KR102554802B1 - 하전 입자 광 디바이스 - Google Patents

하전 입자 광 디바이스 Download PDF

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Publication number
KR102554802B1
KR102554802B1 KR1020227002693A KR20227002693A KR102554802B1 KR 102554802 B1 KR102554802 B1 KR 102554802B1 KR 1020227002693 A KR1020227002693 A KR 1020227002693A KR 20227002693 A KR20227002693 A KR 20227002693A KR 102554802 B1 KR102554802 B1 KR 102554802B1
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South Korea
Prior art keywords
charged particle
deflector
substrate
opening
optical device
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KR1020227002693A
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English (en)
Korean (ko)
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KR20220018072A (ko
Inventor
소해일 샤투
주스트 비테벤
아론 로젠탈
요한 주스트 코닝
Original Assignee
에이에스엠엘 네델란즈 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 에이에스엠엘 네델란즈 비.브이. filed Critical 에이에스엠엘 네델란즈 비.브이.
Priority to KR1020237023119A priority Critical patent/KR102780436B1/ko
Publication of KR20220018072A publication Critical patent/KR20220018072A/ko
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Publication of KR102554802B1 publication Critical patent/KR102554802B1/ko
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/087—Deviation, concentration or focusing of the beam by electric or magnetic means by electrical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/06—Electromagnets; Actuators including electromagnets
    • H01F2007/068—Electromagnets; Actuators including electromagnets using printed circuit coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H01J2237/1526—For X-Y scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31774—Multi-beam

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Electron Beam Exposure (AREA)
KR1020227002693A 2013-09-06 2014-09-05 하전 입자 광 디바이스 Active KR102554802B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020237023119A KR102780436B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201361874394P 2013-09-06 2013-09-06
NL2011401A NL2011401C2 (en) 2013-09-06 2013-09-06 Charged particle optical device.
NL2011401 2013-09-06
US61/874,394 2013-09-06
PCT/NL2014/050610 WO2015034362A1 (en) 2013-09-06 2014-09-05 Charged particle optical device
KR1020167009093A KR102357144B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020167009093A Division KR102357144B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020237023119A Division KR102780436B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스

Publications (2)

Publication Number Publication Date
KR20220018072A KR20220018072A (ko) 2022-02-14
KR102554802B1 true KR102554802B1 (ko) 2023-07-13

Family

ID=50071680

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020167009093A Active KR102357144B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스
KR1020227002693A Active KR102554802B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스
KR1020237023119A Active KR102780436B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020167009093A Active KR102357144B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020237023119A Active KR102780436B1 (ko) 2013-09-06 2014-09-05 하전 입자 광 디바이스

Country Status (8)

Country Link
US (1) US9111657B2 (enExample)
EP (1) EP3042386B1 (enExample)
JP (1) JP6469699B2 (enExample)
KR (3) KR102357144B1 (enExample)
CN (1) CN105765689B (enExample)
NL (1) NL2011401C2 (enExample)
TW (1) TWI656555B (enExample)
WO (1) WO2015034362A1 (enExample)

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US9346127B2 (en) 2014-06-20 2016-05-24 Velo3D, Inc. Apparatuses, systems and methods for three-dimensional printing
WO2017015217A2 (en) * 2015-07-20 2017-01-26 Velo3D, Inc. Transfer of particulate material
EP3370948A4 (en) 2015-11-06 2019-07-24 Velo3d Inc. PROFESSIONAL THREE-DIMENSIONAL PRINTING
US20170239719A1 (en) 2016-02-18 2017-08-24 Velo3D, Inc. Accurate three-dimensional printing
US9981293B2 (en) * 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems
JP6640040B2 (ja) * 2016-06-23 2020-02-05 株式会社ニューフレアテクノロジー 伝熱板および描画装置
US11691343B2 (en) 2016-06-29 2023-07-04 Velo3D, Inc. Three-dimensional printing and three-dimensional printers
US20180093419A1 (en) 2016-09-30 2018-04-05 Velo3D, Inc. Three-dimensional objects and their formation
US20180126650A1 (en) 2016-11-07 2018-05-10 Velo3D, Inc. Gas flow in three-dimensional printing
US20180186081A1 (en) 2017-01-05 2018-07-05 Velo3D, Inc. Optics in three-dimensional printing
US10442003B2 (en) 2017-03-02 2019-10-15 Velo3D, Inc. Three-dimensional printing of three-dimensional objects
US20180281237A1 (en) 2017-03-28 2018-10-04 Velo3D, Inc. Material manipulation in three-dimensional printing
US10272525B1 (en) 2017-12-27 2019-04-30 Velo3D, Inc. Three-dimensional printing systems and methods of their use
US10144176B1 (en) 2018-01-15 2018-12-04 Velo3D, Inc. Three-dimensional printing systems and methods of their use
US10504687B2 (en) * 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
CN114340876A (zh) 2019-07-26 2022-04-12 维勒3D股份有限公司 三维物体形成的质量保证
CA3172893A1 (en) * 2020-03-24 2021-09-30 Asml Netherlands B.V. Stack alignment techniques
US11855463B2 (en) * 2020-12-04 2023-12-26 Spark Connected LLC Wireless power transmission to a mobile device
EP4202970A1 (en) 2021-12-24 2023-06-28 ASML Netherlands B.V. Alignment determination method and computer program

