TWI230844B - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method Download PDF

Info

Publication number
TWI230844B
TWI230844B TW92115242A TW92115242A TWI230844B TW I230844 B TWI230844 B TW I230844B TW 92115242 A TW92115242 A TW 92115242A TW 92115242 A TW92115242 A TW 92115242A TW I230844 B TWI230844 B TW I230844B
Authority
TW
Taiwan
Prior art keywords
manufacturing method
device manufacturing
lithographic apparatus
balance mass
mass bm
Prior art date
Application number
TW92115242A
Other versions
TW200408910A (en
Inventor
Henrikus Herman Marie Cox
Ballegoij Robertus Nicodem Van
Petrus Matthijs Henric Vosters
Sven Antoin Johan Hol
Sebastiaan Maria J Cornelissen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to EP02253970 priority Critical
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200408910A publication Critical patent/TW200408910A/en
Application granted granted Critical
Publication of TWI230844B publication Critical patent/TWI230844B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70766Reaction force control means, e.g. countermass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/44Movable or adjustable work or tool supports using particular mechanisms
    • B23Q1/56Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
    • B23Q1/58Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism a single sliding pair
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q11/00Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
    • B23Q11/0032Arrangements for preventing or isolating vibrations in parts of the machine
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70758Drive means, e.g. actuator, motor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
    • G03F7/70833Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression

Abstract

A lithographic projection apparatus in which a reaction force is generated between a balance mass BM and a substrate table WT. The balance mass BM is elastically coupled to the base frame BF with a suspension eigenfrequency of between 0.3 and 10 Hz.
TW92115242A 2002-06-07 2003-06-05 Lithographic apparatus and device manufacturing method TWI230844B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP02253970 2002-06-07

Publications (2)

Publication Number Publication Date
TW200408910A TW200408910A (en) 2004-06-01
TWI230844B true TWI230844B (en) 2005-04-11

Family

ID=30011230

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92115242A TWI230844B (en) 2002-06-07 2003-06-05 Lithographic apparatus and device manufacturing method

Country Status (6)

