KR102362859B1 - 중합성 기를 함유하는 플루오렌 옥심 에스테르 광 개시제, 및 이의 제조방법 및 용도 - Google Patents

중합성 기를 함유하는 플루오렌 옥심 에스테르 광 개시제, 및 이의 제조방법 및 용도 Download PDF

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KR102362859B1
KR102362859B1 KR1020197032437A KR20197032437A KR102362859B1 KR 102362859 B1 KR102362859 B1 KR 102362859B1 KR 1020197032437 A KR1020197032437 A KR 1020197032437A KR 20197032437 A KR20197032437 A KR 20197032437A KR 102362859 B1 KR102362859 B1 KR 102362859B1
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group
oxime ester
alkyl group
delete delete
meth
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KR1020197032437A
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Korean (ko)
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KR20190131115A (ko
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샤오춘 첸
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창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드
샹조우 트론리 뉴 일렉트로닉 머티리얼즈 컴퍼니 리미티드
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Priority claimed from CN201710274018.4A external-priority patent/CN108727517B/zh
Priority claimed from CN201710796351.1A external-priority patent/CN109459914B/zh
Application filed by 창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드, 샹조우 트론리 뉴 일렉트로닉 머티리얼즈 컴퍼니 리미티드 filed Critical 창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드
Publication of KR20190131115A publication Critical patent/KR20190131115A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C13/00—Cyclic hydrocarbons containing rings other than, or in addition to, six-membered aromatic rings
    • C07C13/28—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof
    • C07C13/32—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings
    • C07C13/54—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with three condensed rings
    • C07C13/547—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with three condensed rings at least one ring not being six-membered, the other rings being at the most six-membered
    • C07C13/567—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with three condensed rings at least one ring not being six-membered, the other rings being at the most six-membered with a fluorene or hydrogenated fluorene ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
KR1020197032437A 2017-04-25 2018-04-12 중합성 기를 함유하는 플루오렌 옥심 에스테르 광 개시제, 및 이의 제조방법 및 용도 KR102362859B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
CN201710274018.4 2017-04-25
CN201710274018.4A CN108727517B (zh) 2017-04-25 2017-04-25 含有可聚合基团的芴肟酯类光引发剂、其制备方法及应用
CN201710796351.1A CN109459914B (zh) 2017-09-06 2017-09-06 光固化树脂组合物及其应用
CN201710796351.1 2017-09-06
PCT/CN2018/082761 WO2018196619A1 (fr) 2017-04-25 2018-04-12 Photoinitiateur à base d'ester d'oxime fluorène contenant un groupe polymérisable, son procédé de préparation et son utilisation

Publications (2)

Publication Number Publication Date
KR20190131115A KR20190131115A (ko) 2019-11-25
KR102362859B1 true KR102362859B1 (ko) 2022-02-14

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KR1020197032437A KR102362859B1 (ko) 2017-04-25 2018-04-12 중합성 기를 함유하는 플루오렌 옥심 에스테르 광 개시제, 및 이의 제조방법 및 용도

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Country Link
JP (1) JP7034175B2 (fr)
KR (1) KR102362859B1 (fr)
TW (1) TWI680118B (fr)
WO (1) WO2018196619A1 (fr)

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JP6968633B2 (ja) * 2017-09-07 2021-11-17 東京応化工業株式会社 感光性組成物、及びそれに用いられる光重合開始剤
JP6999039B2 (ja) * 2017-12-22 2022-02-04 常州強力先端電子材料有限公司 フッ素含有フルオレンオキシムエステル系光開始剤、それを含む光硬化組成物およびその適用
KR20200135308A (ko) * 2018-03-27 2020-12-02 가부시키가이샤 아데카 화합물, 라디칼 중합 개시제, 조성물, 경화물 및 경화물의 제조 방법
CN111320714B (zh) * 2018-12-13 2022-04-19 常州强力先端电子材料有限公司 肟酯类光引发剂、其制备方法及应用
JP7345252B2 (ja) * 2018-12-28 2023-09-15 日鉄ケミカル＆マテリアル株式会社 遮光膜用感光性樹脂組成物及びその硬化物、並びに当該硬化物を用いたカラーフィルター及びタッチパネルの製造方法
CN114149517B (zh) * 2020-09-07 2022-12-30 常州强力电子新材料股份有限公司 含噻吩结构的肟酯光引发剂、制备方法及光敏树脂组合物
CN115368341B (zh) * 2021-05-20 2024-01-26 常州强力先端电子材料有限公司 肟磺酸酯化合物、含其的抗蚀剂组合物、电子器件及应用
WO2023085056A1 (fr) * 2021-11-09 2023-05-19 富士フイルム株式会社 Composition durcissable, procédé de production d'une composition durcissable, film, dispositif optique, capteur d'image, dispositif d'imagerie à semi-conducteurs, dispositif d'affichage d'image et initiateur de polymérisation radicalaire
CN115650886A (zh) * 2022-10-15 2023-01-31 瑞红(苏州)电子化学品股份有限公司 肟磺酸酯类光产酸剂及其抗蚀剂组合物应用
CN115611782A (zh) * 2022-10-15 2023-01-17 瑞红(苏州)电子化学品股份有限公司 高产酸肟磺酸酯类光产酸剂及其抗蚀剂组合物应用

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JP2014137466A (ja) 2013-01-16 2014-07-28 Jsr Corp 感放射線性着色組成物、着色硬化膜及び表示素子
WO2017023067A2 (fr) * 2015-07-31 2017-02-09 (주)켐이 Dérivé de fluorène, et initiateur de photopolymérisation et composition de photorésine en contenant

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KR20130055870A (ko) * 2011-11-21 2013-05-29 동우 화인켐 주식회사 컬러필터 형성용 조성물 및 이로부터 제조되는 컬러필터
TWI472507B (zh) * 2012-05-03 2015-02-11 Korea Res Inst Chem Tech 新穎茀肟酯化合物、含彼之光聚合起始劑及光阻組合物
KR102282647B1 (ko) * 2013-09-10 2021-07-28 바스프 에스이 옥심 에스테르 광개시제
EP3165965B1 (fr) * 2014-07-15 2018-10-10 Tokyo Ohka Kogyo Co., Ltd. Composition photosensible et composé
CN104076606B (zh) * 2014-07-15 2019-12-03 常州强力电子新材料股份有限公司 一种含肟酯类光引发剂的感光性组合物及其应用

Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
JP2014137466A (ja) 2013-01-16 2014-07-28 Jsr Corp 感放射線性着色組成物、着色硬化膜及び表示素子
WO2017023067A2 (fr) * 2015-07-31 2017-02-09 (주)켐이 Dérivé de fluorène, et initiateur de photopolymérisation et composition de photorésine en contenant

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JP7034175B2 (ja) 2022-03-11
WO2018196619A1 (fr) 2018-11-01
JP2020517804A (ja) 2020-06-18
KR20190131115A (ko) 2019-11-25
TWI680118B (zh) 2019-12-21
TW201838968A (zh) 2018-11-01

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