KR102193919B1 - 임프린트 장치 및 물품 제조 방법 - Google Patents

임프린트 장치 및 물품 제조 방법 Download PDF

Info

Publication number
KR102193919B1
KR102193919B1 KR1020170087574A KR20170087574A KR102193919B1 KR 102193919 B1 KR102193919 B1 KR 102193919B1 KR 1020170087574 A KR1020170087574 A KR 1020170087574A KR 20170087574 A KR20170087574 A KR 20170087574A KR 102193919 B1 KR102193919 B1 KR 102193919B1
Authority
KR
South Korea
Prior art keywords
mold
substrate
imprint
imprint device
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020170087574A
Other languages
English (en)
Korean (ko)
Other versions
KR20180007331A (ko
Inventor
가즈키 나카가와
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20180007331A publication Critical patent/KR20180007331A/ko
Application granted granted Critical
Publication of KR102193919B1 publication Critical patent/KR102193919B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002—Component parts, details or accessories; Auxiliary operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • H01L21/027—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)
KR1020170087574A 2016-07-12 2017-07-11 임프린트 장치 및 물품 제조 방법 Active KR102193919B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2016-137956 2016-07-12
JP2016137956A JP6808386B2 (ja) 2016-07-12 2016-07-12 インプリント装置および物品製造方法

Publications (2)

Publication Number Publication Date
KR20180007331A KR20180007331A (ko) 2018-01-22
KR102193919B1 true KR102193919B1 (ko) 2020-12-22

Family

ID=60995796

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170087574A Active KR102193919B1 (ko) 2016-07-12 2017-07-11 임프린트 장치 및 물품 제조 방법

Country Status (2)

Country Link
JP (1) JP6808386B2 (enExample)
KR (1) KR102193919B1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7495814B2 (ja) * 2020-05-13 2024-06-05 キヤノン株式会社 インプリント装置、および物品の製造方法
KR102599372B1 (ko) 2021-04-21 2023-11-06 엘에스일렉트릭(주) 냉각 유닛을 구비한 배전반

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012174809A (ja) * 2011-02-18 2012-09-10 Canon Inc インプリント装置及び物品の製造方法
JP2014056854A (ja) * 2012-09-11 2014-03-27 Dainippon Printing Co Ltd インプリント方法およびそれを実施するためのインプリント装置
JP2014212206A (ja) 2013-04-18 2014-11-13 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US7316554B2 (en) * 2005-09-21 2008-01-08 Molecular Imprints, Inc. System to control an atmosphere between a body and a substrate
US20110140304A1 (en) * 2009-12-10 2011-06-16 Molecular Imprints, Inc. Imprint lithography template
JP2013026573A (ja) * 2011-07-25 2013-02-04 Canon Inc インプリント装置、および、物品の製造方法
WO2014112495A1 (ja) * 2013-01-17 2014-07-24 キヤノン株式会社 インプリント方法、およびインプリント装置
US10279538B2 (en) * 2012-10-04 2019-05-07 Dai Nippon Printing Co., Ltd. Imprinting method and imprinting apparatus
JP5949430B2 (ja) * 2012-10-18 2016-07-06 富士通株式会社 インプリント装置及びインプリント方法
JP6177346B2 (ja) * 2013-11-06 2017-08-09 キヤノン株式会社 インプリント用型のパターンの決定方法、インプリント方法及び装置
JP6497839B2 (ja) * 2013-11-07 2019-04-10 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2016021442A (ja) * 2014-07-11 2016-02-04 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2016031952A (ja) * 2014-07-25 2016-03-07 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2016054231A (ja) * 2014-09-04 2016-04-14 キヤノン株式会社 インプリント装置
JP2016054232A (ja) * 2014-09-04 2016-04-14 キヤノン株式会社 インプリント装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012174809A (ja) * 2011-02-18 2012-09-10 Canon Inc インプリント装置及び物品の製造方法
JP2014056854A (ja) * 2012-09-11 2014-03-27 Dainippon Printing Co Ltd インプリント方法およびそれを実施するためのインプリント装置
JP2014212206A (ja) 2013-04-18 2014-11-13 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法

Also Published As

Publication number Publication date
KR20180007331A (ko) 2018-01-22
JP6808386B2 (ja) 2021-01-06
JP2018010941A (ja) 2018-01-18

Similar Documents

Publication Publication Date Title
TWI649789B (zh) 壓印裝置、壓印方法及物品製造方法
KR102507668B1 (ko) 임프린트 장치, 임프린트 방법 및 물품 제조 방법
CN110554564B (zh) 压印装置、压印方法和物品制造方法
US11194249B2 (en) Molding apparatus for molding composition on substrate with mold, and article manufacturing method
US20260061691A1 (en) Imprint device, imprint method, storage medium, and article manufacturing method
US12332562B2 (en) Molding apparatus for molding composition on substrate using mold, molding method, and method for manufacturing article
JP6808386B2 (ja) インプリント装置および物品製造方法
WO2018088049A1 (ja) インプリント装置、インプリント方法、及び物品製造方法
KR102537179B1 (ko) 임프린트 장치, 임프린트 방법 및 물품의 제조 방법
TW202527063A (zh) 成形方法、成形裝置及物品製造方法
KR102422617B1 (ko) 임프린트 장치 및 물품 제조 방법
KR102452936B1 (ko) 임프린트 장치 및 물품 제조 방법
KR102397055B1 (ko) 임프린트 장치 및 물품 제조 방법
JP7091138B2 (ja) インプリント装置、インプリント方法、および物品製造方法
JP6700771B2 (ja) インプリント装置、及び物品の製造方法
JP2018029101A (ja) インプリント装置、および物品製造方法
US20250073963A1 (en) Imprint apparatus, imprint method, information processing apparatus and article manufacturing method
JP2019102606A (ja) インプリント方法、インプリント装置及び物品の製造方法
JP2019149482A (ja) 型を用いて基板上の組成物を成形する成形装置、および物品の製造方法
JP2025107931A (ja) インプリント装置、インプリント方法、および、物品製造方法
US20190285982A1 (en) Mold, imprint apparatus, and method of manufacturing article
JP2019117844A (ja) モールド、レプリカモールド、インプリント装置、および物品製造方法
KR20220168157A (ko) 성형 장치, 성형 방법 및 물품의 제조 방법
KR20190027911A (ko) 임프린트 장치 및 물품 제조 방법

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 6

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000