JPH11297616A - Stage equipment, aligner using the equipment and device-manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve dynamic characteristics of a vertical stage. SOLUTION: A Y-stage 20 driven in the Y-axis direction (vertical direction) by a Y-linear motor 40 is linked with a counter mass 61 for self-weight compensation by using a belt 62. The Y-stage 20 is coupled with the belt 62 via an actuator 70 such as a fellowfram and an air cylinder which can control air pressure. On the basis of position information of the X-stage 30, the actuator 70 is controlled. Thereby angular moment is corrected, and a load applied to a Y-guide 11 is reduced. A linear motor accelerating the counter mass 61 in the direction opposite to the Y-linear motor 40 is installed on the back side of a surface plate 10. Thereby natural vibration of the counter mass 61 is eliminated, and vibration removing property is improved, together with the actuator 70.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus used in a lithography process for manufacturing semiconductor devices and the like, a stage apparatus mounted on various precision processing machines or various precision measuring instruments, and an exposure apparatus using the same. And a device manufacturing method.

[0002]

2. Description of the Related Art Conventionally, an apparatus generally called a stepper is known as an exposure apparatus used for manufacturing a semiconductor device or the like. In this method, a substrate is two-dimensionally moved stepwise with respect to a projection optical system for projecting an original pattern such as a reticle or a mask onto a substrate such as a wafer, and a plurality of original patterns are printed on one substrate. .

A stage device for positioning a substrate such as a wafer by moving it stepwise with respect to a projection optical system of a stepper includes:
As semiconductor devices and the like become more highly integrated, higher accuracy is required.

In recent years, the size of wafers has tended to increase in order to increase the number of device products obtained from one wafer, that is, the number of devices to be obtained, and accordingly stage devices such as steppers have become larger and larger. Increase weight. In order to obtain the required accuracy in such a state, it is necessary to further improve the dynamic characteristics of the stage, and it is desired to increase the rigidity of the guide and the like, but this results in a further increase in the weight of the entire stage. .

In addition, in order to reduce the cost of a semiconductor device or the like, it is required to shorten the exposure cycle time and improve the throughput, and it is desired that a stage for moving a wafer or the like be driven at a high speed. However, in order to increase the speed of a large and heavy stage, the rigidity of the structure supporting the stage must be further strengthened. As a result, the entire apparatus becomes significantly larger, heavier, and more expensive. Could be.

On the other hand, recently developed X-ray exposure apparatuses using soft X-rays (radiated light from a charged particle storage ring) as exposure light hold substrates such as wafers in a vertical direction, and use a standard such as a vertical or similar one. A vertical stage that moves two-dimensionally in a plane is used. In such a vertical stage, in addition to the problems associated with the above-mentioned enlargement and speeding up,
Since the stage is moved in the direction of gravity, a counter mass mechanism or the like that compensates for the weight of the stage is required.However, if vibration occurs in the counter mass or the like, a disturbance that degrades the positioning accuracy of the wafer or the like is caused. The dynamic characteristics and the like also deteriorate significantly.

FIGS. 15 and 16 show a conventional vertical stage, which is reciprocally movable in the Y-axis direction (vertical direction) along a surface plate 1110 erected on a base plate 1110a. A certain Y stage 1120 and a Y stage 1
X stage 1 that can reciprocate in the X-axis direction on the X-axis 120
130, a cylinder 1140 for moving the Y stage 1120 in the Y axis direction, and an XY stage having a linear motor (not shown) for moving the X stage 1130 in the X axis direction.

The surface plate 1110 has a guide surface for supporting the back surface of the Y stage 1120 in a non-contact manner via an air pad or the like. Also, one end of the surface plate 1110 has a Y stage 1
An unillustrated Y guide (yaw guide) for guiding the Y-axis 120 in the Y-axis direction is provided.

