KR102424717B1 - 미러 어레이 - Google Patents

미러 어레이 Download PDF

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Publication number
KR102424717B1
KR102424717B1 KR1020167025881A KR20167025881A KR102424717B1 KR 102424717 B1 KR102424717 B1 KR 102424717B1 KR 1020167025881 A KR1020167025881 A KR 1020167025881A KR 20167025881 A KR20167025881 A KR 20167025881A KR 102424717 B1 KR102424717 B1 KR 102424717B1
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South Korea
Prior art keywords
mirror
individual mirrors
illumination
group
mirror array
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KR1020167025881A
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English (en)
Korean (ko)
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KR20160124205A (ko
Inventor
스티그 비엘링
마르쿠스 하우프
라르스 비쉬마이어
파비안 하아커
마틴 엔드레스
요하네스 아이센멩거
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
KR1020167025881A 2014-02-21 2015-02-17 미러 어레이 Active KR102424717B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
DE102014203189.3 2014-02-21
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (2)

Publication Number Publication Date
KR20160124205A KR20160124205A (ko) 2016-10-26
KR102424717B1 true KR102424717B1 (ko) 2022-07-25

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167025881A Active KR102424717B1 (ko) 2014-02-21 2015-02-17 미러 어레이

Country Status (5)

Country Link
US (1) US9874819B2 (enExample)
JP (1) JP6568865B2 (enExample)
KR (1) KR102424717B1 (enExample)
DE (1) DE102014203189A1 (enExample)
WO (1) WO2015124555A1 (enExample)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109040552B (zh) 2013-06-13 2021-06-22 核心光电有限公司 双孔径变焦数字摄影机
WO2015001440A1 (en) 2013-07-04 2015-01-08 Corephotonics Ltd. Miniature telephoto lens assembly
CN108989648B (zh) 2013-08-01 2021-01-15 核心光电有限公司 具有自动聚焦的纤薄多孔径成像系统及其使用方法
US9392188B2 (en) 2014-08-10 2016-07-12 Corephotonics Ltd. Zoom dual-aperture camera with folded lens
US10288840B2 (en) 2015-01-03 2019-05-14 Corephotonics Ltd Miniature telephoto lens module and a camera utilizing such a lens module
CN111175926B (zh) 2015-04-16 2021-08-20 核心光电有限公司 紧凑型折叠式相机中的自动对焦和光学图像稳定
EP3335415B1 (en) 2015-08-13 2019-11-20 Corephotonics Ltd. Dual aperture zoom camera with video support and switching / non-switching dynamic control
WO2017208090A1 (en) 2016-05-30 2017-12-07 Corephotonics Ltd. Rotational ball-guided voice coil motor
EP3381181B1 (en) 2016-06-19 2022-04-06 Corephotonics Ltd. Frame synchronization in a dual-aperture camera system
KR102390572B1 (ko) 2016-07-07 2022-04-25 코어포토닉스 리미티드 폴디드 옵틱용 선형 볼 가이드 음성 코일 모터
DE102016217735A1 (de) * 2016-09-16 2018-03-22 Carl Zeiss Smt Gmbh Komponente für eine Spiegelanordnung für die EUV-Lithographie
KR102269547B1 (ko) 2016-12-28 2021-06-25 코어포토닉스 리미티드 확장된 광-폴딩-요소 스캐닝 범위를 갖는 폴디드 카메라 구조
KR102164655B1 (ko) 2017-01-12 2020-10-13 코어포토닉스 리미티드 컴팩트 폴디드 카메라
US11111133B1 (en) * 2017-01-30 2021-09-07 Mirrorcle Technologies, Inc. MEMS actuators with improved performance and cooling
CN114137790A (zh) 2017-03-15 2022-03-04 核心光电有限公司 具有全景扫瞄范围的系统、移动电子装置及其方法
CN113075837B (zh) 2017-11-23 2022-04-12 核心光电有限公司 摄影机及制法、移动电子设备及减小凸起占用空间的方法
EP4472224A3 (en) 2018-02-05 2025-02-19 Corephotonics Ltd. Reduced height penalty for folded camera
EP4191315B1 (en) 2018-02-12 2024-09-25 Corephotonics Ltd. Folded camera with optical image stabilization
CN114153107B (zh) 2018-04-23 2024-07-02 核心光电有限公司 相机及致动器
KR20210003856A (ko) * 2018-07-04 2021-01-12 코어포토닉스 리미티드 자동차 또는 감시 애플리케이션을 위한 스캐닝 광학 경로 폴딩 요소들을 구비하는 카메라
WO2020039302A1 (en) 2018-08-22 2020-02-27 Corephotonics Ltd. Two-state zoom folded camera
US10859062B2 (en) * 2018-10-10 2020-12-08 Trilok Vyas Villanova ultra efficient vertical windmill system and method
DE102019206865B4 (de) 2019-05-13 2024-09-12 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system
