KR102424717B1 - 미러 어레이 - Google Patents

미러 어레이 Download PDF

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Publication number
KR102424717B1
KR102424717B1 KR1020167025881A KR20167025881A KR102424717B1 KR 102424717 B1 KR102424717 B1 KR 102424717B1 KR 1020167025881 A KR1020167025881 A KR 1020167025881A KR 20167025881 A KR20167025881 A KR 20167025881A KR 102424717 B1 KR102424717 B1 KR 102424717B1
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KR
South Korea
Prior art keywords
mirror
individual mirrors
illumination
group
mirror array
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KR1020167025881A
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English (en)
Korean (ko)
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KR20160124205A (ko
Inventor
스티그 비엘링
마르쿠스 하우프
라르스 비쉬마이어
파비안 하아커
마틴 엔드레스
요하네스 아이센멩거
Original Assignee
칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
KR1020167025881A 2014-02-21 2015-02-17 미러 어레이 Active KR102424717B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3 2014-02-21
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (2)

Publication Number Publication Date
KR20160124205A KR20160124205A (ko) 2016-10-26
KR102424717B1 true KR102424717B1 (ko) 2022-07-25

Family

ID=52595296

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167025881A Active KR102424717B1 (ko) 2014-02-21 2015-02-17 미러 어레이

Country Status (5)

Country Link
US (1) US9874819B2 (enExample)
JP (1) JP6568865B2 (enExample)
KR (1) KR102424717B1 (enExample)
DE (1) DE102014203189A1 (enExample)
WO (1) WO2015124555A1 (enExample)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109194849B (zh) 2013-06-13 2021-01-15 核心光电有限公司 双孔径变焦数字摄影机
EP3779565B1 (en) 2013-07-04 2024-05-22 Corephotonics Ltd. Miniature telephoto lens assembly
EP3028443A2 (en) 2013-08-01 2016-06-08 Corephotonics Ltd. Thin multi-aperture imaging system with auto-focus and methods for using same
US9392188B2 (en) 2014-08-10 2016-07-12 Corephotonics Ltd. Zoom dual-aperture camera with folded lens
US10288840B2 (en) 2015-01-03 2019-05-14 Corephotonics Ltd Miniature telephoto lens module and a camera utilizing such a lens module
KR101866482B1 (ko) 2015-04-16 2018-06-11 코어포토닉스 리미티드 소형 접이식 카메라의 오토 포커스 및 광학 이미지 안정화
US10230898B2 (en) 2015-08-13 2019-03-12 Corephotonics Ltd. Dual aperture zoom camera with video support and switching / non-switching dynamic control
WO2017115179A1 (en) 2015-12-29 2017-07-06 Corephotonics Ltd. Dual-aperture zoom digital camera with automatic adjustable tele field of view
WO2017208090A1 (en) 2016-05-30 2017-12-07 Corephotonics Ltd. Rotational ball-guided voice coil motor
US10616484B2 (en) 2016-06-19 2020-04-07 Corephotonics Ltd. Frame syncrhonization in a dual-aperture camera system
EP4485046B1 (en) 2016-07-07 2026-06-10 Corephotonics Ltd. Linear ball guided voice coil motor for folded optic
DE102016217735A1 (de) * 2016-09-16 2018-03-22 Carl Zeiss Smt Gmbh Komponente für eine Spiegelanordnung für die EUV-Lithographie
KR102269547B1 (ko) 2016-12-28 2021-06-25 코어포토닉스 리미티드 확장된 광-폴딩-요소 스캐닝 범위를 갖는 폴디드 카메라 구조
KR102901328B1 (ko) 2017-01-12 2025-12-16 코어포토닉스 리미티드 컴팩트 폴디드 카메라
US11111133B1 (en) 2017-01-30 2021-09-07 Mirrorcle Technologies, Inc. MEMS actuators with improved performance and cooling
CN110582724B (zh) 2017-03-15 2022-01-04 核心光电有限公司 具有全景扫描范围的照相装置
CN113075837B (zh) 2017-11-23 2022-04-12 核心光电有限公司 摄影机及制法、移动电子设备及减小凸起占用空间的方法
KR102242452B1 (ko) 2018-02-05 2021-04-20 코어포토닉스 리미티드 폴디드 카메라에 대한 감소된 높이 페널티
EP3707893B1 (en) 2018-02-12 2023-03-08 Corephotonics Ltd. Folded camera with optical image stabilization
EP4303653A1 (en) 2018-04-23 2024-01-10 Corephotonics Ltd. An optical-path folding-element with an extended two degree of freedom rotation range
CN112272829B (zh) * 2018-07-04 2025-04-08 核心光电有限公司 用于汽车或监控应用具有扫描光路折叠元件的相机
WO2020039302A1 (en) 2018-08-22 2020-02-27 Corephotonics Ltd. Two-state zoom folded camera
AU2019359452A1 (en) * 2018-10-10 2021-04-22 Trilok VYAS Villanova ultra efficient vertical windmill system and method
CN111919057B (zh) 2019-01-07 2021-08-31 核心光电有限公司 具有滑动接头的旋转机构
DE102019206865B4 (de) 2019-05-13 2024-09-12 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system
KR102914109B1 (ko) 2019-07-31 2026-01-15 코어포토닉스 리미티드 카메라 패닝 또는 모션에서 배경 블러링을 생성하는 시스템 및 방법
KR102810415B1 (ko) 2019-12-03 2025-05-19 코어포토닉스 리미티드 연장된 2-자유도 회전 범위를 제공하기 위한 액추에이터
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
KR20250078581A (ko) 2020-02-22 2025-06-02 코어포토닉스 리미티드 매크로 촬영을 위한 분할 스크린 기능
KR102793241B1 (ko) 2020-04-26 2025-04-08 코어포토닉스 리미티드 홀 바 센서 보정을 위한 온도 제어
US11832018B2 (en) 2020-05-17 2023-11-28 Corephotonics Ltd. Image stitching in the presence of a full field of view reference image
CN117518313A (zh) 2020-05-30 2024-02-06 核心光电有限公司 用于获得超微距图像的系统
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
CN119583941A (zh) 2020-07-15 2025-03-07 核心光电有限公司 用于校正扫描折叠相机和包含这样的扫描折叠相机的多相机中的视点像差的系统
CN118424341A (zh) 2020-07-31 2024-08-02 核心光电有限公司 位置感测单元
KR20250016472A (ko) 2020-08-12 2025-02-03 코어포토닉스 리미티드 스캐닝 폴디드 카메라의 광학 이미지 안정화
KR102589548B1 (ko) 2021-03-11 2023-10-13 코어포토닉스 리미티드 팝-아웃 카메라 시스템
US12007671B2 (en) 2021-06-08 2024-06-11 Corephotonics Ltd. Systems and cameras for tilting a focal plane of a super-macro image
US12520025B2 (en) 2021-07-21 2026-01-06 Corephotonics Ltd. Pop-out mobile cameras and actuators
KR102770497B1 (ko) 2022-03-24 2025-02-18 코어포토닉스 리미티드 슬림 컴팩트 렌즈 광학 이미지 안정화
DE102022203369A1 (de) * 2022-04-05 2023-10-05 Carl Zeiss Smt Gmbh Anordnung, Verfahren und Computerprogrammprodukt zur Kalibrierung von Facettenspiegeln
WO2024037916A1 (en) * 2022-08-16 2024-02-22 Carl Zeiss Smt Gmbh Micro-optical element
DE102022209411A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen
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DE102022212167A1 (de) 2022-11-16 2023-09-14 Carl Zeiss Smt Gmbh EUV-Quellen-Modul für eine EUV-Projektionsbelichtungsanlage
DE102022212168A1 (de) 2022-11-16 2024-05-16 Carl Zeiss Smt Gmbh EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage
KR20240161846A (ko) 2023-02-15 2024-11-12 코어포토닉스 리미티드 폴디드 카메라를 위한 라지 앵글 컴팩트 광학 이미지 안정화
DE102023126597A1 (de) * 2023-09-29 2025-04-03 Carl Zeiss Smt Gmbh Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale
CN122018143B (zh) * 2026-04-10 2026-06-23 中国科学院西安光学精密机械研究所 一种音圈电机驱动的反作用扰动自补偿快速反射镜