[0009] Y stage 1120 and X stage 1130
A self-weight compensating mechanism 1160 for canceling (cancelling) the weight of a wafer or the like (not shown) held by the Y-stage 1120 at one end, and a belt 1162 for suspending a counter mass 1161 at the other end, and winds and supports this. It has a pulley 1163 and the weight of the counter mass 1161 is Y
The stage 1120 and the X stage 1130 are set so as to balance the weight of the stage movable portion including the wafer and the like held thereon.

[0010]

However, according to the above prior art, when the X stage moves in the X-axis direction on the Y stage, the position of the center of gravity of the stage movable section including the Y stage and the X stage changes. The balance of the rotational moment about the axis (in the ωZ axis direction) changes. However, the counter mass alone cannot support this moment, and an excessive load is applied to the Y guide (yaw guide) of the Y stage.

In order to support such a large load, Y
Although it is necessary to increase the rigidity of the guide, increasing the rigidity of the Y guide involves increasing the size of the Y guide and the like, so that the entire stage becomes larger, heavier, and the dynamic characteristics of the stage deteriorate. As a result, there is an unsolved problem that high precision and high speed positioning are hindered.

In general, a steel belt or a wire is used as a belt connecting the stage and the counter mass. When the stage is moved, natural vibration of several tens Hz due to insufficient rigidity of the steel belt or the like is generated. Occur. In addition, the natural vibration of, for example, 50 Hz or more of the counter mass itself propagates to the front stage via the belt. These vibrations significantly deteriorate the positioning accuracy of the stage, and become a major obstacle in improving the frequency response characteristics of the positioning control system.

The present invention has been made in view of the above-mentioned unsolved problems of the prior art, and has been made to improve the dynamic characteristics of a vertical stage having a self-weight compensation mechanism such as a counter mass.
It is an object of the present invention to provide a high-performance stage apparatus capable of greatly promoting high-speed positioning and high-accuracy positioning without increasing the size of the apparatus, an exposure apparatus using the same, and a device manufacturing method.

[0014]

In order to achieve the above object, a stage apparatus according to the present invention comprises: a work stage which is movable two-dimensionally along a reference plane; First driving means for moving the work stage in an approximate first direction, second driving means for moving the work stage in a second direction, a counter mass balanced with the weight of the work stage, and the counter mass A connecting member for connecting the counter mass to the work stage; and a third member for moving the counter mass in a direction opposite to the first direction.
Characterized in that it has the following driving means.

The third step is performed such that the acceleration of the work stage in the first direction is equal to the absolute value of the acceleration of the counter mass.
It is preferable that a control system for controlling the driving means is provided.

It is preferable that a plurality of connecting members are provided, and an actuator for adjusting the tension or the effective length of each connecting member and a control means for controlling the actuator based on positional information of the work stage be provided.

[0017] It is preferable that an actuator is provided at a connecting portion between each connecting member and the work stage.

[0018] An actuator may be provided at a connecting portion between each connecting member and the counter mass.

[0019] The actuator may be provided on a support portion of the pulley that winds and supports each connecting member.

[0020]

The counter mass for self-weight compensation, which balances with the weight of the work stage, is connected to the work stage by a belt or the like. When the position of the center of gravity of the work stage changes due to the driving of the second driving means, and the balance of the rotational moment is impaired, the posture of the work stage changes and an excessive load is applied to the yaw guide. Therefore, an actuator for changing the tension or the effective length of each belt or the like based on the position information of the work stage is provided to correct the rotational moment.

Thus, the load on the yaw guide when the wafer or the like is moved stepwise can be reduced, and the dynamic characteristics of the stage device can be greatly improved.

When an air spring, an air cylinder, a linear motor, or the like is used for the actuator, since these have a vibration absorbing property, vibrations generated due to insufficient rigidity of the connecting member are attenuated, and the dynamic characteristics of the stage are improved. The effect of further improvement can be expected.

