JP3890127B2 - Stage apparatus, exposure apparatus using the same, and device manufacturing method - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an exposure apparatus used in a lithography process of semiconductor manufacturing, a stage apparatus used in various precision processing machines or various precision measuring instruments, and an exposure apparatus and device manufacturing method using the stage apparatus.
[0002]
[Prior art]
2. Description of the Related Art Conventionally, an apparatus called a stepper is known as an exposure apparatus used for manufacturing semiconductor devices. In this stepper, a pattern image formed on a reticle is reduced and projected onto a wafer with a projection lens while stepping the semiconductor wafer under the projection lens, and sequentially exposed to a plurality of locations on one wafer. Is.
[0003]
[Problems to be solved by the invention]
As for the semiconductor wafer processed by the exposure apparatus having such a configuration, a semiconductor wafer having a large diameter and a large size tends to be used in order to increase the area of the semiconductor element and reduce the cost. Further, there is a demand for a positioning device that can perform high-speed and high-precision alignment along with high integration of semiconductor elements.
[0004]
In order to meet the demands of high-speed, high-precision XY stages in response to the increase in the diameter of semiconductor wafers to be mounted, it is necessary to improve the dynamic characteristics of the XY stage and to increase the guide rigidity. The stage weight is inevitably increased more than the weight increase due to the stroke up. Furthermore, in order to increase the movement acceleration and movement speed of the XY stage in order to cope with higher throughput, and aiming to shorten the movement time, the large size of the apparatus by strengthening the structure is combined with a decrease in the relative rigidity of the structure of the stage movement. There is a problem that the cost is increased.
[0005]
In view of the problems of the prior art, the object of the present invention is to prevent transmission of vibration associated with increased stage excitation force with a simple configuration in a stage apparatus used in an exposure apparatus, various precision processing machines, or various precision measuring instruments. The purpose is to enable high-speed and high-precision positioning.
[0006]
[Means for Solving the Problems]
  In order to solve the above problems, a first preferred form of the stage apparatus of the present invention is:
  A first stage movable in a first direction on a reference plane including a vertical direction; first stage driving means for moving the first stage in the first direction; and intersecting the first direction on the reference plane DoIncluding vertical directionA second stage movable in a second direction, second stage driving means for moving the second stage in the second direction,A mechanism having a second mass body that moves in a direction opposite to the second stage and a second mass body driving unit that drives the second mass body, and the weight of the second stage and the second mass body; The stage device is characterized in that the second stage and the mass body are connected by a pulley and a belt so as to perform gravity compensation.
[0007]
  In addition, the second preferred form of the stage apparatus of the present invention is:
  A first stage movable in a first direction on a reference plane including a vertical direction; first stage driving means for moving the first stage in the first direction; and intersecting the first direction on the reference plane A second stage movable in a second direction including a vertical direction, second stage driving means for moving the second stage in the second direction, and a second mass body moving in a direction opposite to the second stage And a mechanism having a second mass body driving means for driving the second mass body, and a first cylinder mechanism for performing gravity compensation for the second stage, and performing gravity compensation for the second mass body. A second cylinder mechanism, and the first cylinder mechanism and the second cylinder mechanism are coupled so as to perform gravity compensation by balancing the weight of the second stage and the second mass body.Is a stage device characterized by
[0010]
  The third preferred embodiment of the stage apparatus of the present invention is
  In a direction including the vertical directionA movable stage; a mass body that moves in a direction opposite to the stage; a first cylinder mechanism connected to the stage; and a second cylinder mechanism connected to the mass body;The first cylinder mechanism supports the weight of the stage in the vertical direction, the second cylinder mechanism supports the weight of the mass body in the vertical direction, and balances the weight of the stage and the mass body to compensate for gravity. The stage device is characterized in that the first cylinder mechanism and the second cylinder mechanism are coupled to each other.It is.
[0012]
An exposure apparatus according to the present invention includes the stage device.
[0013]
The exposure apparatus is preferably an X-ray exposure apparatus.
[0014]
Furthermore, a device manufacturing method for manufacturing a device using the exposure apparatus is also included in the scope of the present invention.
[0015]
DETAILED DESCRIPTION OF THE INVENTION
<Embodiment 1>
FIG. 1 is a schematic front view of a vertical stage apparatus that best represents the features of the first embodiment of the present invention. In this apparatus, an inertial force applying means and a gravity compensating means are provided on a vertical XY stage that can move in the wafer surface while holding a wafer mounted in an X-ray exposure apparatus using synchrotron radiation in the vertical direction. It is characterized by that.
[0016]
In the figure, 1 is a surface plate for supporting a vertical stage device, 2 is a vibration damping damper for vibrating the surface plate 1, and 3 is a stage base supported by the surface plate 1 and having a reference surface for supporting the stage device. is there.
[0017]
A wafer chuck 4 holds the wafer. Reference numeral 5 denotes a main stage (first stage) that supports the wafer chuck 4 and is movable in the wafer plane (XY plane). The X measuring mirror 6 and the Y measuring mirror that serve as a reflecting surface for the position measuring beam on the end face. The mirror 7 is fixed.
[0018]
Reference numeral 8 denotes a Y stage guide fixed to the stage base 3. Reference numeral 9 denotes a Y stage base (second stage) on which the main stage 5 is mounted and movable in the Y direction. The Y stage guide 8 supports the Y stage base 9 in the X direction (first direction) and guides it in the Y direction (second direction) without contact.
