KR102354948B1 - 노광 장치 및 물품의 제조 방법 - Google Patents

노광 장치 및 물품의 제조 방법 Download PDF

Info

Publication number
KR102354948B1
KR102354948B1 KR1020180070702A KR20180070702A KR102354948B1 KR 102354948 B1 KR102354948 B1 KR 102354948B1 KR 1020180070702 A KR1020180070702 A KR 1020180070702A KR 20180070702 A KR20180070702 A KR 20180070702A KR 102354948 B1 KR102354948 B1 KR 102354948B1
Authority
KR
South Korea
Prior art keywords
substrate
measurement
height direction
stage
measurement unit
Prior art date
Application number
KR1020180070702A
Other languages
English (en)
Korean (ko)
Other versions
KR20180138544A (ko
Inventor
다카시 하야카와
다카노리 사토
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20180138544A publication Critical patent/KR20180138544A/ko
Application granted granted Critical
Publication of KR102354948B1 publication Critical patent/KR102354948B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020180070702A 2017-06-21 2018-06-20 노광 장치 및 물품의 제조 방법 KR102354948B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017121561A JP6882091B2 (ja) 2017-06-21 2017-06-21 露光装置及び物品の製造方法
JPJP-P-2017-121561 2017-06-21

Publications (2)

Publication Number Publication Date
KR20180138544A KR20180138544A (ko) 2018-12-31
KR102354948B1 true KR102354948B1 (ko) 2022-01-25

Family

ID=64844993

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180070702A KR102354948B1 (ko) 2017-06-21 2018-06-20 노광 장치 및 물품의 제조 방법

Country Status (3)

Country Link
JP (1) JP6882091B2 (ja)
KR (1) KR102354948B1 (ja)
CN (1) CN109100920B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7312053B2 (ja) * 2019-08-05 2023-07-20 キヤノン株式会社 露光装置、および物品の製造方法
JP7361599B2 (ja) * 2019-12-26 2023-10-16 キヤノン株式会社 露光装置および物品製造方法
KR20230069214A (ko) * 2020-10-20 2023-05-18 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치에서의 기판 레벨 감지

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999039374A1 (fr) * 1998-01-29 1999-08-05 Nikon Corporation Procede d'exposition et dispositif associe
WO2005124832A1 (ja) * 2004-06-17 2005-12-29 Nikon Corporation 露光装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3288280B2 (ja) * 1997-09-29 2002-06-04 日本電気株式会社 露光方法
JPH11186129A (ja) * 1997-12-19 1999-07-09 Nikon Corp 走査型露光方法及び装置
JP2003173960A (ja) * 2001-12-06 2003-06-20 Nikon Corp 露光装置
JP2003203855A (ja) * 2002-01-10 2003-07-18 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP3780221B2 (ja) * 2002-03-26 2006-05-31 キヤノン株式会社 露光方法及び装置
JP3428639B2 (ja) * 2002-08-28 2003-07-22 株式会社ニコン 走査型露光装置及びデバイス製造方法
JP5498243B2 (ja) * 2010-05-07 2014-05-21 キヤノン株式会社 露光装置、露光方法及びデバイス製造方法
CN104541208B (zh) * 2012-07-09 2019-01-22 株式会社尼康 驱动系统和驱动方法、以及曝光装置和曝光方法
JP6071628B2 (ja) * 2013-02-22 2017-02-01 キヤノン株式会社 露光装置、露光方法及びデバイスの製造方法
JP6267530B2 (ja) * 2014-02-04 2018-01-24 キヤノン株式会社 露光装置、および物品の製造方法
US20160266500A1 (en) * 2015-03-13 2016-09-15 Kabushiki Kaisha Toshiba Exposure apparatus, exposure method, and manufacturing method of device
JP6806509B2 (ja) * 2016-09-15 2021-01-06 キヤノン株式会社 露光装置及び物品の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999039374A1 (fr) * 1998-01-29 1999-08-05 Nikon Corporation Procede d'exposition et dispositif associe
WO2005124832A1 (ja) * 2004-06-17 2005-12-29 Nikon Corporation 露光装置

Also Published As

Publication number Publication date
CN109100920A (zh) 2018-12-28
KR20180138544A (ko) 2018-12-31
JP6882091B2 (ja) 2021-06-02
JP2019008029A (ja) 2019-01-17
CN109100920B (zh) 2021-07-09

Similar Documents

Publication Publication Date Title
KR100875008B1 (ko) 노광장치 및 디바이스 제조방법
KR101444981B1 (ko) 노광 장치, 노광 방법 및 디바이스 제조 방법
KR102354948B1 (ko) 노광 장치 및 물품의 제조 방법
JP2020052430A (ja) 計測装置及び計測方法、並びに露光装置
JP6267530B2 (ja) 露光装置、および物品の製造方法
KR102222673B1 (ko) 노광 장치 및 물품 제조 방법
US10488764B2 (en) Lithography apparatus, lithography method, and method of manufacturing article
US20090310108A1 (en) Exposure apparatus and method of manufacturing device
JP6700932B2 (ja) 検出装置、検出方法、プログラム、リソグラフィ装置、および物品製造方法
JP2014143429A (ja) 露光装置、露光方法及びデバイス製造方法
KR20220138803A (ko) 노광 장치, 노광 방법 및 물품의 제조 방법
JP6053316B2 (ja) リソグラフィー装置、および、物品製造方法
JP2023077924A (ja) 露光装置、露光方法、および物品製造方法
JP2021026113A (ja) 露光装置、および物品の製造方法
JP2018077288A (ja) 露光装置及び物品の製造方法

Legal Events

Date Code Title Description
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right