KR101991216B1 - 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 - Google Patents
편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 Download PDFInfo
- Publication number
- KR101991216B1 KR101991216B1 KR1020187024359A KR20187024359A KR101991216B1 KR 101991216 B1 KR101991216 B1 KR 101991216B1 KR 1020187024359 A KR1020187024359 A KR 1020187024359A KR 20187024359 A KR20187024359 A KR 20187024359A KR 101991216 B1 KR101991216 B1 KR 101991216B1
- Authority
- KR
- South Korea
- Prior art keywords
- light
- polarizer
- shielding film
- polarizers
- thin
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
- G02F1/133548—Wire-grid polarisers
-
- G02F2001/133548—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Liquid Crystal (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2014-005220 | 2014-01-15 | ||
JP2014005220 | 2014-01-15 | ||
JP2014122212 | 2014-06-13 | ||
JPJP-P-2014-122212 | 2014-06-13 | ||
PCT/JP2015/050822 WO2015108075A1 (ja) | 2014-01-15 | 2015-01-14 | 偏光子、偏光子の製造方法、光配向装置および偏光子の装着方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020167016788A Division KR101919210B1 (ko) | 2014-01-15 | 2015-01-14 | 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20180098688A KR20180098688A (ko) | 2018-09-04 |
KR101991216B1 true KR101991216B1 (ko) | 2019-06-19 |
Family
ID=53542963
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020167016788A KR101919210B1 (ko) | 2014-01-15 | 2015-01-14 | 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 |
KR1020187024359A KR101991216B1 (ko) | 2014-01-15 | 2015-01-14 | 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020167016788A KR101919210B1 (ko) | 2014-01-15 | 2015-01-14 | 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP6455444B2 (zh) |
KR (2) | KR101919210B1 (zh) |
CN (1) | CN105874365B (zh) |
TW (2) | TWI564633B (zh) |
WO (1) | WO2015108075A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6312454B2 (ja) * | 2014-02-07 | 2018-04-18 | 株式会社ブイ・テクノロジー | 偏光光照射装置 |
JP6766370B2 (ja) * | 2015-02-18 | 2020-10-14 | 大日本印刷株式会社 | 偏光子、偏光子ホルダー、及び光配向装置 |
JP6884501B2 (ja) * | 2015-08-25 | 2021-06-09 | 大日本印刷株式会社 | 偏光子 |
JP6270927B2 (ja) * | 2016-07-08 | 2018-01-31 | 日本エイアンドエル株式会社 | めっき用樹脂組成物及びめっき成形品 |
JP2018017952A (ja) * | 2016-07-29 | 2018-02-01 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
JP2019109375A (ja) * | 2017-12-19 | 2019-07-04 | セイコーエプソン株式会社 | 偏光素子、偏光素子の製造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004271558A (ja) * | 2003-03-05 | 2004-09-30 | Ricoh Opt Ind Co Ltd | 偏光光学素子とその製造方法 |
JP2006126464A (ja) * | 2004-10-28 | 2006-05-18 | Ushio Inc | 偏光素子ユニット及び偏光光照射装置 |
JP2007114647A (ja) * | 2005-10-24 | 2007-05-10 | Ushio Inc | 光配向用偏光光照射装置 |
