KR102116142B1 - 착색 감광성 수지 조성물 - Google Patents

착색 감광성 수지 조성물 Download PDF

Info

Publication number
KR102116142B1
KR102116142B1 KR1020120060957A KR20120060957A KR102116142B1 KR 102116142 B1 KR102116142 B1 KR 102116142B1 KR 1020120060957 A KR1020120060957 A KR 1020120060957A KR 20120060957 A KR20120060957 A KR 20120060957A KR 102116142 B1 KR102116142 B1 KR 102116142B1
Authority
KR
South Korea
Prior art keywords
group
meth
resin composition
photosensitive resin
mass
Prior art date
Application number
KR1020120060957A
Other languages
English (en)
Korean (ko)
Other versions
KR20120137268A (ko
Inventor
야스유키 기류
Original Assignee
스미또모 가가꾸 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미또모 가가꾸 가부시끼가이샤 filed Critical 스미또모 가가꾸 가부시끼가이샤
Publication of KR20120137268A publication Critical patent/KR20120137268A/ko
Application granted granted Critical
Publication of KR102116142B1 publication Critical patent/KR102116142B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020120060957A 2011-06-10 2012-06-07 착색 감광성 수지 조성물 KR102116142B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011129913A JP2012255963A (ja) 2011-06-10 2011-06-10 着色感光性樹脂組成物
JPJP-P-2011-129913 2011-06-10

Publications (2)

Publication Number Publication Date
KR20120137268A KR20120137268A (ko) 2012-12-20
KR102116142B1 true KR102116142B1 (ko) 2020-05-27

Family

ID=47303359

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120060957A KR102116142B1 (ko) 2011-06-10 2012-06-07 착색 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP2012255963A (ja)
KR (1) KR102116142B1 (ja)
CN (1) CN102819188B (ja)
TW (1) TWI596432B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170041808A (ko) * 2014-08-07 2017-04-17 스미또모 가가꾸 가부시끼가이샤 착색 감광성 수지 조성물

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102386493B1 (ko) * 2018-01-15 2022-04-14 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
KR102156478B1 (ko) * 2018-04-05 2020-09-16 주식회사 엘지화학 잔텐계 화합물, 이를 포함하는 감광성 수지 조성물, 감광재, 컬러필터, 및 디스플레이 장치

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4994136B2 (ja) * 2006-07-26 2012-08-08 富士フイルム株式会社 感光性組成物、感光性樹脂転写フイルム及びフォトスペーサーの製造方法並びに液晶表示装置用基板、及び液晶表示装置
JP5339686B2 (ja) * 2007-03-30 2013-11-13 富士フイルム株式会社 顔料分散組成物、硬化性組成物、並びにカラーフィルタ及びその製造方法
JP4985140B2 (ja) * 2007-06-21 2012-07-25 Ｊｓｒ株式会社 側鎖不飽和重合体、感放射線性樹脂組成物および液晶表示素子用スペーサー
KR101608292B1 (ko) * 2008-02-22 2016-04-01 후지필름 가부시키가이샤 착색 경화성 조성물, 착색 패턴, 컬러 필터, 컬러 필터의 제조 방법, 및 액정 표시 소자
JP5528677B2 (ja) * 2008-03-31 2014-06-25 富士フイルム株式会社 重合性組成物、固体撮像素子用遮光性カラーフィルタ、固体撮像素子および固体撮像素子用遮光性カラーフィルタの製造方法
JP2010085833A (ja) * 2008-10-01 2010-04-15 Dnp Fine Chemicals Co Ltd ブルーレジスト組成物
TWI475320B (zh) * 2009-02-13 2015-03-01 Sumitomo Chemical Co 著色感光性樹脂組成物及彩色濾光片
TWI488003B (zh) * 2009-03-17 2015-06-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
TW201111447A (en) * 2009-07-14 2011-04-01 Sumitomo Chemical Co Production method of pigment dispersion solution
TW201113303A (en) * 2009-10-07 2011-04-16 Sumitomo Chemical Co Colored photosensitive resin compositions
TWI491982B (zh) * 2009-10-28 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP5495991B2 (ja) * 2010-07-12 2014-05-21 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜及びその製造方法、カラーフィルタ、並びに、表示装置
JP5771944B2 (ja) * 2010-10-18 2015-09-02 Jsr株式会社 カラーフィルタの製造方法
JP5750953B2 (ja) * 2011-03-15 2015-07-22 Jsr株式会社 硬化膜の形成方法
JP5817562B2 (ja) * 2011-03-24 2015-11-18 Jsr株式会社 カラーフィルタ、カラーフィルタの製造方法および液晶表示素子
JP5708227B2 (ja) * 2011-05-16 2015-04-30 Jsr株式会社 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
JP5786445B2 (ja) * 2011-05-17 2015-09-30 Jsr株式会社 アレイ基板、液晶表示素子およびアレイ基板の製造方法
JP5786451B2 (ja) * 2011-05-19 2015-09-30 Jsr株式会社 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
JP2013041153A (ja) * 2011-08-17 2013-02-28 Fujifilm Corp フォトスペーサ用感光性樹脂組成物およびこれを用いたフォトスペーサ