Country Link
US (2) US6906786B2 (en)
JP (1) JP3947501B2 (en)
KR (1) KR100522885B1 (en)
CN (1) CN1282903C (en)
SG (1) SG108317A1 (en)
TW (1) TWI230844B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7372549B2 (en) 2005-06-24 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6906786B2 (en) * 2002-06-07 2005-06-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100573665B1 (en) 2002-09-30 2006-04-24 에이에스엠엘 네델란즈 비.브이. Lithographic Apparatus and Device Manufacturing Method
US7126674B2 (en) * 2004-06-14 2006-10-24 Asml Netherlands B.V. Positioning device and device manufacturing method
US20090123853A1 (en) * 2004-06-25 2009-05-14 Nikon Corporation Aligning apparatus, aligning method, exposure apparatus, exposure method, and device manufacturing method
US7333179B2 (en) * 2004-08-13 2008-02-19 Nikon Corporation Moving mechanism with high bandwidth response and low force transmissibility
JP4041109B2 (en) * 2004-09-27 2008-01-30 株式会社東芝 Charged particle beam processing equipment
SG149819A1 (en) * 2004-09-30 2009-02-27 Nikon Corp Projection optical device and exposure apparatus
US7292317B2 (en) * 2005-06-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
US7751130B2 (en) * 2005-12-30 2010-07-06 Asml Holding N.V. Optical element damping systems
US7649613B2 (en) * 2006-03-03 2010-01-19 Asml Netherlands B.V. Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method
US8027023B2 (en) 2006-05-19 2011-09-27 Carl Zeiss Smt Gmbh Optical imaging device and method for reducing dynamic fluctuations in pressure difference
DE102006023876A1 (en) * 2006-05-19 2007-11-22 Carl Zeiss Smt Ag Optical imaging device
US7502103B2 (en) * 2006-05-31 2009-03-10 Asml Netherlands B.V. Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
EP1870614B1 (en) * 2006-06-23 2010-10-20 Integrated Dynamics Engineering GmbH Active vibration isolation system with improved sensor/actuator correlation
US7869001B2 (en) * 2006-11-08 2011-01-11 Asml Netherlands B.V. Eddy current damper, and lithographic apparatus having an eddy current damper
US7602562B2 (en) 2007-05-21 2009-10-13 Electro Scientific Industries, Inc. Fluid counterbalance for a laser lens used to scribe an electronic component substrate
US8044373B2 (en) * 2007-06-14 2011-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5008630B2 (en) * 2007-10-02 2012-08-22 エーエスエムエル ネザーランズ ビー.ブイ. Lithographic apparatus and device manufacturing method
EP2045664B1 (en) 2007-10-04 2013-03-06 ASML Netherlands B.V. Lithographic apparatus, projection assembly and active damping
DE102007059631B4 (en) 2007-12-10 2009-09-17 Integrated Dynamics Engineering Gmbh Vibration isolator for use in vacuum
DE102007063305A1 (en) * 2007-12-27 2009-07-02 Carl Zeiss Smt Ag Optical device with a spring device with a range of constant spring force
NL1036568A1 (en) 2008-03-18 2009-09-21 Asml Netherlands Bv Actuator system, lithographic apparatus, and device manufacturing method.
US8797509B2 (en) * 2008-05-29 2014-08-05 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
EP2202426A3 (en) * 2008-12-23 2017-05-03 ASML Netherlands B.V. A method for damping an object, an active damping system, and a lithographic apparatus
DE102009009221A1 (en) * 2009-02-17 2010-08-26 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography with an actuator system
NL2004281A (en) * 2009-03-19 2010-09-20 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2005309A (en) * 2009-10-13 2011-04-14 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US9864279B2 (en) * 2010-08-05 2018-01-09 Asml Netherlands B.V. Imprint lithography
DE102011006024A1 (en) * 2011-03-24 2012-09-27 Carl Zeiss Smt Gmbh Arrangement for vibration isolation of a payload
AT511551B1 (en) * 2011-05-18 2013-10-15 Univ Wien Tech Device and method for mechanical machining of a workpiece
WO2013036116A1 (en) * 2011-09-09 2013-03-14 Mapper Lithography Ip B.V. Support structure for wafer table
JP2014530478A (en) * 2011-09-09 2014-11-17 マッパー・リソグラフィー・アイピー・ビー.ブイ. Anti-vibration module and substrate processing system
NL2010628A (en) * 2012-04-27 2013-10-29 Asml Netherlands Bv Lithographic apparatus comprising an actuator, and method for protecting such actuator.
CN103472678B (en) * 2012-06-08 2015-07-22 上海微电子装备有限公司 Lithography and workpiece table system applied in lithography
CN103809384B (en) * 2012-11-12 2016-03-09 上海微电子装备有限公司 The workpiece stage and the mask stage and the common balance mass system lithography
US9529341B2 (en) * 2013-10-25 2016-12-27 Mitsubishi Electric Research Laboratories, Inc. Motion-control system for performing different tasks
CN104678711B (en) * 2013-11-26 2017-06-27 上海微电子装备有限公司 Motion stage reaction force canceling means
SG11201606276QA (en) * 2014-01-31 2016-08-30 Asml Netherlands Bv Stage positioning system and lithographic apparatus
PL2926941T3 (en) * 2014-04-03 2017-08-31 Bystronic Laser Ag Jet or beam processing device
CN104265827B (en) * 2014-09-08 2016-08-24 金坛市德博密封技术有限公司 An engine mounting damping mount for a three-dimensional
CN105487347A (en) * 2016-01-14 2016-04-13 哈尔滨工业大学 Spring-damping-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device
CN105487345A (en) * 2016-01-14 2016-04-13 哈尔滨工业大学 Electric-refrigeration-chip-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device
CN105549329A (en) * 2016-01-14 2016-05-04 哈尔滨工业大学 Electric refrigeration slice moving coil magnetic-suspension dual workpiece stage vector arc based stage exchanging method and device
CN105425552A (en) * 2016-01-14 2016-03-23 哈尔滨工业大学 Moving magnetic steel gas-magnetism combined air-suspension double-workpiece-stage vector circular-arc exchange method and device based on planar grating measurement
CN105629674A (en) * 2016-01-14 2016-06-01 哈尔滨工业大学 Vector arc stage switching method and device for double dual-layer water cooling-based dynamic magnetic steel type magnetic levitation workpiece stages
CN105487343A (en) * 2016-01-14 2016-04-13 哈尔滨工业大学 Plane-grating-measurement-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device
CN105487346A (en) * 2016-01-14 2016-04-13 哈尔滨工业大学 Electromagnetic-damping-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device
CN105527799A (en) * 2016-01-14 2016-04-27 哈尔滨工业大学 Plane grating measurement based vector circular arc stage change method and device of moving-coil magnetic suspension dual-workpiece stage
DE102016208008A1 (en) * 2016-05-10 2017-11-16 Carl Zeiss Smt Gmbh Bearing arrangement for a lithography system and lithography system
CN105957828B (en) * 2016-07-01 2019-07-02 广东工业大学 A kind of positioning system and its control method of platform
CN107859817B (en) * 2016-09-22 2019-08-09 大银微系统股份有限公司 Reaction force eliminates stage apparatus
NL2018108B1 (en) * 2016-12-30 2018-07-23 Mapper Lithography Ip Bv Adjustment assembly and substrate exposure system comprising such an adjustment assembly
TW201833685A (en) * 2016-12-30 2018-09-16 荷蘭商瑪波微影Ip公司 Adjustment assembly and substrate exposure system comprising such an adjustment assembly
US10048599B2 (en) 2016-12-30 2018-08-14 Mapper Lithography Ip B.V. Adjustment assembly and substrate exposure system comprising such an adjustment assembly
US9768722B1 (en) * 2017-01-25 2017-09-19 Hiwin Mikrosystem Corp. Reaction force counteracting device for a metrology tool
DE102017201598B4 (en) 2017-02-01 2019-02-14 Hiwin Mikrosystem Corp. Reaction force counteracting device for a metrological tool
WO2019043204A1 (en) * 2017-09-04 2019-03-07 Asml Netherlands B.V. Electron beam inspection apparatus stage positioning
CN109725498A (en) * 2017-10-31 2019-05-07 上海微电子装备(集团)股份有限公司 Balance quality device and lithography system

