyl propionate; 2-oxy-2-methyl propionic acid esters such as 2-oxy-2-methyl methyl propionate, 2-oxy-2-methyl ethyl propionate, 2-methoxy-2-methyl methyl propionate, 2-ethoxy-2- monooxy monocarboxylic acid alkyl esters of 2-alkoxy-2-methyl alkyl propionate such as methyl ethyl propionate; esters such as 2-hydroxy ethyl propionate, 2-hydroxy-2-methyl ethyl propionate, hydroxy ethyl acetate, and 2-hydroxy-3-methyl methyl butanoate; ketonic acid esters such as ethyl pyruvate, etc., and also N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, N,N-dimethylacetamide , N-methylpyrrolidone, dimethylsulfoxide, benzylethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid and high boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.
이들 중 좋게는 상용성 및 반응성을 고려하여, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 에틸 셀로솔브 아세테이트 등의 에틸렌 글리콜 알킬에테르 아세테이트류; 2-히드록시 프로피온산 에틸 등의 에스테르류; 디에틸렌 글리콜 모노메틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 및/또는 사이클로헥사논 등의 케톤류가 사용될 수 있다.Among these, considering compatibility and reactivity, glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as 2-hydroxy ethyl propionate; carbitols such as diethylene glycol monomethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; and/or ketones such as cyclohexanone may be used.
상기 용매는 상기 감광성 수지 조성물 총량에 대하여 잔부량, 예컨대 30 중량% 내지 80 중량%로 포함될 수 있다. 용매가 상기 범위 내로 포함될 경우 상기 감광성 수지 조성물이 적절한 점도를 가짐에 따라 컬러필터 제조시 공정성이 우수하다.The solvent may be included in a balance amount, for example, 30 wt % to 80 wt %, based on the total amount of the photosensitive resin composition. When the solvent is included within the above range, the photosensitive resin composition has an appropriate viscosity, and therefore, processability in manufacturing the color filter is excellent.
다른 일 구현예에 따른 감광성 수지 조성물은 기판과의 밀착성 등을 개선하기 위해 에폭시 화합물을 더 포함할 수 있다. The photosensitive resin composition according to another embodiment may further include an epoxy compound to improve adhesion to a substrate.
상기 에폭시 화합물의 예로는, 페놀 노볼락 에폭시 화합물, 테트라메틸 비페닐 에폭시 화합물, 비스페놀 A형 에폭시 화합물, 지환족 에폭시화합물 또는 이들의 조합을 들 수 있다.Examples of the epoxy compound include a phenol novolak epoxy compound, a tetramethyl biphenyl epoxy compound, a bisphenol A type epoxy compound, an alicyclic epoxy compound, or a combination thereof.
상기 에폭시 화합물은 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 20 중량부, 예컨대 0.1 중량부 내지 10 중량부로 포함될 수 있다. 에폭시 화합물이 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. The epoxy compound may be included in an amount of 0.01 part by weight to 20 parts by weight, for example, 0.1 part by weight to 10 parts by weight, based on 100 parts by weight of the photosensitive resin composition. When the epoxy compound is included within the above range, adhesion, storability, and the like are excellent.
또한 상기 감광성 수지 조성물은 기판과의 접착성을 향상시키기 위해 카르복실기, 메타크릴로일기, 이소시아네이트기, 에폭시기 등의 반응성 치환기를 갖는 실란 커플링제를 더 포함할 수 있다.In addition, the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, or an epoxy group to improve adhesion to a substrate.
상기 실란 커플링제의 예로는, 트리메톡시실릴 벤조산, γ-메타크릴 옥시프로필 트리메톡시실란, 비닐 트리아세톡시실란, 비닐 트리메톡시실란, γ-이소시아네이트 프로필 트리에톡시실란, γ-글리시독시 프로필 트리메톡시실란, β-(에폭시사이클로헥실)에틸트리메톡시실란 등을 들 수 있으며, 이들을 단독 또는 2종 이상 혼합하여 사용할 수 있다. Examples of the silane coupling agent include trimethoxysilyl benzoic acid, γ-methacryloxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ-isocyanate propyl triethoxysilane, γ-glycidox cypropyltrimethoxysilane, β-(epoxycyclohexyl)ethyltrimethoxysilane, and the like, and these may be used alone or in combination of two or more.