Citations (3)

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Publication number Priority date Publication date Assignee Title
JP2003031172A (ja) * 2001-07-16 2003-01-31 Nikon Corp 偏向器とその製造方法、及び荷電粒子露光装置
US20080217531A1 (en) * 2006-09-12 2008-09-11 Muray Lawrence P Integrated deflectors for beam alignment and blanking in charged particle columns
WO2012165955A2 (en) * 2011-05-30 2012-12-06 Mapper Lithography Ip B.V. Charged particle multi-beamlet apparatus

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JPH03176955A (ja) * 1989-12-05 1991-07-31 Jeol Ltd 走査形電子ビーム装置
JPH04179116A (ja) * 1990-11-09 1992-06-25 Hitachi Ltd 荷電粒子線装置
JP3774953B2 (ja) * 1995-10-19 2006-05-17 株式会社日立製作所 走査形電子顕微鏡
JP3938966B2 (ja) * 1997-02-13 2007-06-27 富士通株式会社 荷電粒子ビーム露光方法及びその露光装置
US6153885A (en) * 1999-06-03 2000-11-28 Nikon Corporation Toroidal charged particle deflector with high mechanical stability and accuracy
JP4738723B2 (ja) * 2003-08-06 2011-08-03 キヤノン株式会社 マルチ荷電粒子線描画装置、荷電粒子線の電流の測定方法及びデバイス製造方法
US7235799B2 (en) * 2003-11-28 2007-06-26 Ebara Corporation System and method for evaluation using electron beam and manufacture of devices
JP2012504309A (ja) * 2008-09-30 2012-02-16 カール ツァイス エヌティーエス エルエルシー 荷電粒子ビームの位置合わせ
JP5386934B2 (ja) * 2008-11-04 2014-01-15 株式会社島津製作所 荷電粒子ビーム装置及びその対物レンズのコンタミネーション防止装置
NL1036912C2 (en) * 2009-04-29 2010-11-01 Mapper Lithography Ip Bv Charged particle optical system comprising an electrostatic deflector.
US8138484B2 (en) * 2010-04-28 2012-03-20 Axcelis Technologies Inc. Magnetic scanning system with improved efficiency
JP5253532B2 (ja) * 2011-03-01 2013-07-31 キヤノン株式会社 偏向器アレイ、偏向器アレイの製造方法、描画装置、および物品の製造方法
NL2007392C2 (en) 2011-09-12 2013-03-13 Mapper Lithography Ip Bv Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003031172A (ja) * 2001-07-16 2003-01-31 Nikon Corp 偏向器とその製造方法、及び荷電粒子露光装置
US20080217531A1 (en) * 2006-09-12 2008-09-11 Muray Lawrence P Integrated deflectors for beam alignment and blanking in charged particle columns
WO2012165955A2 (en) * 2011-05-30 2012-12-06 Mapper Lithography Ip B.V. Charged particle multi-beamlet apparatus

Also Published As

Publication number Publication date
US9111657B2 (en) 2015-08-18
US20150069259A1 (en) 2015-03-12
KR102780436B1 (ko) 2025-03-14
CN105765689B (zh) 2018-05-18
KR20220018072A (ko) 2022-02-14
NL2011401C2 (en) 2015-03-09
EP3042386B1 (en) 2017-07-19
TW201532103A (zh) 2015-08-16
TWI656555B (zh) 2019-04-11
KR102357144B1 (ko) 2022-01-28
JP2016529684A (ja) 2016-09-23
KR20160051894A (ko) 2016-05-11
EP3042386A1 (en) 2016-07-13
CN105765689A (zh) 2016-07-13
WO2015034362A1 (en) 2015-03-12
KR20230110651A (ko) 2023-07-24
JP6469699B2 (ja) 2019-02-13

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