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9100407A (en) 1991-03-07 1992-10-01 Philips Nv An optical lithographic device with a machine frame offset force.
TW318255B (en) 1995-05-30 1997-10-21 Philips Electronics Nv
DE69629087T2 (en) 1995-05-30 2004-04-22 Asml Netherlands B.V. Positioning device with a reference frame for a measurement system
US5815246A (en) 1996-12-24 1998-09-29 U.S. Philips Corporation Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device
WO1998040791A1 (en) 1997-03-10 1998-09-17 Koninklijke Philips Electronics N.V. Positioning device having two object holders
JPH11315883A (en) 1998-04-30 1999-11-16 Canon Inc Vibration damping device, exposing device and manufacture of device
TWI264617B (en) 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
EP1111470B1 (en) 1999-12-21 2007-03-07 ASML Netherlands B.V. Lithographic apparatus with a balanced positioning system
US6906786B2 (en) * 2002-06-07 2005-06-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7372549B2 (en) 2005-06-24 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
KR100522885B1 (en) 2005-10-20
KR20040026096A (en) 2004-03-27
US20050190351A1 (en) 2005-09-01
US20040008331A1 (en) 2004-01-15
TW200408910A (en) 2004-06-01
JP2004134745A (en) 2004-04-30
CN1479174A (en) 2004-03-03
US6906786B2 (en) 2005-06-14
CN1282903C (en) 2006-11-01
US7072025B2 (en) 2006-07-04
SG108317A1 (en) 2005-01-28
JP3947501B2 (en) 2007-07-25

Similar Documents

Publication Publication Date Title
TWI266148B (en) Lithographic apparatus and device manufacturing method
TWI233427B (en) Silica by precipitation at constant alkali number, and its use
TW594389B (en) A polysiloxane, a process for preparing the same, a radiation-sensitive resin composition
TWI272448B (en) Orientation dependent shielding for use with dipole illumination techniques
TW335561B (en) Method of unsticking components of micro-mechanical devices (2)
TW577214B (en) Mobile telephone and method for its manufacture
TWI221601B (en) Configurable panel controller and flexible display interface
TW587135B (en) Vibration damper using magnetic circuit
TW498421B (en) Semiconductor device, electron beam drawing mask blank, electron beam drawing mask, and method of manufacturing the same
TW380099B (en) Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporing devices
TWI233257B (en) Piezoelectric vibrating plate, piezoelectric apparatus using piezoelectric vibrating plate, and portable phone and electronic device using piezoelectric apparatus
TW536763B (en) Device for supplying and returning wafer ring
TWI264308B (en) Hair treatment agent composition and method for producing the same
TW200520112A (en) Method for production of a film
TWI238295B (en) Lithographic apparatus and device manufacturing method
TWI222110B (en) Semiconductor device and production process thereof
TW200514132A (en) Exposure equipment, and component manufacture method
WO2002084736A8 (en) Microelectronic spring with additional protruding member
NZ596207A (en) Blower with one of lid and chassis made of metal and plastic composite
WO2003006873A8 (en) Apparatus and method for mounting a computer system in a vehicle
TW200502035A (en) Acrylic dispersing agents in nanocomposites
TW506146B (en) Reflector-containing semiconductor component
MXPA02003272A (en) Trifluoromethyl-substituted spirocyclic ketoenols and use thereof as pesticides and herbicides.
AU2003220530A1 (en) Silicon source reagent compositions, and method of making and using same for microelectronic device structure
TWI242479B (en) Gantry-type XY stage