KR102518443B1 - 이차 이온 질량 분광계를 위한 세슘 일차 이온 소스 - Google Patents

이차 이온 질량 분광계를 위한 세슘 일차 이온 소스 Download PDF

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KR102518443B1
KR102518443B1 KR1020177013103A KR20177013103A KR102518443B1 KR 102518443 B1 KR102518443 B1 KR 102518443B1 KR 1020177013103 A KR1020177013103 A KR 1020177013103A KR 20177013103 A KR20177013103 A KR 20177013103A KR 102518443 B1 KR102518443 B1 KR 102518443B1
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ionizer
delete delete
reservoir
ion source
tube
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KR20170117364A (ko
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피터 윌리엄스
카렌 아만다 윌리엄스
메이트레이 보스
존 프린스
Original Assignee
아리조나 보드 오브 리전트스, 아리조나주의 아리조나 주립대 대행법인
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/22—Metal ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2255—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident ion beams, e.g. proton beams
    • G01N23/2258—Measuring secondary ion emission, e.g. secondary ion mass spectrometry [SIMS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H3/00—Mechanisms for operating contacts
    • H01H3/02—Operating parts, i.e. for operating driving mechanism by a mechanical force external to the switch
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0004—Imaging particle spectrometry
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
    • H03L7/00—Automatic control of frequency or phase; Synchronisation
    • H03L7/26—Automatic control of frequency or phase; Synchronisation using energy levels of molecules, atoms, or subatomic particles as a frequency reference

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1020177013103A 2014-10-13 2015-10-13 이차 이온 질량 분광계를 위한 세슘 일차 이온 소스 Active KR102518443B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201462063023P 2014-10-13 2014-10-13
US62/063,023 2014-10-13
PCT/US2015/055261 WO2016061057A1 (en) 2014-10-13 2015-10-13 Cesium primary ion source for secondary ion mass spectrometer

Publications (2)

Publication Number Publication Date
KR20170117364A KR20170117364A (ko) 2017-10-23
KR102518443B1 true KR102518443B1 (ko) 2023-04-06

Family

ID=55747202

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177013103A Active KR102518443B1 (ko) 2014-10-13 2015-10-13 이차 이온 질량 분광계를 위한 세슘 일차 이온 소스

Country Status (6)

Country Link
US (1) US9941089B2 (enExample)
EP (1) EP3207636B1 (enExample)
JP (1) JP6879908B2 (enExample)
KR (1) KR102518443B1 (enExample)
CN (1) CN107210749B (enExample)
WO (1) WO2016061057A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10672602B2 (en) * 2014-10-13 2020-06-02 Arizona Board Of Regents On Behalf Of Arizona State University Cesium primary ion source for secondary ion mass spectrometer
US20190019662A1 (en) * 2017-07-14 2019-01-17 Purdue Research Foundation Electrophoretic mass spectrometry probes and systems and uses thereof
CN110504154B (zh) * 2018-11-25 2020-09-22 中国科学院大连化学物理研究所 一种高气密性离子迁移管
CN109360781B (zh) * 2018-11-29 2019-11-26 清华大学深圳研究生院 二次电喷雾离子源装置及质谱检测设备
US11705321B2 (en) * 2019-06-12 2023-07-18 Topanga Asia Limited Electrodeless plasma lamps, transmission lines and radio frequency systems
CN110444463B (zh) * 2019-08-12 2020-11-10 电子科技大学 一种微电流铯离子源
US11170973B2 (en) 2019-10-09 2021-11-09 Applied Materials, Inc. Temperature control for insertable target holder for solid dopant materials
US11289299B2 (en) 2019-10-24 2022-03-29 Arizona Board Of Regents On Behalf Of Arizona State University Duoplasmatron ion source with a partially ferromagnetic anode
US10957509B1 (en) * 2019-11-07 2021-03-23 Applied Materials, Inc. Insertable target holder for improved stability and performance for solid dopant materials
CN110967962B (zh) * 2019-11-26 2021-04-06 北京无线电计量测试研究所 一种铯炉的电击穿系统和方法
US11031205B1 (en) * 2020-02-04 2021-06-08 Georg-August-Universität Göttingen Stiftung Öffentlichen Rechts, Universitätsmedizin Device for generating negative ions by impinging positive ions on a target
US11854760B2 (en) 2021-06-21 2023-12-26 Applied Materials, Inc. Crucible design for liquid metal in an ion source

