IL288309B - בדיקת מסכה לייצור דגימות מוליכים למחצה - Google Patents

בדיקת מסכה לייצור דגימות מוליכים למחצה

Info

Publication number
IL288309B
IL288309B IL288309A IL28830921A IL288309B IL 288309 B IL288309 B IL 288309B IL 288309 A IL288309 A IL 288309A IL 28830921 A IL28830921 A IL 28830921A IL 288309 B IL288309 B IL 288309B
Authority
IL
Israel
Prior art keywords
mask inspection
specimen fabrication
semiconductor specimen
semiconductor
fabrication
Prior art date
Application number
IL288309A
Other languages
English (en)
Original Assignee
Applied Materials Israel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Israel Ltd filed Critical Applied Materials Israel Ltd
Priority to IL288309A priority Critical patent/IL288309B/he
Publication of IL288309B publication Critical patent/IL288309B/he
Priority to DE102022120297.6A priority patent/DE102022120297B4/de
Priority to TW111144379A priority patent/TW202331644A/zh
Priority to KR1020220156223A priority patent/KR20230075369A/ko
Priority to CN202211464692.6A priority patent/CN116152155B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G06T5/20—Image enhancement or restoration using local operators
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/25—Determination of region of interest [ROI] or a volume of interest [VOI]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20092—Interactive image processing based on input by user
    • G06T2207/20104—Interactive definition of region of interest [ROI]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30121—CRT, LCD or plasma display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Analysis (AREA)
IL288309A 2021-11-22 2021-11-22 בדיקת מסכה לייצור דגימות מוליכים למחצה IL288309B (he)

Priority Applications (5)

Application Number Priority Date Filing Date Title
IL288309A IL288309B (he) 2021-11-22 2021-11-22 בדיקת מסכה לייצור דגימות מוליכים למחצה
DE102022120297.6A DE102022120297B4 (de) 2021-11-22 2022-08-11 Maskeninspektion für die Herstellung von Halbleiter-Proben
TW111144379A TW202331644A (zh) 2021-11-22 2022-11-21 用於半導體取樣製造的遮罩檢查
KR1020220156223A KR20230075369A (ko) 2021-11-22 2022-11-21 반도체 시편 제조를 위한 마스크 검사
CN202211464692.6A CN116152155B (zh) 2021-11-22 2022-11-22 用于半导体样本制造的掩模检查

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL288309A IL288309B (he) 2021-11-22 2021-11-22 בדיקת מסכה לייצור דגימות מוליכים למחצה

Publications (1)

Publication Number Publication Date
IL288309B true IL288309B (he) 2022-05-01

Family

ID=81579365

Family Applications (1)

Application Number Title Priority Date Filing Date
IL288309A IL288309B (he) 2021-11-22 2021-11-22 בדיקת מסכה לייצור דגימות מוליכים למחצה

Country Status (5)

Country Link
KR (1) KR20230075369A (he)
CN (1) CN116152155B (he)
DE (1) DE102022120297B4 (he)
IL (1) IL288309B (he)
TW (1) TW202331644A (he)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120805510A (zh) * 2025-09-10 2025-10-17 江苏派恩新型材料有限公司 一种双向拉伸pet高光膜在线表面活化处理方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL309325B2 (he) * 2023-12-12 2024-12-01 Applied Materials Israel Ltd בחינה של פגמים בדגימות מוליך למחצה מבוססת התאמה

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104537666A (zh) * 2014-12-26 2015-04-22 中国科学院半导体研究所 一种芯片封装外观缺陷检测系统及方法
KR102561093B1 (ko) * 2015-11-30 2023-08-01 에스케이하이닉스 주식회사 반도체 장치의 결함 검출을 위한 필터 추출 장치 및 방법과, 이를 이용한 결함 검출 시스템
US10290087B2 (en) * 2017-09-11 2019-05-14 Applied Materials Israel Ltd. Method of generating an examination recipe and system thereof
US10957034B2 (en) * 2019-01-17 2021-03-23 Applied Materials Israel Ltd. Method of examination of a specimen and system thereof
US11348224B2 (en) * 2019-09-11 2022-05-31 Applied Materials Israel Ltd. Mask inspection of a semiconductor specimen
CN111340753B (zh) * 2019-12-30 2023-06-02 上海集成电路研发中心有限公司 一种晶圆检测装置、数据处理方法及存储介质

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120805510A (zh) * 2025-09-10 2025-10-17 江苏派恩新型材料有限公司 一种双向拉伸pet高光膜在线表面活化处理方法
CN120805510B (zh) * 2025-09-10 2025-11-25 江苏派恩新型材料有限公司 一种双向拉伸pet高光膜在线表面活化处理方法

Also Published As

Publication number Publication date
KR20230075369A (ko) 2023-05-31
DE102022120297B4 (de) 2025-07-24
DE102022120297A1 (de) 2023-05-25
CN116152155A (zh) 2023-05-23
CN116152155B (zh) 2025-07-25
TW202331644A (zh) 2023-08-01

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