상기 실란 커플링제는 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 10 중량부로 포함될 수 있다. 실란 커플링제가 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. The silane coupling agent may be included in an amount of 0.01 part by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included within the above range, adhesion, storability, and the like are excellent.
또한 상기 감광성 수지 조성물은 필요에 따라 코팅성 향상 및 결점 생성 방지 효과를 위해 계면 활성제를 더 포함할 수 있다. In addition, the photosensitive resin composition may further include a surfactant to improve coating properties and prevent defect formation, if necessary.
상기 계면활성제의 예로는, BM Chemie社의 BM-1000®, BM-1100® 등; 다이 닛폰 잉키 가가꾸 고교(주)社의 메카 팩 F 142D®, 동 F 172®, 동 F 173®, 동 F 183® 등; 스미토모 스리엠(주)社의 프로라드 FC-135®, 동 FC-170C®, 동 FC-430®, 동 FC-431® 등; 아사히 그라스(주)社의 사프론 S-112®, 동 S-113®, 동 S-131®, 동 S-141®, 동 S-145® 등; 도레이 실리콘(주)社의 SH-28PA®, 동-190®, 동-193®, SZ-6032®, SF-8428® 등의 명칭으로 시판된고 있는 불소계 계면 활성제를 사용할 수 있다.Examples of the surfactant, BM Chemie's BM-1000 ® , BM-1100 ® and the like; Mecha Pack F 142D ® , F 172 ® , F 173 ® , F 183 ® and the like of Dainippon Inki Kagaku Kogyo Co., Ltd.; Prorad FC-135 ® , FC-170C ® , FC-430 ® , FC-431 ® and the like of Sumitomo 3M Co., Ltd.; Saffron S-112 ® , S-113 ® , S-131 ® , S-141 ® , S-145 ® and the like of Asahi Grass Co., Ltd.; Fluorine-based surfactants commercially available under names such as SH-28PA ® , Copper-190 ® , Copper-193 ® , SZ-6032 ® , SF-8428 ® from Toray Silicone Co., Ltd. can be used.
상기 계면 활성제는 감광성 수지 조성물 100 중량부에 대하여 0.001 중량부 내지 5 중량부로 사용될 수 있다. 계면 활성제가 상기 범위 내로 포함될 경우 코팅 균일성이 확보되고, 얼룩이 발생하지 않으며, 유리 기판에 대한 습윤성(wetting)이 우수하다.The surfactant may be used in an amount of 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is included within the above range, coating uniformity is secured, stains are not generated, and wettability to a glass substrate is excellent.
또한 상기 감광성 수지 조성물은 물성을 저해하지 않는 범위 내에서 산화방지제, 안정제 등의 기타 첨가제가 일정량 첨가될 수도 있다.In addition, a certain amount of other additives such as antioxidants and stabilizers may be added to the photosensitive resin composition within a range that does not impair physical properties.
또 다른 일 구현예에 따르면, 상기 일 구현예에 따른 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공한다. According to another embodiment, a color filter manufactured using the photosensitive resin composition according to the embodiment is provided.
상기 컬러필터 내 패턴 형성 공정은 다음과 같다.A process of forming a pattern in the color filter is as follows.
