JPH11145041A - Stage unit and pattern exposure system using the same, and device manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent transfer of vibration caused by an increased force applied to a stage and to perform high accuracy positioning, by arranging a mechanism having a first mass body moved in the direction opposite to a first stage and a mechanism having a second mass body moved in the direction opposite to a second stage. SOLUTION: If a main stage 5 is moved in the direction of X, a force reactive to the movement is reduced by the movement of an X mass body to reduce a force applied to a stage base S and a surface plate 1. Further, the main stage 5 and the X mass body 27 are moved at a rate of the inverse of mass ratio in the direction opposite to X direction, which hardly produces a change in the position of the center of gravity. Further, a reaction force caused by the movement of a Y stage base 9 is reduced by the movement of a Y mass body 23 to reduce a force applied to a stage base S and a surface plate 1. Still further, the Y stage base 9 and the Y mass body 23 are moved at a rate of the inverse of mass ratio in the direction opposite to Y direction, which hardly produces a change in the position of the center of gravity.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus used in a lithography process of semiconductor manufacturing, a stage apparatus used in various precision processing machines or various precision measuring instruments, and an exposure apparatus using this stage apparatus. The present invention relates to a device manufacturing method.

[0002]

2. Description of the Related Art Conventionally, as an exposure apparatus used for manufacturing a semiconductor device, an apparatus called a stepper has been known. This stepper reduces and projects the pattern image formed on the reticle onto the wafer by the projection lens while step-moving the semiconductor wafer under the projection lens, and sequentially exposes a plurality of locations on one wafer. Things.

[0003]

As for the semiconductor wafer processed by the exposure apparatus having such a configuration, a large-diameter and large-sized semiconductor wafer is used in order to increase the area of the semiconductor element and reduce the cost. It is in. In addition, with an increase in the degree of integration of semiconductor elements, a positioning device capable of performing higher-speed and higher-precision alignment has been desired.

In order to respond to the demand for a high-speed and high-precision XY stage in order to cope with an increase in the diameter of a semiconductor wafer to be mounted, it is necessary to improve the dynamic characteristics of the XY stage and to increase the guide rigidity. It is necessary to increase the stage weight more than simply increasing the weight by increasing the stroke. Furthermore, to increase the moving acceleration and moving speed of the XY stage and to reduce the moving time in order to cope with higher throughput, the size of the apparatus is increased by strengthening the structure together with the relative rigidity of the structure moving the stage. There are problems such as cost increase and cost increase.

SUMMARY OF THE INVENTION In view of the problems of the prior art, an object of the present invention is to provide a stage apparatus used for an exposure apparatus, various precision processing machines or various precision measuring instruments with a simple configuration.
Prevents transmission of vibration due to increased stage excitation force,
The object is to enable high-precision positioning.

[0006]

A first preferred embodiment of a stage device according to the present invention for solving the above-mentioned problems comprises a first stage movable in a first direction on a reference plane including a vertical direction,
First stage driving means for moving the first stage in the first direction, a second stage movable in a second direction intersecting the first direction on the reference plane, and A second stage driving means for moving in two directions; a first mass body moving in a direction opposite to the first stage; and a first mass driving means for driving the first mass body.
At least one of a mechanism, a second mass body that moves in a direction opposite to the second stage, and a second mechanism that has a second mass body driving unit that drives the second mass body is provided. Is a stage device.

A second preferred embodiment of the stage device of the present invention comprises a first stage movable in a first direction, and a second stage movable in a second direction intersecting the first direction. A first mechanism configured by attaching different ones of a first magnet and a first coil to the first stage and a first mass moving in a direction opposite to the first stage; At least one of a second mechanism configured by attaching a different one of a second magnet and a second coil to a second mass body that moves in a direction opposite to the second stage is provided. It is a stage device to perform.

It is preferable that the stage device has a stage gravity compensation means and a mass gravity compensation means for compensating gravity of the second stage and the second mass body.

The stage gravity compensating means and the mass gravity compensating means may be connected or independent.

In a third preferred embodiment of the stage apparatus according to the present invention, a movable stage, a mass moving in a direction opposite to the stage, and a first stage connected to the stage are provided.
A stage device comprising a cylinder mechanism and a second cylinder mechanism connected to the mass body.

When the cylinder mechanism is connected, the ratio of the cross-sectional area of the piston of the first cylinder mechanism to the cross-sectional area of the piston of the second cylinder mechanism is determined by the mass ratio between the stage and the mass body. It is desirable that they are approximately equal.

Further, an exposure apparatus according to the present invention is provided with the above stage device.

Preferably, the exposure apparatus is an X-ray exposure apparatus.

Further, a device manufacturing method for manufacturing a device using the above exposure apparatus is also included in the scope of the present invention.

[0015]

DESCRIPTION OF THE PREFERRED EMBODIMENTS <First Embodiment> FIG. 1 is a schematic front view of a vertical stage device that best illustrates the features of a first embodiment of the present invention. In this apparatus, an inertial force applying unit and a gravity compensating unit are provided on a vertical XY stage that can hold a wafer mounted on an X-ray exposure apparatus using synchrotron radiation and move in a wafer plane while holding the wafer vertically. It is characterized by:

In FIG. 1, reference numeral 1 denotes a surface plate for supporting a vertical stage device, 2 denotes an anti-vibration damper for damping the surface plate 1, and 3 denotes a reference surface which is supported by the surface plate 1 and supports the stage device. Stage based.

Reference numeral 4 denotes a wafer chuck for holding a wafer. Numeral 5 supports the wafer chuck 4 so that the in-plane (XY)
The main stage (first stage) is movable on a flat surface, and an X length measuring mirror 6 and a Y length measuring mirror 7 serving as a reflection surface of a position measuring beam are fixed to an end surface.

Reference numeral 8 denotes a Y stage guide fixed to the stage base 3, and 9 denotes a Y stage on which the main stage 5 is mounted.
It is a Y stage base (second stage) that can move in the direction. The Y stage guide 8 supports the Y stage base 9 in the X direction (first direction) and guides the non-contact in the Y direction (second direction).

Reference numeral 10 denotes X fixed to the Y stage base 9
It is a stage guide that supports the main stage 5 in the Y direction and guides it in the X direction without contact.