As described above, even if the weight of the work stage is canceled by the self-weight compensating mechanism using the counter mass and the vibration or the like propagating from the counter mass or belt to the work stage is reduced, the counter mass still remains. Cannot sufficiently remove the natural vibration of the stage, which may adversely affect the dynamic characteristics of the stage. Although the frequency of such vibration is as low as several Hz, it cannot be ignored in order to cope with higher precision and higher speed of the exposure apparatus.

Therefore, third driving means is provided for accelerating the counter mass in the direction opposite to the work stage to actively suppress the natural vibration of the counter mass. By controlling the third driving means based on a command value given to the control system of the first driving means to make the acceleration difference between the counter mass and the work stage zero, disturbance caused by the counter mass can be almost completely eliminated. Thus, the positioning accuracy can be further improved, and the speeding up can be promoted.

[0025]

Embodiments of the present invention will be described with reference to the drawings.

FIG. 1 shows a stage device according to a first embodiment, which is mounted on a base plate (not shown) in a Y-axis direction (vertical or approximate direction). ), A first stage for moving the Y stage 20 in the Y-axis direction, and a first stage for moving the Y stage 20 in the Y-axis direction.
An XY stage having a pair of Y linear motors 40 as driving means and an X linear motor 50 as second driving means for moving the X stage 30 in the X-axis direction. FIG.
In the figure, the Y linear motor 40 on the left side in the figure is omitted to explain a Y guide 11 described later.

The surface plate 10 has an XY guide surface 10a as a reference surface for supporting the back surfaces of the Y stage 20 and the X stage 30 in a non-contact manner via an air pad or the like which is a hydrostatic bearing device (not shown).

A Y guide 11 (shown by a broken line), which is a yaw guide for guiding the Y stage 20 in the Y axis direction, is provided upright at one end of the surface plate 10 in the X axis direction. The space between the Y stages 20 is kept in a non-contact state by an air pad 20a or the like which is a yaw guide static pressure bearing device. When both Y linear motors 40 are driven, the Y stage 20 moves on the XY guide surface 10 a of the base 10 along the Y guide 11.

The Y stage 20 includes a pair of Y sliders 2
1 and 22 and an X linear motor stator 52 supported at both ends thereof.
The back surfaces of the Y sliders 21 and 22 face the XY guide surface 10a of the surface plate 10, and are supported in a non-contact manner through the air pads and the like as described above. The Y slider 22 on the left side in the figure is longer than the other, and the side surface 22a faces the Y guide surface 11a of the Y guide 11, and is guided in a non-contact manner through the air pad 20a and the like as described above. (See FIG. 2B). The Y sliders 21 and 22 are integrally connected to the Y linear motor mover 41 by the connecting plate 23.

The X stage 30 is a hollow frame having a top plate 31, and an X linear motor stator 52 penetrates the hollow portion. The surface of the top plate 31 forms a work stage for sucking and holding a wafer, which is a work (not shown).

The Y linear motors 40 are connected to the Y sliders 21 and 21 of the Y stage 20 via the connecting plate 23 as described above.
A Y linear motor mover 41 integrally connected to
There is a Y linear motor stator 42 penetrating the opening.

The current supplied to each Y linear motor stator 42 generates a thrust in the Y axis direction on each Y linear motor movable element 41, causing the Y stage 20 and the X stage 30 to move in the Y direction.
Move in the axial direction. Possible X stage 30 to Y stage 2
The X linear motor mover that moves in the X-axis direction on 0 is
The X stage 30 is fixed inside the top plate 31.

The X-axis motor thrust is generated in the X-axis direction by the current supplied to the X-linear motor stator 52, and the X-stage 30 is moved in the X-axis direction along the Y-linear motor stator 52. .

The counter mass mechanism 60, which is a self-weight compensation mechanism for canceling (cancelling) the weight of the Y stage 20 and the X stage 30, etc., has Y sliders 21 and 22, ie, the Y stage 20, at one end and a counter mass 61 at the other end. A belt 62, which is a plurality of connecting members to be suspended, and a pulley 63 for winding and supporting the belt 62, the weight of the counter mass 61 is
The balance is set so as to balance the weight of the entire stage movable portion including the Y stage 20 and the X stage 30 and the wafers held thereon.

