WO2021172787A1 - Core-shell compound, photosensitive resin composition comprising same, photosensitive resin film, color filter, and cmos image sensor - Google Patents
Core-shell compound, photosensitive resin composition comprising same, photosensitive resin film, color filter, and cmos image sensor Download PDFInfo
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- WO2021172787A1 WO2021172787A1 PCT/KR2021/001615 KR2021001615W WO2021172787A1 WO 2021172787 A1 WO2021172787 A1 WO 2021172787A1 KR 2021001615 W KR2021001615 W KR 2021001615W WO 2021172787 A1 WO2021172787 A1 WO 2021172787A1
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- Prior art keywords
- formula
- substituted
- photosensitive resin
- compound
- unsubstituted
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 164
- 239000011342 resin composition Substances 0.000 title claims abstract description 72
- 229920005989 resin Polymers 0.000 title claims abstract description 29
- 239000011347 resin Substances 0.000 title claims abstract description 29
- 239000011258 core-shell material Substances 0.000 title claims abstract description 21
- 238000002834 transmittance Methods 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 13
- 125000005843 halogen group Chemical group 0.000 claims description 13
- 238000010521 absorption reaction Methods 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000001046 green dye Substances 0.000 claims description 4
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 description 76
- 238000003786 synthesis reaction Methods 0.000 description 75
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 40
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 33
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- 239000002904 solvent Substances 0.000 description 22
- 239000000049 pigment Substances 0.000 description 21
- -1 polyoxyalkylene Polymers 0.000 description 21
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- 238000004440 column chromatography Methods 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 18
- 239000000203 mixture Substances 0.000 description 15
- 239000000126 substance Substances 0.000 description 14
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 12
- 239000011230 binding agent Substances 0.000 description 11
- 239000000376 reactant Substances 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 10
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 10
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 10
- 238000004821 distillation Methods 0.000 description 10
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000002270 dispersing agent Substances 0.000 description 9
- 239000006185 dispersion Substances 0.000 description 9
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 8
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- 239000003999 initiator Substances 0.000 description 8
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- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
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- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
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- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 229940022663 acetate Drugs 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 229940017219 methyl propionate Drugs 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
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- BULRAJRWRCUGCN-UHFFFAOYSA-N CC1=C(C=CC(=C1)C)N(C1=CC=C(C=C1)C=1C(C(C=1O)=O)=O)C1C(CCCC1)OC Chemical compound CC1=C(C=CC(=C1)C)N(C1=CC=C(C=C1)C=1C(C(C=1O)=O)=O)C1C(CCCC1)OC BULRAJRWRCUGCN-UHFFFAOYSA-N 0.000 description 4
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- 229920005822 acrylic binder Polymers 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
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- 238000004519 manufacturing process Methods 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 3
- PWWCNEOLXYYULN-UHFFFAOYSA-N CC1=C(C=CC(=C1)C)N(C1=CC=C(C=C1)C=1C(C(C=1O)=O)=O)C1C(CCCC1)OCCOCCOC Chemical compound CC1=C(C=CC(=C1)C)N(C1=CC=C(C=C1)C=1C(C(C=1O)=O)=O)C1C(CCCC1)OCCOCCOC PWWCNEOLXYYULN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000001056 green pigment Substances 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- 229940044192 2-hydroxyethyl methacrylate Drugs 0.000 description 2
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
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- UVWBCPGUUNAHFY-UHFFFAOYSA-N FC1=CC=C2C=CN(C2=C1)C1=CC=C(C=C1)OC Chemical compound FC1=CC=C2C=CN(C2=C1)C1=CC=C(C=C1)OC UVWBCPGUUNAHFY-UHFFFAOYSA-N 0.000 description 2
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- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
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- 230000005540 biological transmission Effects 0.000 description 2
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- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 229910052731 fluorine Inorganic materials 0.000 description 2
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- 238000005259 measurement Methods 0.000 description 2
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
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- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- 239000001052 yellow pigment Substances 0.000 description 2
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- FJKOQFIGFHTRRW-UHFFFAOYSA-N (2-methoxy-3-methylphenyl)-(3-methylphenyl)methanone Chemical compound COC1=C(C)C=CC=C1C(=O)C1=CC=CC(C)=C1 FJKOQFIGFHTRRW-UHFFFAOYSA-N 0.000 description 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
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- BUZYGTVTZYSBCU-UHFFFAOYSA-N 1-(4-chlorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Cl)C=C1 BUZYGTVTZYSBCU-UHFFFAOYSA-N 0.000 description 1
- JDOHKGNGBGUGTR-UHFFFAOYSA-N 1-(4-fluorophenyl)indole Chemical compound C1=CC(F)=CC=C1N1C2=CC=CC=C2C=C1 JDOHKGNGBGUGTR-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 1
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- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229940067265 pigment yellow 138 Drugs 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
- C09B57/007—Squaraine dyes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/12—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains three hetero rings
- C07D471/14—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0097—Dye preparations of special physical nature; Tablets, films, extrusion, microcapsules, sheets, pads, bags with dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
Definitions
- the present disclosure relates to a core-shell compound, a photosensitive resin composition including the same, a photosensitive resin film prepared using the photosensitive resin composition, a color filter including the photosensitive resin film, and a CMOS image sensor including the color filter.
- Image sensors include a charge coupled device (CCD) and a CMOS image sensor, where the CMOS image sensor (hereinafter referred to as CIS) has a simple driving method and the signal processing circuit can be integrated into a single chip, resulting in miniaturization of the product. is possible
- CIS CMOS image sensor
- it has the advantage of being easy to apply to products with limited battery capacity due to very low power consumption.
- the use of CIS is rapidly increasing as high resolution can be realized along with technology development.
- a green pixel Due to the CIS-related technology trends, the number of pixels and the size are decreasing for realizing high quality and miniaturization of devices.
- a green pixel has transmittance that must be satisfied at a specific wavelength or a specific wavelength range.
- One embodiment is to provide a core-shell compound constituting a green pixel in a color filter for CIS.
- Another embodiment is to provide a photosensitive resin composition comprising the compound.
- Another embodiment is to provide a photosensitive resin film prepared using the photosensitive resin composition.
- Another embodiment is to provide a color filter including the photosensitive resin film.
- Another embodiment is to provide a CIS including the color filter.
- One embodiment of the present invention provides a core-shell compound comprising a core represented by the following formula (1) and a shell surrounding the core and represented by the following formula (2).
- R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
- R 2 and R 4 may each independently exist or fuse with each other to form a fused ring
- R 3 and R 5 are each independently present or may be fused with each other to form a fused ring
- L a and L b are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group.
- the core represented by Formula 1 may be represented by Formula 1-1 below.
- R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
- R 2 and R 4 may each independently exist or fuse with each other to form a fused ring
- R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring.
- the core represented by Formula 1-1 may be represented by Formula 1-1-1 or Formula 1-1-2.
- R 1 to R 3 and R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 an alkoxy group or a substituted or unsubstituted C6 to C20 aryl group.
- R 1 may be a substituted or unsubstituted C1 to C20 alkoxy group.
- R 2 may be a substituted or unsubstituted C3 to C20 cycloalkyl group, for example, a C3 to C20 cycloalkyl group substituted with an alkoxy group.
- R 3 may be a substituted or unsubstituted C6 to C20 aryl group, for example, a C6 to C20 aryl group substituted with one or more alkyl groups.
- R 6 may be a hydrogen atom, a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group.
- the core represented by Formula 1 may have a maximum absorption wavelength in the range of 610 nm to 640 nm.
- the shell represented by Formula 2 may be represented by Formula 2-1 below.
- the core-shell compound may be represented by any one of the following Chemical Formulas A to I.
- the core-shell compound may be a green dye.
- Another embodiment provides a photosensitive resin composition including the core-shell compound.
- the photosensitive resin composition may have a transmittance of 90% or more at 540 nm, and a transmittance of 10% or less at 600 nm to 640 nm.
- the photosensitive resin composition may have a transmittance of 5% or less at 450 nm.
- the photosensitive resin composition may be for a CMOS image sensor.
- Another embodiment provides a photosensitive resin film prepared using the photosensitive resin composition.
- Another embodiment provides a color filter including the photosensitive resin film.
- Another embodiment provides a CMOS image sensor including the color filter.
- the photosensitive resin composition including the core-shell compound according to the exemplary embodiment may form a green pixel, thereby providing a color filter for a CMOS image sensor having high transmittance.
- Example 2 is a graph of transmittance according to wavelength of the photosensitive resin composition according to Example 1, Comparative Example 1, and Comparative Example 2;
- substituted to “substituted” means that at least one hydrogen atom in the functional group of the present invention is a halogen atom (F, Br, Cl or I), a hydroxyl group, a nitro group, a cyano group, an amino group ( NH 2 , NH(R 200 ) or N(R 201 )(R 202 ), wherein R 200 , R 201 and R 202 are the same or different from each other, and each independently a C1 to C10 alkyl group), an amidino group, A hydrazine group, a hydrazone group, a carboxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted alicyclic organic group, a substituted or unsubstituted aryl group
- alkyl group means a C1 to C20 alkyl group, specifically means a C1 to C15 alkyl group
- cycloalkyl group means a C3 to C20 cycloalkyl group, specifically C3 to C18 cycloalkyl group
- alkoxy group means a C1 to C20 alkoxy group, specifically means a C1 to C18 alkoxy group
- aryl group means a C6 to C20 aryl group, specifically C6 to refers to a C18 aryl group
- alkenyl group refers to a C2 to C20 alkenyl group, specifically refers to a C2 to C18 alkenyl group
- alkylene group refers to a C1 to C20 alkylene group, specifically C1 to C18 alkylene group
- arylene group means C6 to C20 arylene group, specifically, C6 to C16 arylene group.
- (meth)acrylate means that both “acrylate” and “methacrylate” are possible
- (meth)acrylic acid is “acrylic acid” and “methacrylic acid” It means both are possible.
- copolymerization means block copolymerization or random copolymerization
- copolymer means block copolymerization or random copolymerization
- One embodiment provides a core-shell compound comprising a core represented by the following formula (1) and a shell surrounding the core and represented by the following formula (2).
- R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
- R 2 and R 4 may each independently exist or fuse with each other to form a fused ring
- R 3 and R 5 are each independently present or may be fused with each other to form a fused ring
- L a and L b are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group.
- the condition of the light transmittance of 90% or more at any wavelength within the range for example, the light transmittance at a wavelength of 540 nm and the condition of the light transmittance of 10% or less at any wavelength within the wavelength range of 600 nm to 640 nm was satisfied.
- the transmittance in the long wavelength region (600 nm to 640 nm) is further improved (10% or less) It was confirmed.
- the core represented by Formula 1 may be represented by Formula 1-1 below.
- R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
- R 2 and R 4 may each independently exist or fuse with each other to form a fused ring
- R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring.
- the core represented by Formula 1-1 may be represented by Formula 1-1-1 or Formula 1-1-2.
- R 1 to R 3 and R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 an alkoxy group or a substituted or unsubstituted C6 to C20 aryl group.
- R 1 may be a substituted or unsubstituted C1 to C20 alkoxy group.
- R 2 may be a substituted or unsubstituted C3 to C20 cycloalkyl group, for example, a C3 to C20 cycloalkyl group substituted with an alkoxy group.
- R 3 may be a substituted or unsubstituted C6 to C20 aryl group, for example, a C6 to C20 aryl group substituted with one or more alkyl groups.
- R 6 may be a hydrogen atom, a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group.
- the core represented by Formula 1 may have a maximum absorption wavelength in the range of 610 nm to 640 nm. Even if it is a dye compound having excellent solubility in organic solvents of 10% or more, if it does not have a maximum absorption wavelength at 610 nm to 640 nm, it may be unsuitable for use as a green photosensitive resin composition for high transmission type CIS.
- the shell represented by Formula 2 may be represented by Formula 2-1 below.
- the core-shell compound may be represented by any one of the following Chemical Formulas A to I, but is not necessarily limited thereto.
- the core-shell compound may be a green dye.
- a photosensitive resin composition including the core-shell compound according to the embodiment.
- the photosensitive resin composition may have a transmittance of 90% or more at 540 nm, a transmittance of 10% or less at 600 nm to 640 nm, and a transmittance of 5% or less at 450 nm, a green color for high transmission type CIS It may be suitable for filter implementation. That is, the photosensitive resin composition may be for a high-transmission CMOS image sensor.
- the photosensitive resin composition may further include the core-shell compound, a binder resin, a photopolymerizable compound, a photoinitiator, and a solvent.
- the core-shell compound according to an embodiment may be included in an amount of 1 wt% to 10 wt%, for example 3 wt% to 7 wt%, based on the total amount of the photosensitive resin composition.
- color gamut and contrast ratio are excellent .
- the photosensitive resin composition may further include a pigment, such as a yellow pigment, a green pigment, or a combination thereof.
- the yellow pigment has C.I. Pigment Yellow 138, C.I. Pigment Yellow 139, C.I. Pigment Yellow 150 etc. are mentioned, These can be used individually or in mixture of 2 or more types.
- the green pigment has C.I. Pigment Green 36, C.I. Pigment Green 58, C.I. Pigment Green 59 etc. are mentioned, These can be used individually or in mixture of 2 or more types.
- the pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
- the pigment dispersion may include a solid pigment, a solvent, and a dispersing agent for uniformly dispersing the pigment in the solvent.
- the solid content of the pigment is 1% to 20% by weight, such as 8% to 20% by weight, such as 8% to 15% by weight, such as 10% to 20% by weight, such as 10% to 20% by weight, based on the total amount of the pigment dispersion. It may be included in 15% by weight.
- a nonionic dispersant an anionic dispersant, a cationic dispersant, and the like may be used.
- the dispersant include polyalkylene glycol and its esters, polyoxyalkylene, polyalcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more.
- Examples of commercially available products of the dispersant include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc.
- the dispersant may be included in an amount of 1 wt% to 20 wt% based on the total amount of the pigment dispersion.
- the dispersant is included within the above range, it is possible to maintain an appropriate viscosity and thus the photosensitive resin composition has excellent dispersibility, thereby maintaining optical, physical and chemical quality when applying the product.