Here, in this embodiment, an air bearing is employed for the non-contact guide. However, the present invention is not limited to this as long as it is a low friction guide.

Reference numeral 51 denotes a mover of a linear motor (second stage driving means) driven in the Y direction, which is fixed to the Y stage base 9 and faces a linear motor stator (not shown) provided on the Y stage guide 8. doing. A mover (not shown) of a linear motor (first stage driving means) driven in the X direction is attached to the main stage 5.
It faces the X linear motor stator 54 provided in the stage guide 10.

In both linear motors, it is desirable that the working shaft on which the thrust acts passes through the center of gravity of the driven body.

Reference numeral 27 denotes an X mass body (first mass body) for applying inertial force to the stage base 3 in the X direction. An X mass body guide 28 fixed to the Y stage base 9 guides the X mass body 27 in a non-contact manner so that the X mass body 27 can be driven in the X direction. The X mass body 27 plays a role of an inertial force applying unit in the X direction by moving in the X direction.

Reference numeral 23 denotes a Y mass (second mass) which applies an inertial force to the stage base 3 in the Y direction. Reference numeral 24 denotes a Y mass body guide fixed to the stage base, and guides the Y mass body 23 in a non-contact manner such that the Y mass body 23 can be driven in the X direction. Note that the Y mass body 23 plays a role of a means for applying inertial force in the Y direction by moving in the Y direction.

A movable element (not shown) of a linear motor driven in a predetermined direction is attached to each mass body, and opposes a linear motor stator (not shown) provided on each guide to apply inertial force. Means (first mechanism, second mechanism)
Is composed. In both linear motors, it is desirable that the working shaft on which the thrust acts passes through the center of gravity of the mass body.

The present embodiment employs a cylinder mechanism having a piston as means for compensating for the gravity acting on the Y stage base.

In the figure, 31 is a Y stage base 9
, The tip of which is opposite to the Y-stage base 9 is supported by a cylinder piston A32 (first cylinder mechanism). Reference numeral 33 denotes a cylinder rod B fixed to the Y mass body, and a tip opposite to the Y mass body 23 is supported by a cylinder piston B34 (second cylinder mechanism).

The piston A32 and the piston B34 seal the fluid in the air cylinder 35 which is connected. As a result, the piston A
The weight of the Y stage base 9 supported by 32 and the weight of the Y mass body 23 supported by the piston B34 are transmitted, and the two are balanced.
As a result, gravity compensation of the Y stage base 9 is performed.
Further, the cylinder 35, the piston A32 and the piston B
Numeral 34 is, for example, non-contact so that it can move with extremely low friction sliding.

Here, "the weight of the Y stage base" means "total weight including the main stage, the X stage guide, the X mass body, the X mass body guide guide, etc., which moves in the Y direction together with the Y stage base". Similarly, "mass of the Y stage base" is treated as "total mass including the object moving in the Y direction together with the Y stage base", and the same applies hereinafter unless otherwise specified.

The sectional area of the piston constituting the cylinder mechanism 35 is determined in consideration of the weight of the Y stage base 9 and the weight of the Y mass body 23. This will be described later.

The driving signal of the mass body is obtained as follows. Assuming that the main stage 5 is driven in the X direction in FIG.
The reaction force generated in the linear motor stator of the stage guide 10 is F _x , and when the X mass body 27 of the inertial force applying means is driven, the reaction force is applied to the stator of the linear motor (first mass body driving means) of the X mass body guide 28. The resultant resultant reaction force is defined as _Rx . In order for the inertial force imparting means to act on R _x so as to cancel F _x , the following equation may be satisfied.

R _x = −F _x

[0033] At this time, by arranging the inertial force application means as the operating shaft of R _x coincides with the operating shaft of the driving reaction force F _x in the main stage 5, the rotational torque is not generated in the main stage 5. In addition, arranging a plurality of X mass bodies 27 can increase the degree of freedom in designing the operating axis of the driving thrust acting on the main stage 5 so as to pass through the position of the center of gravity. However, the number of the X mass bodies 27 is not limited to a plurality.

Here, the mass of the main stage 5 is represented by M _x ,
When the total mass of the X masses 27 and m _x, drive stroke s _x of the X mass 27 is determined by the weight ratio of M _x and m _x with respect to the X-direction of the stroke S _x of the main stage, by the following formula Is represented.

S _x / s _x = 1 / (M _x / m _x )

That is, the ratio of the amount of movement between the two moves with respect to the stage base 3 at the reciprocal of the mass ratio. Therefore, by increasing the m _x, since the mass ratio M _x / m _x decreases, it is possible to reduce design a drive stroke s _x of the X mass 27. However, since the moving mass in the Y direction including the X mass body 27 becomes large, the energy required for the movement in the Y direction becomes large. Conversely, if increased design s _x, it is possible to reduce the mass m _x of the X masses 27, Y-direction moving mass is reduced, it is possible to reduce the energy required to move in the Y direction.

Similarly, in the case of the Y direction, the Y mass body of the inertial force applying means may be driven so as to cancel the reaction force generated in the Y stage guide 8 when the Y stage base is driven in the Y direction. However, the influence of gravity on the Y stage base 9 and the Y mass body 23 is assumed to be working first, and the influence of gravity on the Y stage base 9 and the Y mass body 23 is assumed to be working. Ignoring, and consider only the operation of the driving means in the Y direction as in the case of the X direction described above.

When the Y stage base 9 is driven in the Y direction, the resultant force of the reaction force generated on the Y stage guide 8 fixed to the stage base 3 is represented by F _y , and the Y mass body 2 of the inertial force applying means.
The resultant force of the reaction force generated in the Y mass body guide fixed to the stage base when driving 3 is _Ry . In order for the inertial force applying means to act on R _y so as to cancel F _y , the following equation may be satisfied.

R _y = −F _y

At this time, if the inertial force applying means is arranged so that the operating axis of R _y coincides with the operating axis of F _y , no rotational torque is generated on the stage base 3. In addition, the Y mass 23
Is designed to allow the axis of action of the driving thrust acting on the Y stage base 9 to pass through the position of the center of gravity.
The degree of freedom can be increased. However, the number of the Y mass bodies 23 is not limited to a plurality.