When the X stage 30 moves in the X axis direction,
Because the position of the center of gravity of the stage movable part including the Y stage 20 and the X stage 30 changes, around the Z axis (in the ωZ axis direction)
The balance of the rotational moment of the motor is lost. However, this moment cannot be received only by the counter mass mechanism 60, and an excessive load is applied to the Y guide (yaw guide) 11 for guiding the Y stage 20.

In order to support such a large load,
It is necessary to significantly increase the rigidity of the Y guide 11,
Since the rigidity of the Y guide 11 is accompanied by an increase in the size of the Y guide 11 and the like, the entire stage is further increased in size and weight, and the dynamic characteristics of the stage are deteriorated. The result is a great hindrance.

The Y stage 20 and the counter mass 6
Generally, a steel belt, a wire, or the like is used as the belt 62 connecting the first and second belts 1. However, when the Y stage 20 is moved, vibration occurs due to insufficient rigidity of the steel belt. Such vibration significantly deteriorates the positioning accuracy of the stage, and becomes a major obstacle in improving the frequency response characteristics of the positioning control system.

Therefore, an actuator 70 for adjusting the tension or the effective length of the belt 62 according to the displacement of the X stage 30 is provided at the connection between the Y stage 20 and each belt 62.
Is provided. The actuator 70 is a bellowsram (air spring) 71, an air cylinder 72, a linear motor 73 for controlling the tension of the belt 62 as shown in FIGS. 4 to 6, respectively, or the effective length of the belt 62 as shown in FIG. A piezoelectric element 74 for changing the height is used.
The drive amount of each actuator 70 of the belt 62 that suspends both Y sliders 21 and 22 is individually controlled based on the position information of the X stage 30 as described later, so that the tension or the effective length of each belt 62 is controlled. Adjust the length. In this way, by canceling (compensating) the rotational moment generated with the movement of the X stage 30, the load applied to the Y guide 11 by the Y stage 20 is reduced.

In addition, the bellofram 71, the air cylinder 72, and the linear motor 73 have a vibration absorbing effect of absorbing and attenuating natural vibration generated due to insufficient rigidity of the belt 62 and natural vibration of the counter mass 61 itself. That is, the actuator 70 has the advantage that the vibration transmitted from the belt 62 to the Y stage 20 can be reduced, and the positioning accuracy and the frequency response characteristic of the positioning control system can be greatly improved.

The space between the guide surface 11a of the Y guide 11 and the Y stage 20 (Y slider 22) opposed thereto is kept in a non-contact state by the air pad 20a as described above. Y stage 20 has a magnetic pad 20b in addition to the air pad 20a, which is a preload of the air pads 20a and opposite, is for obtaining a bearing stiffness k ₁ shown in FIG. 2 (a) .

As shown in FIG. 3, a counter mass yaw guide 64 is provided on the back side of the surface plate 10 in parallel with the Y guide 11.
Opposes an air pad 61a and a magnetic pad 61b, which are counter mass yaw guide static pressure bearing devices provided at one end of the counter mass 61, and guide the counter mass 61 in the Y-axis direction without contact. The magnetic pad 61b of the counter mass 61 is an air pad 61a.
And a preload opposite, is configured to obtain the bearing stiffness k ₂ is greater than the bearing rigidity k ₁ of the Y stage 20 side as shown in FIG.

As described above, the counter-mayo guide 64
The of the bearing stiffness k ₂ is greater than the bearing rigidity k ₁ of Y guide 11, the influence of the rotation moment generated when the center of gravity of the Y stage 20 is accompanied with the movement of the X-axis direction of the X stage 30 has changed , Counter Masyo Guide 6
4 to reduce the rotational moment applied to the Y stage 20.

