KR102079022B1 - 검사 레시피를 생성하는 방법 및 그 시스템 - Google Patents

검사 레시피를 생성하는 방법 및 그 시스템 Download PDF

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KR102079022B1
KR102079022B1 KR1020180108425A KR20180108425A KR102079022B1 KR 102079022 B1 KR102079022 B1 KR 102079022B1 KR 1020180108425 A KR1020180108425 A KR 1020180108425A KR 20180108425 A KR20180108425 A KR 20180108425A KR 102079022 B1 KR102079022 B1 KR 102079022B1
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data
segmentation
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KR20190029484A (ko
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아리엘 쉬카림
모세 암잘레그
이얄 네이스테인
실로모 투불
마크 게쉴
엘라드 코헨
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어플라이드 머티리얼즈 이스라엘 리미티드
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/36—Circuit design at the analogue level
    • G06F30/367—Design verification, e.g. using simulation, simulation program with integrated circuit emphasis [SPICE], direct methods or relaxation methods
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0006—Industrial image inspection using a design-rule based approach
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0008—Industrial image inspection checking presence/absence
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/10—Segmentation; Edge detection
    • G06T7/11—Region-based segmentation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20212—Image combination
    • G06T2207/20224—Image subtraction
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30168—Image quality inspection

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Quality & Reliability (AREA)
  • Computer Hardware Design (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020180108425A 2017-09-11 2018-09-11 검사 레시피를 생성하는 방법 및 그 시스템 Active KR102079022B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/701,371 US10290087B2 (en) 2017-09-11 2017-09-11 Method of generating an examination recipe and system thereof
US15/701,371 2017-09-11

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KR20190029484A KR20190029484A (ko) 2019-03-20
KR102079022B1 true KR102079022B1 (ko) 2020-02-19

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US (1) US10290087B2 (enExample)
JP (1) JP6629934B2 (enExample)
KR (1) KR102079022B1 (enExample)
CN (1) CN109558620B (enExample)
TW (1) TWI684000B (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10872406B2 (en) * 2018-04-13 2020-12-22 Taiwan Semiconductor Manufacturing Company, Ltd. Hot spot defect detecting method and hot spot defect detecting system
US10853932B2 (en) * 2019-01-16 2020-12-01 Applied Material Israel, Ltd. Method of defect detection on a specimen and system thereof
KR102433186B1 (ko) * 2019-04-12 2022-08-18 레고 에이/에스 안정성 체크 장치, 방법 및 컴퓨터 프로그램 제품
CN110148131B (zh) * 2019-05-28 2023-04-25 易诚高科（大连）科技有限公司 一种针对oled屏的mura检测方法
US11619592B2 (en) * 2019-07-09 2023-04-04 KLA Corp. Selecting defect detection methods for inspection of a specimen
US11120546B2 (en) 2019-09-24 2021-09-14 Kla Corporation Unsupervised learning-based reference selection for enhanced defect inspection sensitivity
US11615993B2 (en) * 2019-11-21 2023-03-28 Kla Corporation Clustering sub-care areas based on noise characteristics
JP7475901B2 (ja) * 2020-03-09 2024-04-30 アプライド マテリアルズ イスラエル リミテッド 試験片上の欠陥検出の方法およびそのシステム
US11022566B1 (en) * 2020-03-31 2021-06-01 Applied Materials Israel Ltd. Examination of a semiconductor specimen
US11631179B2 (en) * 2020-06-30 2023-04-18 Applied Materials Israel Ltd. Segmentation of an image of a semiconductor specimen
US11307150B2 (en) * 2020-08-17 2022-04-19 Applied Materials Israel Ltd. Automatic optimization of an examination recipe
US11828714B2 (en) * 2020-09-30 2023-11-28 Applied Materials Israel Ltd. Image acquisition by an electron beam examination tool for metrology measurement
KR20220118627A (ko) 2021-02-19 2022-08-26 장서희 들이쉼과 내쉼을 달리하는 마스크
US11887296B2 (en) * 2021-07-05 2024-01-30 KLA Corp. Setting up care areas for inspection of a specimen
IL288309B (en) * 2021-11-22 2022-05-01 Applied Materials Israel Ltd Mask testing for the production of semiconductor samples
CN114399508A (zh) * 2022-03-25 2022-04-26 杭州广立微电子股份有限公司 晶圆数据的处理方法、装置、电子装置和存储介质
WO2025196881A1 (ja) * 2024-03-18 2025-09-25 株式会社日立ハイテク 欠陥分類装置および欠陥分類方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000323541A (ja) 1999-05-13 2000-11-24 Tokyo Seimitsu Co Ltd 被検査物の外観検査方法及び装置
JP2006284433A (ja) * 2005-04-01 2006-10-19 Tokyo Seimitsu Co Ltd 外観検査装置及び外観検査方法
JP2008139202A (ja) 2006-12-04 2008-06-19 Tokyo Electron Ltd 欠陥検出装置、欠陥検出方法、情報処理装置、情報処理方法及びそのプログラム
US20090304244A1 (en) 2008-06-06 2009-12-10 Applied Spectral Imaging Ltd. Method and a system for presenting sections of a histological specimen

