KR102312480B1 - 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법 - Google Patents

밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법 Download PDF

Info

Publication number
KR102312480B1
KR102312480B1 KR1020217019061A KR20217019061A KR102312480B1 KR 102312480 B1 KR102312480 B1 KR 102312480B1 KR 1020217019061 A KR1020217019061 A KR 1020217019061A KR 20217019061 A KR20217019061 A KR 20217019061A KR 102312480 B1 KR102312480 B1 KR 102312480B1
Authority
KR
South Korea
Prior art keywords
actuator
flow path
valve body
piezoelectric actuator
valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020217019061A
Other languages
English (en)
Korean (ko)
Other versions
KR20210079403A (ko
Inventor
토시히데 요시다
토모히로 나카타
츠토무 시노하라
토시유키 이나다
타카시 후나코시
Original Assignee
가부시키가이샤 후지킨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 후지킨 filed Critical 가부시키가이샤 후지킨
Publication of KR20210079403A publication Critical patent/KR20210079403A/ko
Application granted granted Critical
Publication of KR102312480B1 publication Critical patent/KR102312480B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F16K31/1225—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston with a plurality of pistons
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K7/00—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves
    • F16K7/12—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm
    • F16K7/14—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat
    • F16K7/17—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat the diaphragm being actuated by fluid pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
    • F16K31/007—Piezoelectric stacks
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F16K31/1221—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston one side of the piston being spring-loaded
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Fluid Mechanics (AREA)
  • Electrically Driven Valve-Operating Means (AREA)
  • Chemical Vapour Deposition (AREA)
  • Fluid-Driven Valves (AREA)
  • Lift Valve (AREA)
KR1020217019061A 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법 Active KR102312480B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2016-218093 2016-11-08
JP2016218093 2016-11-08
KR1020197015535A KR20190077477A (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법
PCT/JP2017/039729 WO2018088326A1 (ja) 2016-11-08 2017-11-02 バルブ装置、このバルブ装置を用いた流量制御方法および半導体製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020197015535A Division KR20190077477A (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법

Publications (2)

Publication Number Publication Date
KR20210079403A KR20210079403A (ko) 2021-06-29
KR102312480B1 true KR102312480B1 (ko) 2021-10-14

Family

ID=62110580

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020217019061A Active KR102312480B1 (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법
KR1020197015535A Ceased KR20190077477A (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020197015535A Ceased KR20190077477A (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법

Country Status (7)

Country Link
US (1) US11098819B2 (enExample)
EP (1) EP3540280A4 (enExample)
JP (2) JP6336692B1 (enExample)
KR (2) KR102312480B1 (enExample)
CN (1) CN109952459B (enExample)
TW (1) TWI671483B (enExample)
WO (1) WO2018088326A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11022224B2 (en) * 2016-11-30 2021-06-01 Fujikin Incorporated Valve device, flow control method using the same, and semiconductor manufacturing method
WO2018235900A1 (ja) 2017-06-22 2018-12-27 株式会社フジキン 流量制御装置および流量制御装置の流量制御方法
US11506290B2 (en) 2017-09-25 2022-11-22 Fujikin Incorporated Valve apparatus, flow rate adjusting method, fluid control apparatus, flow rate control method, semiconductor manufacturing apparatus, and semiconductor manufacturing method
US11536386B2 (en) * 2018-08-30 2022-12-27 Fujikin Incorporated Fluid control device
KR102542263B1 (ko) 2019-01-31 2023-06-13 가부시키가이샤 후지킨 밸브장치, 이 밸브장치를 사용한 유량 제어방법, 유체 제어장치, 반도체 제조방법, 및 반도체 제조장치
JP7308506B2 (ja) * 2019-01-31 2023-07-14 株式会社フジキン バルブ装置、このバルブ装置を用いた流量制御方法、半導体製造方法、および半導体製造装置
JP7352971B2 (ja) * 2019-01-31 2023-09-29 株式会社フジキン バルブ装置、流量制御方法、流体制御装置、半導体製造方法、および半導体製造装置
CN110307351A (zh) * 2019-07-10 2019-10-08 广东工业大学 一种压电陶瓷限流阀
US11079035B2 (en) * 2019-07-12 2021-08-03 Pivotal Systems Corporation Preloaded piezo actuator and gas valve employing the actuator
IL268254B2 (en) * 2019-07-24 2024-10-01 Ham Let Israel Canada Ltd Fluid-flow control device
JP7382054B2 (ja) * 2019-08-29 2023-11-16 株式会社フジキン バルブ装置および流量制御装置
US11927274B2 (en) 2019-11-25 2024-03-12 M-System Co., Ltd. Actuator and fluid control device
KR20230131613A (ko) 2022-03-07 2023-09-14 주식회사 코일넷 미생물 분뇨처리조가 구비된 변기
DE102022003518A1 (de) * 2022-09-23 2024-03-28 Vat Holding Ag Pneumatisches gaseinlassventil mit verstellbarem anschlag
JP2024158856A (ja) * 2023-04-28 2024-11-08 株式会社堀場エステック 流体制御弁、流体制御装置、及び、材料供給システム

