DE102013218131A1 - Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie - Google Patents
Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie Download PDFInfo
- Publication number
- DE102013218131A1 DE102013218131A1 DE201310218131 DE102013218131A DE102013218131A1 DE 102013218131 A1 DE102013218131 A1 DE 102013218131A1 DE 201310218131 DE201310218131 DE 201310218131 DE 102013218131 A DE102013218131 A DE 102013218131A DE 102013218131 A1 DE102013218131 A1 DE 102013218131A1
- Authority
- DE
- Germany
- Prior art keywords
- illumination
- facets
- specular
- pupil
- field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005286 illumination Methods 0.000 title claims abstract description 176
- 238000001459 lithography Methods 0.000 title claims abstract description 9
- 238000006073 displacement reaction Methods 0.000 claims abstract description 11
- 230000003068 static effect Effects 0.000 claims abstract description 7
- 238000003384 imaging method Methods 0.000 claims abstract 3
- 210000001747 pupil Anatomy 0.000 claims description 173
- 230000003287 optical effect Effects 0.000 claims description 31
- 238000009826 distribution Methods 0.000 claims description 26
- 230000001427 coherent effect Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 238000013507 mapping Methods 0.000 claims 2
- 238000011144 upstream manufacturing Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 238000007493 shaping process Methods 0.000 description 13
- 230000005855 radiation Effects 0.000 description 8
- 230000012447 hatching Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 3
- 238000003491 array Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 230000005405 multipole Effects 0.000 description 2
- 238000009304 pastoral farming Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE201310218131 DE102013218131A1 (de) | 2013-09-11 | 2013-09-11 | Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie |
| JP2016541865A JP6703944B2 (ja) | 2013-09-11 | 2014-08-25 | Ｅｕｖ投影リソグラフィのための照明光学系及び照明系 |
| KR1020167009359A KR102343801B1 (ko) | 2013-09-11 | 2014-08-25 | 조명 광학 유닛 및 euv 투영 리소그래피용 조명 시스템 |
| CN201480060611.3A CN105706003B (zh) | 2013-09-11 | 2014-08-25 | 用于euv投射光刻的照明光学装置以及照明系统 |
| PCT/EP2014/067961 WO2015036226A1 (de) | 2013-09-11 | 2014-08-25 | Beleuchtungsoptik sowie beleuchtungssystem für die euv-projektionslithographie |
| US15/061,048 US9915874B2 (en) | 2013-09-11 | 2016-03-04 | Illumination optical unit and illumination system for EUV projection lithography |
| JP2020083202A JP7071436B2 (ja) | 2013-09-11 | 2020-05-11 | Ｅｕｖ投影リソグラフィのための照明光学系及び照明系 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE201310218131 DE102013218131A1 (de) | 2013-09-11 | 2013-09-11 | Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102013218131A1 true DE102013218131A1 (de) | 2015-03-12 |
Family
ID=51542327
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE201310218131 Ceased DE102013218131A1 (de) | 2013-09-11 | 2013-09-11 | Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9915874B2 (https=) |
| JP (2) | JP6703944B2 (https=) |
| KR (1) | KR102343801B1 (https=) |
| CN (1) | CN105706003B (https=) |
| DE (1) | DE102013218131A1 (https=) |
| WO (1) | WO2015036226A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015217603A1 (de) | 2015-09-15 | 2017-03-16 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| DE102018201457A1 (de) * | 2018-01-31 | 2019-08-01 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie |
| US11543753B2 (en) | 2019-10-30 | 2023-01-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Tunable illuminator for lithography systems |
| DE102024205226A1 (de) | 2024-06-06 | 2025-02-20 | Carl Zeiss Smt Gmbh | Verfahren zum Betrieb eines optischen Systems einer Lithographie-Projektionsbelichtungsanlage |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5361292A (en) * | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