JP2007169716A (ja) * | 2005-12-22 | 2007-07-05 | Dainippon Printing Co Ltd | メタルマスク、メタルマスク位置アラインメント方法及び装置 |
JP2010078437A (ja) * | 2008-09-25 | 2010-04-08 | Toshiba Corp | 偏光状態検査装置および偏光状態検査方法 |
JP2011248284A (ja) * | 2010-05-31 | 2011-12-08 | Sony Chemical & Information Device Corp | 偏光板及び偏光板の製造方法 |
JP5344105B1 (ja) * | 2013-03-08 | 2013-11-20 | ウシオ電機株式会社 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5534574B2 (zh) | 1972-11-10 | 1980-09-08 | ||
JP2003131356A (ja) * | 2001-10-25 | 2003-05-09 | Hitachi Ltd | ホトマスクの製造方法および描画装置 |
KR100732749B1 (ko) * | 2001-12-28 | 2007-06-27 | 주식회사 하이닉스반도체 | 미세 패턴 형성용 마스크 |
US20040174596A1 (en) * | 2003-03-05 | 2004-09-09 | Ricoh Optical Industries Co., Ltd. | Polarization optical device and manufacturing method therefor |
KR100614651B1 (ko) * | 2004-10-11 | 2006-08-22 | 삼성전자주식회사 | 회로 패턴의 노광을 위한 장치 및 방법, 사용되는포토마스크 및 그 설계 방법, 그리고 조명계 및 그 구현방법 |
JP2007178763A (ja) | 2005-12-28 | 2007-07-12 | Seiko Epson Corp | 光学素子の製造方法、液晶装置、及び投射型表示装置 |
JP2008083215A (ja) * | 2006-09-26 | 2008-04-10 | Seiko Epson Corp | 配向膜製造用マスク及び液晶装置の製造方法 |
JP5109520B2 (ja) * | 2007-07-27 | 2012-12-26 | セイコーエプソン株式会社 | 光学素子、液晶装置、液晶装置用マザー基板、及び電子機器、並びにワイヤグリッド偏光素子 |
JP4968165B2 (ja) | 2008-04-24 | 2012-07-04 | ウシオ電機株式会社 | 光配向用偏光光照射装置 |
JP2013505482A (ja) * | 2009-09-22 | 2013-02-14 | エルジー・ケム・リミテッド | 光配向膜製造用紫外線高透過二重ワイヤグリッド偏光板及びその製造方法 |
JP2011186394A (ja) * | 2010-03-11 | 2011-09-22 | Toppan Printing Co Ltd | マスクパターンの白欠陥修正方法およびマスクパターン |
JP2011203669A (ja) * | 2010-03-26 | 2011-10-13 | Toppan Printing Co Ltd | 偏光露光装置 |
JP5682437B2 (ja) * | 2010-09-07 | 2015-03-11 | ソニー株式会社 | 固体撮像素子、固体撮像装置、撮像機器、及び、偏光素子の製造方法 |
US8873144B2 (en) * | 2011-05-17 | 2014-10-28 | Moxtek, Inc. | Wire grid polarizer with multiple functionality sections |
JP5077465B2 (ja) * | 2011-07-14 | 2012-11-21 | ウシオ電機株式会社 | 光配向用偏光光照射装置 |
JP4977794B2 (ja) * | 2011-09-21 | 2012-07-18 | 信越化学工業株式会社 | パターン転写方法およびフォトマスク |
JP2013145863A (ja) | 2011-11-29 | 2013-07-25 | Gigaphoton Inc | 2光束干渉装置および2光束干渉露光システム |
US8922890B2 (en) * | 2012-03-21 | 2014-12-30 | Moxtek, Inc. | Polarizer edge rib modification |
JP6248296B2 (ja) * | 2012-06-21 | 2017-12-20 | マクセル株式会社 | 光学素子、光学素子の製造方法および光学装置 |
JP6308816B2 (ja) * | 2013-03-07 | 2018-04-11 | 株式会社ブイ・テクノロジー | 光配向用偏光照射装置 |
JP6428171B2 (ja) * | 2013-11-13 | 2018-11-28 | 大日本印刷株式会社 | 偏光子、偏光子用基板および光配向装置 |
-
2015
- 2015-01-14 CN CN201580003710.2A patent/CN105874365B/zh active Active
- 2015-01-14 KR KR1020167016788A patent/KR101919210B1/ko active IP Right Grant
- 2015-01-14 JP JP2015557851A patent/JP6455444B2/ja active Active
- 2015-01-14 WO PCT/JP2015/050822 patent/WO2015108075A1/ja active Application Filing
- 2015-01-14 KR KR1020187024359A patent/KR101991216B1/ko active IP Right Review Request