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170041808A (ko) * 2014-08-07 2017-04-17 스미또모 가가꾸 가부시끼가이샤 착색 감광성 수지 조성물
KR102397163B1 (ko) 2014-08-07 2022-05-11 스미또모 가가꾸 가부시끼가이샤 착색 감광성 수지 조성물

Also Published As

Publication number Publication date
CN102819188B (zh) 2017-06-23
TW201312271A (zh) 2013-03-16
KR20120137268A (ko) 2012-12-20
JP2012255963A (ja) 2012-12-27
TWI596432B (zh) 2017-08-21
CN102819188A (zh) 2012-12-12

Similar Documents

Publication Publication Date Title
KR101946643B1 (ko) 착색 감광성 수지 조성물
JP6098113B2 (ja) 着色感光性樹脂組成物
JP5785810B2 (ja) 着色硬化性樹脂組成物
JP6461453B2 (ja) 赤色着色硬化性樹脂組成物
KR102202939B1 (ko) 착색 경화성 수지 조성물 및 컬러 필터 및 액정 표시 장치
KR102021617B1 (ko) 착색 감광성 수지 조성물
CN103838084B (zh) 感光性树脂组合物
KR102077702B1 (ko) 착색 경화성 수지 조성물, 컬러 필터 및 액정표시장치
JP2013104002A (ja) 着色硬化性樹脂組成物
JP6019596B2 (ja) 着色感光性樹脂組成物
KR102023779B1 (ko) 착색 경화성 수지 조성물
KR20130121732A (ko) 착색 감광성 수지 조성물
JP5825961B2 (ja) 着色感光性組成物
KR102116142B1 (ko) 착색 감광성 수지 조성물
JP6051689B2 (ja) 着色感光性樹脂組成物
TWI615680B (zh) 著色感光性樹脂組合物
KR102092965B1 (ko) 감광성 수지 조성물
TWI575318B (zh) 著色硬化性樹脂組成物
KR20220128471A (ko) 착색 경화성 조성물
KR20170003457A (ko) 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치
JP6047885B2 (ja) 着色感光性樹脂組成物
KR102092349B1 (ko) 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치
KR102455993B1 (ko) 착색 감광성 수지 조성물
KR102547226B1 (ko) 적색 착색 조성물
JP2013003283A (ja) 着色感光性樹脂組成物

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
AMND Amendment
J201 Request for trial against refusal decision
J301 Trial decision

Free format text: TRIAL NUMBER: 2018101004540; TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20181105

Effective date: 20200310

S901 Examination by remand of revocation
GRNO Decision to grant (after opposition)
GRNT Written decision to grant