JP2015020435A - ポリマー薄膜にディジタル式のマイクロスケールのパターンを連続的に製造する方法 - Google Patents
ポリマー薄膜にディジタル式のマイクロスケールのパターンを連続的に製造する方法 Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultraviolet light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- General Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
Abstract
Description
Claims (3)
- 複数のマイクロスケールのパターニングされた構造体を連続的に製造する方法であって、
第1の表面上に液状薄膜を配置するステップと、
前記液状薄膜が前記第1の表面とこれに対向する第2の表面との間に画定された隙間領域を通過するように前記第1の表面を移動させるステップと、
前記液状薄膜が前記隙間領域を通過している間、前記液状薄膜が電気流体力学的(EHD)パターニング変形を受けるように前記隙間領域内に電界を生成するステップであって、これによって、前記液状薄膜の複数の部分がマイクロスケールのパターニングされた形状を有する複数のパターニングされた液体特徴を形成する、ステップと、
前記複数のパターニングされた液体特徴を固化するステップであって、前記複数のパターニングされた液体特徴の各々が前記マイクロスケールのパターニングされた形状を有する対応する固体のマイクロスケールのパターニングされた構造体を形成する、ステップと、
を含む方法。 - 複数の分離したマイクロスケールのパターニングされた粒子を生成する方法であって、
第1の表面上へ液状薄膜を配置するステップと、
前記液状薄膜が前記第1の表面とこれに対向する第2の表面との間に画定された隙間領域を通過するように前記第1の表面を移動させるステップと、
前記液状薄膜が前記隙間領域を通過している間、前記液状薄膜が電気流体力学的(EHD)パターニング変形を受けるように前記隙間領域内に電界を生成するステップであって、前記EHDパターニング変形によって前記液状薄膜が複数の個別の液体島に分裂される、ステップと、
前記複数の個別の液体島の各々が対応する固体のマイクロスケールのパターニングされた粒子を形成するように前記複数の個別の液体島を固化するステップと、
を含む方法。 - 複数のマイクロスケールのパターニングされた構造体を連続的に製造するための方法であって、
第1の移動表面と第2の移動表面の少なくとも一面上に可変電荷パターンを生成するステップであって、前記可変電荷パターンが前記第1の移動表面と第2の移動表面との間に画定された隙間領域内に電界を生成し、前記電界が、前記第1の移動表面に配置された液状薄膜が前記隙間領域を通過している間、前記液状薄膜が電気流体力学的(EHD)パターニング変形を受けるのに十分な強度を有し、これによって、前記液状薄膜の複数の部分がマイクロスケールのパターニングされた形状を有する複数のパターニングされた液体特徴を形成する、ステップと、
前記複数のパターニングされた液体特徴の各々が前記マイクロスケールのパターニングされた形状を有する対応する固体のマイクロスケールのパターニングされた構造体を形成するように前記複数のパターニングされた液体特徴を固化するステップと、
を含む方法。
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US13/944,851 | 2013-07-17 | ||
US13/944,851 US9700869B2 (en) | 2013-07-17 | 2013-07-17 | Continuously producing digital micro-scale patterns on a thin polymer film |
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JP2015020435A true JP2015020435A (ja) | 2015-02-02 |
JP2015020435A5 JP2015020435A5 (ja) | 2017-11-30 |
JP6424029B2 JP6424029B2 (ja) | 2018-11-14 |
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US (1) | US9700869B2 (ja) |
EP (1) | EP2827193B1 (ja) |
JP (1) | JP6424029B2 (ja) |
KR (1) | KR102104770B1 (ja) |
CN (1) | CN104291265B (ja) |
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JP7438072B2 (ja) | 2019-10-02 | 2024-03-01 | パロ アルト リサーチ センター,エルエルシー | 3つの誘電材料の電気流体力学的パターニング |
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US10696210B2 (en) | 2013-02-25 | 2020-06-30 | Rensselaer Polytechnic Institute | Low luminance lighting |
JP6037914B2 (ja) * | 2013-03-29 | 2016-12-07 | 富士フイルム株式会社 | 保護膜のエッチング方法およびテンプレートの製造方法 |
US9884437B2 (en) | 2014-06-20 | 2018-02-06 | Palo Alto Research Center Incorporated | Integral vasculature |
US9718914B2 (en) * | 2015-08-31 | 2017-08-01 | Palo Alto Research Center Incorporated | Mechanically robust linked particle networks |
CN106513278A (zh) * | 2015-09-11 | 2017-03-22 | 新纶科技(常州)有限公司 | 紫外光固化机 |
US10384432B2 (en) | 2016-02-19 | 2019-08-20 | Palo Alto Research Center Incorporated | Hierarchical laminates fabricated from micro-scale, digitally patterned films |
CN107463069A (zh) * | 2017-08-28 | 2017-12-12 | 中国科学技术大学 | 一种大面积连续辊动曝光装置及方法 |
NL2021092B1 (en) | 2018-06-08 | 2019-12-13 | Qlayers Holding B V | Application of a coating on a base structure |
US20220379544A1 (en) * | 2019-10-29 | 2022-12-01 | Georgia Tech Research Corporation | Methods and Systems of Obtaining Patterned Structures on Surfaces |
CN114602762B (zh) * | 2022-02-26 | 2023-04-14 | 宁波大学 | 一种电场辅助功能涂层制备方法 |
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JP2007050518A (ja) * | 2005-08-12 | 2007-03-01 | Ricoh Co Ltd | プラスチック成形品の製造方法及びこの製造方法により製造されるプラスチック成形品 |
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KR102104770B1 (ko) | 2020-04-28 |
EP2827193A1 (en) | 2015-01-21 |
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US9700869B2 (en) | 2017-07-11 |
KR20150009924A (ko) | 2015-01-27 |
EP2827193B1 (en) | 2019-04-03 |
CN104291265B (zh) | 2017-07-04 |
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