KR101923249B1 - 네거티브형 감광성 수지 조성물, 격벽 및 광학 소자 - Google Patents

네거티브형 감광성 수지 조성물, 격벽 및 광학 소자 Download PDF

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KR101923249B1
KR101923249B1 KR1020147005137A KR20147005137A KR101923249B1 KR 101923249 B1 KR101923249 B1 KR 101923249B1 KR 1020147005137 A KR1020147005137 A KR 1020147005137A KR 20147005137 A KR20147005137 A KR 20147005137A KR 101923249 B1 KR101923249 B1 KR 101923249B1
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KR
South Korea
Prior art keywords
group
solvent
compound
photosensitive resin
resin composition
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KR1020147005137A
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English (en)
Korean (ko)
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KR20140061429A (ko
Inventor
마사유키 가와시마
히데유키 다카하시
유타카 후루카와
고타로 야마다
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에이지씨 가부시키가이샤
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Publication of KR20140061429A publication Critical patent/KR20140061429A/ko
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Publication of KR101923249B1 publication Critical patent/KR101923249B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020147005137A 2011-08-30 2012-08-27 네거티브형 감광성 수지 조성물, 격벽 및 광학 소자 KR101923249B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011187764 2011-08-30
JPJP-P-2011-187764 2011-08-30
PCT/JP2012/071613 WO2013031737A1 (ja) 2011-08-30 2012-08-27 ネガ型感光性樹脂組成物、隔壁および光学素子

Publications (2)

Publication Number Publication Date
KR20140061429A KR20140061429A (ko) 2014-05-21
KR101923249B1 true KR101923249B1 (ko) 2018-11-28

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KR1020147005137A KR101923249B1 (ko) 2011-08-30 2012-08-27 네거티브형 감광성 수지 조성물, 격벽 및 광학 소자

Country Status (5)

Country Link
JP (1) JP6136928B2 (zh)
KR (1) KR101923249B1 (zh)
CN (1) CN103765314B (zh)
TW (1) TWI529492B (zh)
WO (1) WO2013031737A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014197153A (ja) * 2013-03-29 2014-10-16 三洋化成工業株式会社 感光性樹脂組成物
WO2015093415A1 (ja) * 2013-12-17 2015-06-25 旭硝子株式会社 ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子
KR102372955B1 (ko) * 2014-06-09 2022-03-10 에이지씨 가부시키가이샤 발잉크제, 네거티브형 감광성 수지 조성물, 격벽 및 광학 소자
JP6697222B2 (ja) * 2015-03-04 2020-05-20 太陽インキ製造株式会社 エッチングレジスト組成物およびドライフィルム
KR102541614B1 (ko) * 2015-03-04 2023-06-09 다이요 홀딩스 가부시키가이샤 에칭 레지스트 조성물 및 드라이 필름
WO2017170249A1 (ja) * 2016-03-28 2017-10-05 東レ株式会社 感光性樹脂組成物
KR102395742B1 (ko) * 2017-03-31 2022-05-09 동우 화인켐 주식회사 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
TWI662069B (zh) * 2018-07-11 2019-06-11 新應材股份有限公司 感光性組成物、彩色濾光片及彩色濾光片的製造方法
CN112889002A (zh) * 2018-10-12 2021-06-01 东丽株式会社 感光性树脂组合物、固化膜、及使用该固化膜的显示装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011065396A (ja) 2009-09-17 2011-03-31 Namco Bandai Games Inc プログラム、情報記憶媒体及びオブジェクト生成システム

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4671338B2 (ja) * 2005-06-27 2011-04-13 日本化薬株式会社 フッ素含有ポリシロキサン、それを用いる感光性樹脂組成物及びその硬化物
JP5162861B2 (ja) * 2005-09-29 2013-03-13 Ｊｎｃ株式会社 フッ素を含有した光硬化性重合体組成物
TW200722795A (en) * 2005-11-02 2007-06-16 Fujifilm Corp Substrate with dividing walls for an inkjet color filter, method for manufacturing the substrate, color filter including the substrate with dividing walls for an inkjet color filter and method of menufacturing the color filter, and liquid crystal display
CN101326452B (zh) * 2005-12-16 2011-09-07 富士胶片株式会社 滤色片用隔壁的制造方法、带有滤色片用隔壁的基板、显示元件用滤色片、以及显示装置
EP2312394B1 (en) * 2008-08-01 2012-12-05 Asahi Glass Company, Limited Negative working photosensitive composition, partition walls for an optical element using the negative working photosensitive composition, and optical element comprising the partition walls
CN101750890A (zh) * 2008-11-12 2010-06-23 住友化学株式会社 感光性黑色树脂组合物、黑底基板以及滤色器的制造方法
JP5329192B2 (ja) * 2008-11-27 2013-10-30 東京応化工業株式会社 感光性樹脂組成物
JP2011048195A (ja) * 2009-08-27 2011-03-10 Asahi Glass Co Ltd 光学素子隔壁形成用感光性組成物、これを用いたブラックマトリックスおよびその製造方法、並びにカラーフィルタオンアレイの製造方法
JP5501175B2 (ja) * 2009-09-28 2014-05-21 富士フイルム株式会社 分散組成物及びその製造方法、遮光性カラーフィルタ用感光性樹脂組成物及びその製造方法、遮光性カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5428910B2 (ja) * 2010-02-05 2014-02-26 三菱化学株式会社 アクティブ駆動型有機電界発光素子の隔壁用感光性組成物およびアクティブ駆動型有機電界発光表示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011065396A (ja) 2009-09-17 2011-03-31 Namco Bandai Games Inc プログラム、情報記憶媒体及びオブジェクト生成システム

Also Published As

Publication number Publication date
JPWO2013031737A1 (ja) 2015-03-23
CN103765314A (zh) 2014-04-30
TW201319752A (zh) 2013-05-16
WO2013031737A1 (ja) 2013-03-07
KR20140061429A (ko) 2014-05-21
TWI529492B (zh) 2016-04-11
CN103765314B (zh) 2018-02-16
JP6136928B2 (ja) 2017-05-31

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