The positions of the X stage 30 in the Y-axis direction and the X-axis direction are respectively determined by position sensors 30c and 30c which receive the reflected light from the Y length measuring mirror 30a and the X length measuring mirror 30b integrated with the X stage 30, respectively. It is measured by 30d.

Next, as each actuator 70, FIG.
The case where the bellofram 71 shown in FIG. The bellow ram 71 has a bellows 71b provided with an air supply port 71a, and the upper end of the bellows 71b is connected to a first housing 71c integral with the Y stage 20.
The lower end of b is connected to a second housing 71d connected to the lower end of the belt 62. By changing the pressure of the air supplied to the air supply port 71a, the air pressure in the bellows 71b is changed, thereby changing the tension of the belt 62.

FIG. 8 is a block diagram showing a control system for controlling the air pressure of the bellows 71b based on the position information of the X stage 30 in the X axis direction. The servo system for controlling the X linear motor 50 controls the drive amount of the X linear motor 50 based on the position command value sent from a computer (not shown) and the position information in the X axis direction of the X stage 30 fed back from the position sensor 30d. Control. The position command value is converted to kp and transmitted to the controller 70a as a control means together with the pressure command value of the bellofram control system, and the bellows 71b is adjusted by controlling the servo valve connected to the air supply port 71a of the bellofram 71. Control the air pressure inside.

The conversion coefficient k is converted into the position command value of the X stage 30.
By multiplying by p and adding the pressure command value of the bellofram control system, the air pressure in each bellofram 71 is changed when the position of the center of gravity of the stage movable section changes, and the tension of each belt 62 is adjusted. By individually adjusting the tension of each belt 62 in this manner, a rotational moment opposite to the rotational moment generated by the movement of the X stage 30 is generated, and the load on the Y guide 11 is reduced.

Since the load applied to the Y guide 11 is greatly reduced by performing the above-described moment correction, the dynamic characteristics of the stage can be significantly improved without increasing the size and weight of the Y guide 11, and the step movement can be achieved. And high-speed and high-precision positioning.

As described above, Y is controlled by the actuator 70.
Even if the rotational moment of the stage 20 is corrected and the vibration propagating to the Y stage 20 via the belt 62 is reduced, it is still difficult to completely eliminate the vibration propagating from the counter mass 61 to the Y stage 20. Such vibrations are as low as several Hz, but cannot be neglected in order to further improve the positioning accuracy and promote the speeding up.

Therefore, as shown in FIG. 3, a pair of linear motors 80 as third driving means for suppressing the natural vibration of the counter mass 61 by accelerating the counter mass 61 in the opposite direction to the Y stage 20 is provided. Provide. The two linear motors 80 are provided at both ends of the counter mass 61, and are respectively located behind the Y linear motor 40 that drives the Y stage 20 in the Y-axis direction.

Each linear motor 80 has a counter mass 6
1 has a linear motor mover 81 which moves along a linear motor stator 82 provided on a side edge of the surface plate 10. By controlling the current supplied to the linear motor stator 82, the acceleration of the counter mass 61 in the Y-axis direction
If the absolute value is adjusted in the opposite direction to the acceleration given to the Y stage 20 from 0, the counter mass 6
Disturbance due to one natural vibration can be almost completely removed. Linear motor 80 for driving counter mass 61
This control system will be described later with reference to the block diagram shown in FIG.

The counter mass mechanism 60 including the belt 62
Vibration propagating from the actuator to the Y stage 20
By attenuating by 0 and reducing the natural vibration itself of the counter mass 61, disturbance of the control system of the Y stage 20 is extremely effectively removed, contributing to further improvement of positioning accuracy and speeding up of positioning. it can.

The use of such a small and high-performance stage apparatus suitable for high-speed operation can greatly contribute to the miniaturization, high-performance, and improvement in productivity of an exposure apparatus for manufacturing a semiconductor device or the like.