[0019]
Reference numeral 10 denotes an X stage guide fixed to the Y stage base 9, which supports the main stage 5 in the Y direction and guides it in the X direction without contact.
[0020]
Here, in this embodiment, an air bearing is employed for non-contact guidance. However, the low friction guide is not limited to this.
[0021]
Reference numeral 51 denotes a mover of a linear motor (second stage drive means) that drives in the Y direction, which is fixed to the Y stage base 9 and faces a linear motor stator (not shown) provided in the Y stage guide 8. . Further, a movable element (not shown) of a linear motor (first stage driving means) that drives in the X direction is attached to the main stage 5, and faces the X linear motor stator 54 provided in the X stage guide 10. Yes.
[0022]
In both linear motors, it is desirable that the acting axis on which the thrust acts passes through the center of gravity of the driven body.
[0023]
Reference numeral 27 denotes an X mass body (first mass body) that applies an inertial force to the stage base 3 in the X direction. Reference numeral 28 denotes an X mass body guide guide fixed to the Y stage base 9 and guides the X mass body 27 in a non-contact manner so as to be driven in the X direction. The X mass body 27 moves in the X direction, thereby serving as an inertial force applying means in the X direction.
[0024]
Reference numeral 23 denotes a Y mass body (second mass body) that applies an inertial force to the stage base 3 in the Y direction. Reference numeral 24 denotes a Y mass body guide guide fixed to the stage base, which guides the Y mass body 23 in a non-contact manner so as to be driven in the X direction. Note that the Y mass body 23 moves in the Y direction, thereby serving as an inertial force applying means in the Y direction.
[0025]
Each mass body is attached with a mover (not shown) of a linear motor driven in a predetermined direction, and is opposed to a linear motor stator (not shown) provided in each guide, so that inertia force applying means (first 1 mechanism, 2nd mechanism). In both linear motors, it is desirable that the working axis on which the thrust acts passes through the center of gravity of the mass body.
[0026]
In addition, this embodiment employs a cylinder mechanism having a piston as a means for compensating for the gravity acting on the Y stage base.
[0027]
In the figure, 31 is a cylinder rod A fixed to the Y stage base 9, and the tip opposite to the Y stage base 9 is supported by a cylinder piston A32 (first cylinder mechanism). Reference numeral 33 denotes a cylinder rod B fixed to the Y mass body, and the tip opposite to the Y mass body 23 is supported by a cylinder piston B34 (second cylinder mechanism).
[0028]
Piston A32 and piston B34 seal the fluid in the air cylinder 35 of the connected structure. As a result, the weight of the Y stage base 9 supported by the piston A32 and the weight of the Y mass body 23 supported by the piston B34 are transmitted via the cylinder mechanism 35, and the two are balanced. It has become. As a result, gravity compensation of the Y stage base 9 is performed. The cylinder 35, the piston A32, and the piston B34 are, for example, non-contact so that they can move with extremely low frictional sliding.
[0029]
Here, “the weight of the Y stage base” represents “the total weight including the main stage moving in the Y direction together with the Y stage base, the X stage guide, the X mass body, the X mass body guide guide, and the like”. In addition, “the mass of the Y stage base” is treated as “the total mass including the object moving in the Y direction together with the Y stage base”, and the same applies to the following unless otherwise specified.
[0030]
The sectional area of the piston constituting the cylinder mechanism 35 is determined in consideration of the weight of the Y stage base 9 and the weight of the Y mass body 23. This will be described later.
[0031]
The driving signal of the mass body is obtained as follows. Assuming that the main stage 5 is driven in the X direction in the figure, the reaction force generated in the linear motor stator of the X stage guide 10 when the main stage 5 is driven is F._xThe resultant force of the reaction force generated on the stator of the linear motor (first mass body driving means) of the X mass body guide guide 28 when driving the X mass body 27 of the inertia force applying means is R_xAnd The inertial force applying means is F_xR to cancel_xIn order to act, the following equation should be satisfied.
[0032]
R_x= -F_x
[0033]
At this time, R_xIs the driving reaction force F of the main stage 5_xIf the inertial force imparting means is arranged so as to coincide with the action axis, no rotational torque is generated in the main stage 5. Arranging a plurality of X mass bodies 27 can increase the degree of freedom in designing so that the axis of action of the driving thrust acting on the main stage 5 passes through the position of the center of gravity. However, the number of X mass bodies 27 is not limited to a plurality.
[0034]
Here, the mass of the main stage 5 is M_x, The total mass of the X mass body 27 is m_xThen, the driving stroke s of the X mass body 27_xIs the stroke S in the X direction of the main stage_xAgainst M_xAnd m_xThe mass ratio is determined by the following formula.
[0035]
S_x/ S_x= 1 / (M_x/ M_x)
[0036]
That is, the movement amount ratio of the two moves with respect to the stage base 3 at a reciprocal of the mass ratio. Therefore, m_xIncreases the mass ratio M_x/ M_xIs smaller, the driving stroke s of the X mass body 27_xCan be designed small. However, since the moving mass in the Y direction including the X mass body 27 increases, the energy required for movement in the Y direction increases. Conversely, s_xCan be designed to be large, the mass m of the X mass 27_xCan be reduced, the moving mass in the Y direction is reduced, and the energy required for movement in the Y direction can be reduced.