[0041] Here, mass M _y of the Y stage base 9, when the total mass of the Y mass body 23 and m _y, drive stroke s _y of the masses with respect to the stroke S _y in the Y direction of the Y-direction moving member determined by the mass ratio of M _y and m _y Te is expressed by the following equation.

S _y / s _y = 1 / (M _y / m _y )

That is, the ratio of the amount of movement between the two moves relative to the stage base 3 at the reciprocal of the mass ratio. Therefore, by increasing the m _y, since the mass ratio M _y / m _y is reduced, thereby reducing design a drive stroke s _y of the Y mass 23.

Next, the relationship between the balance of the Y stage base 9 and the Y mass body 23 by the cylinder mechanism 35 and the relationship between the piston cross-sectional area and the amount of movement of the piston will be considered.

FIG. 2 is a model diagram of a cylinder mechanism which is gravity compensation means of the first embodiment.

In the cylinder mechanism 35, the piston A3
2 and the cross-sectional area of piston B34 are a and b, respectively.
When the relationship between the total mass m _y mass M _y and Y mass 23 of the Y stage base 9 which is supported on the piston A32 is expressed by the following equation.

A / b = M _y / m _y

However, the Y stage base 9 and the Y mass 2
When 3 is supported by a plurality of pistons, a and b are the sum of the cross-sectional areas of the pistons.

The ratio of the movement amount of the piston A32 and the movement amount of the piston B34 whose cross-sectional area ratio is determined by the above equation can be obtained by the following equation. Here, the amount of movement of the S _P piston A32, a s _P is the movement of the piston B34.

S _P / s _P = 1 / (a / b)

That is, the cross-sectional area ratio a / b between the piston A32 supporting the weight of the Y stage base 9 and the piston B34 supporting the weight of the Y mass body 23 is determined by the movement of the Y stage base 9 and the Y mass body 23. It is the reciprocal of the ratio to the quantity.

From these relational expressions, the ratio (S _y / s _y ) of the movement amount of the Y stage base 9 and the Y mass body 23 constituting the stage device of the present embodiment, and the piston of the piston mechanism 35 which is gravity compensation means It can be seen that the ratio (S _p / s _p ) of the movement amounts of A32 and piston B34 becomes equal. Since the ratios of the movement amounts are equal, the Y stage base 9 and the Y mass body 23 constituting the inertial force applying means can be connected to the gravity compensation means via the cylinder rod A31 and the cylinder rod B33. Therefore, both the inertial force applying means and the gravity compensation means can be made compatible with a simple configuration.

At this time, the ratio between the cross-sectional area of the piston A32 and the cross-sectional area of the piston B34 is substantially equal to the mass ratio between the Y stage base 9 and the Y mass body 23.

Here, in this embodiment, gas is used as the medium in the cylinder. However, the present invention is not limited to this as long as it has the same function. For example, a hydraulic cylinder may be used.

In this embodiment, the driving reaction force due to the main stage being driven in the X direction is reduced by the movement of the X mass body, and as a result, the exciting force on the stage base and the surface plate can be reduced. . Furthermore, since the main stage and the X mass move in the X direction at the ratio of the reciprocal of the mass ratio, respectively, there is also an effect that almost no change occurs in the position of the center of gravity of the entire stage apparatus.
Therefore, the deformation of the surface plate supporting the stage base can be suppressed. In particular, in the vertical stage as in the present embodiment, suppressing the reaction force and the change in the position of the center of gravity in the X direction can reduce the change in the load applied to the vibration isolation damper, which is advantageous for a high-speed, high-precision stage device. is there.

Further, in the present embodiment, the driving reaction force due to the Y stage base being driven in the Y direction is reduced by the movement of the Y mass body, and as a result, the exciting force to the stage base and the surface plate is reduced. Can be done. Furthermore, Y
The stage base and the Y mass have the reciprocal of the mass ratio.
Since they move in opposite directions, the position of the center of gravity of the entire stage apparatus hardly changes. Therefore, the deformation of the surface plate supporting the stage base can be suppressed. Further, by compensating the self-weight of the Y stage base by the connected cylinder mechanism, the driving unit and the gravity compensating unit are compatible with a simple configuration, and the stage can be driven with little energy and heat generation.

<Second Embodiment> FIG. 3 is a schematic front view of a vertical stage device showing the features of a second embodiment of the present invention. In the numbers in the figure, the same members as those in the first embodiment in FIG.

In the second embodiment, similarly to the first embodiment, a vertical XY stage is provided with an inertial force applying means and a gravity compensating means.

The operating principle and operating conditions of the main stage and the inertial force applying means of the second embodiment are the same as those of the first embodiment, and a description thereof will be omitted.

In the second embodiment, gravity compensation is performed by pulleys and belts instead of gravity compensation means by a cylinder mechanism.

In FIG. 3, reference numeral 41 denotes a belt for suspending the Y mass body 23 and the Y stage base 9, reference numeral 42 denotes a fixed base fixed to the stage base 3, and reference numeral 43 denotes a pulley unit provided on the fixed base. . As can be seen from the figure, since the belt 41 is hung on the pulley unit 43, the pulley unit 43 is connected to the Y stage base 9 via the belt 41.
And the Y mass body 23 are supported.

FIG. 4 is a model diagram of a pulley unit which is a gravity compensation means of the second embodiment.

Since the pulley unit 43 is composed of pulleys having two diameters, two belts are required for one pulley unit, one end of the belt 41 is fixed to the pulley, and one end of the other belt is Y stage base 9 or Y
It is attached to the mass body 23.

In the second embodiment, attention is paid to the ratio of the pulley diameter of the pulley unit 43, and the balance between the weight of the Y stage base 9 and the Y mass body 23, the movement amount of the Y stage base 9 and the Y mass body 23 and the pulley Consider the relationship between the diameters.

Here, the mass of the Y stage base 9 is represented by M
The total mass of the y and Y mass bodies 23 is defined as my. In the pulley unit 43, the diameter of the pulley on which the belt 41 attached to the Y stage base 9 is hung is d, and the diameter of the pulley on which the belt 41 attached to the Y mass body 23 is h is e.
And In this case, in order to pulley unit 43 is aligned fishing weight of the Y stage base 9 and Y the mass body 23, the ratio d / e of the pulley diameter of the pulley unit 43 is a mass ratio M _y / m _y
And is expressed by the following equation.