- ethylene glycol acetate, ethyl cellosolve, propylene glycol methyl ether acetate, ethyl lactate, polyethylene glycol, cyclohexanone, propylene glycol methyl ether, and the like may be used.
- the pigment dispersion may be included in an amount of 10 wt% to 20 wt%, for example 12 wt% to 18 wt%, based on the total amount of the photosensitive resin composition.
- the pigment dispersion is included within the above range, it is advantageous to secure a process margin, and the color reproducibility and contrast ratio are excellent.
- the binder resin may be an acrylic binder resin.
- the acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including one or more acrylic repeating units.
- the first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
- the first ethylenically unsaturated monomer may be included in an amount of 5 wt% to 50 wt%, for example 10 wt% to 40 wt%, based on the total amount of the acrylic binder resin.
- the second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene, ⁇ -methylstyrene, vinyltoluene or vinylbenzylmethyl ether; Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, benzyl (meth) acrylate, unsaturated carboxylic acid ester compounds such as cyclohexyl (meth) acrylate and phenyl (meth) acrylate; unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate and a vinyl benzoate; unsaturated carboxylic acid glycidyl
- acrylic binder resin examples include (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/2-hydroxyethyl meth acrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer, and the like, but are not limited thereto, and these may be used alone or in combination of two or more. have.
- the weight average molecular weight of the binder resin may be 3,000 g/mol to 150,000 g/mol, such as 5,000 g/mol to 50,000 g/mol, such as 20,000 g/mol to 30,000 g/mol.
- weight average molecular weight of the binder resin is within the above range, physical and chemical properties of the photosensitive resin composition are excellent, the viscosity is appropriate, and the adhesion to the substrate is excellent in manufacturing the color filter.
- the acid value of the binder resin may be 15 mgKOH/g to 60 mgKOH/g, for example, 20 mgKOH/g to 50 mgKOH/g .
- the acid value of the binder resin is within the above range, the resolution of the pixel pattern is excellent.
- the binder resin may be included in an amount of 1 wt% to 30 wt%, for example 1 wt% to 20 wt%, based on the total amount of the photosensitive resin composition.
- excellent developability and improved crosslinking properties can be obtained when manufacturing a color filter, thereby obtaining excellent surface smoothness.
- the photopolymerizable compound may be a monofunctional or polyfunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond.
- the photopolymerizable compound has the ethylenically unsaturated double bond, it is possible to form a pattern having excellent heat resistance, light resistance and chemical resistance by causing sufficient polymerization during exposure to light in the pattern forming process.
- the photopolymerizable compound examples include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol Di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate , pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol hexa (meth) acrylate, dipentaerythritol di (meth) acrylate, dipentaerythritol tri (meth) Acrylate, dipentaerythritol penta (meth)
- Examples of commercially available products of the photopolymerizable compound are as follows.
- Examples of the monofunctional ester of (meth)acrylic acid include Aronix M-101 ® , M-111 ® , M-114 ® by Toagosei Chemical Co., Ltd.; Nihon Kayaku Co., Ltd.'s KAYARAD TC-110S ® , Copper TC-120S ®, etc.; V-158 ® and V-2311 ® of Osaka Yuki Chemical High School Co., Ltd. are mentioned.
- Examples of the bifunctional ester of (meth)acrylic acid Toagosei Chemical Co., Ltd.
- the photopolymerizable compound may be used after treatment with an acid anhydride in order to provide better developability.
- the photopolymerizable compound may be included in an amount of 1 wt% to 15 wt%, for example 5 wt% to 10 wt%, based on the total amount of the photosensitive resin composition.
- the photopolymerizable compound is included within the above range, curing occurs sufficiently during exposure in the pattern forming process to provide excellent reliability and excellent developability in an alkaline developer.
- the photopolymerization initiator is an initiator generally used in the photosensitive resin composition, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, or a combination thereof can be used
- acetophenone-based compound examples include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt -Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.
- benzophenone-based compound examples include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc. are mentioned.
- thioxanthone-based compound examples include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.
- benzoin-based compound examples include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethyl ketal.
- triazine-based compound examples include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'- Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)-4, 6-bis(trichloromethyl)-s-
- Examples of the oxime-based compound include an O-acyloxime-based compound, 2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, and 1-(o-acetyloxime).
- O-acyloxime-based compound 2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione
- O-acyloxime compound examples include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione2 -oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime-O- Acetate etc. are mentioned.
- a carbazole-based compound As the photopolymerization initiator, a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, or a fluorene-based compound may be used in addition to the above compound.
- the photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light to enter an excited state and then transferring the energy.
- photosensitizer examples include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like. can be heard
- the photopolymerization initiator may be included in an amount of 0.01 wt% to 10 wt%, for example 0.1 wt% to 5 wt%, based on the total amount of the photosensitive resin composition.
- the photopolymerization initiator is included within the above range, curing occurs sufficiently during exposure in the pattern formation process to obtain excellent reliability, and the pattern has excellent heat resistance, light resistance and chemical resistance, and also has excellent resolution and adhesion. A decrease in transmittance can be prevented.
- the solvent materials having compatibility with but not reacting with the core-shell compound, pigment, binder resin, photopolymerizable compound, and photoinitiator according to the embodiment may be used.
- the solvent examples include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methylethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene
- N-methylpyrrolidone dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid and high boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, ⁇ -butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.
- glycol ethers such as ethylene glycol monoethyl ether
- ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate
- esters such as ethyl 2-hydroxypropionate
- carbitols such as diethylene glycol monomethyl ether
- propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate
- ketones such as cyclohexanone
- the solvent may be included in a balance, for example, 30 wt% to 80 wt%, based on the total amount of the photosensitive resin composition.
- a balance for example, 30 wt% to 80 wt%, based on the total amount of the photosensitive resin composition.
- the photosensitive resin composition according to another embodiment may further include an epoxy compound to improve adhesion with a substrate.
- Examples of the epoxy compound include a phenol novolac epoxy compound, a tetramethyl biphenyl epoxy compound, a bisphenol A-type epoxy compound, an alicyclic epoxy compound, or a combination thereof.
- the epoxy compound may be included in an amount of 0.01 parts by weight to 20 parts by weight, for example, 0.1 parts by weight to 10 parts by weight, based on 100 parts by weight of the photosensitive resin composition. When the epoxy compound is included within the above range, adhesion and storage properties are excellent.
- the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, and an epoxy group in order to improve adhesion to the substrate.
- a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, and an epoxy group in order to improve adhesion to the substrate.
- silane coupling agent examples include trimethoxysilyl benzoic acid, ⁇ methacryl oxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, ⁇ isocyanate propyl triethoxysilane, ⁇ glycidoxy propyl tri Methoxysilane, ⁇ -epoxycyclohexyl)ethyltrimethoxysilane, etc. are mentioned, and these can be used individually or in mixture of 2 or more types.
- the silane coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included within the above range, adhesion and storage properties are excellent.
- the photosensitive resin composition may further include a surfactant to improve coating properties and prevent defect formation, if necessary.
- surfactant examples include BM-1000 ® , BM-1100 ® and the like by BM Chemie; Mecha Pack F 142D ® , F 172 ® , F 173 ® , F 183 ® etc. manufactured by Dai Nippon Inky Chemical Co., Ltd.; Sumitomo 3M Co., Ltd.'s Prorad FC-135 ® , FC-170C ® , FC-430 ® , FC-431 ®, etc.; Asahi Grass Co., Ltd.'s Saffron S-112 ® , Copper S-113 ® , Copper S-131 ® , Copper S-141 ® , Copper S-145 ®, etc.; Toray silicone (Note) ⁇ SH-28PA ®, copper -190 ®, may be used copper ® -193, fluorine-based surfactants and commercially available under the name, such as SZ-6032 ®, SF-8428 ®.
- the surfactant may be used in an amount of 0.001 parts by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition.
- the surfactant is included within the above range, coating uniformity is secured, staining does not occur, and wettability to a glass substrate is excellent.
- antioxidants and stabilizers may be added to the photosensitive resin composition within a range that does not impair physical properties.
- a color filter manufactured using the photosensitive resin composition according to the embodiment.
- the pattern forming process in the color filter is as follows.
- photosensitive resin composition onto a support substrate by spin coating, slit coating, inkjet printing, or the like; drying the applied photosensitive resin composition to form a photosensitive resin composition film; exposing the photosensitive resin composition film; developing the exposed photosensitive resin composition film with an aqueous alkali solution to prepare a photosensitive resin film; and heat-treating the photosensitive resin film. Since the process conditions and the like are well known in the art, detailed descriptions thereof will be omitted herein.
- Another embodiment provides a CMOS image sensor including the color filter.
- Synthesis Example 1 Synthesis of a compound represented by Formula A
- the compound according to Synthesis Example 1 and Synthesis Example 9 to Comparative Synthesis Example 1 was prepared at a concentration of 0.001wt% using a diluting solvent (ANONE), according to Synthesis Example 1 and Synthesis Example 9 to Comparative Synthesis Example 1.
- Absorption spectra were obtained for each of the core-shell compounds, and the results are shown in Table 1 and FIG. 1 below. (UV-1800, SHIMADZU)
- a photosensitive resin composition according to Example 1 was prepared by mixing the components mentioned below in the composition shown in Table 3 below.
- a photopolymerization initiator was dissolved in a solvent and stirred at room temperature for 2 hours, and then a binder resin and a photopolymerizable compound were added thereto and stirred at room temperature for 2 hours. Then, the compound prepared in Synthesis Example 1 (compound represented by Formula A) and pigment (in the form of a pigment dispersion) as a colorant were added to the obtained reactant and stirred at room temperature for 1 hour. Then, the product was filtered three times to remove impurities, thereby preparing a photosensitive resin composition.
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 2 (compound represented by Formula B) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 3 (compound represented by Formula C) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 4 (compound represented by Formula D) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 5 (compound represented by Formula E) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 6 (compound represented by Formula F) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 7 (compound represented by Formula G) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 8 (compound represented by Formula H) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 9 (compound represented by Formula I) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 1 (compound represented by Formula A) was not used as a colorant.
- a photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Comparative Synthesis Example 1 (compound represented by Formula C-1) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A) .
- the photosensitive resin compositions prepared in Examples 1 to 9, Comparative Examples 1 and 2 were coated on a glass substrate having a thickness of 1 mm to a thickness of 1 ⁇ m to 3 ⁇ m on a degreasing-washed glass substrate, and a hot plate at 90° C.
- a coating film was obtained by drying on the bed for 2 minutes. Subsequently, the coating film was exposed using a high-pressure mercury lamp having a dominant wavelength of 365 nm. After that, the sample was obtained by drying for 5 minutes in a hot air circulation drying furnace at 200°C.
- the transmittance of the sample was measured at wavelengths of 450 nm, 540 nm and 620 nm using a spectrophotometer (MCPD3000, Otsuka electronic), and the results are shown in Table 4 and FIG. 2 below.
- the photosensitive resin composition of Examples 1 to 9 including the core-shell compound according to an embodiment as a dye compared with the photosensitive resin composition of Comparative Examples 1 and 2 not including the compound Thus, the transmittance at 450 nm is 5% or less, the transmittance at 540 nm is 90% or more, and the transmittance is 10% or less at 620 nm. You can check that it is possible. (In Comparative Example 2, the transmittance at 540 nm is 90% or less, which is a transmittance that is not applicable to a general green photosensitive resin composition for CIS.
- the transmittance at 450 nm is 5% or less
- the transmittance at 540 nm is 90% or more
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Abstract
Provided are a core-shell compound, a photosensitive resin composition comprising same, a photosensitive resin film prepared using the photosensitive resin composition, a color filter comprising the photosensitive resin film, and a CMOS image sensor comprising the color filter.
Description
본 기재는 코어-쉘 화합물, 이를 포함하는 감광성 수지 조성물, 상기 감광성 수지 조성물을 이용하여 제조되는 감광성 수지막, 상기 감광성 수지막을 포함하는 컬러필터 및 상기 컬러필터를 포함하는 CMOS 이미지 센서에 관한 것이다.The present disclosure relates to a core-shell compound, a photosensitive resin composition including the same, a photosensitive resin film prepared using the photosensitive resin composition, a color filter including the photosensitive resin film, and a CMOS image sensor including the color filter.
최근 컴퓨터 산업과 통신 산업의 발달에 따라 디지털카메라, 캠코더, PCS(Personal Communication System), 게임기기, 경비용 카메라, 의료용 마이크로 카메라 등 다양한 분야에서 성능이 향상된 이미지 센서의 수요가 증대하고 있다. 이미지 센서로는 전하 결합 소자(CCD: Charge Coupled Device) 및 CMOS 이미지 센서가 있는데, 여기서 CMOS 이미지 센서(이하 CIS) 는 구동방식이 간편하고, 신호처리 회로를 단일칩에 집적할 수 있어 제품의 소형화가 가능하다. 또한 전력소모가 매우 낮아 배터리 용량이 제한적인 제품에 적용이 용이한 장점이 있다. CIS는 기술 개발과 함께 고해상도가 구현 가능함에 따라 사용이 급격하게 늘고 있다.With the recent development of the computer industry and the communication industry, the demand for image sensors with improved performance is increasing in various fields such as digital cameras, camcorders, PCS (Personal Communication System), game devices, security cameras, and medical micro cameras. Image sensors include a charge coupled device (CCD) and a CMOS image sensor, where the CMOS image sensor (hereinafter referred to as CIS) has a simple driving method and the signal processing circuit can be integrated into a single chip, resulting in miniaturization of the product. is possible In addition, it has the advantage of being easy to apply to products with limited battery capacity due to very low power consumption. The use of CIS is rapidly increasing as high resolution can be realized along with technology development.
CIS 관련 기술동향으로, 고화질 및 기기 소형화 구현을 위한 pixel 수 증가 및 size가 감소되고 있으며, 이에 따라 고투과형 CIS용 감광성 수지 조성물 개발이 진행되고 있다. 녹색, 적색, 청색 컬러필터를 갖는 CIS용 감광성 수지 조성물 중, 일반적으로 녹색 화소는 특정 파장 또는 특정 파장범위에서 만족되어야 하는 투과도가 있다. Due to the CIS-related technology trends, the number of pixels and the size are decreasing for realizing high quality and miniaturization of devices. Among the photosensitive resin compositions for CIS having green, red, and blue color filters, in general, a green pixel has transmittance that must be satisfied at a specific wavelength or a specific wavelength range.
그러나 현재까지 개발된 CIS용 녹색 감광성 수지 조성물의 경우, 540nm에서의 투과도 및 600nm 내지 640nm에서의 투과도를 동시에 만족시키지 못하고 있어, 혼색 문제가 개선되지 못하고 있으며, 무엇보다도 고투과형 CIS의 제공이 불가하였다.However, in the case of the green photosensitive resin composition for CIS developed so far, the transmittance at 540 nm and the transmittance at 600 nm to 640 nm were not simultaneously satisfied, so the color mixing problem was not improved. .
일 구현예는 CIS용 컬러필터 내 녹색 화소를 구성하는 코어-쉘 화합물을 제공하기 위한 것이다.One embodiment is to provide a core-shell compound constituting a green pixel in a color filter for CIS.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공하기 위한 것이다.Another embodiment is to provide a photosensitive resin composition comprising the compound.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조된 감광성 수지막을 제공하기 위한 것이다.Another embodiment is to provide a photosensitive resin film prepared using the photosensitive resin composition.
또 다른 일 구현예는 상기 감광성 수지막을 포함하는 컬러필터를 제공하기 위한 것이다.Another embodiment is to provide a color filter including the photosensitive resin film.
또 다른 일 구현예는 상기 컬러필터를 포함하는 CIS를 제공하기 위한 것이다.Another embodiment is to provide a CIS including the color filter.
본 발명의 일 구현예는 하기 화학식 1로 표시되는 코어 및 상기 코어를 둘러싸며, 하기 화학식 2로 표시되는 쉘로 이루어진 코어-쉘 화합물을 제공한다.One embodiment of the present invention provides a core-shell compound comprising a core represented by the following formula (1) and a shell surrounding the core and represented by the following formula (2).
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 및 화학식 2에서,In Formula 1 and Formula 2,
R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or fuse with each other to form a fused ring,
R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 3 and R 5 are each independently present or may be fused with each other to form a fused ring,
La 및 Lb는 각각 독립적으로 단일결합 또는 치환 또는 비치환된 C1 내지 C10 알킬렌기이다.L a and L b are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group.
상기 화학식 1로 표시되는 코어는 하기 화학식 1-1로 표시될 수 있다.The core represented by Formula 1 may be represented by Formula 1-1 below.
[화학식 1-1][Formula 1-1]
상기 화학식 1-1에서,In Formula 1-1,
R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or fuse with each other to form a fused ring,
R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있다.R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring.
상기 화학식 1-1로 표시되는 코어는 하기 화학식 1-1-1 또는 화학식 1-1-2로 표시될 수 있다.The core represented by Formula 1-1 may be represented by Formula 1-1-1 or Formula 1-1-2.
[화학식 1-1-1][Formula 1-1-1]
[화학식 1-1-2][Formula 1-1-2]
상기 화학식 1-1-1 및 화학식 1-1-2에서,In Formulas 1-1-1 and 1-1-2,
R1 내지 R3 및 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.R 1 to R 3 and R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 an alkoxy group or a substituted or unsubstituted C6 to C20 aryl group.
상기 R1은 치환 또는 비치환된 C1 내지 C20 알콕시기일 수 있다.Wherein R 1 may be a substituted or unsubstituted C1 to C20 alkoxy group.
상기 R2는 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 예컨대 알콕시기로 치환된 C3 내지 C20 사이클로알킬기일 수 있다.R 2 may be a substituted or unsubstituted C3 to C20 cycloalkyl group, for example, a C3 to C20 cycloalkyl group substituted with an alkoxy group.
상기 R3은 치환 또는 비치환된 C6 내지 C20 아릴기, 예컨대 하나 이상의 알킬기로 치환된 C6 내지 C20 아릴기일 수 있다. R 3 may be a substituted or unsubstituted C6 to C20 aryl group, for example, a C6 to C20 aryl group substituted with one or more alkyl groups.
상기 R6는 수소 원자, 할로겐 원자, 시아노기 또는 치환 또는 비치환된 C1 내지 C20 알콕시기일 수 있다.R 6 may be a hydrogen atom, a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group.
상기 화학식 1로 표시되는 코어는 610nm 내지 640nm에서 최대흡광파장을 가질 수 있다.The core represented by Formula 1 may have a maximum absorption wavelength in the range of 610 nm to 640 nm.
상기 화학식 2로 표시되는 쉘은 하기 화학식 2-1로 표시될 수 있다.The shell represented by Formula 2 may be represented by Formula 2-1 below.
[화학식 2-1][Formula 2-1]
상기 코어-쉘 화합물은 하기 화학식 A 내지 화학식 I 중 어느 하나로 표시될 수 있다.The core-shell compound may be represented by any one of the following Chemical Formulas A to I.
[화학식 A][Formula A]
[화학식 B][Formula B]
[화학식 C][Formula C]
[화학식 D][Formula D]
[화학식 E][Formula E]
[화학식 F][Formula F]
[화학식 G][Formula G]
[화학식 H][Formula H]
[화학식 I][Formula I]
상기 코어-쉘 화합물은 녹색 염료일 수 있다.The core-shell compound may be a green dye.
다른 일 구현예는 상기 코어-쉘 화합물을 포함하는 감광성 수지 조성물을 제공한다.Another embodiment provides a photosensitive resin composition including the core-shell compound.
상기 감광성 수지 조성물은 540nm에서 90% 이상의 투과도를 가지고, 600nm 내지 640nm에서 10% 이하의 투과도를 가질 수 있다.The photosensitive resin composition may have a transmittance of 90% or more at 540 nm, and a transmittance of 10% or less at 600 nm to 640 nm.
상기 감광성 수지 조성물은 450nm에서 5% 이하의 투과도를 가질 수 있다.The photosensitive resin composition may have a transmittance of 5% or less at 450 nm.
상기 감광성 수지 조성물은 CMOS 이미지 센서용일 수 있다.The photosensitive resin composition may be for a CMOS image sensor.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조되는 감광성 수지막을 제공한다.Another embodiment provides a photosensitive resin film prepared using the photosensitive resin composition.
또 다른 일 구현예는 상기 감광성 수지막을 포함하는 컬러필터를 제공한다.Another embodiment provides a color filter including the photosensitive resin film.
또 다른 일 구현예는 상기 컬러필터를 포함하는 CMOS 이미지 센서를 제공한다.Another embodiment provides a CMOS image sensor including the color filter.
기타 본 발명의 측면들의 구체적인 사항은 이하의 상세한 설명에 포함되어 있다.The specific details of other aspects of the invention are included in the detailed description below.
일 구현예에 따른 코어-쉘 화합물을 포함하는 감광성 수지 조성물은 녹색 화소를 형성하여, 고투과도를 가지는 CMOS 이미지 센서용 컬러필터를 제공할 수 있다.The photosensitive resin composition including the core-shell compound according to the exemplary embodiment may form a green pixel, thereby providing a color filter for a CMOS image sensor having high transmittance.
도 1은 실시예 1 및 비교예 2에 사용된 녹색 염료(합성예 1 및 비교 합성예 1)의 파장에 따른 흡광도 그래프이다.1 is a graph of absorbance according to wavelength of green dyes (Synthesis Example 1 and Comparative Synthesis Example 1) used in Examples 1 and 2;
도 2는 실시예 1, 비교예 1 및 비교예 2에 따른 감광성 수지 조성물의 파장에 따른 투과도 그래프이다.2 is a graph of transmittance according to wavelength of the photosensitive resin composition according to Example 1, Comparative Example 1, and Comparative Example 2;
이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다. Hereinafter, embodiments of the present invention will be described in detail. However, this is provided as an example, and the present invention is not limited thereto, and the present invention is only defined by the scope of the claims to be described later.
본 명세서에서 특별한 언급이 없는 한, "치환" 내지 "치환된"이란, 본 발명의 작용기 중의 하나 이상의 수소 원자가 할로겐 원자(F, Br, Cl 또는 I), 히드록시기, 니트로기, 시아노기, 아미노기(NH2, NH(R200) 또는 N(R201)(R202)이고, 여기서 R200, R201 및 R202는 동일하거나 서로 상이하며, 각각 독립적으로 C1 내지 C10 알킬기임), 아미디노기, 하이드라진기, 하이드라존기, 카르복실기, 치환 또는 비치환된 알킬기, 치환 또는 비치환된 알케닐기, 치환 또는 비치환된 알키닐기, 치환 또는 비치환된 지환족 유기기, 치환 또는 비치환된 아릴기 및 치환 또는 비치환된 헤테로고리기로 이루어진 군에서 선택되는 1종 이상의 치환기로 치환된 것을 의미한다.Unless otherwise specified herein, "substituted" to "substituted" means that at least one hydrogen atom in the functional group of the present invention is a halogen atom (F, Br, Cl or I), a hydroxyl group, a nitro group, a cyano group, an amino group ( NH 2 , NH(R 200 ) or N(R 201 )(R 202 ), wherein R 200 , R 201 and R 202 are the same or different from each other, and each independently a C1 to C10 alkyl group), an amidino group, A hydrazine group, a hydrazone group, a carboxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted alicyclic organic group, a substituted or unsubstituted aryl group, and It means substituted with one or more substituents selected from the group consisting of a substituted or unsubstituted heterocyclic group.
본 명세서에서 특별한 언급이 없는 한, "알킬기"란 C1 내지 C20 알킬기를 의미하고, 구체적으로는 C1 내지 C15 알킬기를 의미하고, "사이클로알킬기"란 C3 내지 C20 사이클로알킬기를 의미하고, 구체적으로는 C3 내지 C18 사이클로알킬기를 의미하고, "알콕시기"란 C1 내지 C20 알콕시기를 의미하고, 구체적으로는 C1 내지 C18 알콕시기를 의미하고, "아릴기"란 C6 내지 C20 아릴기를 의미하고, 구체적으로는 C6 내지 C18 아릴기를 의미하고, "알케닐기"란 C2 내지 C20 알케닐기를 의미하고, 구체적으로는 C2 내지 C18 알케닐기를 의미하고, "알킬렌기"란 C1 내지 C20 알킬렌기를 의미하고, 구체적으로는 C1 내지 C18 알킬렌기를 의미하고, "아릴렌기"란 C6 내지 C20 아릴렌기를 의미하고, 구체적으로는 C6 내지 C16 아릴렌기를 의미한다.Unless otherwise specified herein, "alkyl group" means a C1 to C20 alkyl group, specifically means a C1 to C15 alkyl group, and "cycloalkyl group" means a C3 to C20 cycloalkyl group, specifically C3 to C18 cycloalkyl group, "alkoxy group" means a C1 to C20 alkoxy group, specifically means a C1 to C18 alkoxy group, "aryl group" means a C6 to C20 aryl group, specifically C6 to refers to a C18 aryl group, “alkenyl group” refers to a C2 to C20 alkenyl group, specifically refers to a C2 to C18 alkenyl group, and “alkylene group” refers to a C1 to C20 alkylene group, specifically C1 to C18 alkylene group, "arylene group" means C6 to C20 arylene group, specifically, C6 to C16 arylene group.
본 명세서에서 특별한 언급이 없는 한, "(메타)아크릴레이트"는 "아크릴레이트"와 "메타크릴레이트" 둘 다 가능함을 의미하며, "(메타)아크릴산"은 "아크릴산"과 "메타크릴산" 둘 다 가능함을 의미한다.Unless otherwise specified herein, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" is "acrylic acid" and "methacrylic acid" It means both are possible.
본 명세서에서 별도의 정의가 없는 한, "조합"이란 혼합 또는 공중합을 의미한다. 또한 "공중합"이란 블록 공중합 내지 랜덤 공중합을 의미하고, "공중합체"란 블록 공중합체 내지 랜덤 공중합체를 의미한다.Unless otherwise defined herein, "combination" means mixing or copolymerization. In addition, "copolymerization" means block copolymerization or random copolymerization, and "copolymer" means block copolymerization or random copolymerization.
본 명세서 내 화학식에서 별도의 정의가 없는 한, 화학 결합이 그려져야 하는 위치에 화학결합이 그려져 있지 않은 경우는 상기 위치에 수소 원자가 결합되어 있음을 의미한다.Unless otherwise defined in the chemical formulas in the present specification, when a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.
또한, 본 명세서에서 별도의 정의가 없는 한, "*"는 동일하거나 상이한 원자 또는 화학식과 연결되는 부분을 의미한다.In addition, unless otherwise defined in the present specification, "*" means a moiety connected to the same or different atoms or chemical formulas.
일 구현예는 하기 화학식 1로 표시되는 코어 및 상기 코어를 둘러싸며, 하기 화학식 2로 표시되는 쉘로 이루어진 코어-쉘 화합물을 제공한다.One embodiment provides a core-shell compound comprising a core represented by the following formula (1) and a shell surrounding the core and represented by the following formula (2).
[화학식 1][Formula 1]
[화학식 2][Formula 2]
상기 화학식 1 및 화학식 2에서,In Formula 1 and Formula 2,
R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or fuse with each other to form a fused ring,
R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 3 and R 5 are each independently present or may be fused with each other to form a fused ring,
La 및 Lb는 각각 독립적으로 단일결합 또는 치환 또는 비치환된 C1 내지 C10 알킬렌기이다.L a and L b are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group.
