JP6568865B2 - ミラーアレイ - Google Patents

ミラーアレイ Download PDF

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Publication number
JP6568865B2
JP6568865B2 JP2016553587A JP2016553587A JP6568865B2 JP 6568865 B2 JP6568865 B2 JP 6568865B2 JP 2016553587 A JP2016553587 A JP 2016553587A JP 2016553587 A JP2016553587 A JP 2016553587A JP 6568865 B2 JP6568865 B2 JP 6568865B2
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JP
Japan
Prior art keywords
mirror
facet
individual mirrors
illumination
mirror array
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JP2016553587A
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English (en)
Japanese (ja)
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JP2017509918A5 (cg-RX-API-DMAC7.html
JP2017509918A (ja
Inventor
シュティグ ビーリン
シュティグ ビーリン
マルクス ハウフ
マルクス ハウフ
ラース ヴィッシュマイヤー
ラース ヴィッシュマイヤー
ファビアン ハッカー
ファビアン ハッカー
マルティン エンドレス
マルティン エンドレス
ヨハネス アイゼンメンガー
ヨハネス アイゼンメンガー
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2017509918A5 publication Critical patent/JP2017509918A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
JP2016553587A 2014-02-21 2015-02-17 ミラーアレイ Active JP6568865B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203189.3A DE102014203189A1 (de) 2014-02-21 2014-02-21 Spiegel-Array
DE102014203189.3 2014-02-21
PCT/EP2015/053287 WO2015124555A1 (de) 2014-02-21 2015-02-17 Spiegel-array

Publications (3)

Publication Number Publication Date
JP2017509918A JP2017509918A (ja) 2017-04-06
JP2017509918A5 JP2017509918A5 (cg-RX-API-DMAC7.html) 2018-03-29
JP6568865B2 true JP6568865B2 (ja) 2019-08-28

Family

ID=52595296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016553587A Active JP6568865B2 (ja) 2014-02-21 2015-02-17 ミラーアレイ

Country Status (5)

Country Link
US (1) US9874819B2 (cg-RX-API-DMAC7.html)
JP (1) JP6568865B2 (cg-RX-API-DMAC7.html)
KR (1) KR102424717B1 (cg-RX-API-DMAC7.html)
DE (1) DE102014203189A1 (cg-RX-API-DMAC7.html)
WO (1) WO2015124555A1 (cg-RX-API-DMAC7.html)

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CN107924064B (zh) 2016-07-07 2020-06-12 核心光电有限公司 用于折叠式光学装置的线性滚珠引导音圈电动机
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WO2018122650A1 (en) 2016-12-28 2018-07-05 Corephotonics Ltd. Folded camera structure with an extended light-folding-element scanning range
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EP3513110B1 (en) 2017-11-23 2023-08-23 Corephotonics Ltd. Compact folded camera structure
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KR102781658B1 (ko) 2018-04-23 2025-03-13 코어포토닉스 리미티드 연장된 2 자유도 회전 범위를 갖는 광학 경로 폴딩 요소
CN112272829B (zh) * 2018-07-04 2025-04-08 核心光电有限公司 用于汽车或监控应用具有扫描光路折叠元件的相机
US11635596B2 (en) 2018-08-22 2023-04-25 Corephotonics Ltd. Two-state zoom folded camera
AU2019359452A1 (en) * 2018-10-10 2021-04-22 Trilok VYAS Villanova ultra efficient vertical windmill system and method
DE102019206865B4 (de) 2019-05-13 2024-09-12 Carl Zeiss Smt Gmbh Verfahren und vorrichtung zum erzeugen eines mathematischen modells zum positionieren von einzelspiegeln eines facettenspiegels in einem optischen system
CN112585644A (zh) 2019-07-31 2021-03-30 核心光电有限公司 在相机摇摄或运动中创建背景模糊的系统及方法
US11949976B2 (en) 2019-12-09 2024-04-02 Corephotonics Ltd. Systems and methods for obtaining a smart panoramic image
WO2021165764A1 (en) 2020-02-22 2021-08-26 Corephotonics Ltd. Split screen feature for macro photography
EP4097773A4 (en) 2020-04-26 2023-11-01 Corephotonics Ltd. TEMPERATURE CONTROL FOR HALL BAR SENSOR CORRECTION
US11832018B2 (en) 2020-05-17 2023-11-28 Corephotonics Ltd. Image stitching in the presence of a full field of view reference image
KR102617779B1 (ko) 2020-05-30 2023-12-22 코어포토닉스 리미티드 슈퍼 매크로 이미지를 얻기 위한 시스템 및 방법
US11637977B2 (en) 2020-07-15 2023-04-25 Corephotonics Ltd. Image sensors and sensing methods to obtain time-of-flight and phase detection information
CN119583941A (zh) 2020-07-15 2025-03-07 核心光电有限公司 用于校正扫描折叠相机和包含这样的扫描折叠相机的多相机中的视点像差的系统
EP4065934A4 (en) 2020-07-31 2023-07-26 Corephotonics Ltd. LARGE STROKE LINEAR POSITION DETECTION HALL EFFECT SENSOR MAGNET GEOMETRY
CN116679419A (zh) 2020-08-12 2023-09-01 核心光电有限公司 用于光学防抖的装置和方法
TWI836372B (zh) 2021-03-11 2024-03-21 以色列商核心光電有限公司 彈出式照相機系統
WO2022259154A2 (en) 2021-06-08 2022-12-15 Corephotonics Ltd. Systems and cameras for tilting a focal plane of a super-macro image
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Also Published As

Publication number Publication date
US20160342095A1 (en) 2016-11-24
KR102424717B1 (ko) 2022-07-25
KR20160124205A (ko) 2016-10-26
US9874819B2 (en) 2018-01-23
DE102014203189A1 (de) 2015-08-27
WO2015124555A1 (de) 2015-08-27
JP2017509918A (ja) 2017-04-06

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