상기 감광성 수지 조성물을 지지 기판상에 스핀 코팅, 슬릿 코팅, 잉크젯 프린팅 등으로 도포하는 공정; 상기 도포된 감광성 수지 조성물을 건조하여 감광성 수지 조성물 막을 형성하는 공정; 상기 감광성 수지 조성물 막을 노광하는 공정; 상기 노광된 감광성 수지 조성물 막을 알칼리 수용액으로 현상하여 감광성 수지막을 제조하는 공정; 및 상기 감광성 수지막을 가열 처리하는 공정을 포함한다. 상기 공정 상의 조건 등에 대하여는 당해 분야에서 널리 알려진 사항이므로, 본 명세서에서 자세한 설명은 생략하기로 한다. applying the photosensitive resin composition on a support substrate by spin coating, slit coating, inkjet printing, or the like; drying the applied photosensitive resin composition to form a film of the photosensitive resin composition; exposing the film of the photosensitive resin composition to light; preparing a photosensitive resin film by developing the exposed photosensitive resin composition film with an aqueous alkali solution; and a step of heat-treating the photosensitive resin film. Since the process conditions and the like are widely known in the art, a detailed description thereof will be omitted in the present specification.
또 다른 일 구현예는 상기 컬러필터를 포함하는 CMOS 이미지 센서를 제공한다.Another embodiment provides a CMOS image sensor including the color filter.
이하, 실시예를 들어 본 발명에 대해서 더욱 상세하게 설명할 것이나, 하기의 실시예는 본 발명의 바람직한 실시예일 뿐 본 발명이 하기 실시예에 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to examples, but the following examples are only preferred examples of the present invention and the present invention is not limited to the following examples.
(화합물의 합성)(Synthesis of compounds)
합성예 1: 화학식 A로 표시되는 화합물의 합성Synthesis Example 1: Synthesis of Compound Represented by Formula A
3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 A로 표시되는 화합물을 얻는다. 3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL) and refluxed, and the resulting water was removed with a Dean-stark distillation device. do. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by Formula A below.
[화학식 A][Formula A]
Maldi-tof MS : 1243.5 m/zMaldi-tof MS: 1243.5 m/z
합성예 2: 화학식 B로 표시되는 화합물의 합성Synthesis Example 2: Synthesis of Compound Represented by Formula B
3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-6-methoxy-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 B로 표시되는 화합물을 얻는다. 3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-6-methoxy-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL) and refluxed, and the resulting water was prepared by Dean-stark removed by distillation. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by Formula B below.
[화학식 B][Formula B]
Maldi-tof MS : 1273.58 m/zMaldi-tof MS : 1273.58 m/z
합성예 3: 화학식 C로 표시되는 화합물의 합성Synthesis Example 3: Synthesis of Compound Represented by Formula C
3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole-6-carbonitrile (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 C로 표시되는 화합물을 얻는다.3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole-6-carbonitrile (60 mmol) was added to toluene (200 mL) and butanol (200 mL) and refluxed, and the resulting water was dean-stark removed by distillation. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by Formula C below.
[화학식 C][Formula C]
Maldi-tof MS : 1268.73 m/zMaldi-tof MS : 1268.73 m/z
합성예 4: 화학식 D로 표시되는 화합물의 합성Synthesis Example 4: Synthesis of Compound Represented by Formula D
3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-6-fluoro-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 D로 표시되는 화합물을 얻는다.3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-6-fluoro-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL) and refluxed. removed by distillation. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by Formula D below.
[화학식 D][Formula D]
Maldi-tof MS : 1261.73 m/zMaldi-tof MS : 1261.73 m/z
합성예 5: 화학식 E로 표시되는 화합물의 합성Synthesis Example 5: Synthesis of Compound Represented by Formula E
3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 6-Fluoro-1-(4-methoxy-phenyl)-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 E로 표시되는 화합물을 얻는다.3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3- Produced by refluxing ene-1,2-dione (60 mmol) and 6-Fluoro-1-(4-methoxy-phenyl)-1H-indole (60 mmol) in toluene (200 mL) and butanol (200 mL) The water is removed with a Dean-stark distillation device. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by Formula E below.