녹색 화소의 투과 스펙트럼에서 600nm 내지 640nm의 범위 내 임의 파장에서 광투과율 10% 이하를 만족하게 될 경우, 혼색(crosstalk) 개선이 가능하여 고투과형 CIS용 감광성 수지 조성물을 구현할 수 있으며 이에 따라 고화질 화상을 구현할 수 있다. When the light transmittance of 10% or less is satisfied at any wavelength within the range of 600 nm to 640 nm in the transmission spectrum of the green pixel, crosstalk can be improved and a high-transmission photosensitive resin composition for CIS can be implemented, and thus high-quality images can be obtained. can be implemented
이에 단파장 영역에서 다른 흡광을 가지지 않고, 흡광 기준 반치폭을 최소화하여 원하는 파장 영역을 선택적으로 흡수할 수 있는 스쿠아릴륨계 염료를 사용하여 고투과형 CIS용 감광성 수지 조성물을 구현하려는 노력이 계속되고 있는데, 여전히 만족할만한 수준의 조성물 구현은 이루어지지 않고 있다. 이에 본 발명의 발명자들은 상기와 같은 특정 구조의 비대칭형 스쿠아릴륨계 염료를 사용하여 CIS용 감광성 수지 조성물을 제조하여 투과 스펙트럼을 측정하였더니, 고투과형 녹색 감광성 수지 조성물의 투과율 조건(500nm 내지 600nm의 범위 내의 임의의 파장, 예컨대 540nm에서의 파장에서 광투과율이 90% 이상인 조건과 600nm 내지 640nm의 파장범위 내의 임의의 파장에서 광투과율이 10% 이하인 조건)을 만족하였음을 확인하였다. Accordingly, efforts are being made to realize a high-transmission photosensitive resin composition for CIS by using a squarylium-based dye that does not have different absorption in the short wavelength region and can selectively absorb the desired wavelength region by minimizing the absorption reference half maximum width. A satisfactory level of composition has not been implemented. Accordingly, the inventors of the present invention prepared a photosensitive resin composition for CIS using an asymmetric squarylium-based dye having a specific structure as described above and measured the transmission spectrum. It was confirmed that the condition of the light transmittance of 90% or more at any wavelength within the range, for example, the light transmittance at a wavelength of 540 nm and the condition of the light transmittance of 10% or less at any wavelength within the wavelength range of 600 nm to 640 nm) was satisfied.
나아가, 상기와 같은 특정 구조의 비대칭형 스쿠아릴륨계 화합물은 610nm 내지 640nm에서 최대흡광파장을 가지는 경우 장파장 영역(600nm 내지 640nm)에서의 투과도가 더욱 개선(10% 이하)됨을 확인할 수 있었다.Furthermore, when the asymmetric squarylium-based compound having a specific structure as described above has a maximum absorption wavelength at 610 nm to 640 nm, the transmittance in the long wavelength region (600 nm to 640 nm) is further improved (10% or less) It was confirmed.
예컨대, 상기 화학식 1로 표시되는 코어는 하기 화학식 1-1로 표시될 수 있다.For example, the core represented by Formula 1 may be represented by Formula 1-1 below.
[화학식 1-1][Formula 1-1]
상기 화학식 1-1에서,In Formula 1-1,
R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,
R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or fuse with each other to form a fused ring,
R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있다.R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring.
예컨대, 상기 화학식 1-1로 표시되는 코어는 하기 화학식 1-1-1 또는 화학식 1-1-2로 표시될 수 있다.For example, the core represented by Formula 1-1 may be represented by Formula 1-1-1 or Formula 1-1-2.
[화학식 1-1-1][Formula 1-1-1]
[화학식 1-1-2][Formula 1-1-2]
상기 화학식 1-1-1 및 화학식 1-1-2에서,In Formulas 1-1-1 and 1-1-2,
R1 내지 R3 및 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.R 1 to R 3 and R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 an alkoxy group or a substituted or unsubstituted C6 to C20 aryl group.
예컨대, 상기 R1은 치환 또는 비치환된 C1 내지 C20 알콕시기일 수 있다.For example, R 1 may be a substituted or unsubstituted C1 to C20 alkoxy group.
예컨대, 상기 R2는 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 예컨대 알콕시기로 치환된 C3 내지 C20 사이클로알킬기일 수 있다.For example, R 2 may be a substituted or unsubstituted C3 to C20 cycloalkyl group, for example, a C3 to C20 cycloalkyl group substituted with an alkoxy group.
예컨대, 상기 R3은 치환 또는 비치환된 C6 내지 C20 아릴기, 예컨대 하나 이상의 알킬기로 치환된 C6 내지 C20 아릴기일 수 있다.For example, R 3 may be a substituted or unsubstituted C6 to C20 aryl group, for example, a C6 to C20 aryl group substituted with one or more alkyl groups.
예컨대, 상기 R6는 수소 원자, 할로겐 원자, 시아노기 또는 치환 또는 비치환된 C1 내지 C20 알콕시기일 수 있다.For example, R 6 may be a hydrogen atom, a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group.
예컨대, 상기 화학식 1로 표시되는 코어는 610nm 내지 640nm에서 최대흡광파장을 가질 수 있다. 유기용매에 대한 용해도가 10% 이상으로 우수한 용해도를 가지는 염료 화합물이라 하여도 610nm 내지 640nm에서 최대흡광파장을 가지지 못할 경우, 고투과형 CIS용 녹색 감광성 수지 조성물로 사용되기에 부적합할 수 있다.For example, the core represented by Formula 1 may have a maximum absorption wavelength in the range of 610 nm to 640 nm. Even if it is a dye compound having excellent solubility in organic solvents of 10% or more, if it does not have a maximum absorption wavelength at 610 nm to 640 nm, it may be unsuitable for use as a green photosensitive resin composition for high transmission type CIS.
상기 화학식 2로 표시되는 쉘은 하기 화학식 2-1로 표시될 수 있다.The shell represented by Formula 2 may be represented by Formula 2-1 below.
[화학식 2-1][Formula 2-1]
예컨대, 상기 코어-쉘 화합물은 하기 화학식 A 내지 화학식 I 중 어느 하나로 표시될 수 있으나, 반드시 이에 한정되는 것은 아니다.For example, the core-shell compound may be represented by any one of the following Chemical Formulas A to I, but is not necessarily limited thereto.
[화학식 A][Formula A]
[화학식 B][Formula B]
[화학식 C][Formula C]
[화학식 D][Formula D]
[화학식 E][Formula E]
[화학식 F][Formula F]
[화학식 G][Formula G]
[화학식 H][Formula H]
[화학식 I][Formula I]
예컨대, 상기 코어-쉘 화합물은 녹색 염료일 수 있다.For example, the core-shell compound may be a green dye.
다른 일 구현예에 따르면, 상기 일 구현예에 따른 코어-쉘 화합물을 포함하는 감광성 수지 조성물을 제공한다.According to another embodiment, there is provided a photosensitive resin composition including the core-shell compound according to the embodiment.
예컨대, 상기 감광성 수지 조성물은 540nm에서 90% 이상의 투과도를 가질 수 있고, 600nm 내지 640nm에서 10% 이하의 투과도를 가질 수 있고, 450nm에서 5% 이하의 투과도를 가질 수 있어, 고투과형 CIS용 녹색 컬러필터 구현에 적합할 수 있다. 즉, 상기 감광성 수지 조성물은 고투과형 CMOS 이미지 센서용일 수 있다.For example, the photosensitive resin composition may have a transmittance of 90% or more at 540 nm, a transmittance of 10% or less at 600 nm to 640 nm, and a transmittance of 5% or less at 450 nm, a green color for high transmission type CIS It may be suitable for filter implementation. That is, the photosensitive resin composition may be for a high-transmission CMOS image sensor.
상기 감광성 수지 조성물은 상기 코어-쉘 화합물, 바인더 수지, 광중합성 화합물, 광중합 개시제 및 용매를 더 포함할 수 있다.The photosensitive resin composition may further include the core-shell compound, a binder resin, a photopolymerizable compound, a photoinitiator, and a solvent.
일 구현예에 따른 코어-쉘 화합물은 상기 감광성 수지 조성물 총량에 대해 1 중량% 내지 10 중량%, 예컨대 3 중량% 내지 7 중량%로 포함될 수 있다. 상기 범위로 일 구현예에 따른 코어-쉘 화합물이 포함될 경우 색재현율 및 명암비가 우수해진다.
The core-shell compound according to an embodiment may be included in an amount of 1 wt% to 10 wt%, for example 3 wt% to 7 wt%, based on the total amount of the photosensitive resin composition. When the core-shell compound according to an embodiment is included in the above range, color gamut and contrast ratio are excellent .
상기 감광성 수지 조성물은 안료, 예컨대 황색 안료, 녹색 안료 또는 이들의 조합을 더 포함할 수 있다.The photosensitive resin composition may further include a pigment, such as a yellow pigment, a green pigment, or a combination thereof.
상기 황색 안료는 컬러 인덱스(Color Index) 내에서 C.I. 안료 황색 138, C.I. 안료 황색 139, C.I. 안료 황색 150 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상 혼합하여 사용할 수 있다. The yellow pigment has C.I. Pigment Yellow 138, C.I. Pigment Yellow 139, C.I. Pigment Yellow 150 etc. are mentioned, These can be used individually or in mixture of 2 or more types.
상기 녹색 안료는 컬러 인덱스(Color Index) 내에서 C.I. 안료 녹색 36, C.I. 안료 녹색 58, C.I. 안료 녹색 59 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상 혼합하여 사용할 수 있다.The green pigment has C.I. Pigment Green 36, C.I. Pigment Green 58, C.I. Pigment Green 59 etc. are mentioned, These can be used individually or in mixture of 2 or more types.
상기 안료는 안료분산액의 형태로 상기 감광성 수지 조성물에 포함될 수 있다.The pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
상기 안료분산액은 고형분의 안료, 용제 및 상기 용제 내에 상기 안료를 균일하게 분산시키기 위한 분산제를 포함할 수 있다.The pigment dispersion may include a solid pigment, a solvent, and a dispersing agent for uniformly dispersing the pigment in the solvent.
상기 고형분의 안료는 안료분산액 총량에 대하여 1 중량%내지 20 중량%, 예컨대 8 중량% 내지 20 중량%, 예컨대 8 중량% 내지 15 중량%, 예컨대 10 중량% 내지 20 중량%, 예컨대 10 중량% 내지 15 중량%로 포함될 수 있다.The solid content of the pigment is 1% to 20% by weight, such as 8% to 20% by weight, such as 8% to 15% by weight, such as 10% to 20% by weight, such as 10% to 20% by weight, based on the total amount of the pigment dispersion. It may be included in 15% by weight.
상기 분산제로는 비이온성 분산제, 음이온성 분산제, 양이온성 분산제 등을 사용할 수 있다. 상기 분산제의 구체적인 예로는, 폴리알킬렌글리콜 및 이의 에스테르, 폴리옥시알킬렌, 다가알코올 에스테르 알킬렌 옥사이드 부가물, 알코올알킬렌 옥사이드 부가물, 술폰산 에스테르, 술폰산 염, 카르복실산 에스테르, 카르복실산 염, 알킬아미드 알킬렌 옥사이드 부가물, 알킬 아민 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.As the dispersant, a nonionic dispersant, an anionic dispersant, a cationic dispersant, and the like may be used. Specific examples of the dispersant include polyalkylene glycol and its esters, polyoxyalkylene, polyalcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more.
상기 분산제의 시판되는 제품을 예로 들면, BYK社의 DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 등; EFKA 케미칼社의EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 등; Zeneka社의 Solsperse 5000,Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000 등; 또는 Ajinomoto社의 PB711, PB821 등이 있다.Examples of commercially available products of the dispersant include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc. from EFKA Chemicals; Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000, etc. from Zeneka; or Ajinomoto's PB711 and PB821.
상기 분산제는 안료분산액 총량에 대하여 1 중량% 내지 20 중량%로 포함될 수 있다. 분산제가 상기 범위 내로 포함될 경우, 적절한 점도를 유지할 수 있어감광성 수지 조성물의 분산성이 우수하며, 이로 인해 제품 적용시 광학적, 물리적 및 화학적 품질을 유지할 수 있다.The dispersant may be included in an amount of 1 wt% to 20 wt% based on the total amount of the pigment dispersion. When the dispersant is included within the above range, it is possible to maintain an appropriate viscosity and thus the photosensitive resin composition has excellent dispersibility, thereby maintaining optical, physical and chemical quality when applying the product.
상기 안료분산액을 형성하는 용제로는 에틸렌글리콜 아세테이트, 에틸셀로솔브, 프로필렌글리콜 메틸에테르아세테이트, 에틸락테이트, 폴리에틸렌글리콜, 사이클로헥사논, 프로필렌글리콜 메틸에테르 등을 사용할 수 있다. As a solvent for forming the pigment dispersion, ethylene glycol acetate, ethyl cellosolve, propylene glycol methyl ether acetate, ethyl lactate, polyethylene glycol, cyclohexanone, propylene glycol methyl ether, and the like may be used.
상기 안료분산액은 상기 감광성 수지 조성물 총량에 대하여 10 중량% 내지 20 중량%, 예컨대 12 중량% 내지 18 중량%로 포함될 수 있다. 상기 안료분산액이 상기 범위 내로 포함될 경우, 공정마진 확보에 유리하고, 색재현율 및 명암비가 우수해진다.The pigment dispersion may be included in an amount of 10 wt% to 20 wt%, for example 12 wt% to 18 wt%, based on the total amount of the photosensitive resin composition. When the pigment dispersion is included within the above range, it is advantageous to secure a process margin, and the color reproducibility and contrast ratio are excellent.
상기 바인더 수지는 아크릴계 바인더 수지일 수 있다.The binder resin may be an acrylic binder resin.
상기 아크릴계 바인더 수지는 제1 에틸렌성 불포화 단량체 및 이와 공중합 가능한 제2 에틸렌성 불포화 단량체의 공중합체로, 하나 이상의 아크릴계 반복단위를 포함하는 수지이다. The acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including one or more acrylic repeating units.
상기 제1 에틸렌성 불포화 단량체는 하나 이상의 카르복시기를 함유하는 에틸렌성 불포화 단량체이며, 이의 구체적인 예로는 아크릴산, 메타크릴산, 말레산, 이타콘산, 푸마르산또는 이들의 조합을 들 수 있다.The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
상기 제1 에틸렌성 불포화 단량체는 상기 아크릴계 바인더 수지 총량에 대하여 5 중량% 내지 50 중량%, 예컨대 10 중량% 내지 40 중량%로 포함될 수 있다.The first ethylenically unsaturated monomer may be included in an amount of 5 wt% to 50 wt%, for example 10 wt% to 40 wt%, based on the total amount of the acrylic binder resin.
