KR102108408B1 - 온도 관리를 갖는 램프헤드를 구비하는 기판 처리 시스템 - Google Patents

온도 관리를 갖는 램프헤드를 구비하는 기판 처리 시스템 Download PDF

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Publication number
KR102108408B1
KR102108408B1 KR1020147032448A KR20147032448A KR102108408B1 KR 102108408 B1 KR102108408 B1 KR 102108408B1 KR 1020147032448 A KR1020147032448 A KR 1020147032448A KR 20147032448 A KR20147032448 A KR 20147032448A KR 102108408 B1 KR102108408 B1 KR 102108408B1
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South Korea
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lamp
monolithic member
reflector
disposed
passages
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Korean (ko)
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KR20150003841A (ko
Inventor
조셉 엠. 라니쉬
폴 브릴하트
사티쉬 쿱푸라오
동밍 이우
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어플라이드 머티어리얼스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00—Reflectors for light sources
    • F21V7/0083—Array of reflectors for a cluster of light sources, e.g. arrangement of multiple light sources in one plane

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020147032448A 2012-04-26 2013-04-22 온도 관리를 갖는 램프헤드를 구비하는 기판 처리 시스템 Active KR102108408B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201261638619P 2012-04-26 2012-04-26
US61/638,619 2012-04-26
US201261707938P 2012-09-29 2012-09-29
US61/707,938 2012-09-29
US13/865,672 2013-04-18
US13/865,672 US10202707B2 (en) 2012-04-26 2013-04-18 Substrate processing system with lamphead having temperature management
PCT/US2013/037585 WO2013163080A1 (en) 2012-04-26 2013-04-22 Substrate processing system with lamphead having temperature management

Publications (2)

Publication Number Publication Date
KR20150003841A KR20150003841A (ko) 2015-01-09
KR102108408B1 true KR102108408B1 (ko) 2020-05-08

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KR1020147032448A Active KR102108408B1 (ko) 2012-04-26 2013-04-22 온도 관리를 갖는 램프헤드를 구비하는 기판 처리 시스템

Country Status (6)

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US (1) US10202707B2 (enExample)
JP (1) JP6637312B2 (enExample)
KR (1) KR102108408B1 (enExample)
CN (1) CN104246969B (enExample)
TW (1) TWI646298B (enExample)
WO (1) WO2013163080A1 (enExample)

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US10053777B2 (en) * 2014-03-19 2018-08-21 Applied Materials, Inc. Thermal processing chamber
CN107620893A (zh) * 2017-08-31 2018-01-23 江苏米优光电科技有限公司 一种透气散热型户外全彩led贴片灯组及其生产工艺
KR102699383B1 (ko) 2019-04-18 2024-08-26 삼성전자주식회사 웨이퍼 클리닝 장치
US11680338B2 (en) * 2019-12-19 2023-06-20 Applied Materials, Inc. Linear lamp array for improved thermal uniformity and profile control
US12091749B2 (en) 2021-05-11 2024-09-17 Applied Materials, Inc. Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet
KR102811576B1 (ko) * 2021-05-11 2025-05-22 어플라이드 머티어리얼스, 인코포레이티드 에피택시 및 cvd 챔버용 가스 인젝터
US12060651B2 (en) 2021-05-11 2024-08-13 Applied Materials, Inc. Chamber architecture for epitaxial deposition and advanced epitaxial film applications
US20220367216A1 (en) * 2021-05-11 2022-11-17 Applied Materials, Inc. Multi-zone lamp heating and temperature monitoring in epitaxy process chamber
US12018372B2 (en) 2021-05-11 2024-06-25 Applied Materials, Inc. Gas injector for epitaxy and CVD chamber
JP7667310B2 (ja) * 2021-06-09 2025-04-22 アプライド マテリアルズ インコーポレイテッド 両口金形ランプを用いた軸対称加熱アセンブリレイアウト
CN115161764B (zh) * 2022-06-23 2024-02-06 江苏天芯微半导体设备有限公司 一种控温装置及其外延设备

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Also Published As

Publication number Publication date
WO2013163080A1 (en) 2013-10-31
US10202707B2 (en) 2019-02-12
CN104246969A (zh) 2014-12-24
CN104246969B (zh) 2019-06-11
TWI646298B (zh) 2019-01-01
KR20150003841A (ko) 2015-01-09
JP2015522939A (ja) 2015-08-06
US20130298832A1 (en) 2013-11-14
TW201350778A (zh) 2013-12-16
JP6637312B2 (ja) 2020-01-29

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