KR102104770B1 - 고분자 박막상에 디지털 미세 패턴들 연속 생성 - Google Patents

고분자 박막상에 디지털 미세 패턴들 연속 생성 Download PDF

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KR102104770B1
KR102104770B1 KR1020140086241A KR20140086241A KR102104770B1 KR 102104770 B1 KR102104770 B1 KR 102104770B1 KR 1020140086241 A KR1020140086241 A KR 1020140086241A KR 20140086241 A KR20140086241 A KR 20140086241A KR 102104770 B1 KR102104770 B1 KR 102104770B1
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patterned
liquid
thin film
liquid polymer
generating
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KR20150009924A (ko
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매튜 존슨 데이비드
알. 볼켈 아민
스티븐 파슈케위츠 존
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팔로 알토 리서치 센터 인코포레이티드
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/123—Ultraviolet light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
KR1020140086241A 2013-07-17 2014-07-09 고분자 박막상에 디지털 미세 패턴들 연속 생성 Active KR102104770B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/944,851 US9700869B2 (en) 2013-07-17 2013-07-17 Continuously producing digital micro-scale patterns on a thin polymer film
US13/944,851 2013-07-17

Publications (2)

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KR20150009924A KR20150009924A (ko) 2015-01-27
KR102104770B1 true KR102104770B1 (ko) 2020-04-28

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KR1020140086241A Active KR102104770B1 (ko) 2013-07-17 2014-07-09 고분자 박막상에 디지털 미세 패턴들 연속 생성

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US (1) US9700869B2 (enExample)
EP (1) EP2827193B1 (enExample)
JP (1) JP6424029B2 (enExample)
KR (1) KR102104770B1 (enExample)
CN (1) CN104291265B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10696210B2 (en) 2013-02-25 2020-06-30 Rensselaer Polytechnic Institute Low luminance lighting
JP6037914B2 (ja) * 2013-03-29 2016-12-07 富士フイルム株式会社 保護膜のエッチング方法およびテンプレートの製造方法
US9884437B2 (en) 2014-06-20 2018-02-06 Palo Alto Research Center Incorporated Integral vasculature
US9718914B2 (en) * 2015-08-31 2017-08-01 Palo Alto Research Center Incorporated Mechanically robust linked particle networks
CN106513278A (zh) * 2015-09-11 2017-03-22 新纶科技（常州）有限公司 紫外光固化机
US10384432B2 (en) 2016-02-19 2019-08-20 Palo Alto Research Center Incorporated Hierarchical laminates fabricated from micro-scale, digitally patterned films
CN107463069A (zh) * 2017-08-28 2017-12-12 中国科学技术大学 一种大面积连续辊动曝光装置及方法
NL2021092B1 (en) * 2018-06-08 2019-12-13 Qlayers Holding B V Application of a coating on a base structure
US11732378B2 (en) 2019-10-02 2023-08-22 Palo Alto Research Center Incorporated Three dielectric electrohydrodynamic patterning
WO2021087172A1 (en) * 2019-10-29 2021-05-06 Georgia Tech Research Corporation Methods and systems of obtaining patterned structures on surfaces
CN114602762B (zh) * 2022-02-26 2023-04-14 宁波大学 一种电场辅助功能涂层制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100675074B1 (ko) 1999-12-23 2007-01-29 유니버시티 오브 매사추세츠 막 상에 서브마이크론 패턴을 형성하기 위한 방법 및 장치
JP2007062095A (ja) 2005-08-30 2007-03-15 Ricoh Co Ltd プラスチック成形品の製造方法、及びその製造装置

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US6964793B2 (en) * 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
MY144124A (en) * 2002-07-11 2011-08-15 Molecular Imprints Inc Step and repeat imprint lithography systems
US7163611B2 (en) 2003-12-03 2007-01-16 Palo Alto Research Center Incorporated Concentration and focusing of bio-agents and micron-sized particles using traveling wave grids
JP2007050518A (ja) * 2005-08-12 2007-03-01 Ricoh Co Ltd プラスチック成形品の製造方法及びこの製造方法により製造されるプラスチック成形品
TWI345804B (en) * 2005-08-17 2011-07-21 Lg Chemical Ltd Patterning method using coatings containing ionic components
KR20080105193A (ko) * 2007-05-30 2008-12-04 박종수 전기수력학 공정에 의한 박막코팅 방법과 시스템
KR20090108853A (ko) * 2008-04-14 2009-10-19 삼성전자주식회사 무기물 패턴 형성용 조성물 및 그를 이용한 무기물패턴형성 방법
FR2972315B1 (fr) * 2011-03-04 2013-03-15 Commissariat Energie Atomique Actionneur electrostatique d'une structure mobile a relaxation amelioree des charges piegees
US10014261B2 (en) * 2012-10-15 2018-07-03 Palo Alto Research Center Incorporated Microchip charge patterning
CN103159164B (zh) * 2013-03-01 2015-08-05 西安交通大学 一种高深宽比微柱阵列的电场诱导压印方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100675074B1 (ko) 1999-12-23 2007-01-29 유니버시티 오브 매사추세츠 막 상에 서브마이크론 패턴을 형성하기 위한 방법 및 장치
JP2007062095A (ja) 2005-08-30 2007-03-15 Ricoh Co Ltd プラスチック成形品の製造方法、及びその製造装置

Also Published As

Publication number Publication date
US9700869B2 (en) 2017-07-11
JP2015020435A (ja) 2015-02-02
US20150021161A1 (en) 2015-01-22
JP6424029B2 (ja) 2018-11-14
CN104291265A (zh) 2015-01-21
EP2827193B1 (en) 2019-04-03
CN104291265B (zh) 2017-07-04
EP2827193A1 (en) 2015-01-21
KR20150009924A (ko) 2015-01-27

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