상기 제2 에틸렌성 불포화 단량체는 스티렌, α-메틸스티렌, 비닐톨루엔, 비닐벤질메틸에테르 등의 방향족 비닐 화합물; 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 부틸(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, 2-히드록시 부틸(메타)아크릴레이트, 벤질(메타)아크릴레이트, 사이클로헥실(메타)아크릴레이트, 페닐(메타)아크릴레이트 등의 불포화 카르복시산 에스테르 화합물; 2-아미노에틸(메타)아크릴레이트, 2-디메틸아미노에틸(메타)아크릴레이트 등의 불포화 카르복시산 아미노 알킬 에스테르 화합물; 초산비닐, 안식향산 비닐 등의 카르복시산 비닐 에스테르 화합물; 글리시딜(메타)아크릴레이트 등의 불포화 카르복시산 글리시딜 에스테르 화합물; (메타)아크릴로니트릴 등의 시안화 비닐 화합물; (메타)아크릴아미드 등의 불포화 아미드 화합물; 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene or vinylbenzylmethyl ether; Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, benzyl (meth) acrylate, unsaturated carboxylic acid ester compounds such as cyclohexyl (meth) acrylate and phenyl (meth) acrylate; unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate and a vinyl benzoate; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; Vinyl cyanide compounds, such as (meth)acrylonitrile; unsaturated amide compounds such as (meth)acrylamide; and the like, and these may be used alone or in combination of two or more.
상기 아크릴계 바인더 수지의 구체적인 예로는 (메타)아크릴산/벤질메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌 공중합체, (메타)아크릴산/벤질메타크릴레이트/2-히드록시에틸메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌/2-히드록시에틸메타크릴레이트 공중합체 등을 들 수 있으나, 이에 한정되는 것은 아니며, 이들을 단독 또는 2종 이상을 배합하여 사용할 수도 있다.Specific examples of the acrylic binder resin include (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/2-hydroxyethyl meth acrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer, and the like, but are not limited thereto, and these may be used alone or in combination of two or more. have.
상기 바인더 수지의 중량평균 분자량은 3,000 g/mol 내지 150,000 g/mol, 예컨대 5,000 g/mol 내지 50,000 g/mol, 예컨대 20,000 g/mol 내지 30,000 g/mol 일 수 있다. 상기 바인더 수지의 중량평균 분자량이 상기 범위 내일 경우, 상기 감광성 수지 조성물의 물리적 및 화학적 물성이 우수하고 점도가 적절하며, 컬러필터 제조 시 기판과의 밀착성이 우수하다. The weight average molecular weight of the binder resin may be 3,000 g/mol to 150,000 g/mol, such as 5,000 g/mol to 50,000 g/mol, such as 20,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the binder resin is within the above range, physical and chemical properties of the photosensitive resin composition are excellent, the viscosity is appropriate, and the adhesion to the substrate is excellent in manufacturing the color filter.
상기 바인더 수지의 산가는 15 mgKOH/g 내지 60 mgKOH/g, 예컨대 20 mgKOH/g 내지 50 mgKOH/g 일 수 있다. 상기 바인더 수지의 산가가 상기 범위 내일 경우 픽셀 패턴의 해상도가 우수하다.The acid value of the binder resin may be 15 mgKOH/g to 60 mgKOH/g, for example, 20 mgKOH/g to 50 mgKOH/g . When the acid value of the binder resin is within the above range, the resolution of the pixel pattern is excellent.
상기 바인더 수지는 상기 감광성 수지 조성물 총량에 대하여 1 중량% 내지 30 중량%, 예컨대 1 중량% 내지 20 중량%로 포함될 수 있다. 상기 바인더 수지가 상기 범위 내로 포함될 경우, 컬러필터 제조 시 현상성이 우수하며 가교성이 개선되어 우수한 표면 평활도를 얻을 수 있다.The binder resin may be included in an amount of 1 wt% to 30 wt%, for example 1 wt% to 20 wt%, based on the total amount of the photosensitive resin composition. When the binder resin is included within the above range, excellent developability and improved crosslinking properties can be obtained when manufacturing a color filter, thereby obtaining excellent surface smoothness.
상기 광중합성 화합물은 적어도 1개의 에틸렌성 불포화 이중결합을 가지는 (메타)아크릴산의 일관능 또는 다관능 에스테르가 사용될 수 있다.The photopolymerizable compound may be a monofunctional or polyfunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond.
상기 광중합성 화합물은 상기 에틸렌성 불포화 이중결합을 가짐으로써, 패턴 형성 공정에서 노광시 충분한 중합을 일으킴으로써 내열성, 내광성 및 내화학성이 우수한 패턴을 형성할 수 있다.Since the photopolymerizable compound has the ethylenically unsaturated double bond, it is possible to form a pattern having excellent heat resistance, light resistance and chemical resistance by causing sufficient polymerization during exposure to light in the pattern forming process.
상기 광중합성 화합물의 구체적인 예로는, 에틸렌 글리콜 디(메타)아크릴레이트, 디에틸렌 글리콜 디(메타)아크릴레이트, 트리에틸렌 글리콜 디(메타)아크릴레이트, 프로필렌 글리콜 디(메타)아크릴레이트, 네오펜틸 글리콜 디(메타)아크릴레이트, 1,4-부탄디올 디(메타)아크릴레이트, 1,6-헥산디올 디(메타)아크릴레이트, 비스페놀A 디(메타)아크릴레이트, 펜타에리트리톨 디(메타)아크릴레이트, 펜타에리트리톨 트리(메타)아크릴레이트, 펜타에리트리톨 테트라(메타)아크릴레이트, 펜타에리트리톨 헥사(메타)아크릴레이트, 디펜타에리트리톨 디(메타)아크릴레이트, 디펜타에리트리톨 트리(메타)아크릴레이트, 디펜타에리트리톨 펜타(메타)아크릴레이트, 디펜타에리트리톨 헥사(메타)아크릴레이트, 비스페놀A 에폭시(메타)아크릴레이트, 에틸렌 글리콜 모노메틸에테르 (메타)아크릴레이트, 트리메틸올 프로판 트리(메타)아크릴레이트, 트리스(메타)아크릴로일옥시에틸 포스페이트, 노볼락에폭시 (메타)아크릴레이트등을 들 수 있다. Specific examples of the photopolymerizable compound include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol Di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate , pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol hexa (meth) acrylate, dipentaerythritol di (meth) acrylate, dipentaerythritol tri (meth) Acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl ether (meth) acrylate, trimethylol propane tri ( and meth)acrylate, tris(meth)acryloyloxyethyl phosphate, and novolac epoxy (meth)acrylate.
상기 광중합성 화합물의 시판되는 제품을 예로 들면 다음과 같다. 상기 (메타)아크릴산의 일관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-101®, 동 M-111®, 동 M-114® 등; 니혼 가야꾸(주)社의 KAYARAD TC-110S®, 동 TC-120S® 등; 오사카 유끼 가가꾸 고교(주)社의 V-158®, V-2311® 등을 들 수 있다. 상기 (메타)아크릴산의 이관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-210®, 동 M-240®, 동 M-6200® 등; 니혼 가야꾸(주)社의 KAYARAD HDDA®, 동 HX-220®, 동 R-604® 등; 오사카 유끼 가가꾸 고교(주)社의 V-260®, V-312®, V-335 HP® 등을 들 수 있다. 상기 (메타)아크릴산의 삼관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-309®, 동 M-400®, 동 M-405®, 동 M-450®, 동 M-710®, 동 M-8030®, 동 M-8060® 등; 니혼 가야꾸(주)社의 KAYARAD TMPTA®, 동 DPCA-20®, 동-30®, 동-60®, 동-120® 등; 오사카 유끼 가야꾸 고교(주)社의 V-295®, 동-300®, 동-360®, 동-GPT®, 동-3PA®, 동-400® 등을 들 수 있다. 상기 제품을 단독 사용 또는 2종 이상 함께 사용할 수 있다.Examples of commercially available products of the photopolymerizable compound are as follows. Examples of the monofunctional ester of (meth)acrylic acid include Aronix M-101 ® , M-111 ® , M-114 ® by Toagosei Chemical Co., Ltd.; Nihon Kayaku Co., Ltd.'s KAYARAD TC-110S ® , Copper TC-120S ®, etc.; V-158 ® and V-2311 ® of Osaka Yuki Chemical High School Co., Ltd. are mentioned. Examples of the bifunctional ester of (meth)acrylic acid, Toagosei Chemical Co., Ltd. Aronix M-210 ® , copper M-240 ® , copper M-6200 ® and the like; Nihon Kayaku Co., Ltd.'s KAYARAD HDDA ® , Copper HX-220 ® , Copper R-604 ®, etc.; and V-260 ® , V-312 ® , V-335 HP ® of Osaka Yuki Chemical High School Co., Ltd. and the like. Examples of the trifunctional ester of (meth)acrylic acid, Toagosei Chemical Co., Ltd. Aronix M-309 ® , Copper M-400 ® , Copper M-405 ® , Copper M-450 ® , Copper M -710 ® , copper M-8030 ® , copper M-8060 ® etc; Nihon Kayaku Co., Ltd.'s KAYARAD TMPTA ® , Copper DPCA-20 ® , Copper-30 ® , Copper-60 ® , Copper-120 ® etc.; V-295 ® , Dong-300 ® , Dong-360 ® , Dong-GPT ® , Dong-3PA ® , Dong-400 ® etc. from Osaka Yuki Kayaku High School Co., Ltd. are mentioned. These products may be used alone or in combination of two or more.
상기 광중합성 화합물은 보다 우수한 현상성을 부여하기 위하여 산무수물로 처리하여 사용할 수도 있다.The photopolymerizable compound may be used after treatment with an acid anhydride in order to provide better developability.
상기 광중합성 화합물은 상기 감광성 수지 조성물 총량에 대하여 1중량% 내지 15중량%, 예컨대 5중량% 내지 10 중량%로 포함될 수 있다. 광중합성 화합물이 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광 시 경화가 충분히 일어나 신뢰성이 우수하며, 알칼리 현상액에의 현상성이 우수하다.The photopolymerizable compound may be included in an amount of 1 wt% to 15 wt%, for example 5 wt% to 10 wt%, based on the total amount of the photosensitive resin composition. When the photopolymerizable compound is included within the above range, curing occurs sufficiently during exposure in the pattern forming process to provide excellent reliability and excellent developability in an alkaline developer.
상기 광중합 개시제는 감광성 수지 조성물에 일반적으로 사용되는 개시제로서, 예를 들어 아세토페논계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 벤조인계 화합물, 트리아진계 화합물, 옥심계 화합물, 또는 이들의 조합을 사용할 수 있다. The photopolymerization initiator is an initiator generally used in the photosensitive resin composition, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, or a combination thereof can be used
상기 아세토페논계 화합물의 예로는, 2,2'-디에톡시 아세토페논, 2,2'-디부톡시 아세토페논, 2-히드록시-2-메틸프로피오페논, p-t-부틸트리클로로 아세토페논, p-t-부틸디클로로 아세토페논, 4-클로로 아세토페논, 2,2'-디클로로-4-페녹시 아세토페논, 2-메틸-1-(4-(메틸티오)페닐)-2-모폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모폴리노페닐)-부탄-1-온 등을 들 수 있다.Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt -Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.
상기 벤조페논계 화합물의 예로는, 벤조페논, 벤조일 안식향산, 벤조일 안식향산 메틸, 4-페닐 벤조페논, 히드록시 벤조페논, 아크릴화 벤조페논, 4,4'-비스(디메틸아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논, 4,4'-디메틸아미노벤조페논, 4,4'-디클로로벤조페논, 3,3'-디메틸-2-메톡시벤조페논 등을 들 수 있다.Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc. are mentioned.
상기 티오크산톤계 화합물의 예로는, 티오크산톤, 2-메틸티오크산톤, 이소프로필 티오크산톤, 2,4-디에틸 티오크산톤, 2,4-디이소프로필 티오크산톤, 2-클로로티오크산톤 등을 들 수 있다.Examples of the thioxanthone-based compound include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.
상기 벤조인계 화합물의 예로는, 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르, 벤질디메틸케탈 등을 들 수 있다.Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethyl ketal.
상기 트리아진계 화합물의 예로는, 2,4,6-트리클로로-s-트리아진, 2-페닐 4,6-비스(트리클로로메틸)-s-트리아진, 2-(3', 4'-디메톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4'-메톡시나프틸)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-톨릴)-4,6-비스(트리클로로 메틸)-s-트리아진, 2-비페닐 4,6-비스(트리클로로 메틸)-s-트리아진, 비스(트리클로로메틸)-6-스티릴-s-트리아진, 2-(나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-4-비스(트리클로로메틸)-6-피페로닐-s-트리아진, 2-4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-s-트리아진 등을 들 수 있다.Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'- Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)-4, 6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis (trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, etc. are mentioned.
상기 옥심계 화합물의 예로는, O-아실옥심계 화합물, 2-(o-벤조일옥심)-1-[4-(페닐티오)페닐]-1,2-옥탄디온, 1-(o-아세틸옥심)-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄온, O-에톡시카르보닐-α-옥시아미노-1-페닐프로판-1-온 등을 사용할 수 있다. 상기 O-아실옥심계 화합물의 구체적인 예로는, 1,2-옥탄디온, 2-디메틸아미노-2-(4-메틸벤질)-1-(4-모르폴린-4-일-페닐)-부탄-1-온, 1-(4-페닐술파닐페닐)-부탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1-온옥심-O-아세테이트 및 1-(4-페닐술파닐페닐)-부탄-1-온옥심-O-아세테이트 등을 들 수 있다. Examples of the oxime-based compound include an O-acyloxime-based compound, 2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, and 1-(o-acetyloxime). )-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one etc. can be used. Specific examples of the O-acyloxime compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione2 -oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime-O- Acetate etc. are mentioned.
상기 광중합 개시제는 상기 화합물 이외에도 카바졸계 화합물, 디케톤류 화합물, 술포늄 보레이트계 화합물, 디아조계 화합물, 이미다졸계 화합물, 비이미다졸계 화합물, 플루오렌계 화합물 등을 사용할 수 있다.As the photopolymerization initiator, a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, or a fluorene-based compound may be used in addition to the above compound.
