JP6568865B2 - ミラーアレイ - Google Patents

ミラーアレイ Download PDF

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Publication number
JP6568865B2
JP6568865B2 JP2016553587A JP2016553587A JP6568865B2 JP 6568865 B2 JP6568865 B2 JP 6568865B2 JP 2016553587 A JP2016553587 A JP 2016553587A JP 2016553587 A JP2016553587 A JP 2016553587A JP 6568865 B2 JP6568865 B2 JP 6568865B2
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JP
Japan
Prior art keywords
mirror
facet
individual mirrors
illumination
mirror array
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2016553587A
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English (en)
Japanese (ja)
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JP2017509918A (ja
JP2017509918A5 (enExample
Inventor
シュティグ ビーリン
シュティグ ビーリン
マルクス ハウフ
マルクス ハウフ
ラース ヴィッシュマイヤー
ラース ヴィッシュマイヤー
ファビアン ハッカー
ファビアン ハッカー
マルティン エンドレス
マルティン エンドレス
ヨハネス アイゼンメンガー
ヨハネス アイゼンメンガー
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2017509918A publication Critical patent/JP2017509918A/ja
Publication of JP2017509918A5 publication Critical patent/JP2017509918A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
JP2016553587A 2014-02-21 2015-02-17 ミラーアレイ Active JP6568865B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
DE102014203189.3 2014-02-21
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (3)

Publication Number Publication Date
JP2017509918A JP2017509918A (ja) 2017-04-06
JP2017509918A5 JP2017509918A5 (enExample) 2018-03-29
JP6568865B2 true JP6568865B2 (ja) 2019-08-28

Family

ID=52595296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016553587A Active JP6568865B2 (ja) 2014-02-21 2015-02-17 ミラーアレイ

Country Status (5)

Country Link
US (1) US9874819B2 (enExample)
JP (1) JP6568865B2 (enExample)
KR (1) KR102424717B1 (enExample)
DE (1) DE102014203189A1 (enExample)
WO (1) WO2015124555A1 (enExample)

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CN121284176A (zh) 2019-07-31 2026-01-06 核心光电有限公司 在相机摇摄或运动中创建背景模糊的系统
EP4509897A3 (en) 2019-12-03 2025-05-14 Corephotonics Ltd. Actuators for providing an extended two-degree of freedom rotation range
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
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CN114144898B (zh) 2020-04-26 2022-11-04 核心光电有限公司 用于霍尔棒传感器校正的温度控制
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CN117572549A (zh) 2020-05-30 2024-02-20 核心光电有限公司 用于获得超微距图像的系统和方法
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
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CN114270145B (zh) 2020-07-31 2024-05-17 核心光电有限公司 用于大行程线性位置感测的霍尔传感器-磁体几何结构
CN116626960A (zh) 2020-08-12 2023-08-22 核心光电有限公司 用于光学防抖的方法
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Also Published As

Publication number Publication date
US20160342095A1 (en) 2016-11-24
US9874819B2 (en) 2018-01-23
JP2017509918A (ja) 2017-04-06
WO2015124555A1 (de) 2015-08-27
KR102424717B1 (ko) 2022-07-25
KR20160124205A (ko) 2016-10-26
DE102014203189A1 (de) 2015-08-27

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