KR102373189B9 - 금속판, 증착용 마스크 및 이의 제조방법 - Google Patents

금속판, 증착용 마스크 및 이의 제조방법

Info

Publication number
KR102373189B9
KR102373189B9 KR1020210158756A KR20210158756A KR102373189B9 KR 102373189 B9 KR102373189 B9 KR 102373189B9 KR 1020210158756 A KR1020210158756 A KR 1020210158756A KR 20210158756 A KR20210158756 A KR 20210158756A KR 102373189 B9 KR102373189 B9 KR 102373189B9
Authority
KR
South Korea
Prior art keywords
deposition
manufacturing
same
metal substrate
metal
Prior art date
Application number
KR1020210158756A
Other languages
English (en)
Other versions
KR102373189B1 (ko
KR20210144629A (ko
Inventor
백지흠
김윤태
Original Assignee
엘지이노텍 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지이노텍 주식회사 filed Critical 엘지이노텍 주식회사
Priority to KR1020210158756A priority Critical patent/KR102373189B1/ko
Publication of KR20210144629A publication Critical patent/KR20210144629A/ko
Application granted granted Critical
Publication of KR102373189B1 publication Critical patent/KR102373189B1/ko
Publication of KR102373189B9 publication Critical patent/KR102373189B9/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • B32B15/015—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium the said other metal being copper or nickel or an alloy thereof
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020210158756A 2017-03-14 2021-11-17 금속판, 증착용 마스크 및 이의 제조방법 KR102373189B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020210158756A KR102373189B1 (ko) 2017-03-14 2021-11-17 금속판, 증착용 마스크 및 이의 제조방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020170031938A KR102330373B1 (ko) 2017-03-14 2017-03-14 금속판, 증착용 마스크 및 이의 제조방법
KR1020210158756A KR102373189B1 (ko) 2017-03-14 2021-11-17 금속판, 증착용 마스크 및 이의 제조방법

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020170031938A Division KR102330373B1 (ko) 2017-03-14 2017-03-14 금속판, 증착용 마스크 및 이의 제조방법

Publications (3)

Publication Number Publication Date
KR20210144629A KR20210144629A (ko) 2021-11-30
KR102373189B1 KR102373189B1 (ko) 2022-03-11
KR102373189B9 true KR102373189B9 (ko) 2023-12-07

Family

ID=63522458

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020170031938A KR102330373B1 (ko) 2017-03-14 2017-03-14 금속판, 증착용 마스크 및 이의 제조방법
KR1020210158756A KR102373189B1 (ko) 2017-03-14 2021-11-17 금속판, 증착용 마스크 및 이의 제조방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020170031938A KR102330373B1 (ko) 2017-03-14 2017-03-14 금속판, 증착용 마스크 및 이의 제조방법

Country Status (6)