[화학식 E][Formula E]
Maldi-tof MS : 1251.75 m/zMaldi-tof MS : 1251.75 m/z
합성예 6: 화학식 F로 표시되는 화합물의 합성Synthesis Example 6: Synthesis of Compound Represented by Formula F
3-Hydroxy-4-(2,3,6,7-tetrahydro-1H,5H-pyrido[3,2,1-ij]quinolin-9-yl)-cyclobut-3-ene-1,2-dione (60 mmol), 6-Fluoro-1-(4-methoxy-phenyl)-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 F로 표시되는 화합물을 얻는다.3-Hydroxy-4-(2,3,6,7-tetrahydro-1H,5H-pyrido[3,2,1-ij]quinolin-9-yl)-cyclobut-3-ene-1,2-dione ( 60 mmol), 6-Fluoro-1-(4-methoxy-phenyl)-1H-indole (60 mmol) in toluene (200 mL) and butanol (200 mL) and reflux the resulting water into a Dean-stark distillation device remove with After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by Formula F below.
[화학식 F] [Formula F]
Maldi-tof MS : 1027.49 m/zMaldi-tof MS: 1027.49 m/z
합성예 7: 화학식 G로 표시되는 화합물의 합성Synthesis Example 7: Synthesis of Compound Represented by Formula G
3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 4-Indol-1-yl-benzonitrile (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 G로 표시되는 화합물을 얻는다.3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3- After putting ene-1,2-dione (60 mmol) and 4-indol-1-yl-benzonitrile (60 mmol) in toluene (200 mL) and butanol (200 mL) and refluxing it, the water produced is a Dean-stark distillation device remove with After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by Formula G below.
[화학식 G][Formula G]
Maldi-tof MS : 1242.54 m/zMaldi-tof MS : 1242.54 m/z
합성예 8: 화학식 H로 표시되는 화합물의 합성Synthesis Example 8: Synthesis of Compound Represented by Formula H
3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-(4-Fluoro-phenyl)-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 H로 표시되는 화합물을 얻는다.3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3- After adding ene-1,2-dione (60 mmol) and 1-(4-Fluoro-phenyl)-1H-indole (60 mmol) to toluene (200 mL) and butanol (200 mL) and refluxing, the resulting water was deaned. Remove with -stark distillation equipment. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by Formula H below.
[화학식 H][Formula H]
Maldi-tof MS : 1221.67 m/zMaldi-tof MS : 1221.67 m/z
합성예 9: 화학식 I로 표시되는 화합물의 합성Synthesis Example 9: Synthesis of Compound Represented by Formula I
3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 I로 표시되는 화합물을 얻는다.3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3- Ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole (60 mmol) were added to toluene (200 mL) and butanol (200 mL) and refluxed. The resulting water is removed with a Dean-stark distillation device. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (I).
[화학식 I][Formula I]
Maldi-tof MS : 1331.81 m/zMaldi-tof MS: 1331.81 m/z
비교 합성예 1: 화학식 C-1로 표시되는 화합물의 합성Comparative Synthesis Example 1: Synthesis of Compound Represented by Formula C-1
Propionic acid 2-{(2-cyano-ethyl)-[4-(2-hydroxy-3,4-dioxo-cyclobut-1-enyl)-phenyl]-amino}-ethyl ester (60 mmol), 1-(2-Ethyl-hexyl)-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 C-1로 표시되는 화합물을 얻는다.Propionic acid 2-{(2-cyano-ethyl)-[4-(2-hydroxy-3,4-dioxo-cyclobut-1-enyl)-phenyl]-amino}-ethyl ester (60 mmol), 1-( 2-Ethyl-hexyl)-1H-indole (60 mmol) is added to toluene (200 mL) and butanol (200 mL) and refluxed, and the resulting water is removed using a Dean-stark distillation apparatus. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squailium-based compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and added dropwise at room temperature for 5 hours at the same time. After 12 hours, it was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula C-1.
