KR102547554B1 - 어레이 기반 특성화 툴 - Google Patents

어레이 기반 특성화 툴 Download PDF

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Publication number
KR102547554B1
KR102547554B1 KR1020207034236A KR20207034236A KR102547554B1 KR 102547554 B1 KR102547554 B1 KR 102547554B1 KR 1020207034236 A KR1020207034236 A KR 1020207034236A KR 20207034236 A KR20207034236 A KR 20207034236A KR 102547554 B1 KR102547554 B1 KR 102547554B1
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South Korea
Prior art keywords
deflector
electro
optical
electron
electron beam
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Korean (ko)
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KR20200139257A (ko
Inventor
알렉스 립킨드
알론 로센탈
프랑크 칠레스
존 젤링
로렌스 머레이
로버트 헤이네스
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케이엘에이 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1020207034236A 2018-05-02 2019-04-30 어레이 기반 특성화 툴 Active KR102547554B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020237007799A KR102608083B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/969,555 2018-05-02
US15/969,555 US10438769B1 (en) 2018-05-02 2018-05-02 Array-based characterization tool
PCT/US2019/029764 WO2019213000A1 (en) 2018-05-02 2019-04-30 Array-based characterization tool

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020237007799A Division KR102608083B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴

Publications (2)

Publication Number Publication Date
KR20200139257A KR20200139257A (ko) 2020-12-11
KR102547554B1 true KR102547554B1 (ko) 2023-06-23

Family

ID=68102068

Family Applications (2)

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KR1020207034236A Active KR102547554B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴
KR1020237007799A Active KR102608083B1 (ko) 2018-05-02 2019-04-30 어레이 기반 특성화 툴

Family Applications After (1)

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Country Status (7)

Country Link
US (1) US10438769B1 (https=)
EP (1) EP3765886A4 (https=)
JP (3) JP7271572B2 (https=)
KR (2) KR102547554B1 (https=)
CN (2) CN115047608A (https=)
TW (1) TWI780324B (https=)
WO (1) WO2019213000A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
US20240021404A1 (en) * 2020-12-10 2024-01-18 Asml Netherlands B.V. Charged-particle beam apparatus with beam-tilt and methods thereof
JP7680923B2 (ja) * 2021-09-16 2025-05-21 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置、多極子アレイの制御方法、及びマルチ電子ビーム検査方法
US20250357071A1 (en) * 2024-05-17 2025-11-20 Fei Company Scanning deflector

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US20020117967A1 (en) * 2001-02-23 2002-08-29 Gerlach Robert L. Electron beam system using multiple electron beams
JP2010020919A (ja) * 2008-07-08 2010-01-28 Hitachi High-Technologies Corp 検査装置
JP2013097869A (ja) * 2011-10-28 2013-05-20 Ebara Corp 試料観察装置及び試料観察方法
US20180068825A1 (en) * 2016-09-08 2018-03-08 Kla-Tencor Corporation Apparatus and Method for Correcting Arrayed Astigmatism in a Multi-Column Scanning Electron Microscopy System

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JPS6293931A (ja) * 1985-10-19 1987-04-30 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム露光装置
EP0281743B1 (de) * 1987-02-02 1994-03-30 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Detektorobjectiv für Rastermikroskope
US4926054A (en) * 1988-03-17 1990-05-15 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Objective lens for focusing charged particles in an electron microscope
JP2775812B2 (ja) * 1989-02-21 1998-07-16 株式会社ニコン 荷電粒子線装置
JP4215282B2 (ja) * 1997-12-23 2009-01-28 エフ イー アイ カンパニ 静電対物レンズ及び電気走査装置を装備したｓｅｍ
US6633034B1 (en) * 2000-05-04 2003-10-14 Applied Materials, Inc. Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
DE60105199T2 (de) 2000-12-22 2005-08-11 Fei Co., Hillsboro Sem mit einem sekundärelektronendetektor mit einer zentralelektrode
US6750455B2 (en) 2001-07-02 2004-06-15 Applied Materials, Inc. Method and apparatus for multiple charged particle beams
KR101057554B1 (ko) * 2002-07-11 2011-08-17 어플라이드 머티리얼즈 이스라엘 리미티드 입자빔으로 임계 치수를 측정하기 위한 방법 및 장치
CN101414534B (zh) * 2002-10-30 2012-10-03 迈普尔平版印刷Ip有限公司 电子束曝光系统
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NL2013411B1 (en) * 2014-09-04 2016-09-27 Univ Delft Tech Multi electron beam inspection apparatus.
CN111261481B (zh) * 2015-03-24 2022-12-16 科磊股份有限公司 用于带电粒子显微镜的方法及系统
WO2016182948A1 (en) * 2015-05-08 2016-11-17 Kla-Tencor Corporation Method and system for aberration correction in electron beam system
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SG10201912510QA (en) * 2015-09-23 2020-02-27 Kla Tencor Corp Method and system for focus adjustment a multi-beam scanning electron microscopy system
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Publication number Priority date Publication date Assignee Title
US20020117967A1 (en) * 2001-02-23 2002-08-29 Gerlach Robert L. Electron beam system using multiple electron beams
JP2010020919A (ja) * 2008-07-08 2010-01-28 Hitachi High-Technologies Corp 検査装置
JP2013097869A (ja) * 2011-10-28 2013-05-20 Ebara Corp 試料観察装置及び試料観察方法
US20180068825A1 (en) * 2016-09-08 2018-03-08 Kla-Tencor Corporation Apparatus and Method for Correcting Arrayed Astigmatism in a Multi-Column Scanning Electron Microscopy System

Also Published As

Publication number Publication date
CN112136070B (zh) 2022-06-10
EP3765886A1 (en) 2021-01-20
KR20200139257A (ko) 2020-12-11
KR102608083B1 (ko) 2023-11-29
JP2023033554A (ja) 2023-03-10
KR20230037694A (ko) 2023-03-16
CN112136070A (zh) 2020-12-25
EP3765886A4 (en) 2022-11-09
TW202001970A (zh) 2020-01-01
US10438769B1 (en) 2019-10-08
WO2019213000A1 (en) 2019-11-07
JP7271572B2 (ja) 2023-05-11
CN115047608A (zh) 2022-09-13
JP2025061364A (ja) 2025-04-10
JP7745790B2 (ja) 2025-09-29
JP2021522659A (ja) 2021-08-30
TWI780324B (zh) 2022-10-11

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