Country Link
US (3) US11293105B2 (ko)
EP (2) EP3597794B1 (ko)
JP (4) JP6868706B2 (ko)
KR (2) KR102330373B1 (ko)
CN (2) CN110431256B (ko)
WO (1) WO2018169250A1 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102154556B1 (ko) 2018-11-30 2020-09-10 (주)영진아스텍 이종 다층 전주도금과 열처리를 통한 고해상도 저열팽창성 oled 기반 마이크로 디스플레이용 미세 금속 마스크의 제조방법
KR20210086073A (ko) * 2019-12-31 2021-07-08 엘지디스플레이 주식회사 박막 증착용 마스크 프레임 및 이를 이용한 유기발광 표시패널의 제조방법
KR20220023927A (ko) * 2020-08-21 2022-03-03 삼성디스플레이 주식회사 표시장치 및 그것의 제조설비
KR102558317B1 (ko) * 2020-11-19 2023-07-21 크레아퓨쳐 주식회사 내식성 강화 인바시트 및 그의 제조방법
TWI828015B (zh) * 2021-12-01 2024-01-01 達運精密工業股份有限公司 精密金屬遮罩的製造方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003064451A (ja) * 2001-06-11 2003-03-05 Hitachi Ltd 複合傾斜合金板とその製造方法およびこの複合傾斜合金板を用いたシャドウマスクを備えたカラー陰極線管
JP2005154879A (ja) * 2003-11-28 2005-06-16 Canon Components Inc 蒸着用メタルマスク及びそれを用いた蒸着パターンの製造方法
KR100778540B1 (ko) * 2006-06-12 2007-11-22 주식회사 이코니 금속 마스크 제조 방법 및 금속 마스크 프레임 어셈블리제조 방법
KR20080064720A (ko) 2007-01-05 2008-07-09 (주)우리정도 도금형 바이메탈 및 이의 제조 방법
JP2011034681A (ja) * 2009-07-29 2011-02-17 Hitachi Displays Ltd 金属加工方法、金属マスク製造方法及び有機ｅｌ表示装置製造方法
KR20120105292A (ko) * 2011-03-15 2012-09-25 삼성디스플레이 주식회사 증착 마스크 및 증착 마스크 제조 방법
KR101820020B1 (ko) 2011-04-25 2018-01-19 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 어셈블리
CN103205688B (zh) * 2012-01-16 2016-06-15 昆山允升吉光电科技有限公司 易于去除辅助图形的掩模板及其制作方法
KR101951029B1 (ko) * 2012-06-13 2019-04-26 삼성디스플레이 주식회사 증착용 마스크 및 이를 이용한 유기 발광 표시장치의 제조방법
JP5382259B1 (ja) * 2013-01-10 2014-01-08 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
JP2015036436A (ja) 2013-08-13 2015-02-23 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
JP5455099B1 (ja) * 2013-09-13 2014-03-26 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
JP5641462B1 (ja) 2014-05-13 2014-12-17 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
JP6341039B2 (ja) * 2014-09-29 2018-06-13 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
TWI696708B (zh) * 2015-02-10 2020-06-21 日商大日本印刷股份有限公司 有機ｅｌ顯示裝置用蒸鍍遮罩之製造方法、欲製作有機ｅｌ顯示裝置用蒸鍍遮罩所使用之金屬板及其製造方法
WO2016129534A1 (ja) * 2015-02-10 2016-08-18 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
CN110923622B (zh) * 2015-04-24 2021-12-03 Lg伊诺特有限公司 沉积掩膜
CN109440062B (zh) 2015-07-17 2021-02-05 凸版印刷株式会社 金属掩模基材、金属掩模基材的管理方法、金属掩模以及金属掩模的制造方法
KR101968033B1 (ko) * 2015-07-17 2019-04-10 도판 인사츠 가부시키가이샤 메탈 마스크용 기재의 제조 방법, 증착용 메탈 마스크의 제조 방법, 메탈 마스크용 기재, 및, 증착용 메탈 마스크
CN105177496B (zh) * 2015-09-25 2019-06-04 信利（惠州）智能显示有限公司 掩膜板的制作方法
KR101693514B1 (ko) 2015-12-24 2017-01-06 주식회사 포스코 전기강판용 Fe-Ni-P 합금 다층 강판 및 이의 제조방법

Also Published As

Publication number Publication date
JP2024037820A (ja) 2024-03-19
JP2023002550A (ja) 2023-01-10
KR20180104964A (ko) 2018-09-27
EP3597794A1 (en) 2020-01-22
JP7401622B2 (ja) 2023-12-19
EP3597794A4 (en) 2021-01-06
KR102330373B1 (ko) 2021-11-23
JP2020509238A (ja) 2020-03-26
KR102373189B1 (ko) 2022-03-11
US20210140061A1 (en) 2021-05-13
CN110431256A (zh) 2019-11-08
JP6868706B2 (ja) 2021-05-12
CN113622004B (zh) 2024-04-16
JP7150086B2 (ja) 2022-10-07
EP3940113A1 (en) 2022-01-19
WO2018169250A1 (ko) 2018-09-20
US11781224B2 (en) 2023-10-10
US11293105B2 (en) 2022-04-05
US20220090270A1 (en) 2022-03-24
CN113622004A (zh) 2021-11-09
JP2021107582A (ja) 2021-07-29
EP3597794B1 (en) 2021-10-27
CN110431256B (zh) 2021-08-20
KR20210144629A (ko) 2021-11-30
US20230383414A1 (en) 2023-11-30

