IL288309B - Mask inspection for semiconductor specimen fabrication - Google Patents

Mask inspection for semiconductor specimen fabrication

Info

Publication number
IL288309B
IL288309B IL288309A IL28830921A IL288309B IL 288309 B IL288309 B IL 288309B IL 288309 A IL288309 A IL 288309A IL 28830921 A IL28830921 A IL 28830921A IL 288309 B IL288309 B IL 288309B
Authority
IL
Israel
Prior art keywords
mask inspection
specimen fabrication
semiconductor specimen
semiconductor
fabrication
Prior art date
Application number
IL288309A
Other languages
Hebrew (he)
Original Assignee
Applied Materials Israel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Israel Ltd filed Critical Applied Materials Israel Ltd
Priority to IL288309A priority Critical patent/IL288309B/en
Publication of IL288309B publication Critical patent/IL288309B/en
Priority to DE102022120297.6A priority patent/DE102022120297A1/en
Priority to TW111144379A priority patent/TW202331644A/en
Priority to KR1020220156223A priority patent/KR20230075369A/en
Priority to CN202211464692.6A priority patent/CN116152155A/en

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G06T5/20—Image enhancement or restoration using local operators
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/25—Determination of region of interest [ROI] or a volume of interest [VOI]
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20092—Interactive image processing based on input by user
    • G06T2207/20104—Interactive definition of region of interest [ROI]
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30121—CRT, LCD or plasma display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Analysis (AREA)
IL288309A 2021-11-22 2021-11-22 Mask inspection for semiconductor specimen fabrication IL288309B (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
IL288309A IL288309B (en) 2021-11-22 2021-11-22 Mask inspection for semiconductor specimen fabrication
DE102022120297.6A DE102022120297A1 (en) 2021-11-22 2022-08-11 MASK INSPECTION FOR THE PRODUCTION OF SEMICONDUCTOR SAMPLES
TW111144379A TW202331644A (en) 2021-11-22 2022-11-21 Mask inspection for semiconductor specimen fabrication
KR1020220156223A KR20230075369A (en) 2021-11-22 2022-11-21 Mask inspection for semiconductor specimen fabrication
CN202211464692.6A CN116152155A (en) 2021-11-22 2022-11-22 Mask inspection for semiconductor sample fabrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL288309A IL288309B (en) 2021-11-22 2021-11-22 Mask inspection for semiconductor specimen fabrication

Publications (1)

Publication Number Publication Date
IL288309B true IL288309B (en) 2022-05-01

Family

ID=81579365

Family Applications (1)

Application Number Title Priority Date Filing Date
IL288309A IL288309B (en) 2021-11-22 2021-11-22 Mask inspection for semiconductor specimen fabrication

Country Status (5)

Country Link
KR (1) KR20230075369A (en)
CN (1) CN116152155A (en)
DE (1) DE102022120297A1 (en)
IL (1) IL288309B (en)
TW (1) TW202331644A (en)

Also Published As

Publication number Publication date
KR20230075369A (en) 2023-05-31
CN116152155A (en) 2023-05-23
TW202331644A (en) 2023-08-01
DE102022120297A1 (en) 2023-05-25

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