KR102554567B1 - 광경화성 조성물 및 이로부터 형성된 광경화 막 - Google Patents

광경화성 조성물 및 이로부터 형성된 광경화 막 Download PDF

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Publication number
KR102554567B1
KR102554567B1 KR1020170008504A KR20170008504A KR102554567B1 KR 102554567 B1 KR102554567 B1 KR 102554567B1 KR 1020170008504 A KR1020170008504 A KR 1020170008504A KR 20170008504 A KR20170008504 A KR 20170008504A KR 102554567 B1 KR102554567 B1 KR 102554567B1
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South Korea
Prior art keywords
meth
acrylate
formula
photocurable composition
compound
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KR1020170008504A
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English (en)
Korean (ko)
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KR20180085181A (ko
Inventor
김성빈
조용환
박한우
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동우 화인켐 주식회사
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Priority to KR1020170008504A priority Critical patent/KR102554567B1/ko
Priority to JP2018003282A priority patent/JP6535767B2/ja
Priority to CN201810041645.8A priority patent/CN108329424B/zh
Publication of KR20180085181A publication Critical patent/KR20180085181A/ko
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Publication of KR102554567B1 publication Critical patent/KR102554567B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D135/02—Homopolymers or copolymers of esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
KR1020170008504A 2017-01-18 2017-01-18 광경화성 조성물 및 이로부터 형성된 광경화 막 KR102554567B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020170008504A KR102554567B1 (ko) 2017-01-18 2017-01-18 광경화성 조성물 및 이로부터 형성된 광경화 막
JP2018003282A JP6535767B2 (ja) 2017-01-18 2018-01-12 光硬化性組成物及びそれから形成された光硬化膜
CN201810041645.8A CN108329424B (zh) 2017-01-18 2018-01-16 光固化性组合物及由该光固化性组合物形成的光固化膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020170008504A KR102554567B1 (ko) 2017-01-18 2017-01-18 광경화성 조성물 및 이로부터 형성된 광경화 막

Publications (2)

Publication Number Publication Date
KR20180085181A KR20180085181A (ko) 2018-07-26
KR102554567B1 true KR102554567B1 (ko) 2023-07-11

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JP (1) JP6535767B2 (zh)
KR (1) KR102554567B1 (zh)
CN (1) CN108329424B (zh)

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JP7236671B2 (ja) * 2018-12-25 2023-03-10 パナソニックＩｐマネジメント株式会社 発光素子封止用組成物、及び発光装置
JP7236672B2 (ja) * 2018-12-25 2023-03-10 パナソニックＩｐマネジメント株式会社 封止材の製造方法、及び発光装置の製造方法
WO2020162104A1 (ja) * 2019-02-04 2020-08-13 セントラル硝子株式会社 有機発光素子封止用組成物、および該組成物を用いた有機発光素子封止膜、並びにその形成方法
CN113248652B (zh) * 2020-11-11 2022-09-16 浙江华显光电科技有限公司 一种用于密封有机发光器件的光固化性组合物
KR20230041335A (ko) * 2021-09-17 2023-03-24 코오롱인더스트리 주식회사 봉지재 조성물 및 발광 소자

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JP2014063863A (ja) * 2012-09-21 2014-04-10 Tokuyama Corp 光硬化性ナノインプリント用組成物およびパターンの形成方法

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Publication number Publication date
JP2018173622A (ja) 2018-11-08
CN108329424B (zh) 2020-08-04
KR20180085181A (ko) 2018-07-26
CN108329424A (zh) 2018-07-27
JP6535767B2 (ja) 2019-06-26

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