KR102254947B1 (ko) 2019-07-31 2021-05-24 코어포토닉스 리미티드 카메라 패닝 또는 모션에서 배경 블러링을 생성하는 시스템 및 방법
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
KR102811003B1 (ko) 2020-02-22 2025-05-20 코어포토닉스 리미티드 매크로 촬영을 위한 분할 스크린 기능
EP4097773A4 (en) 2020-04-26 2023-11-01 Corephotonics Ltd. TEMPERATURE CONTROL FOR HALL BAR SENSOR CORRECTION
KR102495627B1 (ko) 2020-05-17 2023-02-06 코어포토닉스 리미티드 전체 시야 레퍼런스 이미지 존재 하의 이미지 스티칭
CN114080565B (zh) 2020-05-30 2024-01-19 核心光电有限公司 用于获得超微距图像的系统和方法
EP4202521B1 (en) 2020-07-15 2025-03-19 Corephotonics Ltd. Point of view aberrations correction in a scanning folded camera
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
WO2022023914A1 (en) 2020-07-31 2022-02-03 Corephotonics Ltd. Hall sensor - magnet geometry for large stroke linear position sensing
KR102547198B1 (ko) 2020-08-12 2023-06-22 코어포토닉스 리미티드 스캐닝 폴디드 카메라의 광학 이미지 안정화
KR20250165686A (ko) 2021-03-11 2025-11-26 코어포토닉스 리미티드 팝-아웃 카메라 시스템
WO2022259154A2 (en) 2021-06-08 2022-12-15 Corephotonics Ltd. Systems and cameras for tilting a focal plane of a super-macro image
KR102770497B1 (ko) 2022-03-24 2025-02-18 코어포토닉스 리미티드 슬림 컴팩트 렌즈 광학 이미지 안정화
KR20250048255A (ko) * 2022-08-16 2025-04-08 칼 짜이스 에스엠테 게엠베하 마이크로 광학 요소
DE102022209411A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen
DE102022209427A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen
DE102022212168A1 (de) 2022-11-16 2024-05-16 Carl Zeiss Smt Gmbh EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage
DE102022212167A1 (de) 2022-11-16 2023-09-14 Carl Zeiss Smt Gmbh EUV-Quellen-Modul für eine EUV-Projektionsbelichtungsanlage
DE102023126597A1 (de) * 2023-09-29 2025-04-03 Carl Zeiss Smt Gmbh Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007052256A (ja) 2005-08-18 2007-03-01 Fujifilm Corp 回転変位型光変調素子及びこれを用いた光学装置
JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
JP2010518595A (ja) 2007-02-06 2010-05-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
JP2013541729A (ja) * 2010-09-15 2013-11-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US7145269B2 (en) 2004-03-10 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, Lorentz actuator, and device manufacturing method
DE102006023652B4 (de) 2006-05-18 2008-10-30 Esa Patentverwertungsagentur Sachsen-Anhalt Gmbh Elektromotorische Einrichtung zur Betätigung von Gaswechselventilen
US20080100816A1 (en) * 2006-10-31 2008-05-01 Asml Netherlands B.V. Lithographic apparatus and method
JP5329520B2 (ja) * 2007-03-27 2013-10-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 低角度で入射する補正光を用いる補正光学素子
EP2243047B1 (en) * 2008-02-15 2021-03-31 Carl Zeiss SMT GmbH Facet mirror for use in a projection exposure apparatus for microlithography
CN102257421B (zh) 2008-10-20 2014-07-02 卡尔蔡司Smt有限责任公司 用于引导辐射束的光学模块
JP5134732B2 (ja) * 2008-10-31 2013-01-30 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系
DE102009045694B4 (de) * 2009-10-14 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102011006100A1 (de) 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102012213515A1 (de) * 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage
DE102014203188A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007052256A (ja) 2005-08-18 2007-03-01 Fujifilm Corp 回転変位型光変調素子及びこれを用いた光学装置
JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
JP2010518595A (ja) 2007-02-06 2010-05-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
JP2013541729A (ja) * 2010-09-15 2013-11-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系

Also Published As

Publication number Publication date
JP2017509918A (ja) 2017-04-06
KR20160124205A (ko) 2016-10-26
US20160342095A1 (en) 2016-11-24
WO2015124555A1 (de) 2015-08-27
DE102014203189A1 (de) 2015-08-27
JP6568865B2 (ja) 2019-08-28
US9874819B2 (en) 2018-01-23

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