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3678133B2 (ja) * 2000-10-30 2005-08-03 株式会社日立製作所 検査システムおよび半導体デバイスの製造方法
JP4133047B2 (ja) * 2002-07-05 2008-08-13 シャープ株式会社 補正マスクパターン検証装置および補正マスクパターン検証方法
JP4233397B2 (ja) * 2002-10-01 2009-03-04 株式会社東京精密 画像欠陥検査方法、画像欠陥検査装置及び外観検査装置
JP2004354605A (ja) * 2003-05-28 2004-12-16 Matsushita Electric Ind Co Ltd 半導体設計レイアウトパタン生成方法および図形パタン生成装置
JP2006162954A (ja) * 2004-12-07 2006-06-22 Dainippon Screen Mfg Co Ltd パターン形成用データ
US7801353B2 (en) 2006-02-01 2010-09-21 Applied Materials Israel, Ltd. Method for defect detection using computer aided design data
WO2008077100A2 (en) * 2006-12-19 2008-06-26 Kla-Tencor Corporation Systems and methods for creating inspection recipes
JP5366110B2 (ja) * 2007-05-16 2013-12-11 独立行政法人産業技術総合研究所 マイクロリアクターおよびその製造方法
JP4799574B2 (ja) * 2008-02-29 2011-10-26 株式会社東芝 線状パターンの検知方法および装置
US8112241B2 (en) * 2009-03-13 2012-02-07 Kla-Tencor Corp. Methods and systems for generating an inspection process for a wafer
JP5498258B2 (ja) * 2010-05-20 2014-05-21 株式会社東芝 欠陥解析方法、欠陥解析装置、欠陥解析システム、およびプログラム
JP5460662B2 (ja) * 2011-09-07 2014-04-02 株式会社日立ハイテクノロジーズ 領域決定装置、観察装置または検査装置、領域決定方法および領域決定方法を用いた観察方法または検査方法
US9141730B2 (en) * 2011-09-12 2015-09-22 Applied Materials Israel, Ltd. Method of generating a recipe for a manufacturing tool and system thereof
US9599575B2 (en) 2012-02-07 2017-03-21 Applied Materials Israel, Ltd. System, a method and a computer program product for CAD-based registration
US9098891B2 (en) * 2013-04-08 2015-08-04 Kla-Tencor Corp. Adaptive sampling for semiconductor inspection recipe creation, defect review, and metrology
US9727047B2 (en) * 2014-10-14 2017-08-08 Kla-Tencor Corp. Defect detection using structural information
US10140698B2 (en) * 2015-08-10 2018-11-27 Kla-Tencor Corporation Polygon-based geometry classification for semiconductor mask inspection
TWI737659B (zh) * 2015-12-22 2021-09-01 以色列商應用材料以色列公司 半導體試樣的基於深度學習之檢查的方法及其系統
US10127651B2 (en) * 2016-01-15 2018-11-13 Kla-Tencor Corporation Defect sensitivity of semiconductor wafer inspectors using design data with wafer image data
CN106096217A (zh) * 2016-08-17 2016-11-09 北京道亨时代科技有限公司 一种配网线路的设计方法和设计系统
US10296702B2 (en) * 2017-03-15 2019-05-21 Applied Materials Israel Ltd. Method of performing metrology operations and system thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000323541A (ja) 1999-05-13 2000-11-24 Tokyo Seimitsu Co Ltd 被検査物の外観検査方法及び装置
JP2006284433A (ja) * 2005-04-01 2006-10-19 Tokyo Seimitsu Co Ltd 外観検査装置及び外観検査方法
JP2008139202A (ja) 2006-12-04 2008-06-19 Tokyo Electron Ltd 欠陥検出装置、欠陥検出方法、情報処理装置、情報処理方法及びそのプログラム
US20090304244A1 (en) 2008-06-06 2009-12-10 Applied Spectral Imaging Ltd. Method and a system for presenting sections of a histological specimen

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JP2019050376A (ja) 2019-03-28
TW201930862A (zh) 2019-08-01
KR20190029484A (ko) 2019-03-20
US10290087B2 (en) 2019-05-14
JP6629934B2 (ja) 2020-01-15
CN109558620B (zh) 2020-09-11
TWI684000B (zh) 2020-02-01
CN109558620A (zh) 2019-04-02
US20190080447A1 (en) 2019-03-14

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