KR101899418B1 - 재료 공급 장치용 필터 - Google Patents

재료 공급 장치용 필터 Download PDF

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Publication number
KR101899418B1
KR101899418B1 KR1020137032828A KR20137032828A KR101899418B1 KR 101899418 B1 KR101899418 B1 KR 101899418B1 KR 1020137032828 A KR1020137032828 A KR 1020137032828A KR 20137032828 A KR20137032828 A KR 20137032828A KR 101899418 B1 KR101899418 B1 KR 101899418B1
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South Korea
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filter
target
holes
hole
cross
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Korean (ko)
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KR20140036223A (ko
Inventor
이고르 브이. 포멘코브
윌리암 엔. 팔트로
게오르기 오. 바쉔코
윌리암 올드햄
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에이에스엠엘 네델란즈 비.브이.
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
    • B01D29/56—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Filtering Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020137032828A 2011-05-20 2012-03-20 재료 공급 장치용 필터 Active KR101899418B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/112,784 2011-05-20
US13/112,784 US9029813B2 (en) 2011-05-20 2011-05-20 Filter for material supply apparatus of an extreme ultraviolet light source
PCT/US2012/029838 WO2012161860A1 (en) 2011-05-20 2012-03-20 Filter for material supply apparatus

Publications (2)

Publication Number Publication Date
KR20140036223A KR20140036223A (ko) 2014-03-25
KR101899418B1 true KR101899418B1 (ko) 2018-10-04

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KR1020137032828A Active KR101899418B1 (ko) 2011-05-20 2012-03-20 재료 공급 장치용 필터

Country Status (7)

Country Link
US (2) US9029813B2 (OSRAM)
EP (1) EP2709743A4 (OSRAM)
JP (1) JP6117188B2 (OSRAM)
KR (1) KR101899418B1 (OSRAM)
CN (1) CN103561839B (OSRAM)
TW (1) TWI587903B (OSRAM)
WO (1) WO2012161860A1 (OSRAM)