상기 광중합 개시제는 빛을 흡수하여 들뜬 상태가 된 후 그 에너지를 전달함으로써 화학반응을 일으키는 광 증감제와 함께 사용될 수도 있다.The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light to enter an excited state and then transferring the energy.
상기 광 증감제의 예로는, 테트라에틸렌글리콜 비스-3-머캡토 프로피오네이트, 펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트, 디펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트 등을 들 수 있다. Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like. can be heard
상기 광중합 개시제는 상기 감광성 수지 조성물 총량에 대하여 0.01 중량% 내지 10 중량%, 예컨대 0.1 중량% 내지 5 중량%로 포함될 수 있다. 광중합 개시제가 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 충분히 일어나 우수한 신뢰성을 얻을 수 있으며, 패턴의 내열성, 내광성 및 내화학성이 우수하고, 해상도 및 밀착성 또한 우수하며, 미반응 개시제로 인한 투과율의 저하를 막을 수 있다.The photopolymerization initiator may be included in an amount of 0.01 wt% to 10 wt%, for example 0.1 wt% to 5 wt%, based on the total amount of the photosensitive resin composition. When the photopolymerization initiator is included within the above range, curing occurs sufficiently during exposure in the pattern formation process to obtain excellent reliability, and the pattern has excellent heat resistance, light resistance and chemical resistance, and also has excellent resolution and adhesion. A decrease in transmittance can be prevented.
상기 용매는 일 구현예에 따른 코어-쉘 화합물, 안료, 바인더 수지, 광중합성 화합물 및 광중합 개시제와의 상용성을 가지되 반응하지 않는 물질들이 사용될 수 있다.As the solvent, materials having compatibility with but not reacting with the core-shell compound, pigment, binder resin, photopolymerizable compound, and photoinitiator according to the embodiment may be used.
상기 용매의 예로는, 메탄올, 에탄올 등의 알코올류; 디클로로에틸 에테르, n-부틸 에테르, 디이소아밀 에테르, 메틸페닐 에테르, 테트라히드로퓨란 등의 에테르류; 에틸렌 글리콜 모노메틸에테르, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 메틸 셀로솔브 아세테이트, 에틸 셀로솔브 아세테이트, 디에틸 셀로솔브 아세테이트 등의 셀로솔브 아세테이트류; 메틸에틸 카르비톨, 디에틸 카르비톨, 디에틸렌 글리콜 모노메틸에테르, 디에틸렌 글리콜 모노에틸에테르, 디에틸렌 글리콜 디메틸에테르, 디에틸렌 글리콜 메틸에틸에테르, 디에틸렌 글리콜 디에틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 톨루엔, 크실렌 등의 방향족 탄화수소류; 메틸에틸케톤, 사이클로헥사논, 4-히드록시-4-메틸-2-펜타논, 메틸-n-프로필케톤, 메틸-n-부틸케톤, 메틸-n-아밀케톤, 2-헵타논 등의 케톤류; 초산 에틸, 초산-n-부틸, 초산 이소부틸 등의 포화 지방족 모노카르복실산 알킬 에스테르류; 젖산 메틸, 젖산 에틸 등의 젖산 에스테르류; 옥시 초산 메틸, 옥시 초산 에틸, 옥시 초산 부틸 등의 옥시 초산 알킬 에스테르류; 메톡시 초산 메틸, 메톡시 초산 에틸, 메톡시 초산 부틸, 에톡시 초산 메틸, 에톡시 초산 에틸 등의 알콕시 초산 알킬 에스테르류; 3-옥시 프로피온산 메틸, 3-옥시 프로피온산 에틸 등의 3-옥시 프로피온산 알킬에스테르류; 3-메톡시 프로피온산 메틸, 3-메톡시 프로피온산 에틸, 3-에톡시 프로피온산 에틸, 3-에톡시 프로피온산 메틸 등의 3-알콕시 프로피온산 알킬 에스테르류; 2-옥시 프로피온산 메틸, 2-옥시 프로피온산 에틸, 2-옥시 프로피온산 프로필 등의 2-옥시 프로피온산 알킬 에스테르류; 2-메톡시 프로피온산 메틸, 2-메톡시 프로피온산 에틸, 2-에톡시 프로피온산 에틸, 2-에톡시 프로피온산 메틸 등의 2-알콕시 프로피온산 알킬 에스테르류; 2-옥시-2-메틸 프로피온산 메틸, 2-옥시-2-메틸 프로피온산 에틸 등의 2-옥시-2-메틸 프로피온산 에스테르류, 2-메톡시-2-메틸 프로피온산 메틸, 2-에톡시-2-메틸 프로피온산 에틸 등의 2-알콕시-2-메틸 프로피온산 알킬류의 모노옥시 모노카르복실산 알킬 에스테르류; 2-히드록시 프로피온산 에틸, 2-히드록시-2-메틸 프로피온산 에틸, 히드록시 초산 에틸, 2-히드록시-3-메틸 부탄산 메틸 등의 에스테르류; 피루빈산 에틸 등의 케톤산 에스테르류 등이 있으며, 또한, N-메틸포름아미드, N,N-디메틸포름아미드, N-메틸포름아닐라드, N-메틸아세트아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 벤질에틸에테르, 디헥실에테르, 아세틸아세톤, 이소포론, 카프론산, 카프릴산, 1-옥탄올, 1-노난올, 벤질알코올, 초산 벤질, 안식향산 에틸, 옥살산 디에틸, 말레인산 디에틸, γ부티로락톤, 탄산 에틸렌, 탄산 프로필렌, 페닐 셀로솔브 아세테이트 등의 고비점 용매를 들 수 있다.Examples of the solvent include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methylethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; lactic acid esters such as methyl lactate and ethyl lactate; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; Alkoxy acetate alkyl esters, such as methoxy methyl acetate, methoxy ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxypropionic acid alkyl esters, such as 3-oxy methyl propionate and 3-oxy ethyl propionate; 3-alkoxy propionic acid alkyl esters, such as 3-methoxy methyl propionate, 3-methoxy ethyl propionate, 3-ethoxy ethyl propionate, and 3-ethoxy methyl propionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, and propyl 2-oxypropionate; 2-alkoxy propionic acid alkyl esters, such as 2-methoxy methyl propionate, 2-methoxy ethyl propionate, 2-ethoxy ethyl propionate, and 2-ethoxy methyl propionate; 2-oxy-2-methyl propionic acid esters such as 2-oxy-2-methyl methyl propionate and 2-oxy-2-methyl ethyl propionate; 2-methoxy-2-methyl methyl propionate; 2-ethoxy-2- monooxy monocarboxylic acid alkyl esters of 2-alkoxy-2-methyl propionate alkyls such as ethyl methyl propionate; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methyl ethyl propionate, ethyl hydroxyacetate, and 2-hydroxy-3-methyl methyl butanoate; Ketonic acid esters such as ethyl pyruvate, and the like, and N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, and N,N-dimethylacetamide. , N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid and high boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.
이들 중 좋게는 상용성 및 반응성을 고려하여, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 에틸 셀로솔브 아세테이트 등의 에틸렌 글리콜 알킬에테르 아세테이트류; 2-히드록시 프로피온산 에틸 등의 에스테르류; 디에틸렌 글리콜 모노메틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 및/또는 사이클로헥사논 등의 케톤류가 사용될 수 있다.Among these, in consideration of compatibility and reactivity, glycol ethers, such as ethylene glycol monoethyl ether, are preferable; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; and/or ketones such as cyclohexanone may be used.
상기 용매는 상기 감광성 수지 조성물 총량에 대하여 잔부량, 예컨대 30 중량% 내지 80 중량%로 포함될 수 있다. 용매가 상기 범위 내로 포함될 경우 상기 감광성 수지 조성물이 적절한 점도를 가짐에 따라 컬러필터 제조시 공정성이 우수하다.The solvent may be included in a balance, for example, 30 wt% to 80 wt%, based on the total amount of the photosensitive resin composition. When the solvent is included within the above range, since the photosensitive resin composition has an appropriate viscosity, processability in manufacturing the color filter is excellent.
다른 일 구현예에 따른 감광성 수지 조성물은 기판과의 밀착성 등을 개선하기 위해 에폭시 화합물을 더 포함할 수 있다. The photosensitive resin composition according to another embodiment may further include an epoxy compound to improve adhesion with a substrate.
상기 에폭시 화합물의 예로는, 페놀 노볼락 에폭시 화합물, 테트라메틸 비페닐 에폭시 화합물, 비스페놀 A형 에폭시 화합물, 지환족 에폭시화합물 또는 이들의 조합을 들 수 있다.Examples of the epoxy compound include a phenol novolac epoxy compound, a tetramethyl biphenyl epoxy compound, a bisphenol A-type epoxy compound, an alicyclic epoxy compound, or a combination thereof.
상기 에폭시 화합물은 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 20 중량부, 예컨대 0.1 중량부 내지 10 중량부로 포함될 수 있다. 에폭시 화합물이 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. The epoxy compound may be included in an amount of 0.01 parts by weight to 20 parts by weight, for example, 0.1 parts by weight to 10 parts by weight, based on 100 parts by weight of the photosensitive resin composition. When the epoxy compound is included within the above range, adhesion and storage properties are excellent.
또한 상기 감광성 수지 조성물은 기판과의 접착성을 향상시키기 위해 카르복실기, 메타크릴로일기, 이소시아네이트기, 에폭시기 등의 반응성 치환기를 갖는 실란 커플링제를 더 포함할 수 있다.In addition, the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, and an epoxy group in order to improve adhesion to the substrate.
상기 실란 커플링제의 예로는, 트리메톡시실릴 벤조산, γ메타크릴 옥시프로필 트리메톡시실란, 비닐 트리아세톡시실란, 비닐 트리메톡시실란, γ이소시아네이트 프로필 트리에톡시실란, γ글리시독시 프로필 트리메톡시실란, β에폭시사이클로헥실)에틸트리메톡시실란 등을 들 수 있으며, 이들을 단독 또는 2종 이상 혼합하여 사용할 수 있다. Examples of the silane coupling agent include trimethoxysilyl benzoic acid, γ methacryl oxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ isocyanate propyl triethoxysilane, γ glycidoxy propyl tri Methoxysilane, β-epoxycyclohexyl)ethyltrimethoxysilane, etc. are mentioned, and these can be used individually or in mixture of 2 or more types.
상기 실란 커플링제는 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 10 중량부로 포함될 수 있다. 실란 커플링제가 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. The silane coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included within the above range, adhesion and storage properties are excellent.
또한 상기 감광성 수지 조성물은 필요에 따라 코팅성 향상 및 결점 생성 방지 효과를 위해 계면 활성제를 더 포함할 수 있다. In addition, the photosensitive resin composition may further include a surfactant to improve coating properties and prevent defect formation, if necessary.
상기 계면활성제의 예로는, BM Chemie社의 BM-1000®, BM-1100® 등; 다이 닛폰 잉키 가가꾸 고교(주)社의 메카 팩 F 142D®, 동 F 172®, 동 F 173®, 동 F 183® 등; 스미토모 스리엠(주)社의 프로라드 FC-135®, 동 FC-170C®, 동 FC-430®, 동 FC-431® 등; 아사히 그라스(주)社의 사프론 S-112®, 동 S-113®, 동 S-131®, 동 S-141®, 동 S-145® 등; 도레이 실리콘(주)社의 SH-28PA®, 동-190®, 동-193®, SZ-6032®, SF-8428® 등의 명칭으로 시판된고 있는 불소계 계면 활성제를 사용할 수 있다.Examples of the surfactant include BM-1000 ® , BM-1100 ® and the like by BM Chemie; Mecha Pack F 142D ® , F 172 ® , F 173 ® , F 183 ® etc. manufactured by Dai Nippon Inky Chemical Co., Ltd.; Sumitomo 3M Co., Ltd.'s Prorad FC-135 ® , FC-170C ® , FC-430 ® , FC-431 ®, etc.; Asahi Grass Co., Ltd.'s Saffron S-112 ® , Copper S-113 ® , Copper S-131 ® , Copper S-141 ® , Copper S-145 ®, etc.; Toray silicone (Note)社SH-28PA ®, copper -190 ®, may be used copper ® -193, fluorine-based surfactants and commercially available under the name, such as SZ-6032 ®, SF-8428 ®.
상기 계면 활성제는 감광성 수지 조성물 100 중량부에 대하여 0.001 중량부 내지 5 중량부로 사용될 수 있다. 계면 활성제가 상기 범위 내로 포함될 경우 코팅 균일성이 확보되고, 얼룩이 발생하지 않으며, 유리 기판에 대한 습윤성(wetting)이 우수하다.The surfactant may be used in an amount of 0.001 parts by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is included within the above range, coating uniformity is secured, staining does not occur, and wettability to a glass substrate is excellent.
또한 상기 감광성 수지 조성물은 물성을 저해하지 않는 범위 내에서 산화방지제, 안정제 등의 기타 첨가제가 일정량 첨가될 수도 있다.In addition, a certain amount of other additives such as antioxidants and stabilizers may be added to the photosensitive resin composition within a range that does not impair physical properties.
또 다른 일 구현예에 따르면, 상기 일 구현예에 따른 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공한다. According to another embodiment, there is provided a color filter manufactured using the photosensitive resin composition according to the embodiment.
상기 컬러필터 내 패턴 형성 공정은 다음과 같다.The pattern forming process in the color filter is as follows.
상기 감광성 수지 조성물을 지지 기판상에 스핀 코팅, 슬릿 코팅, 잉크젯 프린팅 등으로 도포하는 공정; 상기 도포된 감광성 수지 조성물을 건조하여 감광성 수지 조성물 막을 형성하는 공정; 상기 감광성 수지 조성물 막을 노광하는 공정; 상기 노광된 감광성 수지 조성물 막을 알칼리 수용액으로 현상하여 감광성 수지막을 제조하는 공정; 및 상기 감광성 수지막을 가열 처리하는 공정을 포함한다. 상기 공정 상의 조건 등에 대하여는 당해 분야에서 널리 알려진 사항이므로, 본 명세서에서 자세한 설명은 생략하기로 한다. applying the photosensitive resin composition onto a support substrate by spin coating, slit coating, inkjet printing, or the like; drying the applied photosensitive resin composition to form a photosensitive resin composition film; exposing the photosensitive resin composition film; developing the exposed photosensitive resin composition film with an aqueous alkali solution to prepare a photosensitive resin film; and heat-treating the photosensitive resin film. Since the process conditions and the like are well known in the art, detailed descriptions thereof will be omitted herein.
