KR101858974B1 - 무빙 테이블의 저항력 상쇄 장치 - Google Patents

무빙 테이블의 저항력 상쇄 장치 Download PDF

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Publication number
KR101858974B1
KR101858974B1 KR1020167016863A KR20167016863A KR101858974B1 KR 101858974 B1 KR101858974 B1 KR 101858974B1 KR 1020167016863 A KR1020167016863 A KR 1020167016863A KR 20167016863 A KR20167016863 A KR 20167016863A KR 101858974 B1 KR101858974 B1 KR 101858974B1
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KR
South Korea
Prior art keywords
motor stator
pair
motor
moving table
decoupling
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KR1020167016863A
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English (en)
Korean (ko)
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KR20160089484A (ko
Inventor
리 리
푸챵 양
웨빈 주
Original Assignee
상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드
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Application filed by 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 filed Critical 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드
Publication of KR20160089484A publication Critical patent/KR20160089484A/ko
Application granted granted Critical
Publication of KR101858974B1 publication Critical patent/KR101858974B1/ko

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
KR1020167016863A 2013-11-26 2014-10-23 무빙 테이블의 저항력 상쇄 장치 KR101858974B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201310612812.7A CN104678711B (zh) 2013-11-26 2013-11-26 运动台反力抵消装置
CN201310612812.7 2013-11-26
PCT/CN2014/089224 WO2015078246A1 (zh) 2013-11-26 2014-10-23 运动台反力抵消装置

Publications (2)

Publication Number Publication Date
KR20160089484A KR20160089484A (ko) 2016-07-27
KR101858974B1 true KR101858974B1 (ko) 2018-05-17

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167016863A KR101858974B1 (ko) 2013-11-26 2014-10-23 무빙 테이블의 저항력 상쇄 장치

Country Status (5)

Country Link
KR (1) KR101858974B1 (zh)
CN (1) CN104678711B (zh)
SG (1) SG11201604203WA (zh)
TW (1) TWI541455B (zh)
WO (1) WO2015078246A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106933051B (zh) * 2015-12-31 2019-04-12 上海微电子装备（集团）股份有限公司 运动台装置、曝光装置及光刻机
DE102016106408B4 (de) * 2016-04-07 2019-08-29 Trumpf Werkzeugmaschinen Gmbh + Co. Kg Verfahren zur trennenden Bearbeitung eines plattenförmigen Materials in einer Lasermaschine sowie eine Lasermaschine zur trennenden Bearbeitung des plattenförmigen Materials, insbesondere zur Durchführung des Verfahrens
JP6423839B2 (ja) * 2016-09-26 2018-11-14 ファナック株式会社 機械振動抑制機能を備えた駆動装置、及び機械振動抑制機能を備えたシステム
CN109212909A (zh) * 2017-06-30 2019-01-15 上海微电子装备（集团）股份有限公司 一种反力外引机构、电机装置以及光刻机
WO2019029908A1 (en) * 2017-08-08 2019-02-14 Asml Netherlands B.V. VIBRATION ISOLATION SYSTEM AND LITHOGRAPHIC APPARATUS
CN109388029A (zh) * 2017-08-10 2019-02-26 上海微电子装备（集团）股份有限公司 一种掩模台系统及光刻机
CN107991901B (zh) * 2017-12-04 2020-12-25 中国科学院国家天文台南京天文光学技术研究所 音圈电机位移促动器仿真平台
CN109971629B (zh) * 2017-12-28 2022-07-22 长春长光华大智造测序设备有限公司 基因测序仪
CN110716391A (zh) * 2018-07-11 2020-01-21 上海微电子装备（集团）股份有限公司 大尺寸基板曝光机
CN113484540B (zh) * 2021-06-25 2024-04-16 中国科学院宁波材料技术与工程研究所 直线驱动装置及直线驱动装置系统误差的校正方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011029652A (ja) 2006-05-31 2011-02-10 Asml Netherlands Bv メトロロジーツール、リソグラフィ装置およびメトロロジーツールを備えるシステム、および、基板のパラメータを決定する方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3226704B2 (ja) * 1994-03-15 2001-11-05 キヤノン株式会社 露光装置
TWI230844B (en) * 2002-06-07 2005-04-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4095480B2 (ja) * 2003-03-28 2008-06-04 住友重機械工業株式会社 振動制御装置
JP2006049465A (ja) * 2004-08-03 2006-02-16 Nikon Corp 露光装置及びマイクロデバイスの製造方法
EP1803967B1 (de) * 2005-12-30 2016-08-03 Integrated Dynamics Engineering GmbH Schwingungsisolationssystem mit Störgrössenaufschaltung von vorhersehbaren Kraftstörungen
EP2045664B1 (en) * 2007-10-04 2013-03-06 ASML Netherlands B.V. Lithographic apparatus, projection assembly and active damping
US8164737B2 (en) * 2007-10-23 2012-04-24 Asml Netherlands B.V. Lithographic apparatus having an active damping subassembly
CN101364052B (zh) * 2008-10-08 2010-10-27 上海微电子装备有限公司 主动减振系统及其预见控制方法
CN103163738B (zh) * 2011-12-14 2015-03-25 上海微电子装备有限公司 用于补偿照明扫描向刀口驱动反力的装置及光刻设备
CN102522356B (zh) * 2011-12-15 2015-03-25 东莞华中科技大学制造工程研究院 双轴浮动定子线性平台

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011029652A (ja) 2006-05-31 2011-02-10 Asml Netherlands Bv メトロロジーツール、リソグラフィ装置およびメトロロジーツールを備えるシステム、および、基板のパラメータを決定する方法

Also Published As

Publication number Publication date
WO2015078246A1 (zh) 2015-06-04
CN104678711B (zh) 2017-06-27
TW201533348A (zh) 2015-09-01
KR20160089484A (ko) 2016-07-27
TWI541455B (zh) 2016-07-11
CN104678711A (zh) 2015-06-03
SG11201604203WA (en) 2016-07-28

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