CN105765689B - 带电粒子光学器件 - Google Patents
带电粒子光学器件 Download PDFInfo
- Publication number
- CN105765689B CN105765689B CN201480049157.1A CN201480049157A CN105765689B CN 105765689 B CN105765689 B CN 105765689B CN 201480049157 A CN201480049157 A CN 201480049157A CN 105765689 B CN105765689 B CN 105765689B
- Authority
- CN
- China
- Prior art keywords
- charged particle
- substrate
- opening
- deflector
- openings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002245 particle Substances 0.000 title claims abstract description 117
- 239000000758 substrate Substances 0.000 claims abstract description 84
- 230000004907 flux Effects 0.000 claims description 36
- 238000001816 cooling Methods 0.000 claims description 19
- 239000004020 conductor Substances 0.000 claims description 9
- 230000005684 electric field Effects 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- 239000012777 electrically insulating material Substances 0.000 claims description 3
- 239000000110 cooling liquid Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 238000000386 microscopy Methods 0.000 claims description 2
- 238000000206 photolithography Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims 11
- 238000000059 patterning Methods 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 17
- 229910052802 copper Inorganic materials 0.000 description 17
- 239000010949 copper Substances 0.000 description 17
- 229910000859 α-Fe Inorganic materials 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 238000010894 electron beam technology Methods 0.000 description 9
- SXHLTVKPNQVZGL-UHFFFAOYSA-N 1,2-dichloro-3-(3-chlorophenyl)benzene Chemical compound ClC1=CC=CC(C=2C(=C(Cl)C=CC=2)Cl)=C1 SXHLTVKPNQVZGL-UHFFFAOYSA-N 0.000 description 7
- VAHKBZSAUKPEOV-UHFFFAOYSA-N 1,4-dichloro-2-(4-chlorophenyl)benzene Chemical compound C1=CC(Cl)=CC=C1C1=CC(Cl)=CC=C1Cl VAHKBZSAUKPEOV-UHFFFAOYSA-N 0.000 description 7
- NMWSKOLWZZWHPL-UHFFFAOYSA-N 3-chlorobiphenyl Chemical compound ClC1=CC=CC(C=2C=CC=CC=2)=C1 NMWSKOLWZZWHPL-UHFFFAOYSA-N 0.000 description 7
- 101001082832 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) Pyruvate carboxylase 2 Proteins 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- MINPZZUPSSVGJN-UHFFFAOYSA-N 1,1,1,4,4,4-hexachlorobutane Chemical compound ClC(Cl)(Cl)CCC(Cl)(Cl)Cl MINPZZUPSSVGJN-UHFFFAOYSA-N 0.000 description 1
- 101150049492 DVR gene Proteins 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
- G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
- H01J37/1475—Scanning means magnetic
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
- G21K1/087—Deviation, concentration or focusing of the beam by electric or magnetic means by electrical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/06—Electromagnets; Actuators including electromagnets
- H01F2007/068—Electromagnets; Actuators including electromagnets using printed circuit coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/152—Magnetic means
- H01J2237/1526—For X-Y scanning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31774—Multi-beam
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361874394P | 2013-09-06 | 2013-09-06 | |
| NL2011401A NL2011401C2 (en) | 2013-09-06 | 2013-09-06 | Charged particle optical device. |