[0037]
The same applies to the Y direction, and the Y mass body of the inertial force applying means may be driven so as to cancel the reaction force generated in the Y stage guide 8 when the Y stage base is driven in the Y direction. However, since the influence of gravity is large in the Y direction, the gravity compensation means acting on the Y stage base 9 and the Y mass body 23 is assumed to be working first. Ignore it and consider only the action of the driving means in the Y direction as in the case of the X direction described above.
[0038]
The resultant force of the reaction force generated in the Y stage guide 8 fixed to the stage base 3 when the Y stage base 9 is driven in the Y direction is F._yWhen the Y mass body 23 of the inertial force applying means is driven, the resultant force of the reaction force generated in the Y mass body guide guide fixed to the stage base is R_yAnd The inertial force applying means is F_yR to cancel_yIn order to act, the following equation should be satisfied.
[0039]
R_y= -F_y
[0040]
At this time, R_yThe axis of action is F_yIf the inertial force imparting means is arranged so as to coincide with the action axis, no rotational torque is generated in the stage base 3. In addition, arranging a plurality of Y mass bodies 23 can increase the degree of freedom in designing the operation axis of the driving thrust acting on the Y stage base 9 to pass through the position of the center of gravity. However, the number of Y mass bodies 23 is not limited to a plurality.
[0041]
Here, the mass of the Y stage base 9 is M_y, The total mass of the Y mass body 23 is m_yThen, the drive stroke s of the mass body_yIs the stroke S in the Y direction of the moving body in the Y direction_yAgainst M_yAnd m_yThe mass ratio is determined by the following formula.
[0042]
S_y/ S_y= 1 / (M_y/ M_y)
[0043]
That is, the movement amount ratio of the two moves with respect to the stage base 3 at a reciprocal of the mass ratio. Therefore, m_yIncreases the mass ratio M_y/ M_y, The driving stroke s of the Y mass body 23 is reduced._yCan be designed small.
[0044]
Next, the relationship between the balance of the Y stage base 9 and the Y mass body 23 by the cylinder mechanism 35 and the relationship between the piston cross-sectional area and the movement amount of the piston will be considered.
[0045]
FIG. 2 is a model diagram of a cylinder mechanism which is a gravity compensation unit of the first embodiment.
[0046]
In the cylinder mechanism 35, assuming that the cross-sectional areas of the piston A32 and the piston B34 are a and b, respectively, the mass M of the Y stage base 9 supported by the piston A32_yAnd the total mass m of the Y mass 23_yIs expressed by the following equation.
[0047]
a / b = M_y/ M_y
[0048]
However, when the Y stage base 9 and the Y mass body 23 are supported by a plurality of pistons, a and b are the sum of the cross-sectional areas of the pistons.
[0049]
The ratio of the movement amounts of the piston A32 and the piston B34 whose cross-sectional area ratio is determined by the above equation can be obtained by the following equation. Where S_PIs the amount of movement of piston A32, s_PIs the moving amount of the piston B34.
[0050]
S_P/ S_P= 1 / (a / b)
[0051]
That is, the cross-sectional area ratio a / b between the piston A32 that supports the weight of the Y stage base 9 and the piston B34 that supports the weight of the Y mass body 23 is the movement amount of the Y stage base 9 and the Y mass body 23. It is the reciprocal of the ratio.
[0052]
From these relational expressions, the ratio (S of the movement amount of the Y stage base 9 and the Y mass body 23 constituting the stage apparatus of this embodiment)_y/ S_y) And the ratio of the movement amount of the piston A32 and the piston B34 of the piston mechanism 35 which is the gravity compensation means (S_p/ S_p) Are equal. Since the ratios of the movement amounts are equal, the Y stage base 9 and the Y mass body 23 constituting the inertial force applying means can be connected to the gravity compensating means via the cylinder rod A31 and the cylinder rod B33. Therefore, the inertial force applying means and the gravity compensation means can be compatible with a simple configuration.
[0053]
At this time, the ratio of the cross-sectional area of the piston A32 and the cross-sectional area of the piston B34 is substantially equal to the mass ratio between the Y stage base 9 and the Y mass body 23.
[0054]
Here, in this embodiment, gas is used as the medium in the cylinder. However, the present invention is not limited to this as long as it has a similar function. For example, a hydraulic cylinder may be used.
[0055]
In this embodiment, the driving reaction force due to the main stage being driven in the X direction is reduced by the movement of the X mass body, and as a result, the excitation force to the stage base and the surface plate can be reduced. Furthermore, since the main stage and the X mass body move in the opposite directions with respect to the X direction at a ratio of the reciprocal of the mass ratio, there is also an effect that the change in the center of gravity of the entire stage apparatus hardly occurs. Therefore, deformation of the surface plate that supports the stage base can be suppressed. In particular, in the vertical stage as in this embodiment, suppressing the reaction force in the X direction and the change in the center of gravity position is advantageous for a high-speed and high-accuracy stage device because the change in load applied to the vibration isolation damper can be reduced. is there.
[0056]
In this embodiment, the driving reaction force due to the Y stage base being driven in the Y direction is reduced by the movement of the Y mass body, and as a result, the excitation force to the stage base and the surface plate can be reduced. it can. Further, since the Y stage base and the Y mass body move in the opposite directions with respect to the Y direction at a ratio of the reciprocal of the mass ratio, the change in the center of gravity of the entire stage apparatus hardly occurs. Therefore, deformation of the surface plate that supports the stage base can be suppressed. Further, by compensating the Y stage base's own weight with a coupled cylinder mechanism, the driving means and the gravity compensating means are compatible with each other with a simple configuration, and the stage can be driven with less energy and heat generation.