D / e = 1 / (M _y / m _y )

That is, the ratio of the pulley diameter of the pulley unit 43 is the reciprocal of the mass ratio of the Y stage base 9 and the Y mass body 23 supported by the pulley.

[0068] Here, the moving amount s _p of the movement amount S _p and Y the mass body 23 of the Y stage base 9 of case where the pulley ratio of the pulley diameter is proportional to the diameter of the pulley which is connected It becomes like the following formula.

S _p / s _p = d / e

From these relational expressions, the ratio (S _y / s _y ) of the movement amount of the Y stage base 9 and the Y mass body 23 constituting the stage device of the present embodiment, and the gravity compensating means composed of the pulley unit 43 Y stage base 9 and Y mass body 23
It can be seen that the ratios (S _p / s _p ) of the movement amounts are equal. Since the ratios of the movement amounts are equal, the Y stage base 9 and the Y mass body 23 constituting the inertial force applying means are connected to the belt 41.
Can be connected to the pulley of the gravity compensation means.
Therefore, both the inertial force applying means and the gravity compensation means can be made compatible with a simple configuration.

In this embodiment, the belt is used for the gravity compensation mechanism. However, the present invention is not limited to this, as long as the same effect is obtained. For example, a wire may be used.

When a plurality of Y masses 23 are arranged, it is preferable to arrange a plurality of pulley units 43 supporting the Y stage base 9 and the Y masses 23 in the same manner.

In the present embodiment, in addition to the effect of the inertial force applying means of the first embodiment, the effect of the gravity compensating means using the belt and the pulley is that the driving reaction force due to the Y stage base being driven in the Y direction is reduced. , And the movement of the Y mass body, and as a result, the exciting force to the stage base and the surface plate can be reduced. Further, since the Y stage base and the Y mass body move in the opposite directions with respect to the Y direction at the ratio of the reciprocal of the mass ratio, the position of the center of gravity of the entire stage apparatus hardly changes. Therefore, the deformation of the surface plate supporting the stage base can be suppressed. Further, by compensating the weight of the Y stage base with a pulley or a belt, the stage can be driven with less energy and heat generation.

<Third Embodiment> FIG. 5 is a schematic front view of a vertical stage device showing features of a third embodiment of the present invention. In the numbers in the figure, the same members as those in the first embodiment in FIG.

In the third embodiment, as in the first embodiment, the vertical XY stage is provided with an inertial force applying means and a gravity compensating means.

The operation principle, operation state, and the like of the gravity compensating means including the cylinder mechanism 35 of the third embodiment are the same as those of the first embodiment, and a description thereof will be omitted.

In the third embodiment, an X magnet unit and an X coil unit are provided on the main stage and the X mass, instead of being driven independently by linear motors respectively provided on the main stage and the X mass. Direction drive and inertial force application are performed. In the Y direction, the Y stage base and the Y magnet unit and the Y coil unit provided on the Y mass body drive and apply inertial force in the Y direction.

In the figure, reference numeral 1 denotes a platen for supporting a vertical stage device, 2 denotes a vibration damper for damping the platen, and 3 denotes a stage base supported by the platen and fixing a stage unit.

Reference numeral 4 denotes a wafer chuck for holding a wafer. Reference numeral 5 denotes a main stage (first stage) which supports the wafer chuck and is movable in the wafer plane (XY plane), and has an X length measuring mirror 6 and a Y length measuring mirror which are reflection surfaces of position measurement beams on the end surfaces. 7 is fixed.

Reference numeral 8 denotes a Y stage guide fixed to the stage base 3, and reference numeral 9 denotes a Y stage base (second stage) on which a main stage is mounted and is movable in the Y direction (second direction). The Y stage guide 8 supports the Y stage base 9 in the X direction (first direction) and guides the non-contact in the Y direction.

Reference numeral 10 denotes X fixed to the Y stage base 9
It is a stage guide that supports the main stage 5 in the Y direction and guides it in the X direction without contact.

Here, in this embodiment, an air bearing is employed for the non-contact guide. However, the present invention is not limited to this as long as it is a low friction guide.

Reference numeral 25 denotes X attached to the main stage 5.
A magnet unit (first magnet) 26 is an X coil unit (first coil) attached to an X mass body 27 (first mass body).
It is. Here, the X magnet unit 25 and the X coil unit 26 constitute a linear motor (first mechanism) functioning as moving means. For this reason, the X magnet unit and the X coil unit may be arranged in reverse.

The X mass body 27 is a mass body that moves in the direction opposite to the X direction with respect to the main stage 5. Also,
Reference numeral 28 denotes an X mass body guide fixed to the Y stage base 9, and guides the X mass body 27 in a non-contact manner so that the X mass body 27 can be driven in the X direction. The X mass body 27 plays a role of an inertial force applying unit in the X direction by moving with respect to the main stage 5.

Reference numeral 21 denotes a Y magnet unit (second magnet) attached to the Y stage base 9, and reference numeral 22 denotes a Y coil unit (second coil) attached to a Y mass body 23 (second mass body). Here, the Y magnet unit 21 and the Y coil unit 22 constitute a linear motor (second mechanism) functioning as moving means. For this reason, the Y magnet unit and the Y coil unit may be arranged in reverse.

The Y mass body 23 is a mass body which moves in the direction opposite to the Y direction with respect to the Y stage base 9. Reference numeral 24 denotes a Y mass body guide fixed to the stage base, and guides the Y mass body 23 in a non-contact manner so that the Y mass body 23 can be driven in the Y direction. Note that the Y mass body 23 serves as a means for imparting inertia in the Y direction by moving with respect to the Y stage base 9.

A case where the main stage 5 is driven in the X direction with the above configuration will be described. When driving is commanded to the X coil unit 26 via a drive controller (not shown), a thrust in the X direction is generated between the X coil unit 26 and the X magnet unit 25. However, the X magnet unit 2
The main stage 5 on which the X coil unit 26 is mounted and the X mass body 27 on which the X coil unit 26 is mounted are both configured to be movable in the X direction, and are guided in a non-contact manner so as to further reduce friction. Therefore, both move in the opposite direction with respect to the X direction.

