KR102419008B1 - 수지 조성물 및 경화막 - Google Patents

수지 조성물 및 경화막 Download PDF

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Publication number
KR102419008B1
KR102419008B1 KR1020180019462A KR20180019462A KR102419008B1 KR 102419008 B1 KR102419008 B1 KR 102419008B1 KR 1020180019462 A KR1020180019462 A KR 1020180019462A KR 20180019462 A KR20180019462 A KR 20180019462A KR 102419008 B1 KR102419008 B1 KR 102419008B1
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KR
South Korea
Prior art keywords
group
compound
meth
structural unit
resin
Prior art date
Application number
KR1020180019462A
Other languages
English (en)
Korean (ko)
Other versions
KR20180096524A (ko
Inventor
유타카 가와니시
Original Assignee
스미또모 가가꾸 가부시키가이샤
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Publication of KR20180096524A publication Critical patent/KR20180096524A/ko
Application granted granted Critical
Publication of KR102419008B1 publication Critical patent/KR102419008B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F216/12—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F216/125—Monomers containing two or more unsaturated aliphatic radicals, e.g. trimethylolpropane triallyl ether or pentaerythritol triallyl ether
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C08F226/12—N-Vinylcarbazole
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/08—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/08—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
KR1020180019462A 2017-02-21 2018-02-19 수지 조성물 및 경화막 KR102419008B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017030504 2017-02-21
JPJP-P-2017-030504 2017-02-21

Publications (2)

Publication Number Publication Date
KR20180096524A KR20180096524A (ko) 2018-08-29
KR102419008B1 true KR102419008B1 (ko) 2022-07-08

Family

ID=63217087

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180019462A KR102419008B1 (ko) 2017-02-21 2018-02-19 수지 조성물 및 경화막

Country Status (4)

Country Link
JP (1) JP7064900B2 (zh)
KR (1) KR102419008B1 (zh)
CN (1) CN108459468B (zh)
TW (1) TWI750321B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021149520A1 (zh) * 2020-01-22 2021-07-29
WO2023136135A1 (ja) * 2022-01-14 2023-07-20 住友化学株式会社 樹脂、硬化性樹脂組成物及び硬化膜

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015172674A (ja) * 2014-03-12 2015-10-01 日立化成株式会社 感光性樹脂組成物、感光性エレメント、硬化膜付き透明基板の製造方法及び硬化膜付き透明基板

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4275469B2 (ja) * 2003-06-16 2009-06-10 大日本印刷株式会社 凹凸パターン形成材料、凹凸パターン受容体、凹凸パターン形成方法、転写箔、及び光学物品
US8361696B2 (en) * 2007-01-15 2013-01-29 Lg Chem, Ltd. Polymer resin compounds and photoresist composition including new polymer resin compounds
JP5429483B2 (ja) * 2010-01-21 2014-02-26 Ｊｓｒ株式会社 感光性組成物、光学部材、光電変換素子および光電変換素子の製造方法
US9399693B2 (en) * 2011-01-13 2016-07-26 Maruzen Petrochemical Co., Ltd. Resin composition for photoimprinting, pattern forming process and etching mask
EP2762503B1 (en) * 2011-09-27 2017-11-08 Maruzen Petrochemical Co., Ltd. Optical element material and method for producing same
JP5991063B2 (ja) * 2012-07-31 2016-09-14 東洋インキＳｃホールディングス株式会社 樹脂組成物、ならびにそれを用いた塗膜
JP2013242554A (ja) * 2012-04-27 2013-12-05 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP6123187B2 (ja) * 2012-08-21 2017-05-10 住友化学株式会社 感光性樹脂組成物
KR101838830B1 (ko) * 2013-09-05 2018-03-14 주식회사 다이셀 수지 조성물 및 전자 디바이스
TWI516871B (zh) * 2013-10-25 2016-01-11 臺灣永光化學工業股份有限公司 負型厚膜光阻組成物及其用途

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015172674A (ja) * 2014-03-12 2015-10-01 日立化成株式会社 感光性樹脂組成物、感光性エレメント、硬化膜付き透明基板の製造方法及び硬化膜付き透明基板

Also Published As

Publication number Publication date
TW201837068A (zh) 2018-10-16
CN108459468B (zh) 2023-07-28
JP7064900B2 (ja) 2022-05-11
CN108459468A (zh) 2018-08-28
KR20180096524A (ko) 2018-08-29
JP2018135515A (ja) 2018-08-30
TWI750321B (zh) 2021-12-21

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