KR102424717B1 - 미러 어레이 - Google Patents

미러 어레이 Download PDF

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Publication number
KR102424717B1
KR102424717B1 KR1020167025881A KR20167025881A KR102424717B1 KR 102424717 B1 KR102424717 B1 KR 102424717B1 KR 1020167025881 A KR1020167025881 A KR 1020167025881A KR 20167025881 A KR20167025881 A KR 20167025881A KR 102424717 B1 KR102424717 B1 KR 102424717B1
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South Korea
Prior art keywords
mirror
individual mirrors
illumination
group
mirror array
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KR1020167025881A
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Korean (ko)
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KR20160124205A (ko
Inventor
스티그 비엘링
마르쿠스 하우프
라르스 비쉬마이어
파비안 하아커
마틴 엔드레스
요하네스 아이센멩거
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
KR1020167025881A 2014-02-21 2015-02-17 미러 어레이 Active KR102424717B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
DE102014203189.3 2014-02-21
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (2)

Publication Number Publication Date
KR20160124205A KR20160124205A (ko) 2016-10-26
KR102424717B1 true KR102424717B1 (ko) 2022-07-25

Family

ID=52595296

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167025881A Active KR102424717B1 (ko) 2014-02-21 2015-02-17 미러 어레이

Country Status (5)

Country Link
US (1) US9874819B2 (cg-RX-API-DMAC7.html)
JP (1) JP6568865B2 (cg-RX-API-DMAC7.html)
KR (1) KR102424717B1 (cg-RX-API-DMAC7.html)
DE (1) DE102014203189A1 (cg-RX-API-DMAC7.html)
WO (1) WO2015124555A1 (cg-RX-API-DMAC7.html)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101634516B1 (ko) 2013-06-13 2016-06-28 코어포토닉스 리미티드 이중 조리개 줌 디지털 카메라
CN107748432A (zh) 2013-07-04 2018-03-02 核心光电有限公司 小型长焦透镜套件
CN108718376B (zh) 2013-08-01 2020-08-14 核心光电有限公司 具有自动聚焦的纤薄多孔径成像系统及其使用方法
US9392188B2 (en) 2014-08-10 2016-07-12 Corephotonics Ltd. Zoom dual-aperture camera with folded lens
WO2016108093A1 (en) 2015-01-03 2016-07-07 Corephotonics Ltd. Miniature telephoto lens module and a camera utilizing such a lens module
ES2732495T3 (es) 2015-04-16 2019-11-22 Corephotonics Ltd Enfoque automático y estabilización de imagen óptica en una cámara compacta de plegado
WO2017025822A1 (en) 2015-08-13 2017-02-16 Corephotonics Ltd. Dual aperture zoom camera with video support and switching / non-switching dynamic control
WO2017208090A1 (en) 2016-05-30 2017-12-07 Corephotonics Ltd. Rotational ball-guided voice coil motor
EP3381181B1 (en) 2016-06-19 2022-04-06 Corephotonics Ltd. Frame synchronization in a dual-aperture camera system
CN107924064B (zh) 2016-07-07 2020-06-12 核心光电有限公司 用于折叠式光学装置的线性滚珠引导音圈电动机
DE102016217735A1 (de) * 2016-09-16 2018-03-22 Carl Zeiss Smt Gmbh Komponente für eine Spiegelanordnung für die EUV-Lithographie
WO2018122650A1 (en) 2016-12-28 2018-07-05 Corephotonics Ltd. Folded camera structure with an extended light-folding-element scanning range
EP3789810B1 (en) 2017-01-12 2022-09-28 Corephotonics Ltd. Compact folded camera
US11111133B1 (en) 2017-01-30 2021-09-07 Mirrorcle Technologies, Inc. MEMS actuators with improved performance and cooling
KR20250028499A (ko) 2017-03-15 2025-02-28 코어포토닉스 리미티드 파노라마 스캐닝 범위를 갖는 카메라
EP3513110B1 (en) 2017-11-23 2023-08-23 Corephotonics Ltd. Compact folded camera structure
CN110352371B (zh) 2018-02-05 2022-05-13 核心光电有限公司 减少高度容余的折叠摄像装置
KR102708672B1 (ko) 2018-02-12 2024-09-20 코어포토닉스 리미티드 광학 이미지 안정화 기능을 갖는 폴디드 카메라
KR102781658B1 (ko) 2018-04-23 2025-03-13 코어포토닉스 리미티드 연장된 2 자유도 회전 범위를 갖는 광학 경로 폴딩 요소
CN112272829B (zh) * 2018-07-04 2025-04-08 核心光电有限公司 用于汽车或监控应用具有扫描光路折叠元件的相机
US11635596B2 (en) 2018-08-22 2023-04-25 Corephotonics Ltd. Two-state zoom folded camera
AU2019359452A1 (en) * 2018-10-10 2021-04-22 Trilok VYAS Villanova ultra efficient vertical windmill system and method
DE102019206865B4 (de) 2019-05-13 2024-09-12 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system
CN112585644A (zh) 2019-07-31 2021-03-30 核心光电有限公司 在相机摇摄或运动中创建背景模糊的系统及方法
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
WO2021165764A1 (en) 2020-02-22 2021-08-26 Corephotonics Ltd. Split screen feature for macro photography
EP4097773A4 (en) 2020-04-26 2023-11-01 Corephotonics Ltd. TEMPERATURE CONTROL FOR HALL BAR SENSOR CORRECTION
US11832018B2 (en) 2020-05-17 2023-11-28 Corephotonics Ltd. Image stitching in the presence of a full field of view reference image
KR102617779B1 (ko) 2020-05-30 2023-12-22 코어포토닉스 리미티드 슈퍼 매크로 이미지를 얻기 위한 시스템 및 방법
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
CN119583941A (zh) 2020-07-15 2025-03-07 核心光电有限公司 用于校正扫描折叠相机和包含这样的扫描折叠相机的多相机中的视点像差的系统
EP4065934A4 (en) 2020-07-31 2023-07-26 Corephotonics Ltd. LARGE STROKE LINEAR POSITION DETECTION HALL EFFECT SENSOR MAGNET GEOMETRY
CN116679419A (zh) 2020-08-12 2023-09-01 核心光电有限公司 用于光学防抖的装置和方法
TWI836372B (zh) 2021-03-11 2024-03-21 以色列商核心光電有限公司 彈出式照相機系統
WO2022259154A2 (en) 2021-06-08 2022-12-15 Corephotonics Ltd. Systems and cameras for tilting a focal plane of a super-macro image
US12328505B2 (en) 2022-03-24 2025-06-10 Corephotonics Ltd. Slim compact lens optical image stabilization
KR20250048255A (ko) * 2022-08-16 2025-04-08 칼 짜이스 에스엠테 게엠베하 마이크로 광학 요소
DE102022209427A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen
DE102022209411A1 (de) 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit einer Anzahl von Einzelspiegelelementen
DE102022212168A1 (de) 2022-11-16 2024-05-16 Carl Zeiss Smt Gmbh EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage
DE102022212167A1 (de) 2022-11-16 2023-09-14 Carl Zeiss Smt Gmbh EUV-Quellen-Modul für eine EUV-Projektionsbelichtungsanlage
DE102023126597A1 (de) * 2023-09-29 2025-04-03 Carl Zeiss Smt Gmbh Verfahren zur Verarbeitung analoger elektrischer Ausgangssignale