[화학식 C-1][Formula C-1]
Maldi-tof MS : 1088.48 m/zMaldi-tof MS: 1088.48 m/z
평가 1: 최대흡광파장 측정Evaluation 1: Maximum absorption wavelength measurement
상기 합성예 1 및 합성예 9 내지 비교 합성예 1에 따른 화합물을, 희석 용제(ANONE)를 이용하여 0.001wt%의 농도로 제조하여, 상기 합성예 1 및 합성예 9 내지 비교 합성예 1에 따른 코어-쉘 화합물 각각에 대한 흡수스펙트럼을 얻었으며, 그 결과를 하기 표 1 및 도 1에 나타내었다.(UV-1800, SHIMADZU)Compounds according to Synthesis Example 1 and Synthesis Example 9 to Comparative Synthesis Example 1 were prepared at a concentration of 0.001 wt% using a diluting solvent (ANONE), and according to Synthesis Example 1 and Synthesis Example 9 to Comparative Synthesis Example 1 Absorption spectra were obtained for each of the core-shell compounds, and the results are shown in Table 1 and FIG. 1. (UV-1800, SHIMADZU)
평가 2: 용해도 측정Evaluation 2: Solubility measurement
상기 합성예 1 내지 합성예 9 및 비교 합성예 1에 따른 화합물 0.5 g에, 희석 용제(PGMEA)를 각각 첨가하고, 해당 용액을 믹스 로터(iuchi 주식회사, MIXROTAR VMR-5)로 25℃100 rpm로 1시간 동안 교반한 후, 각각의 화합물의 용해도 확인 결과를 하기 표 2에 나타내었다.A diluting solvent (PGMEA) was added to 0.5 g of the compound according to Synthesis Examples 1 to 9 and Comparative Synthesis Example 1, respectively, and the solution was stirred at 25°C and 100 rpm with a mix rotor (Iuchi Co., Ltd., MIXROTAR VMR-5). After stirring for 1 hour, the results of checking the solubility of each compound are shown in Table 2 below.
용해도 평가 기준Solubility Evaluation Criteria
희석용제 총량에 대해 화합물(용질)이 10 중량% 이상 용해: ○10% by weight or more of the compound (solute) dissolved in the total amount of the diluent: ○
희석용제 총량에 대해 화합물(용질)이 10 중량% 미만 용해: XDissolves less than 10% by weight of the compound (solute) relative to the total amount of diluent: X
상기 표 2로부터, 합성예 1 내지 합성예 9의 화합물 및 비교 합성예 1의 화합물 모두 용해도가 우수한 것을 확인할 수 있다.From Table 2, it can be confirmed that both the compounds of Synthesis Examples 1 to 9 and the compound of Comparative Synthesis Example 1 have excellent solubility.
(감광성 수지 조성물의 합성)(Synthesis of photosensitive resin composition)
실시예 1Example 1
하기 언급된 구성성분들을 하기 표 3에 나타낸 조성으로 혼합하여 실시예 1에 따른 감광성 수지 조성물을 제조하였다.The photosensitive resin composition according to Example 1 was prepared by mixing the components mentioned below in the composition shown in Table 3 below.
구체적으로, 용매에 광중합 개시제를 녹인 후 2 시간 동안 상온에서 교반한 다음, 여기에 바인더 수지 및 광중합성 화합물을 첨가하여 2시간 동안 상온에서 교반하였다. 이어서, 얻어진 상기 반응물에 착색제로서 상기 합성예 1에서 제조된 화합물(화학식 A로 표시되는 화합물) 및 안료(안료분산액 형태)를 넣고 1시간 동안 상온에서 교반하였다. 이어 상기 생성물을 3회 여과하여 불순물을 제거함으로써, 감광성 수지 조성물을 제조하였다.Specifically, after dissolving the photopolymerization initiator in a solvent, the mixture was stirred at room temperature for 2 hours, and then a binder resin and a photopolymerizable compound were added thereto and stirred at room temperature for 2 hours. Subsequently, the compound prepared in Synthesis Example 1 (compound represented by Formula A) and a pigment (in the form of a pigment dispersion) as a coloring agent were added to the obtained reactant and stirred at room temperature for 1 hour. Subsequently, a photosensitive resin composition was prepared by filtering the product three times to remove impurities.