- 2015-01-15 TW TW104101299A patent/TWI564633B/zh active
- 2015-01-15 TW TW105127436A patent/TWI612362B/zh active
-
2018
- 2018-09-19 JP JP2018175261A patent/JP6620854B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004271558A (ja) * | 2003-03-05 | 2004-09-30 | Ricoh Opt Ind Co Ltd | 偏光光学素子とその製造方法 |
JP2006126464A (ja) * | 2004-10-28 | 2006-05-18 | Ushio Inc | 偏光素子ユニット及び偏光光照射装置 |
JP2007114647A (ja) * | 2005-10-24 | 2007-05-10 | Ushio Inc | 光配向用偏光光照射装置 |
JP2007169716A (ja) * | 2005-12-22 | 2007-07-05 | Dainippon Printing Co Ltd | メタルマスク、メタルマスク位置アラインメント方法及び装置 |
JP2010078437A (ja) * | 2008-09-25 | 2010-04-08 | Toshiba Corp | 偏光状態検査装置および偏光状態検査方法 |
JP2011248284A (ja) * | 2010-05-31 | 2011-12-08 | Sony Chemical & Information Device Corp | 偏光板及び偏光板の製造方法 |
JP5344105B1 (ja) * | 2013-03-08 | 2013-11-20 | ウシオ電機株式会社 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI564633B (zh) | 2017-01-01 |
KR20180098688A (ko) | 2018-09-04 |
JPWO2015108075A1 (ja) | 2017-03-23 |
WO2015108075A1 (ja) | 2015-07-23 |
KR101919210B1 (ko) | 2018-11-15 |
JP6455444B2 (ja) | 2019-01-23 |
TWI612362B (zh) | 2018-01-21 |
JP2019008318A (ja) | 2019-01-17 |
KR20160105786A (ko) | 2016-09-07 |
TW201531776A (zh) | 2015-08-16 |
CN105874365B (zh) | 2019-08-09 |
CN105874365A (zh) | 2016-08-17 |
JP6620854B2 (ja) | 2019-12-18 |
TW201706688A (zh) | 2017-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101991216B1 (ko) | 편광자, 편광자의 제조 방법, 광 배향 장치 및 편광자의 장착 방법 | |
JP6093117B2 (ja) | フォトマスク、フォトマスクの製造方法及びパターンの転写方法 | |
CN110632823B (zh) | 光掩模及其制造方法、图案转印方法、显示装置的制造方法 | |
KR101593366B1 (ko) | 근접 노광용 포토 마스크 | |
KR102384667B1 (ko) | 포토마스크의 수정 방법, 포토마스크의 제조 방법, 포토마스크 및 표시 장치의 제조 방법 | |
JP2019008318A5 (zh) | ||
US8883372B2 (en) | Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns | |
JP6372205B2 (ja) | 偏光子、偏光子の製造方法、および光配向装置 | |
JP6554768B2 (ja) | 偏光子、積層基板、および光配向装置 | |
CN110703489A (zh) | 掩膜版和显示面板及其制备方法 | |
TWI461839B (zh) | 光罩及其製造方法、圖案轉印方法及護膜 | |
KR101346121B1 (ko) | 하프톤 패턴 및 광근접보정 패턴을 포함하는 포토 마스크 및 그 제조 방법 | |
JP6409295B2 (ja) | 偏光子および光配向装置 | |
JP6628121B2 (ja) | 偏光子の製造方法および電子線照射装置 | |
KR101926614B1 (ko) | 위상반전 마스크 | |
JP6884501B2 (ja) | 偏光子 | |
JPH07307278A (ja) | 投影露光装置 | |
TWI664455B (zh) | 偏振元件及光配向裝置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A107 | Divisional application of patent | ||
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
Z031 | Request for patent cancellation [new post grant opposition system introduced on 1 march 2017] | ||
Z072 | Maintenance of patent after cancellation proceedings: certified copy of decision transmitted [new post grant opposition system as of 20170301] | ||
Z131 | Decision taken on request for patent cancellation [new post grant opposition system as of 20170301] |