| NL2011401 | 2013-09-06 | ||
| US61/874,394 | 2013-09-06 | ||
| PCT/NL2014/050610 WO2015034362A1 (en) | 2013-09-06 | 2014-09-05 | Charged particle optical device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105765689A CN105765689A (zh) | 2016-07-13 |
| CN105765689B true CN105765689B (zh) | 2018-05-18 |
Family
ID=50071680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480049157.1A Active CN105765689B (zh) | 2013-09-06 | 2014-09-05 | 带电粒子光学器件 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9111657B2 (enExample) |
| EP (1) | EP3042386B1 (enExample) |
| JP (1) | JP6469699B2 (enExample) |
| KR (3) | KR102554802B1 (enExample) |
| CN (1) | CN105765689B (enExample) |
| NL (1) | NL2011401C2 (enExample) |
| TW (1) | TWI656555B (enExample) |
| WO (1) | WO2015034362A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150367415A1 (en) | 2014-06-20 | 2015-12-24 | Velo3D, Inc. | Apparatuses, systems and methods for three-dimensional printing |
| WO2017015217A2 (en) * | 2015-07-20 | 2017-01-26 | Velo3D, Inc. | Transfer of particulate material |
| US10065270B2 (en) | 2015-11-06 | 2018-09-04 | Velo3D, Inc. | Three-dimensional printing in real time |
| WO2017143077A1 (en) | 2016-02-18 | 2017-08-24 | Velo3D, Inc. | Accurate three-dimensional printing |
| US9981293B2 (en) | 2016-04-21 | 2018-05-29 | Mapper Lithography Ip B.V. | Method and system for the removal and/or avoidance of contamination in charged particle beam systems |
| JP6640040B2 (ja) * | 2016-06-23 | 2020-02-05 | 株式会社ニューフレアテクノロジー | 伝熱板および描画装置 |
| US11691343B2 (en) | 2016-06-29 | 2023-07-04 | Velo3D, Inc. | Three-dimensional printing and three-dimensional printers |
| US20180093418A1 (en) | 2016-09-30 | 2018-04-05 | Velo3D, Inc. | Three-dimensional objects and their formation |
| US20180126462A1 (en) | 2016-11-07 | 2018-05-10 | Velo3D, Inc. | Gas flow in three-dimensional printing |
| US10611092B2 (en) | 2017-01-05 | 2020-04-07 | Velo3D, Inc. | Optics in three-dimensional printing |
| US10357829B2 (en) | 2017-03-02 | 2019-07-23 | Velo3D, Inc. | Three-dimensional printing of three-dimensional objects |
| US20180281237A1 (en) | 2017-03-28 | 2018-10-04 | Velo3D, Inc. | Material manipulation in three-dimensional printing |
| US10272525B1 (en) | 2017-12-27 | 2019-04-30 | Velo3D, Inc. | Three-dimensional printing systems and methods of their use |
| US10144176B1 (en) | 2018-01-15 | 2018-12-04 | Velo3D, Inc. | Three-dimensional printing systems and methods of their use |
| US10504687B2 (en) * | 2018-02-20 | 2019-12-10 | Technische Universiteit Delft | Signal separator for a multi-beam charged particle inspection apparatus |
| CA3148849A1 (en) | 2019-07-26 | 2021-02-04 | Velo3D, Inc. | Quality assurance in formation of three-dimensional objects |
| CA3172893A1 (en) | 2020-03-24 | 2021-09-30 | Asml Netherlands B.V. | Stack alignment techniques |
| US11855463B2 (en) * | 2020-12-04 | 2023-12-26 | Spark Connected LLC | Wireless power transmission to a mobile device |
| EP4202970A1 (en) | 2021-12-24 | 2023-06-28 | ASML Netherlands B.V. | Alignment determination method and computer program |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03176955A (ja) * | 1989-12-05 | 1991-07-31 | Jeol Ltd | 走査形電子ビーム装置 |