[0057]
<Embodiment 2>
FIG. 3 is a schematic front view of a vertical stage device representing the characteristics of the second embodiment of the present invention. In the numbers in the figure, the same members as those in the first embodiment in FIG.
[0058]
In the second embodiment, as in the case of the first embodiment, an inertial force applying unit and a gravity compensation unit are configured on a vertical XY stage.
[0059]
Since the operating principle, operating conditions, etc. of the main stage and inertial force applying means of the second embodiment are the same as those of the first embodiment, description thereof will be omitted.
[0060]
In the second embodiment, gravity compensation is performed by a pulley and a belt instead of the gravity compensation means by the cylinder mechanism.
[0061]
In FIG. 3, 41 is a belt for hanging the Y mass body 23 and the Y stage base 9, 42 is a fixed base fixed to the stage base 3, and 43 is a pulley unit disposed on the fixed base. As can be seen from the figure, since the belt 41 is hung on the pulley unit 43, the pulley unit 43 is configured to support the Y stage base 9 and the Y mass body 23 via the belt 41.
[0062]
FIG. 4 is a model diagram of a pulley unit which is a gravity compensation unit of the second embodiment.
[0063]
Since the pulley unit 43 is composed of pulleys having two diameters, two belts are required for one pulley unit, one end of the belt 41 is fixed to the pulley, and one end of the other belt is the Y stage base. 9 or Y mass body 23.
[0064]
In the second embodiment, paying attention to the pulley diameter ratio of the pulley unit 43, the weight balance between the Y stage base 9 and the Y mass body 23, and the relationship between the movement amount of the Y stage base 9 and the Y mass body 23 and the pulley diameter. think about.
[0065]
Here, the mass of the Y stage base 9 is My, and the total mass of the Y mass body 23 is my. In the pulley unit 43, the diameter of the pulley on which the belt 41 attached to the Y stage base 9 is hung is d, and the diameter of the pulley on which the belt 41 attached to the Y mass body 23 is hung is e. In this case, in order for the pulley unit 43 to balance the weight of the Y stage base 9 and the Y mass body 23, the pulley diameter ratio d / e of the pulley unit 43 is equal to the mass ratio M._y/ M_yAnd is expressed by the following equation.
[0066]
d / e = 1 / (M_y/ M_y)
[0067]
That is, the pulley diameter ratio of the pulley unit 43 is the reciprocal of the mass ratio of the Y stage base 9 and the Y mass body 23 supported by the pulley.
[0068]
Here, the movement amount S of the Y stage base 9 when the pulley is configured with the ratio of the pulley diameters._pAnd the moving amount s of the Y mass 23_pIs proportional to the diameter of each connected pulley, and is given by
[0069]
S_p/ S_p= D / e
[0070]
From these relational expressions, the ratio (S of the movement amount of the Y stage base 9 and the Y mass body 23 constituting the stage apparatus of the present embodiment (S_y/ S_y) And the ratio of the movement amount of the Y stage base 9 and the Y mass body 23 of the gravity compensation means composed of the pulley unit 43 (S_p/ S_p) Are equal. Since the ratios of the movement amounts are equal, the Y stage base 9 and the Y mass body 23 constituting the inertial force applying means can be connected to the pulley of the gravity compensating means via the belt 41. Therefore, the inertial force applying means and the gravity compensation means can be compatible with a simple configuration.
[0071]
In this embodiment, a belt is used for the gravity compensation mechanism. However, the belt is not limited to this as long as it has the same effect. For example, a wire may be used.
[0072]
When a plurality of Y mass bodies 23 are arranged, it is desirable to arrange a plurality of pulley units 43 that support the Y stage base 9 and the Y mass bodies 23 in the same manner.
[0073]
In this embodiment, in addition to the effect of the inertial force applying means of the first embodiment, the driving reaction force due to the Y stage base being driven in the Y direction is the Y mass as an effect of the gravity compensation means using the belt and pulley. It is reduced by the movement of the body, and as a result, the excitation force to the stage base and the surface plate can be reduced. Further, since the Y stage base and the Y mass body move in the opposite directions with respect to the Y direction at a ratio of the reciprocal of the mass ratio, the change in the center of gravity of the entire stage apparatus hardly occurs. Therefore, deformation of the surface plate that supports the stage base can be suppressed. Furthermore, by compensating the weight of the Y stage base with a pulley or a belt, the stage can be driven with less energy and heat generation.
[0074]
<Third Embodiment>
FIG. 5 is a schematic front view of a vertical stage apparatus representing the features of the third embodiment of the present invention. In the numbers in the figure, the same members as those in the first embodiment in FIG.
[0075]
In the third embodiment, as in the case of the first embodiment, an inertial force applying unit and a gravity compensation unit are configured on a vertical XY stage.
[0076]
The operation principle, operation state, and the like of the gravity compensation means including the cylinder mechanism 35 according to the third embodiment are the same as those in the first embodiment, and thus description thereof is omitted.
[0077]
In the third embodiment, an X magnet unit and an X coil unit are provided on the main stage and the X mass body in place of the linear motors provided on the main stage and the X mass body, respectively, and driving in the X direction is performed. And imparting inertial force. Also, with respect to the Y direction, driving in the Y direction and applying an inertial force are performed by a Y magnet unit and a Y coil unit provided on the Y stage base and the Y mass body.
