KR102343801B1 - 조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템 - Google Patents

조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템 Download PDF

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Publication number
KR102343801B1
KR102343801B1 KR1020167009359A KR20167009359A KR102343801B1 KR 102343801 B1 KR102343801 B1 KR 102343801B1 KR 1020167009359 A KR1020167009359 A KR 1020167009359A KR 20167009359 A KR20167009359 A KR 20167009359A KR 102343801 B1 KR102343801 B1 KR 102343801B1
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South Korea
Prior art keywords
illumination
specular
facet
pupil
facets
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Korean (ko)
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KR20160054579A (ko
Inventor
미카엘 파트라
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020167009359A 2013-09-11 2014-08-25 조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템 Active KR102343801B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013218131.0 2013-09-11
DE201310218131 DE102013218131A1 (de) 2013-09-11 2013-09-11 Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie
PCT/EP2014/067961 WO2015036226A1 (de) 2013-09-11 2014-08-25 Beleuchtungsoptik sowie beleuchtungssystem für die euv-projektionslithographie

Publications (2)

Publication Number Publication Date
KR20160054579A KR20160054579A (ko) 2016-05-16
KR102343801B1 true KR102343801B1 (ko) 2021-12-28

Family

ID=51542327

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167009359A Active KR102343801B1 (ko) 2013-09-11 2014-08-25 조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템

Country Status (6)

Country Link
US (1) US9915874B2 (https=)
JP (2) JP6703944B2 (https=)
KR (1) KR102343801B1 (https=)
CN (1) CN105706003B (https=)
DE (1) DE102013218131A1 (https=)
WO (1) WO2015036226A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015217603A1 (de) 2015-09-15 2017-03-16 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
DE102018201457A1 (de) * 2018-01-31 2019-08-01 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
US11543753B2 (en) * 2019-10-30 2023-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Tunable illuminator for lithography systems
DE102024205226A1 (de) 2024-06-06 2025-02-20 Carl Zeiss Smt Gmbh Verfahren zum Betrieb eines optischen Systems einer Lithographie-Projektionsbelichtungsanlage

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6014252A (en) 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
JP2006523944A (ja) 2003-04-17 2006-10-19 カール・ツァイス・エスエムティー・アーゲー 照明装置のための光学素子
JP2011512659A (ja) * 2008-02-15 2011-04-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
JP2012244184A (ja) 2011-05-19 2012-12-10 Carl Zeiss Smt Gmbh 投影露光装置の照明光学ユニットの瞳ファセットミラーの瞳ファセットを照明光学ユニットの視野ファセットミラーの視野ファセットに割り当てる方法

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US5361292A (en) * 1993-05-11 1994-11-01 The United States Of America As Represented By The Department Of Energy Condenser for illuminating a ring field
DE10053587A1 (de) * 2000-10-27 2002-05-02 Zeiss Carl Beleuchtungssystem mit variabler Einstellung der Ausleuchtung
DE19931848A1 (de) 1999-07-09 2001-01-11 Zeiss Carl Fa Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen
JP4099423B2 (ja) * 2002-03-18 2008-06-11 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造法
US7333178B2 (en) * 2002-03-18 2008-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006108224A (ja) * 2004-10-01 2006-04-20 Nikon Corp 照明光学系、露光装置及びマイクロデバイスの製造方法
US7277158B2 (en) * 2004-12-02 2007-10-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7405809B2 (en) * 2005-03-21 2008-07-29 Carl Zeiss Smt Ag Illumination system particularly for microlithography
JP2007134464A (ja) * 2005-11-09 2007-05-31 Canon Inc 多層膜を有する光学素子及びそれを有する露光装置
DE102006059024A1 (de) * 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102007045396A1 (de) 2007-09-21 2009-04-23 Carl Zeiss Smt Ag Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle
DE102008009600A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
DE102008000967B4 (de) * 2008-04-03 2015-04-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die EUV-Mikrolithographie
DE102008049586A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie
DE102009032194A1 (de) * 2008-10-16 2010-04-22 Carl Zeiss Smt Ag Optischer Spiegel mit einer Mehrzahl benachbarter Spiegelelemente und Verfahren zur Herstellung eines derartigen Spiegels
JP5355699B2 (ja) * 2008-10-20 2013-11-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 放射線ビームを案内するための光学モジュール
WO2010108516A1 (en) * 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
DE102011004615A1 (de) * 2010-03-17 2011-09-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6014252A (en) 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
JP2006523944A (ja) 2003-04-17 2006-10-19 カール・ツァイス・エスエムティー・アーゲー 照明装置のための光学素子
JP2011512659A (ja) * 2008-02-15 2011-04-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
JP2012244184A (ja) 2011-05-19 2012-12-10 Carl Zeiss Smt Gmbh 投影露光装置の照明光学ユニットの瞳ファセットミラーの瞳ファセットを照明光学ユニットの視野ファセットミラーの視野ファセットに割り当てる方法

Also Published As

Publication number Publication date
JP6703944B2 (ja) 2020-06-03
CN105706003A (zh) 2016-06-22
US20160187784A1 (en) 2016-06-30
CN105706003B (zh) 2019-06-28
DE102013218131A1 (de) 2015-03-12
JP7071436B2 (ja) 2022-05-18
WO2015036226A1 (de) 2015-03-19
JP2020122989A (ja) 2020-08-13
KR20160054579A (ko) 2016-05-16
US9915874B2 (en) 2018-03-13
JP2016535313A (ja) 2016-11-10

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