KR102011553B1 - 이물 검사 장치, 노광 장치 및 디바이스 제조 방법 - Google Patents

이물 검사 장치, 노광 장치 및 디바이스 제조 방법 Download PDF

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KR102011553B1
KR102011553B1 KR1020160002391A KR20160002391A KR102011553B1 KR 102011553 B1 KR102011553 B1 KR 102011553B1 KR 1020160002391 A KR1020160002391 A KR 1020160002391A KR 20160002391 A KR20160002391 A KR 20160002391A KR 102011553 B1 KR102011553 B1 KR 102011553B1
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light
foreign material
light receiving
inspection
arrangement
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Korean (ko)
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KR20160088801A (ko
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데페이 사가와
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
    • A63F3/00—Board games; Raffle games
    • A63F3/02—Chess; Similar board games
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
    • A63F13/00—Video games, i.e. games using an electronically generated display having two or more dimensions
    • A63F13/30—Interconnection arrangements between game servers and game devices; Interconnection arrangements between game devices; Interconnection arrangements between game servers
    • A63F13/32—Interconnection arrangements between game servers and game devices; Interconnection arrangements between game devices; Interconnection arrangements between game servers using local area network [LAN] connections
    • A63F13/327—Interconnection arrangements between game servers and game devices; Interconnection arrangements between game devices; Interconnection arrangements between game servers using local area network [LAN] connections using wireless networks, e.g. Wi-Fi® or piconet
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
    • A63F13/00—Video games, i.e. games using an electronically generated display having two or more dimensions
    • A63F13/80—Special adaptations for executing a specific game genre or game mode
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63F—CARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
    • A63F3/00—Board games; Raffle games
    • A63F3/02—Chess; Similar board games
    • A63F3/022—Recording or reproducing chess games
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F9/00—Arrangements for program control, e.g. control units
    • G06F9/06—Arrangements for program control, e.g. control units using stored programs, i.e. using an internal store of processing equipment to receive or retain programs
    • G06F9/44—Arrangements for executing specific programs
    • G—PHYSICS
    • G08—SIGNALLING
    • G08B—SIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS
    • G08B6/00—Tactile signalling systems, e.g. personal calling systems

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Software Systems (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020160002391A 2015-01-16 2016-01-08 이물 검사 장치, 노광 장치 및 디바이스 제조 방법 Active KR102011553B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015007187A JP6613029B2 (ja) 2015-01-16 2015-01-16 異物検査装置、露光装置及びデバイス製造方法
JPJP-P-2015-007187 2015-01-16

Publications (2)

Publication Number Publication Date
KR20160088801A KR20160088801A (ko) 2016-07-26
KR102011553B1 true KR102011553B1 (ko) 2019-08-16

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KR1020160002391A Active KR102011553B1 (ko) 2015-01-16 2016-01-08 이물 검사 장치, 노광 장치 및 디바이스 제조 방법

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JP (1) JP6613029B2 (enExample)
KR (1) KR102011553B1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI673491B (zh) * 2017-02-17 2019-10-01 特銓股份有限公司 光箱結構及應用彼光學檢測設備
JP7292842B2 (ja) * 2018-09-21 2023-06-19 キヤノン株式会社 異物検査装置、露光装置、および物品製造方法
JP7170491B2 (ja) * 2018-10-12 2022-11-14 キヤノン株式会社 異物検出装置、露光装置及び物品の製造方法
US12140870B2 (en) 2020-07-30 2024-11-12 Asml Holding N.V. Double-scanning opto-mechanical configurations to improve throughput of particle inspection systems
TWI839846B (zh) * 2022-09-15 2024-04-21 華洋精機股份有限公司 可用來判斷透明膜表面的瑕疵位於膜表或膜背的檢測方法及檢測系統

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000074849A (ja) * 1998-08-31 2000-03-14 Toshiba Corp 異物検出方法およびその装置
JP2014062771A (ja) * 2012-09-20 2014-04-10 Hitachi High-Technologies Corp 透明基板の欠陥検査装置及び方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0820371B2 (ja) * 1988-01-21 1996-03-04 株式会社ニコン 欠陥検査装置及び欠陥検査方法
JPH0527411A (ja) * 1991-07-23 1993-02-05 Nikon Corp 異物検査装置
JP3211538B2 (ja) * 1994-01-13 2001-09-25 キヤノン株式会社 検査装置及びそれを用いた半導体デバイスの製造方法
JP3480176B2 (ja) * 1996-03-18 2003-12-15 日立電子エンジニアリング株式会社 ガラス基板の表裏欠陥識別方法
JPH11135409A (ja) * 1997-10-29 1999-05-21 Nec Kyushu Ltd 異物検査除去装置
JP2004138470A (ja) * 2002-10-17 2004-05-13 Sony Corp 光透過性基板検査装置
US7274445B1 (en) * 2005-03-11 2007-09-25 Kla-Tencor Technologies Corporation Confocal scatterometer and method for single-sided detection of particles and defects on a transparent wafer or disk
KR20070038706A (ko) * 2005-10-06 2007-04-11 삼성전자주식회사 레티클 세정 장치 및 이를 갖는 기판 노광 장치
JP2011174817A (ja) * 2010-02-24 2011-09-08 Canon Inc 異物検査装置、露光装置及びデバイス製造方法
JP2015219085A (ja) * 2014-05-16 2015-12-07 東レエンジニアリング株式会社 基板検査装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000074849A (ja) * 1998-08-31 2000-03-14 Toshiba Corp 異物検出方法およびその装置
JP2014062771A (ja) * 2012-09-20 2014-04-10 Hitachi High-Technologies Corp 透明基板の欠陥検査装置及び方法

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JP6613029B2 (ja) 2019-11-27
JP2016133357A (ja) 2016-07-25
KR20160088801A (ko) 2016-07-26

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