또 다른 일 구현예는 상기 컬러필터를 포함하는 CMOS 이미지 센서를 제공한다.Another embodiment provides a CMOS image sensor including the color filter.
이하, 실시예를 들어 본 발명에 대해서 더욱 상세하게 설명할 것이나, 하기의 실시예는 본 발명의 바람직한 실시예일 뿐 본 발명이 하기 실시예에 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to examples, but the following examples are only preferred examples of the present invention, and the present invention is not limited to the following examples.
(화합물의 합성)(synthesis of compounds)
합성예 1: 화학식 A로 표시되는 화합물의 합성Synthesis Example 1: Synthesis of a compound represented by Formula A
3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 A로 표시되는 화합물을 얻는다. 3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL), refluxed, and the resulting water was removed with a Dean-stark distillation apparatus. do. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (A).
[화학식 A][Formula A]
Maldi-tof MS : 1243.5 m/zMaldi-tof MS: 1243.5 m/z
합성예 2: 화학식 B로 표시되는 화합물의 합성Synthesis Example 2: Synthesis of a compound represented by Formula B
3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-6-methoxy-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 B로 표시되는 화합물을 얻는다. 3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-6-methoxy-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL), refluxed, and the resulting water was dean-stark removed by distillation. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (B).
[화학식 B][Formula B]
Maldi-tof MS : 1273.58 m/zMaldi-tof MS: 1273.58 m/z
합성예 3: 화학식 C로 표시되는 화합물의 합성Synthesis Example 3: Synthesis of a compound represented by Formula C
3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole-6-carbonitrile (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 C로 표시되는 화합물을 얻는다.3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole-6-carbonitrile (60 mmol) was added to toluene (200 mL) and butanol (200 mL), refluxed, and the resulting water was dean-stark removed by distillation. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (C).
[화학식 C][Formula C]
Maldi-tof MS : 1268.73 m/zMaldi-tof MS: 1268.73 m/z
합성예 4: 화학식 D로 표시되는 화합물의 합성Synthesis Example 4: Synthesis of the compound represented by Formula D
3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-6-fluoro-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 D로 표시되는 화합물을 얻는다.3-{4-[(2,4-Dimethyl-phenyl)-(2-methoxy-cyclohexyl)-amino]-phenyl}-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-6-fluoro-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL), refluxed, and the resulting water was dean-stark removed by distillation. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (D).
[화학식 D][Formula D]
Maldi-tof MS : 1261.73 m/zMaldi-tof MS: 1261.73 m/z
합성예 5: 화학식 E로 표시되는 화합물의 합성Synthesis Example 5: Synthesis of the compound represented by Formula E
3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 6-Fluoro-1-(4-methoxy-phenyl)-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 E로 표시되는 화합물을 얻는다.3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3- ene-1,2-dione (60 mmol), 6-Fluoro-1-(4-methoxy-phenyl)-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL) and refluxed to produce The water is removed with a Dean-stark distillation apparatus. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (E).
[화학식 E][Formula E]
Maldi-tof MS : 1251.75 m/zMaldi-tof MS: 1251.75 m/z
합성예 6: 화학식 F로 표시되는 화합물의 합성Synthesis Example 6: Synthesis of a compound represented by Formula F
3-Hydroxy-4-(2,3,6,7-tetrahydro-1H,5H-pyrido[3,2,1-ij]quinolin-9-yl)-cyclobut-3-ene-1,2-dione (60 mmol), 6-Fluoro-1-(4-methoxy-phenyl)-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 F로 표시되는 화합물을 얻는다.3-Hydroxy-4-(2,3,6,7-tetrahydro-1H,5H-pyrido[3,2,1-ij]quinolin-9-yl)-cyclobut-3-ene-1,2-dione ( 60 mmol), 6-Fluoro-1-(4-methoxy-phenyl)-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL) and refluxed, and the resulting water was distilled in a Dean-stark distillation apparatus. removed with After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (F).
[화학식 F] [Formula F]
Maldi-tof MS : 1027.49 m/zMaldi-tof MS: 1027.49 m/z
합성예 7: 화학식 G로 표시되는 화합물의 합성Synthesis Example 7: Synthesis of a compound represented by Formula G
3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 4-Indol-1-yl-benzonitrile (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 G로 표시되는 화합물을 얻는다.3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3- ene-1,2-dione (60 mmol), 4-Indol-1-yl-benzonitrile (60 mmol) was put in toluene (200 mL) and butanol (200 mL) and refluxed, and the resulting water was purified by a Dean-stark distillation apparatus. removed with After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (G).
[화학식 G][Formula G]
Maldi-tof MS : 1242.54 m/zMaldi-tof MS: 1242.54 m/z
합성예 8: 화학식 H로 표시되는 화합물의 합성Synthesis Example 8: Synthesis of a compound represented by Formula H
3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-(4-Fluoro-phenyl)-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 H로 표시되는 화합물을 얻는다.3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3- ene-1,2-dione (60 mmol), 1-(4-Fluoro-phenyl)-1H-indole (60 mmol) was added to toluene (200 mL) and butanol (200 mL) and refluxed to dean the resulting water. -Stark is removed by distillation apparatus. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (H).
[화학식 H][Formula H]
Maldi-tof MS : 1221.67 m/zMaldi-tof MS: 1221.67 m/z
합성예 9: 화학식 I로 표시되는 화합물의 합성Synthesis Example 9: Synthesis of the compound represented by Formula I
3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3-ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 I로 표시되는 화합물을 얻는다.3-[4-((2,4-Dimethyl-phenyl)-{2-[2-(2-methoxy-ethoxy)-ethoxy]-cyclohexyl}-amino)-phenyl]-4-hydroxy-cyclobut-3- Add ene-1,2-dione (60 mmol), 1-[4-(2-Ethyl-hexyloxy)-phenyl]-1H-indole (60 mmol) to toluene (200 mL) and butanol (200 mL) and reflux The resulting water is removed with a Dean-stark distillation apparatus. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following formula (I).
[화학식 I][Formula I]
Maldi-tof MS : 1331.81 m/zMaldi-tof MS: 1331.81 m/z
비교 합성예 1: 화학식 C-1로 표시되는 화합물의 합성Comparative Synthesis Example 1: Synthesis of a compound represented by Formula C-1
Propionic acid 2-{(2-cyano-ethyl)-[4-(2-hydroxy-3,4-dioxo-cyclobut-1-enyl)-phenyl]-amino}-ethyl ester (60 mmol), 1-(2-Ethyl-hexyl)-1H-indole (60 mmol)을 톨루엔 (200 mL) 및 부탄올 (200 mL)에 넣고 환류하여 생성되는 물을 Dean-stark 증류장치로 제거한다. 12 시간 동안 교반 후 녹색 반응물을 감압증류하고 컬럼 크로마토그래피로 정제하여 비대칭 스쿠아일륨계 화합물을 얻는다. 이 화합물 (5 mmol) 을 600mL 클로로포름 용매에 녹인 후, Isophthaloyl chloride(20 mmol), p-xylylenediamine(20 mmol)을 60mL 클로로포름에 용해하여, 상온에서 5시간 동안 동시 적하시킨다. 12시간 후 감압 증류하고 컬럼 크로마토그래피로 분리하여 하기 화학식 C-1로 표시되는 화합물을 얻는다.Propionic acid 2-{(2-cyano-ethyl)-[4-(2-hydroxy-3,4-dioxo-cyclobut-1-enyl)-phenyl]-amino}-ethyl ester (60 mmol), 1-( 2-Ethyl-hexyl)-1H-indole (60 mmol) is added to toluene (200 mL) and butanol (200 mL), refluxed, and the resulting water is removed using a Dean-stark distillation apparatus. After stirring for 12 hours, the green reactant was distilled under reduced pressure and purified by column chromatography to obtain an asymmetric squarylium compound. After dissolving this compound (5 mmol) in 600 mL of chloroform solvent, Isophthaloyl chloride (20 mmol) and p-xylylenediamine (20 mmol) were dissolved in 60 mL of chloroform, and then added dropwise at room temperature for 5 hours. After 12 hours, the mixture was distilled under reduced pressure and separated by column chromatography to obtain a compound represented by the following Chemical Formula C-1.
[화학식 C-1][Formula C-1]
Maldi-tof MS : 1088.48 m/zMaldi-tof MS: 1088.48 m/z
평가 1: 최대흡광파장 측정Evaluation 1: Measurement of maximum absorption wavelength
상기 합성예 1 및 합성예 9 내지 비교 합성예 1에 따른 화합물을, 희석 용제(ANONE)를 이용하여 0.001wt%의 농도로 제조하여, 상기 합성예 1 및 합성예 9 내지 비교 합성예 1에 따른 코어-쉘 화합물 각각에 대한 흡수스펙트럼을 얻었으며, 그 결과를 하기 표 1 및 도 1에 나타내었다.(UV-1800, SHIMADZU)The compound according to Synthesis Example 1 and Synthesis Example 9 to Comparative Synthesis Example 1 was prepared at a concentration of 0.001wt% using a diluting solvent (ANONE), according to Synthesis Example 1 and Synthesis Example 9 to Comparative Synthesis Example 1. Absorption spectra were obtained for each of the core-shell compounds, and the results are shown in Table 1 and FIG. 1 below. (UV-1800, SHIMADZU)
최대흡광파장maximum absorption wavelength | |
합성예 1Synthesis Example 1 | 620620 |
합성예 2Synthesis Example 2 | 625625 |
합성예 3Synthesis Example 3 | 618618 |
합성예 4Synthesis Example 4 | 619619 |
합성예 5Synthesis Example 5 | 620620 |
합성예 6Synthesis Example 6 | 625625 |
합성예 7Synthesis Example 7 | 621621 |
합성예 8Synthesis Example 8 | 617617 |
합성예 9Synthesis Example 9 | 620620 |
비교 합성예 1Comparative Synthesis Example 1 | 596596 |
평가 2: 용해도 측정Evaluation 2: Determination of solubility
상기 합성예 1 내지 합성예 9 및 비교 합성예 1에 따른 화합물 0.5 g에, 희석 용제(PGMEA)를 각각 첨가하고, 해당 용액을 믹스 로터(iuchi 주식회사, MIXROTAR VMR-5)로 25℃rpm로 1시간 동안 교반한 후, 각각의 화합물의 용해도 확인 결과를 하기 표 2에 나타내었다.To 0.5 g of the compound according to Synthesis Examples 1 to 9 and Comparative Synthesis Example 1, a diluting solvent (PGMEA) was respectively added, and the solution was mixed with a mixing rotor (iuchi Co., Ltd., MIXROTAR VMR-5) at 25°C rpm 1 After stirring for an hour, the results of confirming the solubility of each compound are shown in Table 2 below.
용해도 평가 기준Solubility evaluation criteria
희석용제 총량에 대해 화합물(용질)이 10 중량% 이상 용해: ○Compound (solute) dissolved at least 10% by weight based on the total amount of diluent: ○
희석용제 총량에 대해 화합물(용질)이 10 중량% 미만 용해: XLess than 10% by weight of the compound (solute) dissolved with respect to the total amount of the diluent: X
용해도Solubility | |
합성예 1Synthesis Example 1 | ○○ |
합성예 2Synthesis Example 2 | ○○ |
합성예 3Synthesis Example 3 | ○○ |
합성예 4Synthesis Example 4 | ○○ |
합성예 5Synthesis Example 5 | ○○ |
합성예 6Synthesis Example 6 | ○○ |
합성예 7Synthesis Example 7 | ○○ |
합성예 8Synthesis Example 8 | ○○ |
합성예 9Synthesis Example 9 | ○○ |
비교 합성예 1Comparative Synthesis Example 1 | ○○ |
상기 표 2로부터, 합성예 1 내지 합성예 9의 화합물 및 비교 합성예 1의 화합물 모두 용해도가 우수한 것을 확인할 수 있다.From Table 2, it can be seen that both the compounds of Synthesis Examples 1 to 9 and the compounds of Comparative Synthesis Example 1 have excellent solubility.
(감광성 수지 조성물의 합성)(Synthesis of photosensitive resin composition)
실시예 1Example 1
하기 언급된 구성성분들을 하기 표 3에 나타낸 조성으로 혼합하여 실시예 1에 따른 감광성 수지 조성물을 제조하였다.A photosensitive resin composition according to Example 1 was prepared by mixing the components mentioned below in the composition shown in Table 3 below.
구체적으로, 용매에 광중합 개시제를 녹인 후 2 시간 동안 상온에서 교반한 다음, 여기에 바인더 수지 및 광중합성 화합물을 첨가하여 2시간 동안 상온에서 교반하였다. 이어서, 얻어진 상기 반응물에 착색제로서 상기 합성예 1에서 제조된 화합물(화학식 A로 표시되는 화합물) 및 안료(안료분산액 형태)를 넣고 1시간 동안 상온에서 교반하였다. 이어 상기 생성물을 3회 여과하여 불순물을 제거함으로써, 감광성 수지 조성물을 제조하였다.Specifically, a photopolymerization initiator was dissolved in a solvent and stirred at room temperature for 2 hours, and then a binder resin and a photopolymerizable compound were added thereto and stirred at room temperature for 2 hours. Then, the compound prepared in Synthesis Example 1 (compound represented by Formula A) and pigment (in the form of a pigment dispersion) as a colorant were added to the obtained reactant and stirred at room temperature for 1 hour. Then, the product was filtered three times to remove impurities, thereby preparing a photosensitive resin composition.