[0078]
In the figure, 1 is a surface plate that supports the vertical stage device, 2 is a vibration isolation damper that vibrations the surface plate, and 3 is a stage base that is supported by the surface plate and fixes the stage unit.
[0079]
A wafer chuck 4 holds the wafer. Reference numeral 5 denotes a main stage (first stage) that supports the wafer chuck and is movable in the wafer plane (XY plane). An X length measuring mirror 6 and a Y length measuring mirror that serve as reflecting surfaces for position measurement beams on the end surfaces. 7 is fixed.
[0080]
Reference numeral 8 denotes a Y stage guide fixed to the stage base 3. Reference numeral 9 denotes a Y stage base (second stage) on which the main stage is mounted and movable in the Y direction (second direction). The Y stage guide 8 supports the Y stage base 9 in the X direction (first direction) and guides it in the Y direction without contact.
[0081]
Reference numeral 10 denotes an X stage guide fixed to the Y stage base 9, which supports the main stage 5 in the Y direction and guides it in the X direction without contact.
[0082]
Here, in this embodiment, an air bearing is employed for non-contact guidance. However, the low friction guide is not limited to this.
[0083]
Reference numeral 25 denotes an X magnet unit (first magnet) attached to the main stage 5, and 26 denotes an X coil unit (first coil) attached to an X mass body 27 (first mass body). Here, the X magnet unit 25 and the X coil unit 26 constitute a linear motor (first mechanism) that functions as a moving means. For this reason, you may arrange | position an X magnet unit and an X coil unit reversely.
[0084]
The X mass body 27 is a mass body that moves in the opposite direction with respect to the X direction with respect to the main stage 5. Reference numeral 28 denotes an X mass body guide guide fixed to the Y stage base 9 and guides the X mass body 27 in a non-contact manner so as to be driven in the X direction. In addition, the X mass body 27 moves with respect to the main stage 5 to play a role of an inertial force applying means in the X direction.
[0085]
21 is a Y magnet unit (second magnet) attached to the Y stage base 9, and 22 is a Y coil unit (second coil) attached to a Y mass body 23 (second mass). Here, the Y magnet unit 21 and the Y coil unit 22 constitute a linear motor (second mechanism) that functions as a moving means. For this reason, you may arrange | position a Y magnet unit and a Y coil unit reversely.
[0086]
The Y mass body 23 is a mass body that moves in the opposite direction with respect to the Y direction with respect to the Y stage base 9. Reference numeral 24 denotes a Y mass body guide guide fixed to the stage base, which guides the Y mass body 23 in a non-contact manner so as to be driven in the Y direction. Note that the Y mass body 23 moves with respect to the Y stage base 9 to play a role of Y direction inertia imparting means.
[0087]
A case where the main stage 5 is driven in the X direction with the above configuration will be described. When driving is commanded to the X coil unit 26 via a drive controller (not shown), thrust in the X direction is generated between the X coil unit 26 and the X magnet unit 25. However, the main stage 5 to which the X magnet unit 25 is attached and the X mass body 27 to which the X coil unit 26 is attached are configured so as to be movable in the X direction, and contactless so as to further reduce friction. Therefore, both move in the opposite direction with respect to the X direction.
[0088]
The resultant force of the thrust from the X magnet unit 25 that drives the main stage 5 is F_xThe resultant force of the thrust from the X coil unit 26 that drives the X mass body 27 is R_xAnd Here, the following equation holds from the balance equation of force.
[0089]
F_x= -R_x
[0090]
At this time, R_xIf the X magnet unit 25 and the X coil unit 26 are arranged so that the action axis of the shaft passes through the center of gravity of the main stage 5, the main stage driving thrust F can be obtained._xActs so as to pass through the position of the center of gravity of the main stage 5, so that no rotational torque is generated on the stage. Arranging a plurality of X mass bodies can increase the degree of freedom in designing the action axis of the driving thrust acting on the main stage to pass through the position of the center of gravity. However, the number of X mass bodies is not limited to a plurality.
[0091]
Here, the mass of the main stage 5 is M_x, The total mass of the X mass body 27 is m_xThen, the driving stroke s of the X mass body 27_xIs the stroke S in the X direction of the main stage_xAgainst M_xAnd m_xThe mass ratio is determined by the following formula.
[0092]
S_x/ S_x= 1 / (M_x/ M_x)
[0093]
That is, the movement amount ratio of the two moves with respect to the stage base 3 at a reciprocal of the mass ratio. Therefore, m_xIncreases the mass ratio M_x/ M_xIs smaller, the driving stroke S of the X mass 27_xCan be designed small. However, since the moving mass in the Y direction including the X mass body 27 is increased, the energy required for movement in the Y direction can be reduced.
[0094]
The same applies to the Y direction, and the Y mass body is driven when the Y stage base is driven in the Y direction. However, the influence of gravity is large in the Y direction. First, as the gravity compensation means acting on the Y stage base 9 and the Y mass body 23 is working, the influence of the gravity applied to the Y stage base 9 and the Y mass body 23 is ignored, and in the same manner as in the above X direction, Consider only the action of the driving means in the Y direction.
[0095]
When the Y coil unit 22 is commanded to drive via a drive controller (not shown), a thrust in the Y direction is generated between the Y coil unit 22 and the Y magnet unit 21. However, the Y stage base 9 to which the Y magnet unit 21 is fixed and the Y mass body 23 to which the Y coil unit 22 is fixed are both configured to be movable in the Y direction, so that the friction is further reduced. Since they are guided by contact, both move in the opposite direction with respect to the Y direction.