Similar Documents

Publication Publication Date Title
KR102373189B9 (ko) 금속판, 증착용 마스크 및 이의 제조방법
EP3556899A4 (en) VAPOR PHASE DEPOSIT MASK DEVICE AND METHOD FOR MANUFACTURING A STEAM DEPOSIT MASK DEVICE
EP3712294A4 (en) METAL PLATE FOR MAKING A VAPOR MASK AND METHOD FOR MAKING METAL PLATE AND VAPOR MASK AND METHOD FOR MAKING A VAPOR MASK
KR102071840B9 (ko) 메탈 마스크 기재, 메탈 마스크, 및 메탈 마스크의 제조 방법
EP3358038A4 (en) DEPOSIT MASK, MANUFACTURING METHOD THEREOF AND METAL PLATE
SG11201705487QA (en) Metal hardmask composition and processes for forming fine patterns on semiconductor substrates
EP3514844A4 (en) METAL PLATE FOR DEPOSIT MASK, AND DEPOSIT MASK AND MANUFACTURING METHOD THEREOF
EP3287544A4 (en) Coated metal mold and method for manufacturing same
EP3572553A4 (en) STEAM PHASE DEPOSIT MASK AND METHOD FOR MANUFACTURING THE LATTER
EP3474643A4 (en) CERAMIC SUBSTRATE AND MANUFACTURING METHOD THEREFOR
EP3419074A4 (en) METAL PLATE, MASK FOR DEPOSITION, AND METHOD OF MANUFACTURING THEREOF
EP3680362A4 (en) PRODUCTION PROCESS AND DEVICE FOR VAPOR PHASE DEPOSIT MASK DEVICE
KR102268198B9 (ko) 증착 마스크용 기재, 증착 마스크용 기재의 제조 방법, 증착 마스크의 제조 방법, 및 표시 장치의 제조 방법
PL3445732T3 (pl) Powlekane powierzchnie szkła i sposób powlekania powierzchni szkła
EP3288097A4 (en) METAL SUBSTRATE AND SEPARATION MASK THEREWITH
EP3514249A4 (en) METAL MASK MATERIAL AND MANUFACTURING METHOD THEREOF METAL MASK MATERIAL
AU2017308229B2 (en) Systems and methods for treating a metal substrate
KR102268199B9 (ko) 증착 마스크용 기재, 증착 마스크용 기재의 제조 방법, 증착 마스크의 제조 방법, 및 표시 장치의 제조 방법
EP3617151A4 (en) METAL COMPOSITE NANOPARTICLE, COATING AND FILM USING THE SAME METAL COMPOSITE NANOPARTICLE PRODUCTION METHOD AND METAL COMPOSITE NANOPARTICLE MANUFACTURING METHOD
EP3346025A4 (en) Insulative coating processing liquid and method for manufacturing metal having insulative coating
KR101724996B9 (ko) 금속판 및 이를 이용한 증착용마스크
KR101603200B9 (ko) 금속기판 및 이를 이용한 증착용마스크
HUE056047T2 (hu) Fém/kerámia szubsztrát és annak gyártási eljárása
SG11201913186QA (en) Hydrophobic coating for corrosion protection and method of fabrication
ZA201906946B (en) A coated metallic substrate and fabrication method

Legal Events

Date Code Title Description
A107 Divisional application of patent
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
Z072 Maintenance of patent after cancellation proceedings: certified copy of decision transmitted [new post grant opposition system as of 20170301]
Z131 Decision taken on request for patent cancellation [new post grant opposition system as of 20170301]