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100812560B1 (ko) 2005-09-07 2008-03-13 씨케이디 가부시키 가이샤 유량 제어 밸브

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5092360A (en) 1989-11-14 1992-03-03 Hitachi Metals, Ltd. Flow rated control valve using a high-temperature stacked-type displacement device
JP3532273B2 (ja) * 1994-12-20 2004-05-31 株式会社コガネイ 流体圧作動弁装置
JPH10318385A (ja) 1997-05-21 1998-12-04 Hitachi Metals Ltd 金属ダイアフラム式流量調節弁
JP2001317646A (ja) 2000-05-08 2001-11-16 Smc Corp 圧電式流体制御弁
IT1320475B1 (it) 2000-06-30 2003-11-26 Fiat Ricerche Attuatore piezoelettrico autocompensato per una valvola di controllo.
AU2003211853A1 (en) * 2003-03-07 2004-09-28 Ckd Corporation Flow control valve
JP5054904B2 (ja) 2005-08-30 2012-10-24 株式会社フジキン ダイレクトタッチ型メタルダイヤフラム弁
JP4743763B2 (ja) * 2006-01-18 2011-08-10 株式会社フジキン 圧電素子駆動式金属ダイヤフラム型制御弁
JP4933936B2 (ja) * 2007-03-30 2012-05-16 株式会社フジキン 圧電素子駆動式制御弁
JP5082989B2 (ja) * 2008-03-31 2012-11-28 日立金属株式会社 流量制御装置、その検定方法及び流量制御方法
US20130000759A1 (en) * 2011-06-30 2013-01-03 Agilent Technologies, Inc. Microfluidic device and external piezoelectric actuator
US8783652B2 (en) * 2012-03-12 2014-07-22 Mps Corporation Liquid flow control for film deposition
JP5775110B2 (ja) * 2013-03-26 2015-09-09 株式会社フジキン 流量制御装置用の流量制御弁
JP6491878B2 (ja) 2014-12-25 2019-03-27 株式会社フジキン 流体制御器
KR20170125070A (ko) * 2015-03-13 2017-11-13 테크노프로브 에스.피.에이. 상이한 작동 조건 하에서 각각의 가이드 구멍 내에서 개선된 슬라이드 이동을 하고 테스트 헤드 내에서 프로브를 정확히 유지하는 수직형 프로브를 구비한 테스트 헤드
WO2018235900A1 (ja) * 2017-06-22 2018-12-27 株式会社フジキン 流量制御装置および流量制御装置の流量制御方法
US11506290B2 (en) * 2017-09-25 2022-11-22 Fujikin Incorporated Valve apparatus, flow rate adjusting method, fluid control apparatus, flow rate control method, semiconductor manufacturing apparatus, and semiconductor manufacturing method
US11512993B2 (en) * 2017-09-25 2022-11-29 Fujikin Incorporated Valve device, adjustment information generating method, flow rate adjusting method, fluid control system, flow rate control method, semiconductor manufacturing system and semiconductor manufacturing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100812560B1 (ko) 2005-09-07 2008-03-13 씨케이디 가부시키 가이샤 유량 제어 밸브

Also Published As

Publication number Publication date
EP3540280A1 (en) 2019-09-18
CN109952459B (zh) 2021-02-26
US20190285176A1 (en) 2019-09-19
TW201825817A (zh) 2018-07-16
CN109952459A (zh) 2019-06-28
JPWO2018088326A1 (ja) 2018-11-15
JP6336692B1 (ja) 2018-06-06
WO2018088326A1 (ja) 2018-05-17
KR20190077477A (ko) 2019-07-03
JP2018132195A (ja) 2018-08-23
US11098819B2 (en) 2021-08-24
EP3540280A4 (en) 2019-11-27
TWI671483B (zh) 2019-09-11
KR20210079403A (ko) 2021-06-29

Similar Documents

Publication Publication Date Title
KR102312480B1 (ko) 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법
JP6923220B2 (ja) バルブ装置、このバルブ装置を用いた流量制御方法および半導体製造方法
KR102398907B1 (ko) 밸브 장치
KR102259108B1 (ko) 밸브장치, 조정 정보 생성방법, 유량 조정방법, 유체 제어장치, 유량 제어방법, 반도체 제조장치 및 반도체 제조방법
JP7113529B2 (ja) バルブ装置、流量調整方法、流体制御装置、流量制御方法、半導体製造装置および半導体製造方法
KR102337975B1 (ko) 밸브 장치
US11174949B2 (en) Actuator and valve device using the same

Legal Events

Date Code Title Description
A107 Divisional application of patent
PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5