[0096]
The resultant force of the thrust from the Y magnet unit 21 that drives the Y stage base 9 is F._yThe resultant force of the thrust from the Y coil unit 22 that drives the Y mass body 23 is R_yAnd Here, the following equation holds from the balance equation of force.
[0097]
F_y= -R_y
[0098]
At this time, R_yIf the Y magnet unit 21 and the Y coil unit 22 are arranged so that the action axis of the center passes through the center of gravity of the entire Y-direction moving body including the main stage 5 and the Y stage base 9, F_yActs so as to pass through the center of gravity of the entire Y-direction moving body, so that no rotational torque is generated on the stage. In addition, arranging a plurality of Y mass bodies 23 can increase the degree of freedom in designing the operation axis of the driving thrust acting on the Y stage base 9 to pass through the position of the center of gravity. However, the number of Y mass bodies 23 is not limited to a plurality.
[0099]
Here, the mass of the Y stage base 9 is M_y, The total mass of the Y mass body 23 is m_yThen, the drive stroke s of the mass body_yIs the stroke S in the Y direction of the moving body in the Y direction_yAgainst M_yAnd m_yThe mass ratio is determined by the following formula.
[0100]
S_y/ S_y= 1 / (M_y/ M_y)
[0101]
That is, the movement amount ratio of the two moves with respect to the stage base 3 at a reciprocal of the mass ratio. Therefore, m_yIncreases the mass ratio M_y/ M_ySince Y becomes smaller, the driving stroke s of the Y mass body_yCan be designed small.
[0102]
In the present embodiment, the mass body is driven in the opposite direction to the stage with the movement of the stage, but the relationship between the movement amount of the stage and the movement amount of the mass body is the same as in the case of the first embodiment. Therefore, also in the case of the third embodiment, as in the first embodiment, the Y stage base 9 and the Y mass body 23 constituting the inertial force applying means are connected to the gravity compensating means via the cylinder rod A31 and the cylinder rod B33. can do. Therefore, the inertial force applying means and the gravity compensation means can be compatible with a simple configuration.
[0103]
At this time, the ratio of the cross-sectional area of the piston A32 and the cross-sectional area of the piston B34 is substantially equal to the mass ratio between the Y stage base 9 and the Y mass body 23.
[0104]
In this embodiment, the reaction force due to the main stage being driven in the X direction is reduced by the movement of the X mass body, and as a result, the excitation force to the stage base and the surface plate can be reduced. Furthermore, since the main stage and the X mass body move in the opposite directions with respect to the X direction at a ratio of the reciprocal of the mass ratio, there is also an effect that the change in the center of gravity of the entire stage apparatus hardly occurs. Therefore, deformation of the surface plate that supports the stage base can be suppressed. In particular, in the vertical stage as in this embodiment, suppressing the reaction force and the change in the center of gravity in the X direction is advantageous for a high-speed and high-accuracy stage device because the change in load applied to the vibration isolation damper can be reduced. is there.
[0105]
Further, in this embodiment, the driving reaction force due to the Y stage base being driven in the Y direction is reduced by the movement of the Y mass body, and as a result, the excitation force to the stage base and the surface plate can be reduced. Further, since the Y stage base and the Y mass body move in the opposite directions with respect to the Y direction at a ratio of the reciprocal of the mass ratio, the change in the center of gravity of the entire stage apparatus hardly occurs. Therefore, deformation of the surface plate that supports the stage base can be suppressed. Further, by compensating by the cylinder mechanism in which the weight of the Y stage base is connected, the driving means and the gravity compensation are compatible with each other with a simple configuration, and the stage can be driven with less energy and heat generation.
[0106]
Further, even in the case of an XY stage in which the reference surface of the stage base is a horizontal surface instead of the vertical stage as in this embodiment, a stage or mass body drive mechanism as in this embodiment may be provided. it can. In that case, the gravity compensation means of this embodiment may be omitted.
[0107]
<Embodiment 4>
FIG. 6 is a schematic front view of a vertical stage device according to the fourth embodiment, which represents the features of the present invention. In the figures, the same members as those in the second embodiment of FIG. 3 or the third embodiment of FIG.
[0108]
In the fourth embodiment, as in the above-described embodiment, an inertial force applying unit and a gravity compensation unit are configured on the vertical XY stage.
[0109]
The operation principle, operation state, etc. of the inertial force applying means constituted by the magnet unit and coil unit of the fourth embodiment are the same as those of the third embodiment, and the description thereof is omitted. In addition, the principle of operation and the operation state of the gravity compensation means constituted by the pulley unit 43 and the belt 41 are the same as those in the second embodiment, and the description thereof will be omitted.
[0110]
In this embodiment, the reaction force due to the main stage being driven in the X direction is reduced by the movement of the X mass body, and as a result, the excitation force to the stage base and the surface plate can be reduced. Furthermore, since the main stage and the X mass body move in the opposite directions with respect to the X direction at a ratio of the reciprocal of the mass ratio, there is also an effect that the change in the center of gravity of the entire stage apparatus hardly occurs. Therefore, deformation of the surface plate that supports the stage base can be suppressed. In particular, in the vertical stage as in this embodiment, suppressing the reaction force and the change in the center of gravity in the X direction is advantageous for a high-speed and high-accuracy stage device because the change in load applied to the vibration isolation damper can be reduced. is there.
