KR102028583B1 - 감광성 수지 조성물 - Google Patents

감광성 수지 조성물 Download PDF

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Publication number
KR102028583B1
KR102028583B1 KR1020140117176A KR20140117176A KR102028583B1 KR 102028583 B1 KR102028583 B1 KR 102028583B1 KR 1020140117176 A KR1020140117176 A KR 1020140117176A KR 20140117176 A KR20140117176 A KR 20140117176A KR 102028583 B1 KR102028583 B1 KR 102028583B1
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KR
South Korea
Prior art keywords
quantum dot
dot particles
formula
photosensitive resin
resin composition
Prior art date
Application number
KR1020140117176A
Other languages
English (en)
Korean (ko)
Other versions
KR20160028276A (ko
Inventor
김주호
박슬기
정보람
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020140117176A priority Critical patent/KR102028583B1/ko
Priority to TW104123986A priority patent/TWI655271B/zh
Priority to JP2015169089A priority patent/JP6718663B2/ja
Priority to CN201510547678.6A priority patent/CN105388702B/zh
Publication of KR20160028276A publication Critical patent/KR20160028276A/ko
Application granted granted Critical
Publication of KR102028583B1 publication Critical patent/KR102028583B1/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
KR1020140117176A 2014-09-03 2014-09-03 감광성 수지 조성물 KR102028583B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020140117176A KR102028583B1 (ko) 2014-09-03 2014-09-03 감광성 수지 조성물
TW104123986A TWI655271B (zh) 2014-09-03 2015-07-24 光敏樹脂組成物
JP2015169089A JP6718663B2 (ja) 2014-09-03 2015-08-28 感光性樹脂組成物
CN201510547678.6A CN105388702B (zh) 2014-09-03 2015-08-31 感光性树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140117176A KR102028583B1 (ko) 2014-09-03 2014-09-03 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
KR20160028276A KR20160028276A (ko) 2016-03-11
KR102028583B1 true KR102028583B1 (ko) 2019-10-04

Family

ID=55421125

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140117176A KR102028583B1 (ko) 2014-09-03 2014-09-03 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP6718663B2 (zh)
KR (1) KR102028583B1 (zh)
CN (1) CN105388702B (zh)
TW (1) TWI655271B (zh)

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JP6657684B2 (ja) * 2015-09-04 2020-03-04 Jsr株式会社 硬化膜形成用組成物、硬化膜、発光表示素子及び硬化膜の形成方法
JP2017078120A (ja) * 2015-10-20 2017-04-27 富士フイルム株式会社 重合性組成物、重合物、波長変換部材、バックライトユニット、および液晶表示装置
KR102419207B1 (ko) * 2016-03-22 2022-07-08 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
JP6758070B2 (ja) * 2016-03-31 2020-09-23 日鉄ケミカル＆マテリアル株式会社 遮光膜用感光性樹脂組成物、これを硬化させた遮光膜を備えたディスプレイ用基板、及びディスプレイ用基板の製造方法
KR101970724B1 (ko) 2016-06-14 2019-04-22 삼성에스디아이 주식회사 감광성 수지 조성물, 감광성 수지막 및 이를 이용한 컬러필터
EP3323870A1 (en) 2016-10-19 2018-05-23 Samsung Electronics Co., Ltd. Quantum dot-polymer composite film, method of manufacturing the same, and device including the same
EP3543750A4 (en) * 2016-11-16 2020-06-10 NS Materials Inc. ELEMENT CONTAINING QUANTUM DOTS, SHEET ELEMENT, BACKLIGHT DEVICE AND DISPLAY DEVICE
KR101976659B1 (ko) * 2016-12-12 2019-05-09 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
JP6695369B2 (ja) * 2017-02-16 2020-05-20 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
US10670962B2 (en) * 2017-02-20 2020-06-02 Samsung Electronics Co., Ltd. Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite pattern produced therefrom
KR101958414B1 (ko) * 2017-03-30 2019-03-14 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
CN107490934A (zh) * 2017-09-29 2017-12-19 陈超 一种uv阴图感光液的组合物
JP7024336B2 (ja) * 2017-11-10 2022-02-24 Dic株式会社 インク組成物、光変換層及びカラーフィルタ
JP7024383B2 (ja) * 2017-12-22 2022-02-24 Dic株式会社 インク組成物、光変換層及びカラーフィルタ
CN110297391B (zh) * 2018-03-21 2022-12-20 东友精细化工有限公司 光转换树脂组合物、光转换层叠基材及图像显示装置
TWI748172B (zh) * 2018-03-26 2021-12-01 南韓商東友精細化工有限公司 光轉換樹脂組合物
CN108864384B (zh) 2018-05-08 2020-09-15 纳晶科技股份有限公司 量子点分散树脂成型体、量子点分散胶体以及发光器件
KR102325836B1 (ko) 2018-11-06 2021-11-11 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
KR102409453B1 (ko) * 2019-03-04 2022-06-14 삼성에스디아이 주식회사 디스플레이 장치
KR102062352B1 (ko) * 2019-03-22 2020-01-03 동우 화인켐 주식회사 자발광 조성물, 이를 이용하여 제조된 광변환 적층 기재 및 이를 포함하는 표시 장치
KR102430661B1 (ko) * 2019-03-22 2022-08-09 동우 화인켐 주식회사 자발광 조성물, 이를 이용하여 제조된 광변환 적층 기재 및 이를 포함하는 표시 장치
FR3099295A1 (fr) 2019-07-23 2021-01-29 Commissariat A L'energie Atomique Et Aux Energies Alternatives Formulation de resine photosensible pour la conversion de couleurs
JP7227890B2 (ja) 2019-12-03 2023-02-22 信越化学工業株式会社 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子
JP2021161393A (ja) * 2020-03-31 2021-10-11 住友化学株式会社 硬化性樹脂組成物及び表示装置
KR20240011666A (ko) 2021-05-21 2024-01-26 디아이씨 가부시끼가이샤 잉크 조성물, 광 변환층, 컬러 필터 및 광 변환 필름

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Also Published As

Publication number Publication date
CN105388702B (zh) 2020-04-21
CN105388702A (zh) 2016-03-09
JP6718663B2 (ja) 2020-07-08
JP2016053716A (ja) 2016-04-14
KR20160028276A (ko) 2016-03-11
TW201610094A (zh) 2016-03-16
TWI655271B (zh) 2019-04-01

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