분자량(Mw)=22,000g/mol
(A): 메타크릴산
(B): 벤질메타크릴레이트(A)/(B)=15/85(w/w),
Molecular Weight (Mw)=22,000g/mol
(A): methacrylic acid
(B): benzyl methacrylate
실시예 2Example 2
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 2의 화합물(화학식 B로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except for using the compound of Synthesis Example 2 (compound represented by Formula B) instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 3Example 3
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 3의 화합물(화학식 C로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 3 (compound represented by Formula C) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 4Example 4
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 4의 화합물(화학식 D로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 4 (compound represented by Formula D) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 5Example 5
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 5의 화합물(화학식 E로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 5 (compound represented by Formula E) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 6Example 6
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 6의 화합물(화학식 F로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 6 (compound represented by Formula F) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 7Example 7
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 7의 화합물(화학식 G로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 7 (compound represented by Formula G) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 8Example 8
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 8의 화합물(화학식 H로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 8 (compound represented by Formula H) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 9Example 9
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 9의 화합물(화학식 I로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 9 (compound represented by Formula I) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
비교예 1Comparative Example 1
착색제로 합성예 1의 화합물(화학식 A로 표시되는 화합물)을 사용하지 않은 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 1 (compound represented by Formula A) was not used as a coloring agent.
비교예 2Comparative Example 2
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 비교 합성예 1의 화합물(화학식 C-1로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Comparative Synthesis Example 1 (compound represented by Formula C-1) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A). .
평가 3: 색좌표, 휘도 및 명암비 측정Evaluation 3: Measurement of color coordinates, luminance and contrast ratio
탈지 세척한 두께 1 mm의 유리 기판 상에 1 ㎛ 내지 3 ㎛의 두께로 상기 실시예 1 내지 실시예 9, 비교예 1 및 비교예 2에서 제조한 감광성 수지 조성물을 도포하고, 90℃의 핫 플레이트 상에서 2분 동안 건조시켜 도막을 수득하였다. 계속해서 도막에 365nm의 주파장을 가진 고압수은램프를 사용하여 노광하였다. 이 후, 200℃의 열풍순환식 건조로 안에서 5분 동안 건조시켜 샘플을 수득하였다. 분광광도계(MCPD3000, Otsuka electronic社)를 이용하여 450nm, 540nm 및 620nm의 파장에서의 상기 샘플의 투과율을 측정하여 그 결과를 하기 표 4 및 도 2에 기재하였다.The photosensitive resin composition prepared in Examples 1 to 9, Comparative Example 1 and Comparative Example 2 was applied to a thickness of 1 μm to 3 μm on a glass substrate having a thickness of 1 mm washed and degreased, and a hot plate at 90 ° C. dried for 2 minutes on top to obtain a coating film. Subsequently, the coating film was exposed to light using a high-pressure mercury lamp having a dominant wavelength of 365 nm. Thereafter, a sample was obtained by drying for 5 minutes in a hot air circulation drying furnace at 200 ° C. The transmittance of the sample was measured at wavelengths of 450 nm, 540 nm and 620 nm using a spectrophotometer (MCPD3000, Otsuka electronic Co.), and the results are shown in Table 4 and FIG. 2 below.