[0111]
Further, in this embodiment, the driving reaction force due to the Y stage base being driven in the Y direction is reduced by the movement of the Y mass body, and as a result, the excitation force to the stage base and the surface plate can be reduced. Further, since the Y stage base and the Y mass body move in the opposite directions with respect to the Y direction at a ratio of the reciprocal of the mass ratio, the change in the center of gravity of the entire stage apparatus hardly occurs. Therefore, deformation of the surface plate that supports the stage base can be suppressed. Furthermore, by supporting the weight of the Y stage base with gravity compensation means consisting of a belt and pulley unit, the drive means and gravity compensation are compatible with each other with a simple structure, and the stage can be driven with less energy and heat generation. Can do.
[0125]
  <Embodiment5>
  Next, an embodiment of an X-ray exposure apparatus using the above-described stage apparatus will be described. Figure7SR light 62 emitted from the SR generator 61 as an X-ray source enters a mirror 63 installed at a predetermined position from the light emitting point. The mirror 63 has a convex shape and expands the sheet-like SR light 62 radiated from the SR generator 61. Although the number of mirrors in the figure is one, a plurality of mirrors may be used for the purpose of expanding the sheet-like SR light. The SR light 64 reflected by the mirror passes through an original transmission type mask 67 in which a pattern made of an X-ray absorber is formed on the X-ray transmission film, and then has a desired pattern shape, and a resist as a photosensitive material is formed. The coated substrate 68 (wafer) is irradiated. The wafer 68 is held by the wafer chuck 69 of the stage apparatus described above, and the wafer chuck 69 is mounted on a main stage (not shown). On the upstream side of the mask 67, a shutter 65 for controlling the exposure time is provided over the entire exposure area. The shutter 65 is driven by a shutter drive unit 66 controlled by a shutter control unit 70. A beryllium film (not shown) is located between the mirror 63 and the shutter 65, and the mirror side of the beryllium film is super vacuum and the shutter side is decompressed He.
[0126]
By using the exposure apparatus of this embodiment, it is possible to obtain an exposure apparatus corresponding to high speed and high accuracy.
[0127]
  <Embodiment6>
  Next, an embodiment of a semiconductor device manufacturing method using the above-described exposure apparatus will be described. Figure8Indicates a flow of manufacturing a semiconductor device (a semiconductor chip such as an IC or LSI, a liquid crystal panel, a CCD, a thin film magnetic head, a micromachine, etc.). In step S11 (circuit design), a semiconductor device circuit is designed. In step S12 (mask production), a mask on which the designed circuit pattern is formed is produced. On the other hand, in step S13 (wafer manufacture), a wafer as a substrate is manufactured using a material such as silicon. Step S14 (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer. The next step S15 (assembly) is referred to as a post-process, and is a process for forming a semiconductor chip using the wafer produced in step S14. including. In step S16 (inspection), the semiconductor device manufactured in step S15 undergoes inspections such as an operation confirmation test and a durability test. Through these steps, the semiconductor device is completed and shipped (step S17).
[0128]
  Figure9Shows the detailed flow of the wafer process. In step S21 (oxidation), the wafer surface is oxidized. In step S22 (CVD), an insulating film is formed on the wafer surface. In step S23 (electrode formation), an electrode is formed on the wafer by vapor deposition. In step S24 (ion implantation), ions are implanted into the wafer. In step S25 (resist process), a photosensitive agent is applied to the wafer. In step S26 (exposure), the circuit pattern of the mask is printed on the wafer by exposure using the exposure apparatus described above. In step S27 (development), the exposed wafer is developed. In step S28 (etching), portions other than the developed resist image are removed. In step S29 (resist stripping), the resist that has become unnecessary after the etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer. If the manufacturing method of this embodiment is used, a highly integrated semiconductor device can be manufactured.
[0129]
【The invention's effect】
  According to the present invention, with a simple configuration, transmission of vibration accompanying an increase in stage excitation force can be prevented, and high-speed and high-accuracy positioning can be performed.
[Brief description of the drawings]
FIG. 1 is a schematic front view of a vertical stage apparatus according to a first embodiment.
FIG. 2 is a model diagram of gravity compensation means of the first embodiment.
FIG. 3 is a schematic front view of a vertical stage apparatus according to a second embodiment.
FIG. 4 is a model diagram of gravity compensation means of the second embodiment.
FIG. 5 is a schematic front view of a vertical stage device according to a third embodiment.
FIG. 6 is a schematic front view of a vertical stage apparatus according to a fourth embodiment.