The resultant force of the thrust from the X magnet unit 25 for driving the main stage 5 is F _x , and the resultant force of the thrust from the X coil unit 26 for driving the X mass body 27 is R _x . Here, the following equation holds from the force balance equation.

F _x = −R _x

At this time, if the X magnet unit 25 and the X coil unit 26 are arranged so that the operating axis of R _x passes through the position of the center of gravity of the main stage 5, the main stage driving thrust F _x will be at the center of gravity of the main stage 5. Since it acts so as to pass through the position, no rotational torque is generated on the stage. In addition, arranging a plurality of X mass bodies can increase the degree of freedom in designing the operating axis of the driving thrust acting on the main stage so as to pass through the position of the center of gravity. However, the number of X mass bodies is not limited to a plurality.

Here, the mass of the main stage 5 is represented by M _x ,
When the total mass of the X masses 27 and m _x, drive stroke s _x of the X mass 27 is determined by the weight ratio of M _x and m _x with respect to the X-direction of the stroke S _x of the main stage, by the following formula Is represented.

S _x / s _x = 1 / (M _x / m _x )

That is, the ratio of the movement amounts of the two moves relative to the stage base 3 at a reciprocal of the mass ratio. Therefore, by increasing the m _x, since the mass ratio M _x / m _x decreases, it is possible to reduce design a drive stroke S _x of X mass 27. However, since the moving mass in the Y direction including the X mass body 27 increases, the energy required for moving in the Y direction can be reduced.

The same applies to the case of the Y direction, and when the Y stage base is driven in the Y direction, the Y mass body is driven. However, the influence of gravity is great in the Y direction. First, assuming that the gravity compensation means acting on the Y stage base 9 and the Y mass body 23 are working,
3 ignoring the effect of gravity, only the action of the driving means in the Y direction is considered, as in the case of the X direction described above.

When a drive command is issued to the Y coil unit 22 via a drive controller (not shown), a thrust in the Y direction is generated between the Y coil unit 22 and the Y magnet unit 21. However, the Y stage base 9 to which the Y magnet unit 21 is fixed, and the Y stage to which the Y coil unit 22 is fixed.
The mass bodies 23 are both configured to be movable in the Y direction, and are guided in a non-contact manner so as to reduce friction, so that both move in the opposite direction with respect to the Y direction.

The resultant force of the thrust from the Y magnet unit 21 driving the Y stage base 9 is F _y , and the resultant force of the thrust from the Y coil unit 22 driving the Y mass body 23 is R _y . Here, the following equation holds from the force balance equation.

F _y = −R _y

At this time, if the Y magnet unit 21 and the Y coil unit 22 are arranged so that the operating axis of R _y passes through the center of gravity of the entire Y-direction moving body including the main stage 5 and the Y stage base 9, F _y Acts so as to pass through the position of the center of gravity of the entire Y-direction moving body, so that no rotational torque is generated on the stage. In addition, arranging a plurality of Y mass bodies 23 can increase the degree of freedom in designing the operating axis of the driving thrust acting on the Y stage base 9 so as to pass through the position of the center of gravity. However, the number of the Y mass bodies 23 is not limited to a plurality.

[0099] Here, the mass of the Y stage base 9 M _y, when the total mass of the Y mass body 23 and m _y, with the driving stroke s _y stroke S _y in the Y direction of the Y-direction moving body mass determined by the mass ratio of M _y and m _y Te is expressed by the following equation.

S _y / s _y = 1 / (M _y / m _y )

That is, the ratio of the amount of movement between the two moves relative to the stage base 3 at the reciprocal of the mass ratio. Therefore, by increasing the m _y, since the mass ratio M _y / m _y is reduced, thereby reducing design a drive stroke s _y of the Y mass.

In this embodiment, as the stage moves,
Although the mass body is driven in the opposite direction to the stage, the relationship between the movement amount of the stage and the movement amount of the mass body is the same as in the first embodiment. Therefore, also in the case of the third embodiment, the first
Similarly to the embodiment, the Y stage base 9 and the Y mass body 23 constituting the inertial force applying means can be connected to the gravity compensating means via the cylinder rods A31 and B33. Therefore, both the inertial force applying means and the gravity compensation means can be made compatible with a simple configuration.

At this time, the ratio of the cross-sectional area of the piston A32 to the cross-sectional area of the piston B34 is determined by the Y stage base 9 and the Y
The mass ratio with the mass body 23 is substantially equal.

In the present embodiment, the reaction force due to the main stage being driven in the X direction is reduced by the movement of the X mass, and as a result, the exciting force on the stage base and the surface plate can be reduced. Furthermore, since the main stage and the X mass move in the X direction at the ratio of the reciprocal of the mass ratio, respectively, there is also an effect that almost no change occurs in the position of the center of gravity of the entire stage apparatus. Therefore, the deformation of the surface plate supporting the stage base can be suppressed. In particular, in the vertical stage as in the present embodiment, suppressing the reaction force and the change in the position of the center of gravity in the X direction can reduce the change in the load applied to the vibration isolation damper.
This is advantageous for a high-speed, high-precision stage device.

Further, in this embodiment, the driving reaction force due to the Y stage base being driven in the Y direction is reduced by the movement of the Y mass body, and as a result, the excitation force to the stage base and the surface plate is reduced. Can be. Further, since the Y stage base and the Y mass body move in the opposite directions with respect to the Y direction at the ratio of the reciprocal of the mass ratio, the position of the center of gravity of the entire stage apparatus hardly changes. Therefore, the deformation of the surface plate supporting the stage base can be suppressed. Further, by compensating the self-weight of the Y stage base with the connected cylinder mechanism, the driving means and the gravity compensation are compatible with a simple configuration, and the stage can be driven with little energy and heat generation.

Further, even in the case of an XY stage in which the reference surface of the stage base is a horizontal surface instead of the vertical stage as in the present embodiment, the driving mechanism for the stage and the mass body as in the present embodiment can be used. Can be provided. In that case, the gravity compensation means of the present embodiment may be omitted.

<Embodiment 4> FIG. 6 is a schematic front view of a vertical stage device according to a fourth embodiment of the present invention. In the figure, the same members as those in the second embodiment in FIG. 3 or the third embodiment in FIG. 5 are denoted by the same reference numerals.

In the fourth embodiment, as in the above-described embodiment, a vertical XY stage is provided with an inertial force applying means and a gravity compensating means.

The operation principle and the operation state of the inertial force applying means constituted by the magnet unit and the coil unit of the fourth embodiment are the same as those of the third embodiment, and the explanation is omitted.
The operation principle and operation state of the gravity compensating means composed of the pulley unit 43 and the belt 41 are the same as in the case of the second embodiment, and a description thereof will be omitted.

In the present embodiment, the reaction force due to the main stage being driven in the X direction is reduced by the movement of the X mass, and as a result, the exciting force on the stage base and the surface plate can be reduced. Further, since the main stage and the X mass move in opposite directions with respect to the X direction at a reciprocal ratio of the mass ratio, there is also an effect that almost no change occurs in the position of the center of gravity of the entire stage apparatus. Therefore, the deformation of the surface plate supporting the stage base can be suppressed. In particular, in the vertical stage as in the present embodiment, suppressing the reaction force and the change in the position of the center of gravity in the X direction can reduce the change in the load applied to the vibration isolation damper.
This is advantageous for a high-speed, high-precision stage device.

Further, in this embodiment, the driving reaction force due to the Y stage base being driven in the Y direction is reduced by the movement of the Y mass body, and as a result, the exciting force to the stage base and the surface plate is reduced. Can be. Further, since the Y stage base and the Y mass body move in the opposite directions with respect to the Y direction at the ratio of the reciprocal of the mass ratio, the position of the center of gravity of the entire stage apparatus hardly changes. Therefore, the deformation of the surface plate supporting the stage base can be suppressed. Furthermore, by supporting the weight of the Y stage base by gravity compensation means composed of a belt and a pulley unit, the drive means and gravity compensation are compatible with a simple configuration, and the stage can be driven with little energy and heat generation. Can be.

<Embodiment 5> FIG. 7 is a schematic front view of a vertical stage device according to a fifth embodiment of the present invention. In the numbers in the figure, the same members as those in the first embodiment in FIG.

In the fifth embodiment, similarly to the first embodiment, a vertical XY stage is provided with an inertial force applying means and a gravity compensating means.

The operation principle and operation state of the inertial force applying means of the fifth embodiment are the same as those of the first embodiment, and therefore the description is omitted.

Although the present embodiment also employs a cylinder mechanism having a piston as gravity compensation means, unlike the above-described embodiment, a cylinder supporting the Y stage base and a piston supporting the Y mass body are independent cylinders. It consists of a mechanism and performs gravity compensation separately.

In the figure, reference numeral 31 denotes a cylinder rod A connected to the Y stage base, and a tip opposite to the Y stage base 9 is supported by a cylinder piston A32. Reference numeral 33 denotes a cylinder rod B connected to the Y mass body 23, and a tip opposite to the Y mass body 23 is supported by a cylinder piston B34.

The piston A of gravity compensation means (stage gravity compensation means) for compensating gravity of the Y stage base 9 seals the fluid of the air cylinder A36. A gravity compensation control unit (not shown) calculates a thrust command value to be given to the cylinder A36, and the thrust command value is supplied to a control valve (not shown) of the cylinder. The control valve changes the pressure or volume of the fluid in the cylinder A based on the given current value that is the specified thrust value, and adjusts the thrust of the piston A32. Piston A
Reference numeral 32 is fixed to the cylinder rod A31, and applies a thrust to the Y stage base 9 in the Y direction. Cylinder mechanism 36
By controlling the thrust, the weight of the Y stage base 9 is balanced by the thrust of the cylinder A36.

Similarly, the piston B34 of gravity compensating means (mass body gravity compensating means) for compensating the gravity of the Y mass body 23
Seals the fluid in the air cylinder B37. The control valve is controlled by a thrust command value from a gravity compensation control unit (not shown) to change the pressure or volume in the cylinder B, and adjust the thrust of the piston B37. In this case, the gravity of the Y mass body 23 is balanced by the thrust of the cylinder B37.

As a result, gravity compensation of the Y stage base 9 and the Y mass body 23 is performed. The cylinder A and the piston A, and the cylinder B and the piston B are non-contact, for example, so that they can move with extremely low friction sliding.

In the present embodiment, the gravity compensation of the Y stage base and the gravity compensation of the Y mass body can be performed independently. Therefore, the thrust of the piston of the cylinder mechanism performing the gravity compensation can be used as driving energy, and the Y stage base and the Y mass can be driven independently. In addition to reducing the stage reaction force, it is also possible to cancel the vibration generated on the Y stage base due to disturbance or the like. Further, there is no restriction on the cross-sectional area ratio between the piston A and the piston B supporting the Y stage base and the Y mass body as in the first embodiment, and the degree of freedom in design can be increased. Further, it is possible to cope with a change in mass of the Y stage base due to mounting a wafer on the stage.

<Sixth Embodiment> FIG. 8 is a schematic front view of a vertical stage device according to a sixth embodiment of the present invention. In the numbers in the drawing, the same members as those in the third embodiment in FIG. 5 or the fifth embodiment in FIG.

In the sixth embodiment, as in the above-described embodiment, the vertical XY stage is provided with an inertial force applying means and a gravity compensating means.

The main stage 5 of the present embodiment
(First stage) and an X direction (first direction) constituted by an X magnet unit 25 (first magnet) and an X coil unit 26 (first coil) provided on the X mass body 27 (first mass body). And the Y magnet unit 21 (second magnet) provided on the Y stage base 9 (second stage) and the Y mass body 23 (second mass body).
The operation principle and operation state of the inertial force applying means (second mechanism) in the Y direction (second direction) constituted by the coil unit 22 (second coil) are the same as those in the third embodiment, and therefore, description thereof is omitted. I do.

In the present embodiment, in addition to the effects obtained in the third embodiment, there is no restriction on the cross-sectional area ratio between the piston A and the piston B supporting the Y stage base and the Y mass body. Can be enhanced. Further, it is possible to cope with a change in mass of the Y stage base due to mounting a wafer on the stage.

<Embodiment 7> Next, an embodiment of an X-ray exposure apparatus using the above-described stage apparatus will be described. FIG. 9 is a configuration diagram of the X-ray exposure apparatus of the present invention. SR light 62 emitted from an SR generator 61 as an X-ray source enters a mirror 63 installed at a predetermined position from a light emitting point. The mirror 63 has a convex shape, and enlarges the sheet-like SR light 62 emitted from the SR generator 61. Although one mirror is shown in the figure, a plurality of mirrors may be used for the purpose of enlarging the sheet-like SR light. The SR light 64 reflected by the mirror passes through a transmission mask 67 of an original plate in which a pattern made of an X-ray absorber is formed on an X-ray transmission film, and then has a desired pattern shape. The coated substrate 68 (wafer) is irradiated. The wafer 68 is held by the wafer chuck 69 of the stage device described above, and the wafer chuck 69 is mounted on a main stage (not shown). A shutter 65 for controlling the exposure time over the entire exposure area is provided upstream of the mask 67. The shutter 65 is driven by a shutter drive unit 66 controlled by a shutter control unit 70. A beryllium film (not shown) is located between the mirror 63 and the shutter 65. The mirror side of the beryllium film is in an ultra-vacuum, and the shutter side is in a reduced pressure He.

By using the exposure apparatus of this embodiment, it is possible to obtain an exposure apparatus compatible with high speed and high precision.

<Embodiment 8> Next, an embodiment of a method of manufacturing a semiconductor device using the above-described exposure apparatus will be described. FIG. 10 shows a flow of manufacturing semiconductor devices (semiconductor chips such as ICs and LSIs, liquid crystal panels, CCDs, thin-film magnetic heads, micromachines, etc.). Step S11
In (circuit design), a circuit of a semiconductor device is designed.
In step S12 (mask production), a mask on which the designed circuit pattern is formed is produced. On the other hand, step S13
In (wafer manufacturing), a wafer as a substrate is manufactured using a material such as silicon. Step S14 (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer. The next step S15 (assembly) is called a post-process, and is a process of forming a semiconductor chip using the wafer manufactured in step S14, and includes processes such as an assembly process (dicing and bonding) and a packaging process (chip encapsulation). including. In step S16 (inspection), inspections such as an operation check test and a durability test of the semiconductor device manufactured in step S15 are performed. Through these steps, a semiconductor device is completed and shipped (step S17).

FIG. 11 shows a detailed flow of the wafer process. In step S21 (oxidation), the surface of the wafer is oxidized. In step S22 (CVD), an insulating film is formed on the wafer surface. In step S23 (electrode formation), electrodes are formed on the wafer by vapor deposition. Step S2
In step 4 (ion implantation), ions are implanted into the wafer. In step S25 (resist processing), a photosensitive agent is applied to the wafer. In step S26 (exposure), the circuit pattern of the mask is printed and exposed on the wafer by the exposure apparatus described above. In step S27 (developing), the exposed wafer is developed. In step S28 (etching), portions other than the developed resist image are removed. In step S29 (resist stripping), unnecessary resist after etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer. By using the manufacturing method of the present embodiment, a highly integrated semiconductor device can be manufactured.

[0129]

According to the first aspect of the present invention, in addition to the effect of reducing the inertial force due to the movement acceleration of the stage, the effect of canceling the change in the center of gravity due to the movement of the stage can be obtained. In particular, suppressing a reaction force and a change in the position of the center of gravity in the X direction (first direction) is advantageous for a high-speed, high-precision stage device because a change in load applied to the vibration damper can be reduced.

According to the second aspect of the present invention, the first mechanism and the second mechanism are configured by attaching different ones of the magnet and the coil to the stage and the mass body. The mass moves as the stage moves. With this configuration, in addition to the effect of reducing the inertial force due to the movement acceleration of the stage, the effect of canceling the change in the center of gravity due to the movement of the stage is obtained. In particular, suppressing the reaction force and the change in the position of the center of gravity in the X direction (first direction) can reduce the change in the load applied to the vibration isolation damper.
This is advantageous for a high-speed, high-precision stage device.

According to the eighth aspect of the present invention, the stage device is provided with stage gravity compensation means for compensating the gravity of the stage.
According to the ninth aspect of the present invention, the mass body gravity compensating means for compensating the gravity of the mass body is provided. With this configuration, the stage can be driven with little energy and heat generation.
In particular, according to the tenth aspect of the present invention, the stage gravity compensating means and the mass body gravity compensating means are connected by the pulley and the belt so that the gravity compensating means performs the gravity compensation by balancing the weight of the stage with the weight of the mass body. Have been. Further, claim 1
According to the third aspect of the invention, the gravity compensating means is connected to the cylinder mechanism so as to perform gravity compensation by balancing the weight of the stage with the weight of the mass body. Thus, the driving unit, the inertial force applying unit, and the gravity compensating unit can be compatible with a simple configuration.

According to the fifteenth aspect, the movable stage and the mass body are each provided with a cylinder mechanism. With this configuration, it is possible to perform gravity compensation of the weight of the stage and the weight of the mass body. According to the sixteenth aspect of the present invention, the respective cylinder mechanisms are connected, and the cross-sectional area ratio of the piston and the mass ratio of the stage and the mass body are made substantially equal as in the invention of the seventeenth aspect. Gravity compensation can be performed by balancing the body weight. With this configuration, the weight of the stage and the weight of the mass body can be gravity compensated with a simple configuration.

According to the eighteenth aspect of the present invention, it is possible to suppress the reaction force and the change in the position of the center of gravity due to the movement of the stage.

Further, according to the invention of claim 22, it is possible to achieve both the driving means of the stage and the mass body and the gravity compensation means with a simple configuration.

According to the twenty-seventh aspect of the present invention, the stage device capable of suppressing deformation of the main body is used for the X-ray exposure apparatus. The cost increase due to the increase in size and size can be suppressed, and high-speed, high-precision exposure has become possible.

[Brief description of the drawings]

FIG. 1 is a schematic front view of a vertical stage device according to a first embodiment.

FIG. 2 is a model diagram of gravity compensation means of the first embodiment.

FIG. 3 is a schematic front view of a vertical stage device according to a second embodiment.

FIG. 4 is a model diagram of a gravity compensation unit according to a second embodiment.

FIG. 5 is a schematic front view of a vertical stage device according to a third embodiment.

FIG. 6 is a schematic front view of a vertical stage device according to a fourth embodiment.

FIG. 7 is a schematic front view of a vertical stage device according to a fifth embodiment.

FIG. 8 is a schematic front view of a vertical stage device according to a sixth embodiment.

FIG. 9 is a configuration diagram of an X-ray semiconductor exposure apparatus according to a seventh embodiment.

FIG. 10 is a flowchart of a semiconductor device manufacturing method.

FIG. 11 is a flowchart of a wafer process.

[Description of Signs] 1 surface plate 2 anti-vibration damper 3 stage base 4 wafer chuck 5 main stage 6 X length measuring mirror 7 Y length measuring mirror 8 Y stage guide 9 Y stage base 10 X stage guide 21 Y magnet unit 22 Y coil Unit 23 Y mass body 24 Y mass body guide 25 X magnet unit 26 X coil unit 27 X mass 28 X mass body guide 31 Cylinder rod A 32 Cylinder piston A 33 Cylinder rod B 34 Cylinder piston B 35 Air cylinder 36 Air Cylinder A 37 Air cylinder B 41 Belt 42 Fixed base 43 Pulley unit 51 Y linear motor mover 54 X linear motor stator 61 SR generator 62 SR light 63 Mirror 64 SR light 65 Shutter 66 Shutter drive unit 67 Mask 68 Wafer 69 Wafer chuck 70 Shutter control unit

Claims (28)

[Claims] A first stage movable in a first direction on a reference plane including a vertical direction; first stage driving means for moving the first stage in the first direction; A second stage movable in a second direction intersecting the first direction; and a second stage driving means for moving the second stage in the second direction. A second stage moving in a direction opposite to the first stage is provided. A first mechanism having one mass body, first mass body driving means for driving the first mass body, a second mass body moving in a direction opposite to the second stage, and driving the second mass body And a second mechanism having a second mass driving means. 2. The stage apparatus according to claim 2, wherein said first stage driving means and said second stage driving means are linear motors. 3. The first mass body driving means and the second mass body driving means.
3. The stage device according to claim 1, wherein the mass driving means is a linear motor. 4. A first stage movable in a first direction,
A second stage that is movable in a second direction that intersects the first direction. The first stage and a first mass that moves in a direction opposite to the first stage include a first magnet and a first coil. And a first mechanism configured by attaching different ones of the second stage and the second stage and a second mass body that moves in a direction opposite to the second stage. A stage device provided with at least one of a second mechanism configured to be attached. 5. The stage apparatus according to claim 1, wherein a plurality of said first or second mass bodies are arranged. 6. A method for reducing a reaction force or a change in a center of gravity generated by driving the first or second stage,
The stage device according to claim 1, wherein the first or second mass body moves. 7. The stage device according to claim 1, wherein the second direction includes a vertical direction. 8. The stage apparatus according to claim 7, further comprising stage gravity compensation means for compensating gravity of said second stage. 9. The stage apparatus according to claim 8, further comprising mass gravity compensation means for compensating gravity of said second mass body. 10. The stage gravity compensation means and the mass body gravity compensation means are connected by a pulley and a belt so as to balance the weight of the second stage and the second mass body to perform gravity compensation. The stage device according to claim 9, wherein: 11. A pulley diameter ratio between the pulley supporting the second stage and the pulley supporting the second mass body is a reciprocal of a mass ratio between the second stage and the second mass body. 11. The stage device according to claim 10, wherein the stage devices are substantially equal. 12. The stage apparatus according to claim 8, wherein said gravity compensation means comprises a cylinder mechanism. 13. The stage gravity compensation means comprises a first cylinder mechanism, and the mass body gravity compensation means comprises a second cylinder mechanism.
The first cylinder mechanism and the second cylinder mechanism are connected to each other so as to perform a gravity compensation by balancing a weight of the second stage and the second mass body. The stage device according to claim 12. 14. A ratio of a cross-sectional area of a piston of the first cylinder mechanism to a cross-sectional area of a piston of the second cylinder mechanism is substantially equal to a mass ratio between the second stage and the second mass body. The stage device according to claim 13, wherein: 15. A movable stage, a mass moving in a direction opposite to the stage, a first cylinder mechanism connected to the stage, and a second cylinder mechanism connected to the mass. A stage device characterized by the above-mentioned. 16. The apparatus according to claim 15, wherein the first cylinder mechanism and the second cylinder mechanism are connected.
The described stage device. 17. A ratio of a cross-sectional area of a piston of the first cylinder mechanism to a cross-sectional area of a piston of the second cylinder mechanism is substantially equal to a mass ratio of the stage to the mass body. The stage device according to claim 16. 18. The stage apparatus according to claim 15, wherein the mass body moves so as to reduce a reaction force or a change in the position of a center of gravity generated by the movement of the stage. 19. The stage apparatus according to claim 15, wherein said stage is movable in a direction including a vertical direction. 20. The stage according to claim 19, wherein the first cylinder mechanism vertically supports the weight of the stage, and the second cylinder mechanism vertically supports the weight of the mass body. apparatus. 21. The apparatus according to claim 20, wherein the first cylinder mechanism and the second cylinder mechanism are connected so as to perform gravity compensation by balancing the weight of the stage and the mass body. Stage equipment. 22. The apparatus according to claim 15, further comprising at least one of stage driving means for driving said stage and mass driving means for driving said mass.
22. The stage apparatus according to any one of 21. 23. The stage apparatus according to claim 22, wherein said stage driving means and said mass body driving means are linear motors. 24. The stage device according to claim 12, wherein the cylinder mechanism is an air cylinder mechanism. 25. The stage device according to claim 12, wherein the cylinder mechanism is a hydraulic cylinder mechanism. 26. An exposure apparatus comprising the stage device according to claim 1. Description: 27. An exposure apparatus according to claim 26, wherein said exposure apparatus is an X-ray exposure apparatus. 28. A device manufacturing method, comprising manufacturing a device using the exposure apparatus according to claim 26 or 27.