상기 표 4로부터, 일 구현예에 따른 코어-쉘 화합물을 염료로 포함하는 실시예 1 내지 실시예 9의 감광성 수지 조성물이 상기 화합물을 포함하지 않은 비교예 1 및 비교예 2의 감광성 수지 조성물과 비교하여, 450nm에서의 투과도는 5% 이하인 조건, 540nm에서의 투과도는 90% 이상인 조건 및 620nm에서의 투과도는 10% 이하인 조건을 모두 만족시킴으로써, 이를 녹색 감광성 수지 조성물로 이용하여 고투과형 CIS의 제조가 가능함을 확인할 수 있다. (비교예 2의 경우 540nm에서의 투과도는 90% 이하인데, 이는 일반적인 CIS용 녹색 감광성 수지 조성물에 적용 불가능한 투과도이다. 또한, 450nm에서의 투과도는 5% 이하인 조건, 540nm에서의 투과도는 90% 이상인 조건을 만족함과 동시에, 620nm에서의 투과도가 10% 이하로 낮을 경우, 혼색 개선이 가능하며, 궁극적으로 고투과형 CIS 녹색 컬러필터의 제조를 가능하게 한다.)From Table 4, the photosensitive resin compositions of Examples 1 to 9 containing the core-shell compound according to one embodiment as a dye were compared with the photosensitive resin compositions of Comparative Examples 1 and 2 not containing the compound. Thus, the transmittance at 450 nm is 5% or less, the transmittance at 540 nm is 90% or more, and the transmittance at 620 nm is 10% or less. By using this as a green photosensitive resin composition, high transmittance type CIS can be manufactured. You can check if it is possible. (In the case of Comparative Example 2, the transmittance at 540 nm is 90% or less, which is a transmittance that is not applicable to a general CIS green photosensitive resin composition. In addition, the transmittance at 450 nm is 5% or less, and the transmittance at 540 nm is 90% or more When the condition is satisfied and the transmittance at 620 nm is as low as 10% or less, color mixing can be improved, ultimately enabling the manufacture of a high transmission type CIS green color filter.)
이상 본 발명의 바람직한 실시예에 대하여 설명하였지만, 본 발명은 이에 한정되는 것이 아니고, 특허청구범위와 발명의 상세한 설명 및 첨부한 도면의 범위 안에서 여러 가지로 변형하여 실시하는 것이 가능하고, 이 또한 본 발명의 범위에 속하는 것은 당연하다.Although the preferred embodiments of the present invention have been described above, the present invention is not limited thereto, and it is possible to carry out various modifications within the scope of the claims and the detailed description of the invention and the accompanying drawings, and this is also the present invention. It goes without saying that it falls within the scope of the invention.
Claims (20)
상기 코어를 둘러싸며, 하기 화학식 2로 표시되는 쉘로 이루어진 코어-쉘 화합물:
[화학식 1-1-1]
[화학식 1-1-2]
[화학식 2]
상기 화학식 1-1-1에서,
R1 내지 R3 및 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,
상기 화학식 1-1-2에서,
R1은 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,
R6은 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,
상기 화학식 2에서,
La 및 Lb는 각각 독립적으로 단일결합 또는 치환 또는 비치환된 C1 내지 C10 알킬렌기이다.
A core represented by Formula 1-1-1 or Formula 1-1-2 below; and
A core-shell compound consisting of a shell surrounding the core and represented by Formula 2 below:
[Formula 1-1-1]
[Formula 1-1-2]
[Formula 2]
In Formula 1-1-1,
R 1 to R 3 and R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 An alkoxy group or a substituted or unsubstituted C6 to C20 aryl group,
In Formula 1-1-2,
R 1 is a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
R 6 is a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group Gigo,
In Formula 2,
L a and L b are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group.
상기 R1은 치환 또는 비치환된 C1 내지 C20 알콕시기인 화합물.
According to claim 1,
Wherein R 1 is a substituted or unsubstituted C1 to C20 alkoxy group.
상기 R2는 치환 또는 비치환된 C3 내지 C20 사이클로알킬기인 화합물.
According to claim 4,
Wherein R 2 is a substituted or unsubstituted C3 to C20 cycloalkyl group.
상기 R2는 알콕시기로 치환된 C3 내지 C20 사이클로알킬기인 화합물.