| JPH04179116A (ja) * | 1990-11-09 | 1992-06-25 | Hitachi Ltd | 荷電粒子線装置 |
| JP3774953B2 (ja) * | 1995-10-19 | 2006-05-17 | 株式会社日立製作所 | 走査形電子顕微鏡 |
| JP3938966B2 (ja) * | 1997-02-13 | 2007-06-27 | 富士通株式会社 | 荷電粒子ビーム露光方法及びその露光装置 |
| US6153885A (en) * | 1999-06-03 | 2000-11-28 | Nikon Corporation | Toroidal charged particle deflector with high mechanical stability and accuracy |
| JP2003031172A (ja) * | 2001-07-16 | 2003-01-31 | Nikon Corp | 偏向器とその製造方法、及び荷電粒子露光装置 |
| JP4738723B2 (ja) * | 2003-08-06 | 2011-08-03 | キヤノン株式会社 | マルチ荷電粒子線描画装置、荷電粒子線の電流の測定方法及びデバイス製造方法 |
| US7235799B2 (en) * | 2003-11-28 | 2007-06-26 | Ebara Corporation | System and method for evaluation using electron beam and manufacture of devices |
| WO2008033671A1 (en) * | 2006-09-12 | 2008-03-20 | Novelx, Inc. | Integrated deflectors for beam alignment and blanking in charged particle columns |
| JP2012504309A (ja) * | 2008-09-30 | 2012-02-16 | カール ツァイス エヌティーエス エルエルシー | 荷電粒子ビームの位置合わせ |
| JP5386934B2 (ja) * | 2008-11-04 | 2014-01-15 | 株式会社島津製作所 | 荷電粒子ビーム装置及びその対物レンズのコンタミネーション防止装置 |
| NL1036912C2 (en) * | 2009-04-29 | 2010-11-01 | Mapper Lithography Ip Bv | Charged particle optical system comprising an electrostatic deflector. |
| US8138484B2 (en) * | 2010-04-28 | 2012-03-20 | Axcelis Technologies Inc. | Magnetic scanning system with improved efficiency |
| JP5253532B2 (ja) * | 2011-03-01 | 2013-07-31 | キヤノン株式会社 | 偏向器アレイ、偏向器アレイの製造方法、描画装置、および物品の製造方法 |
| NL2007392C2 (en) | 2011-09-12 | 2013-03-13 | Mapper Lithography Ip Bv | Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly. |
| NL2006868C2 (en) * | 2011-05-30 | 2012-12-03 | Mapper Lithography Ip Bv | Charged particle multi-beamlet apparatus. |
-
2013
- 2013-09-06 NL NL2011401A patent/NL2011401C2/en active
-
2014
- 2014-09-04 US US14/477,769 patent/US9111657B2/en active Active
- 2014-09-05 JP JP2016540837A patent/JP6469699B2/ja active Active
- 2014-09-05 KR KR1020227002693A patent/KR102554802B1/ko active Active
- 2014-09-05 WO PCT/NL2014/050610 patent/WO2015034362A1/en not_active Ceased
- 2014-09-05 EP EP14784383.3A patent/EP3042386B1/en active Active
- 2014-09-05 KR KR1020167009093A patent/KR102357144B1/ko active Active
- 2014-09-05 CN CN201480049157.1A patent/CN105765689B/zh active Active
- 2014-09-05 KR KR1020237023119A patent/KR102780436B1/ko active Active
- 2014-09-05 TW TW103130738A patent/TWI656555B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| US9111657B2 (en) | 2015-08-18 |
| EP3042386A1 (en) | 2016-07-13 |
| KR20160051894A (ko) | 2016-05-11 |
| KR102780436B1 (ko) | 2025-03-14 |
| JP6469699B2 (ja) | 2019-02-13 |
| KR20230110651A (ko) | 2023-07-24 |
| CN105765689A (zh) | 2016-07-13 |
| TWI656555B (zh) | 2019-04-11 |
| KR102357144B1 (ko) | 2022-01-28 |
| KR102554802B1 (ko) | 2023-07-13 |
| US20150069259A1 (en) | 2015-03-12 |
| JP2016529684A (ja) | 2016-09-23 |
| NL2011401C2 (en) | 2015-03-09 |
| WO2015034362A1 (en) | 2015-03-12 |
| TW201532103A (zh) | 2015-08-16 |
| EP3042386B1 (en) | 2017-07-19 |
| KR20220018072A (ko) | 2022-02-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190527 Address after: Holland Weide Eindhoven Patentee after: ASML Holland Co., Ltd. Address before: About Holland Patentee before: Mapper Lithography IP B. V. |