KR102193919B1 - 임프린트 장치 및 물품 제조 방법 - Google Patents

임프린트 장치 및 물품 제조 방법 Download PDF

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Publication number
KR102193919B1
KR102193919B1 KR1020170087574A KR20170087574A KR102193919B1 KR 102193919 B1 KR102193919 B1 KR 102193919B1 KR 1020170087574 A KR1020170087574 A KR 1020170087574A KR 20170087574 A KR20170087574 A KR 20170087574A KR 102193919 B1 KR102193919 B1 KR 102193919B1
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KR
South Korea
Prior art keywords
mold
substrate
imprint
imprint device
gas
Prior art date
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KR1020170087574A
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English (en)
Korean (ko)
Other versions
KR20180007331A (ko
Inventor
가즈키 나카가와
Original Assignee
캐논 가부시끼가이샤
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Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20180007331A publication Critical patent/KR20180007331A/ko
Application granted granted Critical
Publication of KR102193919B1 publication Critical patent/KR102193919B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)
KR1020170087574A 2016-07-12 2017-07-11 임프린트 장치 및 물품 제조 방법 KR102193919B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016137956A JP6808386B2 (ja) 2016-07-12 2016-07-12 インプリント装置および物品製造方法
JPJP-P-2016-137956 2016-07-12

Publications (2)

Publication Number Publication Date
KR20180007331A KR20180007331A (ko) 2018-01-22
KR102193919B1 true KR102193919B1 (ko) 2020-12-22

Family

ID=60995796

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170087574A KR102193919B1 (ko) 2016-07-12 2017-07-11 임프린트 장치 및 물품 제조 방법

Country Status (2)

Country Link
JP (1) JP6808386B2 (ja)
KR (1) KR102193919B1 (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012174809A (ja) * 2011-02-18 2012-09-10 Canon Inc インプリント装置及び物品の製造方法
JP2014056854A (ja) * 2012-09-11 2014-03-27 Dainippon Printing Co Ltd インプリント方法およびそれを実施するためのインプリント装置
JP2014212206A (ja) 2013-04-18 2014-11-13 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US7670534B2 (en) * 2005-09-21 2010-03-02 Molecular Imprints, Inc. Method to control an atmosphere between a body and a substrate
US20110140304A1 (en) * 2009-12-10 2011-06-16 Molecular Imprints, Inc. Imprint lithography template
JP2013026573A (ja) * 2011-07-25 2013-02-04 Canon Inc インプリント装置、および、物品の製造方法
WO2014112495A1 (ja) * 2013-01-17 2014-07-24 キヤノン株式会社 インプリント方法、およびインプリント装置
WO2014054749A1 (ja) * 2012-10-04 2014-04-10 大日本印刷株式会社 インプリント方法およびインプリント装置
JP5949430B2 (ja) * 2012-10-18 2016-07-06 富士通株式会社 インプリント装置及びインプリント方法
CN105706214B (zh) * 2013-11-06 2018-10-02 佳能株式会社 用于确定压印模具的图案的方法、压印方法和装置
JP6497839B2 (ja) * 2013-11-07 2019-04-10 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2016021442A (ja) * 2014-07-11 2016-02-04 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2016031952A (ja) * 2014-07-25 2016-03-07 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2016054231A (ja) * 2014-09-04 2016-04-14 キヤノン株式会社 インプリント装置
JP2016054232A (ja) * 2014-09-04 2016-04-14 キヤノン株式会社 インプリント装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012174809A (ja) * 2011-02-18 2012-09-10 Canon Inc インプリント装置及び物品の製造方法
JP2014056854A (ja) * 2012-09-11 2014-03-27 Dainippon Printing Co Ltd インプリント方法およびそれを実施するためのインプリント装置
JP2014212206A (ja) 2013-04-18 2014-11-13 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法

Also Published As

Publication number Publication date
KR20180007331A (ko) 2018-01-22
JP6808386B2 (ja) 2021-01-06
JP2018010941A (ja) 2018-01-18

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