According to claim 5,
Wherein R 2 is a C3 to C20 cycloalkyl group substituted with an alkoxy group.
상기 R3은 치환 또는 비치환된 C6 내지 C20 아릴기인 화합물.
According to claim 4,
Wherein R 3 is a substituted or unsubstituted C6 to C20 aryl group.
상기 R3은 하나 이상의 알킬기로 치환된 C6 내지 C20 아릴기인 화합물.
According to claim 7,
Wherein R 3 is a C6 to C20 aryl group substituted with one or more alkyl groups.
상기 화학식 1-1-1에서, R6는 수소 원자, 할로겐 원자, 시아노기 또는 치환 또는 비치환된 C1 내지 C20 알콕시기이고,
상기 화학식 1-1-2에서, R6는 할로겐 원자, 시아노기 또는 치환 또는 비치환된 C1 내지 C20 알콕시기인 화합물.
According to claim 1,
In Formula 1-1-1, R 6 is a hydrogen atom, a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group;
In Formula 1-1-2, R 6 is a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group.
상기 화학식 1로 표시되는 코어는 610nm 내지 640nm에서 최대흡광파장을 가지는 화합물.
According to claim 1,
The core represented by Formula 1 is a compound having a maximum absorption wavelength at 610 nm to 640 nm.
상기 화학식 2로 표시되는 쉘은 하기 화학식 2-1로 표시되는 화합물.
[화학식 2-1]
According to claim 1,
The shell represented by Formula 2 is a compound represented by Formula 2-1.
[Formula 2-1]
상기 코어-쉘 화합물은 하기 화학식 A 내지 화학식 I 중 어느 하나로 표시되는 화합물.
[화학식 A]
[화학식 B]
[화학식 C]
[화학식 D]
[화학식 E]
[화학식 F]
[화학식 G]
[화학식 H]
[화학식 I]
According to claim 1,
The core-shell compound is a compound represented by any one of Formulas A to Formula I.
[Formula A]
[Formula B]
[Formula C]
[Formula D]
[Formula E]
[Formula F]
[Formula G]
[Formula H]
[Formula I]
상기 화합물은 녹색 염료인 화합물.
According to claim 1,
The compound is a green dye compound.
A photosensitive resin composition comprising the compound of any one of claims 1 and 4 to 13.
상기 감광성 수지 조성물은 540nm에서 90% 이상의 투과도를 가지고, 600nm 내지 640nm에서 10% 이하의 투과도를 가지는 감광성 수지 조성물.
According to claim 14,
The photosensitive resin composition has a transmittance of 90% or more at 540 nm and a transmittance of 10% or less at 600 nm to 640 nm.
상기 감광성 수지 조성물은 450nm에서 5% 이하의 투과도를 가지는 감광성 수지 조성물.
According to claim 15,
The photosensitive resin composition has a transmittance of 5% or less at 450 nm.
상기 감광성 수지 조성물은 CMOS 이미지 센서용인 감광성 수지 조성물.
According to claim 15,
The photosensitive resin composition is a photosensitive resin composition for a CMOS image sensor.
A photosensitive resin film prepared using the photosensitive resin composition of claim 14.
A color filter comprising the photosensitive resin film of claim 18.
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JP2022549813A JP7425218B2 (en) | 2020-02-24 | 2021-02-08 | Core-shell compounds, photosensitive resin compositions containing the same, photosensitive resin films, color filters, and CMOS image sensors |
CN202180009974.4A CN114981364B (en) | 2020-02-24 | 2021-02-08 | Core-shell compound, photosensitive resin composition including the same, photosensitive resin layer, color filter, and CMOS image sensor |
PCT/KR2021/001615 WO2021172787A1 (en) | 2020-02-24 | 2021-02-08 | Core-shell compound, photosensitive resin composition comprising same, photosensitive resin film, color filter, and cmos image sensor |
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