배합원료Ingredients | 함량content | ||
착색제coloring agent | 염료dyes | 합성예 1의 화합물Compound of Synthesis Example 1 | 5.05.0 |
안료분산액pigment dispersion | C.I. 녹색 안료58C.I. green pigment 58 | 15.015.0 | |
바인더 수지binder resin |
(A)/(B)=15/85(w/w), 분자량(Mw)=22,000g/mol (A): 메타크릴산 (B): 벤질메타크릴레이트(A)/(B)=15/85(w/w), Molecular Weight (Mw) = 22,000 g/mol (A): methacrylic acid (B): benzyl methacrylate |
3.53.5 | |
광중합성 화합물photopolymerizable compound | 디펜타에리트리톨헥사아크릴레이트(DPHA)Dipentaerythritol Hexaacrylate (DPHA) | 8.08.0 | |
광중합 개시제 |
1,2-옥탄디온1,2-octanedione | 1.01.0 | |
2-디메틸아미노-2-(4-메틸-벤질)-1-(4-모르폴린-4-일-페닐)-부탄-1-온2-Dimethylamino-2-(4-methyl-benzyl)-1-(4-morpholin-4-yl-phenyl)-butan-1-one | 0.50.5 | ||
용매menstruum | 사이클로헥사논cyclohexanone | 37.037.0 | |
PGMEA(Propylene Glycol Monomethyl Ether Acetate)PGMEA (Propylene Glycol Monomethyl Ether Acetate) | 30.030.0 | ||
총량(Total)Total | 100.00100.00 |
실시예 2Example 2
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 2의 화합물(화학식 B로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 2 (compound represented by Formula B) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 3Example 3
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 3의 화합물(화학식 C로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 3 (compound represented by Formula C) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 4Example 4
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 4의 화합물(화학식 D로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 4 (compound represented by Formula D) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 5Example 5
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 5의 화합물(화학식 E로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 5 (compound represented by Formula E) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 6Example 6
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 6의 화합물(화학식 F로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 6 (compound represented by Formula F) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 7Example 7
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 7의 화합물(화학식 G로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 7 (compound represented by Formula G) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 8Example 8
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 8의 화합물(화학식 H로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 8 (compound represented by Formula H) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
실시예 9Example 9
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 합성예 9의 화합물(화학식 I로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 9 (compound represented by Formula I) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A).
비교예 1Comparative Example 1
착색제로 합성예 1의 화합물(화학식 A로 표시되는 화합물)을 사용하지 않은 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Synthesis Example 1 (compound represented by Formula A) was not used as a colorant.
비교예 2Comparative Example 2
합성예 1의 화합물(화학식 A로 표시되는 화합물) 대신 비교 합성예 1의 화합물(화학식 C-1로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다.A photosensitive resin composition was prepared in the same manner as in Example 1, except that the compound of Comparative Synthesis Example 1 (compound represented by Formula C-1) was used instead of the compound of Synthesis Example 1 (compound represented by Formula A) .
평가 3: 색좌표, 휘도 및 명암비 측정Evaluation 3: Measurement of color coordinates, luminance and contrast ratio
탈지 세척한 두께 1 mm의 유리 기판 상에 1 ㎛ 내지 3 ㎛의 두께로 상기 실시예 1 내지 실시예 9, 비교예 1 및 비교예 2에서 제조한 감광성 수지 조성물을 도포하고, 90℃의 핫 플레이트 상에서 2분 동안 건조시켜 도막을 수득하였다. 계속해서 도막에 365nm의 주파장을 가진 고압수은램프를 사용하여 노광하였다. 이 후, 200℃의 열풍순환식 건조로 안에서 5분 동안 건조시켜 샘플을 수득하였다. 분광광도계(MCPD3000, Otsuka electronic社)를 이용하여 450nm, 540nm 및 620nm의 파장에서의 상기 샘플의 투과율을 측정하여 그 결과를 하기 표 4 및 도 2에 기재하였다.The photosensitive resin compositions prepared in Examples 1 to 9, Comparative Examples 1 and 2 were coated on a glass substrate having a thickness of 1 mm to a thickness of 1 μm to 3 μm on a degreasing-washed glass substrate, and a hot plate at 90° C. A coating film was obtained by drying on the bed for 2 minutes. Subsequently, the coating film was exposed using a high-pressure mercury lamp having a dominant wavelength of 365 nm. After that, the sample was obtained by drying for 5 minutes in a hot air circulation drying furnace at 200°C. The transmittance of the sample was measured at wavelengths of 450 nm, 540 nm and 620 nm using a spectrophotometer (MCPD3000, Otsuka electronic), and the results are shown in Table 4 and FIG. 2 below.
450nm에서의 투과도Transmittance at 450 nm | 540nm에서의 투과도Transmittance at 540 nm | 620nm에서의 투과도Transmittance at 620 nm | |
실시예 1Example 1 | 4.14.1 | 91.691.6 | 5.75.7 |
실시예 2Example 2 | 4.14.1 | 93.893.8 | 4.34.3 |
실시예 3Example 3 | 4.14.1 | 90.790.7 | 6.26.2 |
실시예 4Example 4 | 4.14.1 | 91.291.2 | 6.06.0 |
실시예 5Example 5 | 4.14.1 | 91.691.6 | 5.75.7 |
실시예 6Example 6 | 4.14.1 | 93.893.8 | 4.34.3 |
실시예 7Example 7 | 4.14.1 | 92.192.1 | 5.45.4 |
실시예 8Example 8 | 4.14.1 | 90.390.3 | 6.56.5 |
실시예 9Example 9 | 4.14.1 | 91.691.6 | 5.75.7 |
비교예 1Comparative Example 1 | 4.14.1 | 95.395.3 | 34.534.5 |
비교예 2Comparative Example 2 | 4.14.1 | 81.081.0 | 12.412.4 |
상기 표 4로부터, 일 구현예에 따른 코어-쉘 화합물을 염료로 포함하는 실시예 1 내지 실시예 9의 감광성 수지 조성물이 상기 화합물을 포함하지 않은 비교예 1 및 비교예 2의 감광성 수지 조성물과 비교하여, 450nm에서의 투과도는 5% 이하인 조건, 540nm에서의 투과도는 90% 이상인 조건 및 620nm에서의 투과도는 10% 이하인 조건을 모두 만족시킴으로써, 이를 녹색 감광성 수지 조성물로 이용하여 고투과형 CIS의 제조가 가능함을 확인할 수 있다. (비교예 2의 경우 540nm에서의 투과도는 90% 이하인데, 이는 일반적인 CIS용 녹색 감광성 수지 조성물에 적용 불가능한 투과도이다. 또한, 450nm에서의 투과도는 5% 이하인 조건, 540nm에서의 투과도는 90% 이상인 조건을 만족함과 동시에, 620nm에서의 투과도가 10% 이하로 낮을 경우, 혼색 개선이 가능하며, 궁극적으로 고투과형 CIS 녹색 컬러필터의 제조를 가능하게 한다.)From Table 4, the photosensitive resin composition of Examples 1 to 9 including the core-shell compound according to an embodiment as a dye compared with the photosensitive resin composition of Comparative Examples 1 and 2 not including the compound Thus, the transmittance at 450 nm is 5% or less, the transmittance at 540 nm is 90% or more, and the transmittance is 10% or less at 620 nm. You can check that it is possible. (In Comparative Example 2, the transmittance at 540 nm is 90% or less, which is a transmittance that is not applicable to a general green photosensitive resin composition for CIS. In addition, the transmittance at 450 nm is 5% or less, and the transmittance at 540 nm is 90% or more When the condition is satisfied and the transmittance at 620 nm is as low as 10% or less, color mixing is possible, and ultimately, it is possible to manufacture a high transmittance type CIS green color filter.)
이상 본 발명의 바람직한 실시예에 대하여 설명하였지만, 본 발명은 이에 한정되는 것이 아니고, 특허청구범위와 발명의 상세한 설명 및 첨부한 도면의 범위 안에서 여러 가지로 변형하여 실시하는 것이 가능하고, 이 또한 본 발명의 범위에 속하는 것은 당연하다.Although preferred embodiments of the present invention have been described above, the present invention is not limited thereto, and various modifications can be made within the scope of the appended claims, the detailed description of the invention, and the accompanying drawings. It goes without saying that it falls within the scope of the invention.
Claims (20)
- 하기 화학식 1로 표시되는 코어 및 A core represented by the following formula (1) and상기 코어를 둘러싸며, 하기 화학식 2로 표시되는 쉘로 이루어진 코어-쉘 화합물:A core-shell compound surrounding the core and consisting of a shell represented by the following formula (2):[화학식 1][Formula 1][화학식 2][Formula 2]상기 화학식 1 및 화학식 2에서,In Formula 1 and Formula 2,R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or fuse with each other to form a fused ring,R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 3 and R 5 are each independently present or may be fused with each other to form a fused ring,La 및 Lb는 각각 독립적으로 단일결합 또는 치환 또는 비치환된 C1 내지 C10 알킬렌기이다.L a and L b are each independently a single bond or a substituted or unsubstituted C1 to C10 alkylene group.
- 제1항에 있어서, According to claim 1,상기 화학식 1로 표시되는 코어는 하기 화학식 1-1로 표시되는 화합물:The core represented by Formula 1 is a compound represented by Formula 1-1:[화학식 1-1][Formula 1-1]상기 화학식 1-1에서,In Formula 1-1,R1 내지 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이고,R 1 to R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, or a substituted or unsubstituted C6 to C20 aryl group,R2 및 R4는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있고,R 2 and R 4 may each independently exist or fuse with each other to form a fused ring,R3 및 R5는 각각 독립적으로 존재하거나 서로 융합하여 융합고리를 형성할 수 있다.R 3 and R 5 may each independently exist or may be fused with each other to form a fused ring.
- 제2항에 있어서, 3. The method of claim 2,상기 화학식 1-1로 표시되는 코어는 하기 화학식 1-1-1 또는 화학식 1-1-2로 표시되는 화합물:The core represented by Formula 1-1 is a compound represented by Formula 1-1-1 or Formula 1-1-2:[화학식 1-1-1][Formula 1-1-1][화학식 1-1-2][Formula 1-1-2]상기 화학식 1-1-1 및 화학식 1-1-2에서,In Formulas 1-1-1 and 1-1-2,R1 내지 R3 및 R6은 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 사이클로알킬기, 치환 또는 비치환된 C1 내지 C20 알콕시기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.R 1 to R 3 and R 6 are each independently a hydrogen atom, a halogen atom, a cyano group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 an alkoxy group or a substituted or unsubstituted C6 to C20 aryl group.
- 제1항에 있어서, According to claim 1,상기 R1은 치환 또는 비치환된 C1 내지 C20 알콕시기인 화합물.wherein R 1 is a substituted or unsubstituted C1 to C20 alkoxy group.
- 제4항에 있어서, 5. The method of claim 4,상기 R2는 치환 또는 비치환된 C3 내지 C20 사이클로알킬기인 화합물.wherein R 2 is a substituted or unsubstituted C3 to C20 cycloalkyl group.
- 제5항에 있어서, 6. The method of claim 5,상기 R2는 알콕시기로 치환된 C3 내지 C20 사이클로알킬기인 화합물.wherein R 2 is a C3 to C20 cycloalkyl group substituted with an alkoxy group.
- 제4항에 있어서, 5. The method of claim 4,상기 R3은 치환 또는 비치환된 C6 내지 C20 아릴기인 화합물.wherein R 3 is a substituted or unsubstituted C6 to C20 aryl group.
- 제7항에 있어서, 8. The method of claim 7,상기 R3은 하나 이상의 알킬기로 치환된 C6 내지 C20 아릴기인 화합물.wherein R 3 is a C6 to C20 aryl group substituted with one or more alkyl groups.
- 제1항에 있어서, According to claim 1,상기 R6는 수소 원자, 할로겐 원자, 시아노기 또는 치환 또는 비치환된 C1 내지 C20 알콕시기인 화합물.wherein R 6 is a hydrogen atom, a halogen atom, a cyano group, or a substituted or unsubstituted C1 to C20 alkoxy group.
- 제1항에 있어서, According to claim 1,상기 화학식 1로 표시되는 코어는 610nm 내지 640nm에서 최대흡광파장을 가지는 화합물.The core represented by Formula 1 is a compound having a maximum absorption wavelength at 610 nm to 640 nm.
- 제1항에 있어서, According to claim 1,상기 코어-쉘 화합물은 하기 화학식 A 내지 화학식 I 중 어느 하나로 표시되는 화합물.The core-shell compound is a compound represented by any one of Formulas A to I.[화학식 A][Formula A][화학식 B][Formula B][화학식 C][Formula C][화학식 D][Formula D][화학식 E][Formula E][화학식 F][Formula F][화학식 G][Formula G][화학식 H][Formula H][화학식 I][Formula I]
- 제1항에 있어서,According to claim 1,상기 화합물은 녹색 염료인 화합물.The compound is a green dye.
- 제1항 내지 제13항 중 어느 한 항의 화합물을 포함하는 감광성 수지 조성물.The photosensitive resin composition containing the compound of any one of Claims 1-13.
- 제14항에 있어서,15. The method of claim 14,상기 감광성 수지 조성물은 540nm에서 90% 이상의 투과도를 가지고, 600nm 내지 640nm에서 10% 이하의 투과도를 가지는 감광성 수지 조성물.The photosensitive resin composition has a transmittance of 90% or more at 540 nm, and a transmittance of 10% or less at 600 nm to 640 nm.
- 제15항에 있어서,16. The method of claim 15,상기 감광성 수지 조성물은 450nm에서 5% 이하의 투과도를 가지는 감광성 수지 조성물.The photosensitive resin composition has a transmittance of 5% or less at 450 nm.
- 제15항에 있어서,16. The method of claim 15,상기 감광성 수지 조성물은 CMOS 이미지 센서용인 감광성 수지 조성물.The photosensitive resin composition is a photosensitive resin composition for a CMOS image sensor.
- 제14항의 감광성 수지 조성물을 이용하여 제조되는 감광성 수지막.A photosensitive resin film produced using the photosensitive resin composition of claim 14 .
- 제18항의 감광성 수지막을 포함하는 컬러필터.A color filter comprising the photosensitive resin film of claim 18 .
- 제19항의 컬러필터를 포함하는 CMOS 이미지 센서.A CMOS image sensor comprising the color filter of claim 19 .
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