JP6568865B2 - ミラーアレイ - Google Patents

ミラーアレイ Download PDF

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Publication number
JP6568865B2
JP6568865B2 JP2016553587A JP2016553587A JP6568865B2 JP 6568865 B2 JP6568865 B2 JP 6568865B2 JP 2016553587 A JP2016553587 A JP 2016553587A JP 2016553587 A JP2016553587 A JP 2016553587A JP 6568865 B2 JP6568865 B2 JP 6568865B2
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JP
Japan
Prior art keywords
mirror
facet
individual mirrors
illumination
mirror array
Prior art date
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JP2016553587A
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English (en)
Japanese (ja)
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JP2017509918A5 (enExample
JP2017509918A (ja
Inventor
シュティグ ビーリン
シュティグ ビーリン
マルクス ハウフ
マルクス ハウフ
ラース ヴィッシュマイヤー
ラース ヴィッシュマイヤー
ファビアン ハッカー
ファビアン ハッカー
マルティン エンドレス
マルティン エンドレス
ヨハネス アイゼンメンガー
ヨハネス アイゼンメンガー
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2017509918A publication Critical patent/JP2017509918A/ja
Publication of JP2017509918A5 publication Critical patent/JP2017509918A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
JP2016553587A 2014-02-21 2015-02-17 ミラーアレイ Active JP6568865B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3 2014-02-21
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (3)

Publication Number Publication Date
JP2017509918A JP2017509918A (ja) 2017-04-06
JP2017509918A5 JP2017509918A5 (enExample) 2018-03-29
JP6568865B2 true JP6568865B2 (ja) 2019-08-28

Family

ID=52595296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016553587A Active JP6568865B2 (ja) 2014-02-21 2015-02-17 ミラーアレイ

Country Status (5)