[Figure7] First5Configuration of X-ray semiconductor exposure apparatus of an embodiment
[Figure8] Flow chart of semiconductor device manufacturing method
[Figure9] Wafer process flow diagram
[Explanation of symbols]
  1 Surface plate
  2 Vibration isolation damper
  3 Stage base
  4 Wafer chuck
  5 Main stage
  6 X measuring mirror
  7 Y measuring mirror
  8 Y stage guide
  9 Y stage base
  10 X stage guide
  21 Y magnet unit
  22 Y coil unit
  23 Y mass
  24 Y Mass Guide
  25 X magnet unit
  26 X coil unit
  27 X mass
  28 X Mass Guide
  31 Cylinder rod A
  32 Cylinder piston A
  33 Cylinder rod B
  34 Cylinder piston B
  35 Air cylinder
  41 belt
  42 fixed base
  43 pulley unit
  51 Y linear motor mover
  54 X linear motor stator
  61 SR generator
  62 SR light
  63 Mirror
  64 SR light
  65 shutter
  66 Shutter drive unit
  67 Mask
  68 wafers
  69 Wafer chuck
  70 Shutter control unit

Claims (20)

A first stage movable in a first direction on a reference plane including a vertical direction; first stage driving means for moving the first stage in the first direction; and intersecting the first direction on the reference plane A second stage movable in a second direction including a vertical direction, and a second stage driving means for moving the second stage in the second direction;
A mechanism having a second mass body that moves in a direction opposite to the second stage and a second mass body driving unit that drives the second mass body;
A stage device, wherein the second stage and the mass body are connected by a pulley and a belt so as to perform gravity compensation by balancing the weight of the second stage and the second mass body. Stage apparatus according to claim 1, wherein the first stage driving means and the second stage drive means is a linear motor. The stage apparatus according to claim 1, wherein the second mass driving unit is a linear motor. A first stage movable in a first direction; a second stage movable in a second direction including a vertical direction intersecting the first direction;
The second stage and a second mass body that moves in the opposite direction to the second stage have a mechanism configured by attaching different ones of a magnet and a coil,
A stage apparatus, wherein the second stage and the mass body are connected by a pulley and a belt so as to perform gravity compensation of the weight of the second stage and the second mass body. The stage apparatus according to claim 1, wherein a plurality of the second mass bodies are arranged. The stage apparatus according to any one of claims 1 to 5, wherein the second mass body moves so as to reduce a reaction force or a change in the center of gravity caused by driving the second stage . A first stage movable in a first direction on a reference plane including a vertical direction; first stage driving means for moving the first stage in the first direction; and intersecting the first direction on the reference plane A second stage movable in a second direction including a vertical direction, and a second stage driving means for moving the second stage in the second direction;
A first mechanism having a first mass body that moves in a direction opposite to the first stage, and a first mass body driving unit that drives the first mass body;
A second mechanism having a second mass body that moves in a direction opposite to the second stage, and a second mass body driving unit that drives the second mass body;
A stage device, wherein the second stage and the second mass body are connected by a pulley and a belt so as to perform gravity compensation by balancing the weight of the second stage and the mass body. The pulley has a first pulley that supports the second stage and a second pulley that supports the second mass body, and a pulley diameter ratio between the first pulley and the second pulley is the second pulley . the stage apparatus according to claim 7, wherein any one, characterized in that approximately equal to the inverse of the mass ratio of the stage and the second mass. A first stage movable in a first direction on a reference plane including a vertical direction; first stage driving means for moving the first stage in the first direction; and intersecting the first direction on the reference plane A second stage movable in a second direction including a vertical direction, and a second stage driving means for moving the second stage in the second direction;
A mechanism having a second mass body that moves in a direction opposite to the second stage and a second mass body driving unit that drives the second mass body;
A first cylinder mechanism that performs gravity compensation of the second stage; and a second cylinder mechanism that performs gravity compensation of the second mass body, and balances the weights of the second stage and the second mass body. A stage apparatus characterized in that the first cylinder mechanism and the second cylinder mechanism are coupled so as to perform gravity compensation . The ratio of the cross-sectional area of the piston of the first cylinder mechanism to the cross-sectional area of the piston of the second cylinder mechanism is substantially equal to the mass ratio of the second stage and the second mass body. Item 10. The stage device according to Item 9 . A movable stage; a mass body that moves in a direction opposite to the stage; a first cylinder mechanism connected to the stage; and a second cylinder mechanism connected to the mass body ;
The first cylinder mechanism and the second cylinder mechanism are coupled, and the ratio of the cross-sectional area of the piston of the first cylinder mechanism to the cross-sectional area of the piston of the second cylinder mechanism is the ratio between the stage and the mass body. A stage apparatus characterized by being substantially equal to a mass ratio . The stage apparatus according to claim 11 , wherein the mass body moves so as to reduce a reaction force or a change in position of the center of gravity caused by the movement of the stage. The stage apparatus according to claim 11 or 12 , wherein the stage is movable in a direction including a vertical direction. 14. The stage apparatus according to claim 13 , wherein the first cylinder mechanism supports the weight of the stage in the vertical direction, and the second cylinder mechanism supports the weight of the mass body in the vertical direction. A stage movable in a direction including a vertical direction ; a mass body that moves in a direction opposite to the stage; a first cylinder mechanism connected to the stage; and a second cylinder mechanism connected to the mass body. The first cylinder mechanism supports the weight of the stage in the vertical direction, the second cylinder mechanism supports the weight of the mass body in the vertical direction, and balances the weight of the stage and the mass body to reduce the gravity. A stage apparatus, wherein the first cylinder mechanism and the second cylinder mechanism are coupled so as to perform compensation. 16. The stage apparatus according to claim 11 , further comprising at least one of a stage driving unit that drives the stage and a mass body driving unit that drives the mass body. The stage apparatus according to claim 16, wherein the stage driving means and the mass body driving means are linear motors. Exposure apparatus comprising the stage apparatus in accordance with claim 1 to 17. The exposure apparatus according to claim 18, wherein the exposure apparatus is an X-ray exposure apparatus. Device manufacturing method characterized by manufacturing a device using the exposure apparatus according to claim 18 or 19 wherein.

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