KR102033673B1 - 조정가능한 전극을 갖는 증착 소스 - Google Patents

조정가능한 전극을 갖는 증착 소스 Download PDF

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Publication number
KR102033673B1
KR102033673B1 KR1020157023455A KR20157023455A KR102033673B1 KR 102033673 B1 KR102033673 B1 KR 102033673B1 KR 1020157023455 A KR1020157023455 A KR 1020157023455A KR 20157023455 A KR20157023455 A KR 20157023455A KR 102033673 B1 KR102033673 B1 KR 102033673B1
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South Korea
Prior art keywords
substrate
gas
coating drum
gas separation
deposition
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English (en)
Korean (ko)
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KR20150114974A (ko
Inventor
볼프강 부쉬베크
플로리안 리이즈
토비아스 슈톨리
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어플라이드 머티어리얼스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0068—Reactive sputtering characterised by means for confinement of gases or sputtered material, e.g. screens, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
KR1020157023455A 2013-01-31 2014-01-28 조정가능한 전극을 갖는 증착 소스 Active KR102033673B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13153493.5 2013-01-31
EP13153493.5A EP2762607B1 (en) 2013-01-31 2013-01-31 Deposition source with adjustable electrode
PCT/EP2014/051632 WO2014118177A1 (en) 2013-01-31 2014-01-28 Deposition source with adjustable electrode

Publications (2)

Publication Number Publication Date
KR20150114974A KR20150114974A (ko) 2015-10-13
KR102033673B1 true KR102033673B1 (ko) 2019-10-17

Family

ID=47747375

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KR1020157023455A Active KR102033673B1 (ko) 2013-01-31 2014-01-28 조정가능한 전극을 갖는 증착 소스

Country Status (7)

Country Link
US (1) US20140212599A1 (enExample)
EP (1) EP2762607B1 (enExample)
JP (1) JP6297597B2 (enExample)
KR (1) KR102033673B1 (enExample)
CN (1) CN104968830B (enExample)
TW (1) TWI619827B (enExample)
WO (1) WO2014118177A1 (enExample)

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CN104040023B (zh) * 2012-01-16 2016-04-13 株式会社爱发科 成膜装置
EP2762609B1 (en) * 2013-01-31 2019-04-17 Applied Materials, Inc. Apparatus and method for depositing at least two layers on a substrate
EP2762608B1 (en) * 2013-01-31 2019-10-02 Applied Materials, Inc. Gas separation by adjustable separation wall
EP2784176B1 (en) * 2013-03-28 2018-10-03 Applied Materials, Inc. Deposition platform for flexible substrates
CN104695201B (zh) * 2015-03-10 2016-09-21 渤扬复合面料科技(昆山)有限公司 翻转式电极组纺织品大气等离子处理机构及双面处理机构
FR3035122B1 (fr) * 2015-04-20 2017-04-28 Coating Plasma Ind Procede de traitement de surface d'un film en mouvement et installation pour la mise en oeuvre de ce procede
CN108603291B (zh) * 2016-02-12 2023-11-14 应用材料公司 真空处理系统和其方法
CN105549340B (zh) * 2016-02-24 2017-10-24 上海大学 卷对卷柔性衬底光刻方法和装置
CN106373868B (zh) * 2016-10-10 2020-03-10 昆山龙腾光电股份有限公司 一种阵列基板的制造方法
EP4596776A3 (en) * 2019-02-19 2025-10-29 Xefco Pty Ltd System for treatment and/or coating of substrates
WO2021185444A1 (en) * 2020-03-18 2021-09-23 Applied Materials, Inc. Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system
US11732345B2 (en) * 2020-06-04 2023-08-22 Applied Materials, Inc. Vapor deposition apparatus and method for coating a substrate in a vacuum chamber
US11905589B2 (en) * 2020-08-20 2024-02-20 Applied Materials, Inc. Material deposition apparatus having at least one heating assembly and method for pre- and/or post-heating a substrate
US20230137506A1 (en) * 2020-08-21 2023-05-04 Applied Materials, Inc. Processing system for processing a flexible substrate and method of measuring at least one of a property of a flexible substrate and a property of one or more coatings on the flexible substrate
CN116724142A (zh) * 2021-01-19 2023-09-08 芝浦机械株式会社 表面处理装置及表面处理方法
TWI788032B (zh) * 2021-09-28 2022-12-21 天虹科技股份有限公司 開合式遮蔽機構及具有開合式遮蔽機構的薄膜沉積機台
CN115874158B (zh) * 2021-09-28 2024-11-15 天虹科技股份有限公司 开合式遮蔽机构及薄膜沉积机台

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Also Published As

Publication number Publication date
EP2762607A1 (en) 2014-08-06
EP2762607B1 (en) 2018-07-25
TW201441403A (zh) 2014-11-01
JP6297597B2 (ja) 2018-03-20
CN104968830A (zh) 2015-10-07
KR20150114974A (ko) 2015-10-13
JP2016514198A (ja) 2016-05-19
US20140212599A1 (en) 2014-07-31
CN104968830B (zh) 2018-09-21
WO2014118177A1 (en) 2014-08-07
TWI619827B (zh) 2018-04-01

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