| US6507440B1 (en) | 1999-07-09 | 2003-01-14 | Carl-Zeiss-Stiftung | Components with an anamorphotic effect for reducing an aspect ratio of a raster element in an illumination system |
| DE10317667A1 (de) | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| US20100231882A1 (en) | 2007-09-21 | 2010-09-16 | Carl Zeiss Smt Ag | Bundle-guiding optical collector for collecting the emission of a radiation source |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6014252A (en) * | 1998-02-20 | 2000-01-11 | The Regents Of The University Of California | Reflective optical imaging system |
| DE10053587A1 (de) | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
| US7333178B2 (en) * | 2002-03-18 | 2008-02-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| SG121762A1 (en) * | 2002-03-18 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus, and device manufacturing method |
| JP2006108224A (ja) | 2004-10-01 | 2006-04-20 | Nikon Corp | 照明光学系、露光装置及びマイクロデバイスの製造方法 |
| US7277158B2 (en) | 2004-12-02 | 2007-10-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7405809B2 (en) | 2005-03-21 | 2008-07-29 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
| JP2007134464A (ja) * | 2005-11-09 | 2007-05-31 | Canon Inc | 多層膜を有する光学素子及びそれを有する露光装置 |
| DE102006059024A1 (de) | 2006-12-14 | 2008-06-19 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil |
| DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| JP5487118B2 (ja) * | 2008-02-15 | 2014-05-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのための投影露光装置に使用するファセットミラー |
| DE102008000967B4 (de) * | 2008-04-03 | 2015-04-09 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
| DE102008049586A1 (de) * | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
| DE102009032194A1 (de) * | 2008-10-16 | 2010-04-22 | Carl Zeiss Smt Ag | Optischer Spiegel mit einer Mehrzahl benachbarter Spiegelelemente und Verfahren zur Herstellung eines derartigen Spiegels |
| KR101769157B1 (ko) * | 2008-10-20 | 2017-08-17 | 칼 짜이스 에스엠테 게엠베하 | 방사선 빔 안내를 위한 광학 모듈 |
| JP6041304B2 (ja) | 2009-03-27 | 2016-12-07 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Ｅｕｖマイクロリソグラフィ用の照明光学系、この種の照明光学系用のｅｕｖ減衰器、及びこの種の照明光学系を有する照明系及び投影露光装置 |
| DE102011004615A1 (de) * | 2010-03-17 | 2011-09-22 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| DE102011076145B4 (de) * | 2011-05-19 | 2013-04-11 | Carl Zeiss Smt Gmbh | Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik |
-
2013
- 2013-09-11 DE DE201310218131 patent/DE102013218131A1/de not_active Ceased
-
2014
- 2014-08-25 CN CN201480060611.3A patent/CN105706003B/zh active Active
- 2014-08-25 WO PCT/EP2014/067961 patent/WO2015036226A1/de not_active Ceased
- 2014-08-25 JP JP2016541865A patent/JP6703944B2/ja active Active
- 2014-08-25 KR KR1020167009359A patent/KR102343801B1/ko active Active
-
2016
- 2016-03-04 US US15/061,048 patent/US9915874B2/en active Active
-
2020
- 2020-05-11 JP JP2020083202A patent/JP7071436B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5361292A (en) * | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
| US6507440B1 (en) | 1999-07-09 | 2003-01-14 | Carl-Zeiss-Stiftung | Components with an anamorphotic effect for reducing an aspect ratio of a raster element in an illumination system |
| DE10317667A1 (de) | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| US20100231882A1 (en) | 2007-09-21 | 2010-09-16 | Carl Zeiss Smt Ag | Bundle-guiding optical collector for collecting the emission of a radiation source |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2020122989A (ja) | 2020-08-13 |
| WO2015036226A1 (de) | 2015-03-19 |
| JP2016535313A (ja) | 2016-11-10 |
| JP7071436B2 (ja) | 2022-05-18 |
| JP6703944B2 (ja) | 2020-06-03 |
| US9915874B2 (en) | 2018-03-13 |
| US20160187784A1 (en) | 2016-06-30 |
| CN105706003B (zh) | 2019-06-28 |
| KR102343801B1 (ko) | 2021-12-28 |
| KR20160054579A (ko) | 2016-05-16 |
| CN105706003A (zh) | 2016-06-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |