KR102164884B1 - 개별 지그의 전류를 제어하는 도금장치 - Google Patents

개별 지그의 전류를 제어하는 도금장치 Download PDF

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Publication number
KR102164884B1
KR102164884B1 KR1020200080185A KR20200080185A KR102164884B1 KR 102164884 B1 KR102164884 B1 KR 102164884B1 KR 1020200080185 A KR1020200080185 A KR 1020200080185A KR 20200080185 A KR20200080185 A KR 20200080185A KR 102164884 B1 KR102164884 B1 KR 102164884B1
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KR
South Korea
Prior art keywords
jig
plating
plating line
substrate
anode
Prior art date
Application number
KR1020200080185A
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English (en)
Korean (ko)
Inventor
배민수
Original Assignee
(주)네오피엠씨
배민수
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)네오피엠씨, 배민수 filed Critical (주)네오피엠씨
Priority to KR1020200080185A priority Critical patent/KR102164884B1/ko
Application granted granted Critical
Publication of KR102164884B1 publication Critical patent/KR102164884B1/ko
Priority to TW109146731A priority patent/TWI746330B/zh
Priority to CN202011613110.7A priority patent/CN113862760A/zh

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electroplating Methods And Accessories (AREA)
KR1020200080185A 2020-06-30 2020-06-30 개별 지그의 전류를 제어하는 도금장치 KR102164884B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020200080185A KR102164884B1 (ko) 2020-06-30 2020-06-30 개별 지그의 전류를 제어하는 도금장치
TW109146731A TWI746330B (zh) 2020-06-30 2020-12-29 控制個別夾具電流的電鍍裝置
CN202011613110.7A CN113862760A (zh) 2020-06-30 2020-12-30 控制个别夹具电流的电镀装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020200080185A KR102164884B1 (ko) 2020-06-30 2020-06-30 개별 지그의 전류를 제어하는 도금장치

Publications (1)

Publication Number Publication Date
KR102164884B1 true KR102164884B1 (ko) 2020-10-14

Family

ID=72847329

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200080185A KR102164884B1 (ko) 2020-06-30 2020-06-30 개별 지그의 전류를 제어하는 도금장치

Country Status (3)

Country Link
KR (1) KR102164884B1 (zh)
CN (1) CN113862760A (zh)
TW (1) TWI746330B (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102271818B1 (ko) 2021-01-22 2021-07-02 (주)네오피엠씨 도금조에 수용되는 도금액의 구리이온농도 자동 제어방법 및 제어시스템
KR102306782B1 (ko) * 2021-03-04 2021-09-30 (주)네오피엠씨 기판 개별 전류량 제어 시스템
KR102435753B1 (ko) * 2021-10-25 2022-08-25 임지훈 전해 도금 설비의 편차 개선 시스템

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010085638A (ko) * 2000-02-28 2001-09-07 다카노 야스아키 도금 장치
JP2006037134A (ja) * 2004-07-23 2006-02-09 Chuo Seisakusho Ltd 連続搬送式めっき装置の電流制御方法
KR20090049957A (ko) * 2007-11-14 2009-05-19 삼성전기주식회사 도금장치
KR20130035201A (ko) * 2011-09-29 2013-04-08 아루멕쿠스 피이 가부시키가이샤 연속 도금 장치
KR20130071861A (ko) 2011-12-21 2013-07-01 삼성전기주식회사 기판 도금 장치 및 그 제어 방법
KR101859395B1 (ko) 2017-10-18 2018-05-18 (주)네오피엠씨 기판 도금장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201485521U (zh) * 2009-08-14 2010-05-26 宁波华龙电子股份有限公司 集成电路引线框架的连续电镀装置
CN202246942U (zh) * 2011-08-29 2012-05-30 江阴康强电子有限公司 引线框架连续电镀装置
CN204982125U (zh) * 2015-08-24 2016-01-20 黄海 一种用于pcb垂直连续电镀生产线的阴极电流分段调节机构

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010085638A (ko) * 2000-02-28 2001-09-07 다카노 야스아키 도금 장치
JP2006037134A (ja) * 2004-07-23 2006-02-09 Chuo Seisakusho Ltd 連続搬送式めっき装置の電流制御方法
KR20090049957A (ko) * 2007-11-14 2009-05-19 삼성전기주식회사 도금장치
KR20130035201A (ko) * 2011-09-29 2013-04-08 아루멕쿠스 피이 가부시키가이샤 연속 도금 장치
KR20130071861A (ko) 2011-12-21 2013-07-01 삼성전기주식회사 기판 도금 장치 및 그 제어 방법
KR101859395B1 (ko) 2017-10-18 2018-05-18 (주)네오피엠씨 기판 도금장치

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102271818B1 (ko) 2021-01-22 2021-07-02 (주)네오피엠씨 도금조에 수용되는 도금액의 구리이온농도 자동 제어방법 및 제어시스템
KR102306782B1 (ko) * 2021-03-04 2021-09-30 (주)네오피엠씨 기판 개별 전류량 제어 시스템
KR102435753B1 (ko) * 2021-10-25 2022-08-25 임지훈 전해 도금 설비의 편차 개선 시스템

Also Published As

Publication number Publication date
TWI746330B (zh) 2021-11-11
TW202202663A (zh) 2022-01-16
CN113862760A (zh) 2021-12-31

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