Country Link
US (1) US9874819B2 (enExample)
JP (1) JP6568865B2 (enExample)
KR (1) KR102424717B1 (enExample)
DE (1) DE102014203189A1 (enExample)
WO (1) WO2015124555A1 (enExample)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109040553B (zh) 2013-06-13 2021-04-13 核心光电有限公司 双孔径变焦数字摄影机
JP2016523389A (ja) 2013-07-04 2016-08-08 コアフォトニクス リミテッド 小型望遠レンズアセンブリ
CN109120823B (zh) 2013-08-01 2020-07-14 核心光电有限公司 具有自动聚焦的纤薄多孔径成像系统及其使用方法
US9392188B2 (en) 2014-08-10 2016-07-12 Corephotonics Ltd. Zoom dual-aperture camera with folded lens
CN112327464A (zh) 2015-01-03 2021-02-05 核心光电有限公司 微型长焦镜头模块和使用该镜头模块的相机
KR102227200B1 (ko) 2015-04-16 2021-03-12 코어포토닉스 리미티드 소형 접이식 카메라의 오토 포커스 및 광학 이미지 안정화
CN107852467B (zh) 2015-08-13 2021-01-26 核心光电有限公司 具有视频支持和切换/无切换动态控制的双孔径变焦摄影机
WO2017208090A1 (en) 2016-05-30 2017-12-07 Corephotonics Ltd. Rotational ball-guided voice coil motor
KR102646151B1 (ko) 2016-06-19 2024-03-08 코어포토닉스 리미티드 듀얼 애퍼처 카메라 시스템에서의 프레임 동기화
KR102390572B1 (ko) 2016-07-07 2022-04-25 코어포토닉스 리미티드 폴디드 옵틱용 선형 볼 가이드 음성 코일 모터
DE102016217735A1 (de) * 2016-09-16 2018-03-22 Carl Zeiss Smt Gmbh Komponente für eine Spiegelanordnung für die EUV-Lithographie
EP3842853B1 (en) 2016-12-28 2024-03-06 Corephotonics Ltd. Folded camera structure with an extended light-folding-element scanning range
EP3789810B1 (en) 2017-01-12 2022-09-28 Corephotonics Ltd. Compact folded camera
US11111133B1 (en) 2017-01-30 2021-09-07 Mirrorcle Technologies, Inc. MEMS actuators with improved performance and cooling
KR20250028499A (ko) 2017-03-15 2025-02-28 코어포토닉스 리미티드 파노라마 스캐닝 범위를 갖는 카메라
KR102104761B1 (ko) 2017-11-23 2020-04-27 코어포토닉스 리미티드 컴팩트 폴디드 카메라 구조
WO2019150188A1 (en) 2018-02-05 2019-08-08 Corephotonics Ltd. Reduced height penalty for folded camera
CN113467031B (zh) 2018-02-12 2023-07-14 核心光电有限公司 具有光学图像稳定化的折叠摄像机、数字摄像机及方法
EP3822588B1 (en) 2018-04-23 2022-09-07 Corephotonics Ltd. An optical-path folding-element with an extended two degree of freedom rotation range
WO2020008419A2 (en) * 2018-07-04 2020-01-09 Corephotonics Ltd. Cameras with scanning optical path folding elements for automotive or surveillance applications
WO2020039302A1 (en) 2018-08-22 2020-02-27 Corephotonics Ltd. Two-state zoom folded camera
BR112021006629A2 (pt) * 2018-10-10 2021-07-06 Vyas Trilok sistema e método de moinho de vento vertical villanova ultraeficiente
DE102019206865B4 (de) * 2019-05-13 2024-09-12 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system
US11368631B1 (en) 2019-07-31 2022-06-21 Corephotonics Ltd. System and method for creating background blur in camera panning or motion
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
CN114641805A (zh) 2020-02-22 2022-06-17 核心光电有限公司 用于微距摄影的分屏特征
KR20250052463A (ko) 2020-04-26 2025-04-18 코어포토닉스 리미티드 홀 바 센서 보정을 위한 온도 제어
KR102674601B1 (ko) 2020-05-17 2024-06-11 코어포토닉스 리미티드 전체 시야 레퍼런스 이미지 존재 하의 이미지 스티칭
EP3966631B1 (en) 2020-05-30 2023-01-25 Corephotonics Ltd. Systems and methods for obtaining a super macro image
EP4202521B1 (en) 2020-07-15 2025-03-19 Corephotonics Ltd. Point of view aberrations correction in a scanning folded camera
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
KR102675907B1 (ko) 2020-07-31 2024-06-14 코어포토닉스 리미티드 큰 스트로크 선형 위치 감지를 위한 홀 센서-자석 구조
KR20250016472A (ko) 2020-08-12 2025-02-03 코어포토닉스 리미티드 스캐닝 폴디드 카메라의 광학 이미지 안정화
US12081856B2 (en) 2021-03-11 2024-09-03 Corephotonics Lid. Systems for pop-out camera
EP4204885A4 (en) 2021-06-08 2024-03-06 Corephotonics Ltd. SYSTEMS AND CAMERAS FOR FILTING A FOCAL PLANE OF A SUPERMACRO IMAGE
CN121115373A (zh) 2022-03-24 2025-12-12 核心光电有限公司 薄型紧凑透镜光学图像稳定
EP4573403A1 (en) * 2022-08-16 2025-06-25 Carl Zeiss SMT GmbH Micro-optical element
DE102022209411A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen
DE102022209427A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen
DE102022212167A1 (de) 2022-11-16 2023-09-14 Carl Zeiss Smt Gmbh EUV-Quellen-Modul für eine EUV-Projektionsbelichtungsanlage
DE102022212168A1 (de) 2022-11-16 2024-05-16 Carl Zeiss Smt Gmbh EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage
DE102023126597A1 (de) * 2023-09-29 2025-04-03 Carl Zeiss Smt Gmbh Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US7145269B2 (en) 2004-03-10 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, Lorentz actuator, and device manufacturing method
JP2007052256A (ja) * 2005-08-18 2007-03-01 Fujifilm Corp 回転変位型光変調素子及びこれを用いた光学装置
DE102006023652B4 (de) 2006-05-18 2008-10-30 Esa Patentverwertungsagentur Sachsen-Anhalt Gmbh Elektromotorische Einrichtung zur Betätigung von Gaswechselventilen
US7804603B2 (en) * 2006-10-03 2010-09-28 Asml Netherlands B.V. Measurement apparatus and method
US20080100816A1 (en) * 2006-10-31 2008-05-01 Asml Netherlands B.V. Lithographic apparatus and method
CN103345128B (zh) * 2007-02-06 2017-04-12 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备的照明系统
DE102008016011A1 (de) * 2007-03-27 2008-10-02 Carl Zeiss Smt Ag Korrektur optischer Elemente mittels flach eingestrahltem Korrekturlicht
CN101946190B (zh) * 2008-02-15 2013-06-19 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
WO2010049076A2 (de) 2008-10-20 2010-05-06 Carl Zeiss Smt Ag Optische baugruppe zur führung eines strahlungsbündels
CN102203675B (zh) * 2008-10-31 2014-02-26 卡尔蔡司Smt有限责任公司 用于euv微光刻的照明光学部件
DE102009045694B4 (de) 2009-10-14 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102010040811A1 (de) * 2010-09-15 2012-03-15 Carl Zeiss Smt Gmbh Abbildende Optik
DE102011006100A1 (de) 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102012213515A1 (de) * 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage
DE102014203188A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
KR102424717B1 (ko) 2022-07-25
US9874819B2 (en) 2018-01-23
KR20160124205A (ko) 2016-10-26
US20160342095A1 (en) 2016-11-24
DE102014203189A1 (de) 2015-08-27
JP2017509918A (ja) 2017-04-06
WO2015124555A1 (de) 2015-08-27

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