KR102122293B1 - 마이크로렌즈 형성용 수지 조성물 - Google Patents

마이크로렌즈 형성용 수지 조성물 Download PDF

Info

Publication number
KR102122293B1
KR102122293B1 KR1020167018087A KR20167018087A KR102122293B1 KR 102122293 B1 KR102122293 B1 KR 102122293B1 KR 1020167018087 A KR1020167018087 A KR 1020167018087A KR 20167018087 A KR20167018087 A KR 20167018087A KR 102122293 B1 KR102122293 B1 KR 102122293B1
Authority
KR
South Korea
Prior art keywords
forming
resin composition
formula
group
copolymer
Prior art date
Application number
KR1020167018087A
Other languages
English (en)
Korean (ko)
Other versions
KR20160113593A (ko
Inventor
타카히로 사카구치
이사오 아다치
Original Assignee
닛산 가가쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 닛산 가가쿠 가부시키가이샤 filed Critical 닛산 가가쿠 가부시키가이샤
Publication of KR20160113593A publication Critical patent/KR20160113593A/ko
Application granted granted Critical
Publication of KR102122293B1 publication Critical patent/KR102122293B1/ko

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041Lenses
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L39/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen; Compositions of derivatives of such polymers
    • C08L39/04Homopolymers or copolymers of monomers containing heterocyclic rings having nitrogen as ring member
    • C08L39/06Homopolymers or copolymers of N-vinyl-pyrrolidones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/32Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36Amides or imides
    • C08F222/40Imides, e.g. cyclic imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36Amides or imides
    • C08F222/40Imides, e.g. cyclic imides
    • C08F222/402Alkyl substituted imides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020167018087A 2014-01-30 2015-01-09 마이크로렌즈 형성용 수지 조성물 KR102122293B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014015564 2014-01-30
JPJP-P-2014-015564 2014-01-30
PCT/JP2015/050510 WO2015115155A1 (ja) 2014-01-30 2015-01-09 マイクロレンズ形成用樹脂組成物

Publications (2)

Publication Number Publication Date
KR20160113593A KR20160113593A (ko) 2016-09-30
KR102122293B1 true KR102122293B1 (ko) 2020-06-12

Family

ID=53756732

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167018087A KR102122293B1 (ko) 2014-01-30 2015-01-09 마이크로렌즈 형성용 수지 조성물

Country Status (5)

Country Link
JP (1) JP6478053B2 (zh)
KR (1) KR102122293B1 (zh)
CN (1) CN105874355B (zh)
TW (1) TWI671350B (zh)
WO (1) WO2015115155A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6781964B2 (ja) * 2017-03-28 2020-11-11 株式会社ニコン 光学系及び光学機器
WO2021106423A1 (ja) 2019-11-26 2021-06-03 富士フイルム株式会社 組成物、膜、マイクロレンズ、固体撮像素子および表示装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012108460A (ja) * 2010-10-22 2012-06-07 Fujifilm Corp 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、及び、液晶表示装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0652321B2 (ja) * 1985-01-22 1994-07-06 旭硝子株式会社 有機光学材料
JP2776810B2 (ja) 1987-07-03 1998-07-16 ソニー株式会社 固体撮像装置の製造方法
JP3254759B2 (ja) 1992-09-25 2002-02-12 ソニー株式会社 光学素子およびオンチップレンズの製造方法
WO2010007915A1 (ja) * 2008-07-16 2010-01-21 日産化学工業株式会社 ポジ型レジスト組成物及びマイクロレンズの製造方法
JP5396315B2 (ja) * 2010-01-19 2014-01-22 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、及び、液晶表示装置
JP5623897B2 (ja) * 2010-01-22 2014-11-12 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、及び、液晶表示装置
US9052437B2 (en) * 2011-01-31 2015-06-09 Nissan Chemical Industries, Ltd. Photosensitive resin composition for forming microlens
KR101852528B1 (ko) * 2011-07-07 2018-04-27 닛산 가가쿠 고교 가부시키 가이샤 수지 조성물
US9029467B2 (en) 2011-09-05 2015-05-12 Nissan Chemical Industries, Ltd. Resin composition
JP6136491B2 (ja) * 2012-04-24 2017-05-31 Jsr株式会社 感放射線性樹脂組成物、表示素子用層間絶縁膜及びその形成方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012108460A (ja) * 2010-10-22 2012-06-07 Fujifilm Corp 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、及び、液晶表示装置

Also Published As

Publication number Publication date
CN105874355A (zh) 2016-08-17
TWI671350B (zh) 2019-09-11
CN105874355B (zh) 2020-04-10
WO2015115155A1 (ja) 2015-08-06
KR20160113593A (ko) 2016-09-30
TW201542665A (zh) 2015-11-16
JP6478053B2 (ja) 2019-03-06
JPWO2015115155A1 (ja) 2017-03-23

Similar Documents

Publication Publication Date Title
KR101852528B1 (ko) 수지 조성물
KR102122294B1 (ko) 수지 조성물
KR101626472B1 (ko) 수지 조성물
KR101935033B1 (ko) 비감광성 수지 조성물
KR102122293B1 (ko) 마이크로렌즈 형성용 수지 조성물
CN106663627B (zh) 平坦化膜用或微透镜用树脂组合物
KR20220098133A (ko) 비감광성 수지 조성물
CN113474684A (zh) 微透镜用感光性树脂组合物
US10752714B2 (en) Resin composition
TWI786237B (zh) 熱硬化性樹脂組成物

Legal Events

Date Code Title Description
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant