KR102161580B1 - MoNb 타깃재 - Google Patents

MoNb 타깃재 Download PDF

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Publication number
KR102161580B1
KR102161580B1 KR1020180076244A KR20180076244A KR102161580B1 KR 102161580 B1 KR102161580 B1 KR 102161580B1 KR 1020180076244 A KR1020180076244 A KR 1020180076244A KR 20180076244 A KR20180076244 A KR 20180076244A KR 102161580 B1 KR102161580 B1 KR 102161580B1
Authority
KR
South Korea
Prior art keywords
target material
sputtering
monb
film
thin film
Prior art date
Application number
KR1020180076244A
Other languages
English (en)
Korean (ko)
Other versions
KR20190005120A (ko
Inventor
준 후쿠오카
다이스케 아오키
가즈야 사이토
히데 우에노
Original Assignee
히타치 긴조쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 히타치 긴조쿠 가부시키가이샤 filed Critical 히타치 긴조쿠 가부시키가이샤
Publication of KR20190005120A publication Critical patent/KR20190005120A/ko
Application granted granted Critical
Publication of KR102161580B1 publication Critical patent/KR102161580B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05—Metallic powder characterised by the size or surface area of the particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/045—Alloys based on refractory metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/04—Alloys based on tungsten or molybdenum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
KR1020180076244A 2017-07-05 2018-07-02 MoNb 타깃재 KR102161580B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2017131701 2017-07-05
JPJP-P-2017-131701 2017-07-05
JPJP-P-2017-199185 2017-10-13
JP2017199185 2017-10-13

Publications (2)

Publication Number Publication Date
KR20190005120A KR20190005120A (ko) 2019-01-15
KR102161580B1 true KR102161580B1 (ko) 2020-10-05

Family

ID=64989883

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180076244A KR102161580B1 (ko) 2017-07-05 2018-07-02 MoNb 타깃재

Country Status (4)

Country Link
JP (1) JP7110749B2 (zh)
KR (1) KR102161580B1 (zh)
CN (1) CN109207941B (zh)
TW (1) TWI674325B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210019170A (ko) 2019-08-12 2021-02-22 주식회사 리딩유아이 몰리브덴 합금 스퍼터링 타깃 및 이의 제조 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010095791A (ja) 2008-09-19 2010-04-30 Sanyo Special Steel Co Ltd ドリル加工性に優れたモリブデン合金成形体およびその製造方法
JP2013083000A (ja) * 2011-09-28 2013-05-09 Hitachi Metals Ltd 焼結Ｍｏ合金スパッタリングターゲット材の製造方法
JP2016188394A (ja) 2015-03-30 2016-11-04 日立金属株式会社 Ｍｏ合金ターゲット

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100398539B1 (ko) * 1998-06-29 2003-09-19 가부시끼가이샤 도시바 스퍼터 타겟
JP4432015B2 (ja) * 2001-04-26 2010-03-17 日立金属株式会社 薄膜配線形成用スパッタリングターゲット
US20050230244A1 (en) * 2004-03-31 2005-10-20 Hitachi Metals, Ltd Sputter target material and method of producing the same
CN102321871B (zh) * 2011-09-19 2013-03-20 基迈克材料科技（苏州）有限公司 热等静压生产平板显示器用钼合金溅射靶材的方法
CN102560383B (zh) * 2012-01-12 2013-10-23 宝鸡市科迪普有色金属加工有限公司 钼铌合金板靶材加工工艺
KR102316360B1 (ko) * 2013-10-29 2021-10-22 플란제 에스이 스퍼터링 타깃 및 제조방법
AT13602U3 (de) * 2013-10-29 2014-08-15 Plansee Se Sputtering Target und Verfahren zur Herstellung
JP6823799B2 (ja) * 2015-10-01 2021-02-03 日立金属株式会社 電子部品用積層配線膜および被覆層形成用スパッタリングターゲット材
AT15356U1 (de) * 2016-09-29 2017-07-15 Plansee Se Sputtering Target
CN109439990A (zh) * 2018-12-29 2019-03-08 宁波高新区敦和科技有限公司 一种高致密度高含量钼铌合金靶材的制备工艺

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010095791A (ja) 2008-09-19 2010-04-30 Sanyo Special Steel Co Ltd ドリル加工性に優れたモリブデン合金成形体およびその製造方法
JP2013083000A (ja) * 2011-09-28 2013-05-09 Hitachi Metals Ltd 焼結Ｍｏ合金スパッタリングターゲット材の製造方法
JP2016188394A (ja) 2015-03-30 2016-11-04 日立金属株式会社 Ｍｏ合金ターゲット

Also Published As

Publication number Publication date
KR20190005120A (ko) 2019-01-15
CN109207941A (zh) 2019-01-15
TWI674325B (zh) 2019-10-11
TW201907023A (zh) 2019-02-16
CN109207941B (zh) 2020-09-29
JP7110749B2 (ja) 2022-08-02
JP2019065383A (ja) 2019-04-25

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