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007052256A (ja) 2005-08-18 2007-03-01 Fujifilm Corp 回転変位型光変調素子及びこれを用いた光学装置
JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
JP2010518595A (ja) 2007-02-06 2010-05-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
JP2013541729A (ja) * 2010-09-15 2013-11-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US7145269B2 (en) 2004-03-10 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, Lorentz actuator, and device manufacturing method
DE102006023652B4 (de) 2006-05-18 2008-10-30 Esa Patentverwertungsagentur Sachsen-Anhalt Gmbh Elektromotorische Einrichtung zur Betätigung von Gaswechselventilen
US20080100816A1 (en) * 2006-10-31 2008-05-01 Asml Netherlands B.V. Lithographic apparatus and method
WO2008116886A1 (de) * 2007-03-27 2008-10-02 Carl Zeiss Smt Ag Korrektur optischer elemente mittels flach eingestrahltem korrekturlicht
JP5487118B2 (ja) * 2008-02-15 2014-05-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
CN102257421B (zh) 2008-10-20 2014-07-02 卡尔蔡司Smt有限责任公司 用于引导辐射束的光学模块
CN102203675B (zh) * 2008-10-31 2014-02-26 卡尔蔡司Smt有限责任公司 用于euv微光刻的照明光学部件
DE102009045694B4 (de) 2009-10-14 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102011006100A1 (de) 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102012213515A1 (de) * 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage
DE102014203188A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007052256A (ja) 2005-08-18 2007-03-01 Fujifilm Corp 回転変位型光変調素子及びこれを用いた光学装置
JP2008091907A (ja) 2006-10-03 2008-04-17 Asml Netherlands Bv 測定装置および方法
JP2010518595A (ja) 2007-02-06 2010-05-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
JP2013541729A (ja) * 2010-09-15 2013-11-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系

Also Published As

Publication number Publication date
US20160342095A1 (en) 2016-11-24
KR20160124205A (ko) 2016-10-26
US9874819B2 (en) 2018-01-23
JP6568865B2 (ja) 2019-08-28
DE102014203189A1 (de) 2015-08-27
WO2015124555A1 (de) 2015-08-27
JP2017509918A (ja) 2017-04-06

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