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JPS5069571U (enExample) * 1973-10-25 1975-06-20
US3967115A (en) * 1974-10-09 1976-06-29 Frequency & Time Systems, Inc. Atomic beam tube
JPS5846091B2 (ja) * 1977-11-02 1983-10-14 富士通株式会社 粒子ビ−ム装置
JPS5794159U (enExample) * 1980-12-01 1982-06-10
JPS5838906B2 (ja) * 1981-09-03 1983-08-26 日本電子株式会社 金属イオン源
JPS58192249A (ja) * 1982-05-07 1983-11-09 Hitachi Ltd 高周波誘導加熱型液体金属イオン源
JPS5966031A (ja) * 1982-10-07 1984-04-14 Ulvac Corp 高輝度表面電離型イオン源およびその製造法
US4617203A (en) 1985-04-08 1986-10-14 Hughes Aircraft Company Preparation of liquid metal source structures for use in ion beam evaporation of boron-containing alloys
US4791273A (en) * 1987-05-15 1988-12-13 Varian Associates, Inc. Vaporizer system for ion source
DE3739253A1 (de) * 1987-11-19 1989-06-01 Max Planck Gesellschaft Mit kontaktionisation arbeitende einrichtung zum erzeugen eines strahles beschleunigter ionen
GB2213636B (en) * 1988-01-07 1993-01-27 Toshiba Kk Apparatus for introducing samples into an inductively coupled,plasma source mass spectrometer
IT1238337B (it) * 1990-01-23 1993-07-12 Cons Ric Microelettronica Dispositivo per la ionizzazione di metalli ad alta temperatura di fusione, utilizzabile su impiantatori ionici del tipo impiegante sorgenti di ioni di tipo freeman o assimilabili
FR2722333B1 (fr) * 1994-07-07 1996-09-13 Rech Scient Snrs Centre Nat De Source d'ions de metaux liquides
AU2002950505A0 (en) * 2002-07-31 2002-09-12 Varian Australia Pty Ltd Mass spectrometry apparatus and method
JP4177645B2 (ja) * 2002-11-14 2008-11-05 エスアイアイ・ナノテクノロジー株式会社 マイクロキャピラリー型Ｇａ液体金属イオン源
JP2004281213A (ja) * 2003-03-14 2004-10-07 Nec Kyushu Ltd イオン源用オーブン
JP4359131B2 (ja) * 2003-12-08 2009-11-04 株式会社日立ハイテクノロジーズ 液体金属イオン銃、及びイオンビーム装置
CN1828818A (zh) * 2004-10-15 2006-09-06 安捷伦科技有限公司 用于增强离子产生的装置和方法
US7235796B2 (en) * 2004-11-24 2007-06-26 Technion Research & Development Foundation Ltd. Method and apparatus for the generation of anionic and neutral particulate beams and a system using same
EP1979925A2 (en) * 2006-01-13 2008-10-15 Technion Research And Development Foundation, Ltd. Method and apparatus for generating ion beam
CN200997383Y (zh) * 2006-06-20 2007-12-26 周振 大气压离子源接口
JP5296341B2 (ja) * 2006-07-14 2013-09-25 ティーイーエル・エピオン・インコーポレーテッド ガスクラスターイオンビーム加工装置における粒子汚染を低減するための装置および方法
CN201465988U (zh) * 2009-06-04 2010-05-12 北京大学 质谱离子传输管外延长接口装置
CN203631482U (zh) * 2013-12-09 2014-06-04 中芯国际集成电路制造(北京)有限公司 离子源及离子注入机

Also Published As

Publication number Publication date
KR20170117364A (ko) 2017-10-23
CN107210749A (zh) 2017-09-26
US20170309433A1 (en) 2017-10-26
EP3207636A4 (en) 2018-10-31
EP3207636A1 (en) 2017-08-23
EP3207636B1 (en) 2019-12-04
US9941089B2 (en) 2018-04-10
JP2017532744A (ja) 2017-11-02
WO2016061057A1 (en) 2016-04-21
CN107210749B (zh) 2021-03-19
JP6879908B2 (ja) 2021-06-02

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