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US9029813B2 (en) 2011-05-20 2015-05-12 Asml Netherlands B.V. Filter for material supply apparatus of an extreme ultraviolet light source
NL2009358A (en) * 2011-09-23 2013-03-26 Asml Netherlands Bv Radiation source.
JP2013140771A (ja) * 2011-12-09 2013-07-18 Gigaphoton Inc ターゲット供給装置
JP6087105B2 (ja) * 2012-10-23 2017-03-01 ギガフォトン株式会社 極端紫外光生成装置
JP6168797B2 (ja) * 2013-03-08 2017-07-26 ギガフォトン株式会社 極端紫外光生成装置
US9699876B2 (en) * 2013-03-14 2017-07-04 Asml Netherlands, B.V. Method of and apparatus for supply and recovery of target material
JP6426602B2 (ja) 2013-05-21 2018-11-21 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光の生成方法
JP6416766B2 (ja) 2013-08-01 2018-10-31 ギガフォトン株式会社 ターゲット供給装置
WO2015040674A1 (ja) 2013-09-17 2015-03-26 ギガフォトン株式会社 ターゲット供給装置およびｅｕｖ光生成装置
WO2015087454A1 (ja) * 2013-12-13 2015-06-18 ギガフォトン株式会社 ターゲット供給装置
US9611163B2 (en) * 2014-03-05 2017-04-04 Owens-Brockway Glass Container Inc. Process and apparatus for refining molten glass
WO2016071972A1 (ja) * 2014-11-05 2016-05-12 ギガフォトン株式会社 フィルタ構造体、ターゲット生成装置およびフィルタ構造体の製造方法
CN104493127B (zh) * 2014-12-18 2017-12-19 绍兴柯桥恒松针纺有限公司 一种压铸铝合金液的过滤装置
JP6513106B2 (ja) 2015-01-28 2019-05-15 ギガフォトン株式会社 ターゲット供給装置
JP6824985B2 (ja) * 2015-12-17 2021-02-03 エーエスエムエル ネザーランズ ビー．ブイ． Ｅｕｖソースのためのノズル及び液滴発生器
CN105771354B (zh) * 2016-03-04 2018-05-01 绍兴南燕染整有限公司 一种印染水液颗粒过滤装置
JP6237825B2 (ja) * 2016-05-27 2017-11-29 ウシオ電機株式会社 高温プラズマ原料供給装置および極端紫外光光源装置
CN106334365B (zh) * 2016-10-08 2018-03-09 黄正集 一种水能制氢用水体初步过滤除杂装置
US10499485B2 (en) 2017-06-20 2019-12-03 Asml Netherlands B.V. Supply system for an extreme ultraviolet light source
JP7078706B2 (ja) 2017-07-06 2022-05-31 インテグリス・インコーポレーテッド 炭化ケイ素フィルター膜および使用方法
US10437162B2 (en) * 2017-09-21 2019-10-08 Asml Netherlands B.V. Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system
US10331035B2 (en) * 2017-11-08 2019-06-25 Taiwan Semiconductor Manufacturing Co., Ltd. Light source for lithography exposure process
US20210028002A1 (en) * 2018-02-09 2021-01-28 Hamamatsu Photonics K.K. Sample supporting body, method for ionizing sample, and mass spectrometry method
US11404256B2 (en) 2018-02-09 2022-08-02 Hamamatsu Photonics K.K. Sample support, ionization method, and mass spectrometry method
NL2024077A (en) 2018-10-25 2020-05-13 Asml Netherlands Bv Target material supply apparatus and method
NL2024324A (en) * 2018-12-31 2020-07-10 Asml Netherlands Bv Apparatus for controlling introduction of euv target material into an euv chamber
JP7504114B2 (ja) * 2019-03-15 2024-06-21 エーエスエムエル ネザーランズ ビー．ブイ． Ｅｕｖ光源におけるターゲット材料制御
JP7660572B2 (ja) * 2019-12-17 2025-04-11 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外光源用のターゲット材料タンク
JP7491737B2 (ja) * 2020-05-21 2024-05-28 ギガフォトン株式会社 ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法
JP2022006351A (ja) * 2020-06-24 2022-01-13 ギガフォトン株式会社 ターゲット供給装置、ターゲット供給方法、及び電子デバイスの製造方法
CN112138452A (zh) * 2020-10-14 2020-12-29 杭州师范大学钱江学院 一种中药渣药液分离器及其分离方法
ES2938351B2 (es) * 2021-10-06 2024-03-12 Univ Navarra Publica Filtro de material cerámico electroconductor
CN116264753B (zh) * 2021-12-15 2025-09-12 北京锐德康科技有限公司 用于重频激光打靶的靶片及可装卸靶盘
US12214303B2 (en) * 2022-11-18 2025-02-04 Collins Engine Nozzles, Inc. Airfoil last chance screen utilizing EDM and AFM
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CN120677368A (zh) * 2023-08-08 2025-09-19 株式会社日立高新技术 过滤装置、过滤系统及过滤方法
WO2025224250A1 (de) * 2024-04-25 2025-10-30 Carl Zeiss Smt Gmbh Strahlführungseinsatz für eine quellkammer einer euv-strahlungsquelle

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Also Published As

Publication number Publication date
JP6117188B2 (ja) 2017-04-19
WO2012161860A1 (en) 2012-11-29
EP2709743A1 (en) 2014-03-26
KR20140036223A (ko) 2014-03-25
CN103561839A (zh) 2014-02-05
EP2709743A4 (en) 2015-05-27
US20120292527A1 (en) 2012-11-22
TW201304850A (zh) 2013-02-01
US20150209701A1 (en) 2015-07-30
CN103561839B (zh) 2017-03-01
JP2014522302A (ja) 2014-09-04
US9029813B2 (en) 2015-05-12
TWI587903B (zh) 2017-06-21
US9669334B2 (en) 2017-06-06

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