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007052256A (ja) 2005-08-18 2007-03-01 Fujifilm Corp 回転変位型光変調素子及びこれを用いた光学装置
JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
JP2010518595A (ja) 2007-02-06 2010-05-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
JP2013541729A (ja) * 2010-09-15 2013-11-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US7145269B2 (en) 2004-03-10 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, Lorentz actuator, and device manufacturing method
DE102006023652B4 (de) 2006-05-18 2008-10-30 Esa Patentverwertungsagentur Sachsen-Anhalt Gmbh Elektromotorische Einrichtung zur Betätigung von Gaswechselventilen
US20080100816A1 (en) * 2006-10-31 2008-05-01 Asml Netherlands B.V. Lithographic apparatus and method
KR101492287B1 (ko) * 2007-03-27 2015-02-11 칼 짜이스 에스엠테 게엠베하 편평하게 조사된 보정광을 이용한 광학 소자의 보정
CN101946190B (zh) * 2008-02-15 2013-06-19 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
KR101769157B1 (ko) 2008-10-20 2017-08-17 칼 짜이스 에스엠테 게엠베하 방사선 빔 안내를 위한 광학 모듈
KR101258344B1 (ko) * 2008-10-31 2013-04-30 칼 짜이스 에스엠티 게엠베하 Ｅｕｖ 마이크로리소그래피용 조명 광학 기기
DE102009045694B4 (de) * 2009-10-14 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102011006100A1 (de) 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102012213515A1 (de) * 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage
DE102014203188A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007052256A (ja) 2005-08-18 2007-03-01 Fujifilm Corp 回転変位型光変調素子及びこれを用いた光学装置
JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
JP2010518595A (ja) 2007-02-06 2010-05-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
JP2013541729A (ja) * 2010-09-15 2013-11-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系

Also Published As

Publication number Publication date
WO2015124555A1 (de) 2015-08-27
US9874819B2 (en) 2018-01-23
JP6568865B2 (ja) 2019-08-28
KR20160124205A (ko) 2016-10-26
US20160342095A1 (en) 2016-11-24
JP2017509918A (ja) 2017-04-06
DE102014203189A1 (de) 2015-08-27

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