KR102343801B1 - 조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템 - Google Patents

조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템 Download PDF

Info

Publication number
KR102343801B1
KR102343801B1 KR1020167009359A KR20167009359A KR102343801B1 KR 102343801 B1 KR102343801 B1 KR 102343801B1 KR 1020167009359 A KR1020167009359 A KR 1020167009359A KR 20167009359 A KR20167009359 A KR 20167009359A KR 102343801 B1 KR102343801 B1 KR 102343801B1
Authority
KR
South Korea
Prior art keywords
illumination
specular
facet
pupil
facets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020167009359A
Other languages
English (en)
Korean (ko)
Other versions
KR20160054579A (ko
Inventor
미카엘 파트라
Original Assignee
칼 짜이스 에스엠티 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠티 게엠베하 filed Critical 칼 짜이스 에스엠티 게엠베하
Publication of KR20160054579A publication Critical patent/KR20160054579A/ko
Application granted granted Critical
Publication of KR102343801B1 publication Critical patent/KR102343801B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020167009359A 2013-09-11 2014-08-25 조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템 Active KR102343801B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE201310218131 DE102013218131A1 (de) 2013-09-11 2013-09-11 Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie
DE102013218131.0 2013-09-11
PCT/EP2014/067961 WO2015036226A1 (de) 2013-09-11 2014-08-25 Beleuchtungsoptik sowie beleuchtungssystem für die euv-projektionslithographie

Publications (2)

Publication Number Publication Date
KR20160054579A KR20160054579A (ko) 2016-05-16
KR102343801B1 true KR102343801B1 (ko) 2021-12-28

Family

ID=51542327

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167009359A Active KR102343801B1 (ko) 2013-09-11 2014-08-25 조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템

Country Status (6)

Country Link
US (1) US9915874B2 (https=)
JP (2) JP6703944B2 (https=)
KR (1) KR102343801B1 (https=)
CN (1) CN105706003B (https=)
DE (1) DE102013218131A1 (https=)
WO (1) WO2015036226A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015217603A1 (de) 2015-09-15 2017-03-16 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
DE102018201457A1 (de) * 2018-01-31 2019-08-01 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
US11543753B2 (en) 2019-10-30 2023-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Tunable illuminator for lithography systems
DE102024205226A1 (de) 2024-06-06 2025-02-20 Carl Zeiss Smt Gmbh Verfahren zum Betrieb eines optischen Systems einer Lithographie-Projektionsbelichtungsanlage

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6014252A (en) 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
JP2006523944A (ja) 2003-04-17 2006-10-19 カール・ツァイス・エスエムティー・アーゲー 照明装置のための光学素子
JP2011512659A (ja) * 2008-02-15 2011-04-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
JP2012244184A (ja) 2011-05-19 2012-12-10 Carl Zeiss Smt Gmbh 投影露光装置の照明光学ユニットの瞳ファセットミラーの瞳ファセットを照明光学ユニットの視野ファセットミラーの視野ファセットに割り当てる方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5361292A (en) * 1993-05-11 1994-11-01 The United States Of America As Represented By The Department Of Energy Condenser for illuminating a ring field
DE10053587A1 (de) 2000-10-27 2002-05-02 Zeiss Carl Beleuchtungssystem mit variabler Einstellung der Ausleuchtung
DE19931848A1 (de) 1999-07-09 2001-01-11 Zeiss Carl Fa Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen
US7333178B2 (en) * 2002-03-18 2008-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121762A1 (en) * 2002-03-18 2006-05-26 Asml Netherlands Bv Lithographic apparatus, and device manufacturing method
JP2006108224A (ja) 2004-10-01 2006-04-20 Nikon Corp 照明光学系、露光装置及びマイクロデバイスの製造方法
US7277158B2 (en) 2004-12-02 2007-10-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7405809B2 (en) 2005-03-21 2008-07-29 Carl Zeiss Smt Ag Illumination system particularly for microlithography
JP2007134464A (ja) * 2005-11-09 2007-05-31 Canon Inc 多層膜を有する光学素子及びそれを有する露光装置
DE102006059024A1 (de) 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102007045396A1 (de) 2007-09-21 2009-04-23 Carl Zeiss Smt Ag Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle
DE102008009600A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
DE102008000967B4 (de) * 2008-04-03 2015-04-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die EUV-Mikrolithographie
DE102008049586A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie
DE102009032194A1 (de) * 2008-10-16 2010-04-22 Carl Zeiss Smt Ag Optischer Spiegel mit einer Mehrzahl benachbarter Spiegelelemente und Verfahren zur Herstellung eines derartigen Spiegels
KR101769157B1 (ko) * 2008-10-20 2017-08-17 칼 짜이스 에스엠테 게엠베하 방사선 빔 안내를 위한 광학 모듈
JP6041304B2 (ja) 2009-03-27 2016-12-07 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系、この種の照明光学系用のｅｕｖ減衰器、及びこの種の照明光学系を有する照明系及び投影露光装置
DE102011004615A1 (de) * 2010-03-17 2011-09-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6014252A (en) 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
JP2006523944A (ja) 2003-04-17 2006-10-19 カール・ツァイス・エスエムティー・アーゲー 照明装置のための光学素子
JP2011512659A (ja) * 2008-02-15 2011-04-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
JP2012244184A (ja) 2011-05-19 2012-12-10 Carl Zeiss Smt Gmbh 投影露光装置の照明光学ユニットの瞳ファセットミラーの瞳ファセットを照明光学ユニットの視野ファセットミラーの視野ファセットに割り当てる方法

Also Published As

Publication number Publication date
DE102013218131A1 (de) 2015-03-12
JP2020122989A (ja) 2020-08-13
WO2015036226A1 (de) 2015-03-19
JP2016535313A (ja) 2016-11-10
JP7071436B2 (ja) 2022-05-18
JP6703944B2 (ja) 2020-06-03
US9915874B2 (en) 2018-03-13
US20160187784A1 (en) 2016-06-30
CN105706003B (zh) 2019-06-28
KR20160054579A (ko) 2016-05-16
CN105706003A (zh) 2016-06-22

Similar Documents

Publication Publication Date Title
KR101188994B1 (ko) 투영 리소그래피용 조명 광학 유닛
KR101470769B1 (ko) 마이크로리소그래픽 투영 노광 장치의 조명 시스템
KR101813307B1 (ko) 마이크로리소그래픽 투영 노광 장치의 조명 시스템
TWI610140B (zh) 用於投射曝光裝置的照射光學單元
US8395754B2 (en) Illumination optical unit for EUV microlithography
JP7071436B2 (ja) Ｅｕｖ投影リソグラフィのための照明光学系及び照明系
US9933704B2 (en) Microlithography illumination optical system and microlithography projection exposure apparatus including same
US9810890B2 (en) Collector
US10216091B2 (en) Facet mirror for an illumination optical unit for projection lithography
US10488567B2 (en) Faceted mirror for EUV projection lithography and illumination optical unit with same
JP2016535313A5 (https=)
US10539883B2 (en) Illumination system of a microlithographic projection device and method for operating such a system
TW201723667A (zh) 投影微影之照明光學單元
US10018917B2 (en) Illumination optical unit for EUV projection lithography
JP2017526969A5 (https=)
US9996010B2 (en) Illumination optical assembly for projection lithography
JP2014134591A (ja) 照明装置、露光装置、照明方法及びデバイス製造方法
TW201626111A (zh) 用以照明一照明場的照明光學單元以及包含此類照明光學單元的投射曝光裝置

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20160408

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20190823

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20201112

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20210923

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20211222

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20211223

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20241213

Start annual number: 4

End annual number: 4