When an air cylinder 72 shown in FIG. 5 is used as each actuator 70 instead of the bellofram 71, the operation is as follows. A cylinder 72b having an air supply port 72a is integral with the Y stage 20 and a belt 62
A piston 72c is connected to the lower end of the piston 72c. Air supply port 7
By changing the pressure of the air supplied to 2a, the belt 6
2. Change the tension of 2. The control system for controlling the air pressure of the cylinder 72b is the same as in FIG.

The case where the linear motor 73 shown in FIG. 6 is used as each actuator 70 is as follows.
The coil 73 a of the linear motor 73 is integrated with the Y stage 20, and a driving magnet 7 is provided at the lower end of the belt 62.
3b are connected. The tension of the belt 62 is changed by changing the current supplied to the coil 73a. The control system for controlling the current supplied to the coil 73a is the same as in FIG.

The case where the piezoelectric element 74 shown in FIG. 7 is used as each actuator 70 is as follows. A housing 74 a supporting the upper end of the piezoelectric element 74 is integral with the Y stage 20, and a piezoelectric element 7
4 is connected to a housing 74b that supports the lower end. By changing the voltage of the piezoelectric element 74, its thickness is changed, and the effective length of the belt 62 is changed. The control system for controlling the voltage of the piezoelectric element 74 is the same as in FIG.

FIG. 9 shows a control system of a linear motor 80 for driving the counter mass 61 in the Y-axis direction.
The servo system that controls the Y linear motor 40 adjusts the drive amount of the Y linear motor 40 based on a position command value sent from a computer (not shown) and position information in the Y axis direction of the Y stage 20 fed back from the position sensor 30c. Control. The above-mentioned position command value is differentiated twice and converted into a kp-converted acceleration command value.
Is sent to the linear motor 80. The drive amount of the Y stage 20 and the counter mass 61 can be controlled synchronously only by adding such a simple control system.

FIG. 10 shows a second embodiment, in which a pulley 63 provided at the upper end of the base 10 instead of providing an actuator 70 at the connection between the belt 62 and the Y stage 20. The actuator 90 is provided on the bearing portion (supporting portion) of (1). As shown in FIG. 11, the actuator 90 is a belofram 91 disposed between the bearing base 63b on which the rolling bearing 63a is mounted to support the pulley 63 and the surface plate 10, and the internal configuration of the belofram 91 is as follows. 8 is similar to Velofram 71 of FIG.
Is controlled by the same control system as.

Instead of the bellofram 91, an air cylinder, a linear motor, a piezoelectric element, etc. similar to those shown in FIGS. 5 to 7 may be used.

Surface plate 10, Y guide 11, Y stage 2
0, the X stage 30, the Y linear motor 40, the X linear motor 50, the countermass mechanism 60, and the like are the same as those in the first embodiment, and are represented by the same reference numerals, and description thereof is omitted.

As described above, the actuator for adjusting the tension and the effective length of the belt may be used for the support of the pulley.
Further, it is needless to say that the same compensation of the rotational moment as described above can be effectively performed even if the same actuator is provided at the connecting portion between the belt and the counter mass on the back side of the surface plate.

Next, an exposure optical system of an X-ray exposure apparatus using the stage device according to the present invention will be described. As shown in FIG. 12, the SR light (charged particle storage ring radiation) as the X-rays emitted from the SR generator (charged particle storage ring) 1 as the X-ray source is in the form of a sheet beam. Is scanned in the Y-axis direction by a mirror 2 installed at a predetermined distance from the camera. The number of mirrors 2 is not limited to one, and a plurality of mirrors may be used.

The SR light reflected by the mirror 2 is X
The light passes through an original M such as a mask in which a pattern made of an X-ray absorber is formed on a radiation transmitting film, and is irradiated onto a wafer W coated with a resist as a photosensitive material. The wafer W is held on a wafer chuck (work stage) on the stage device described above, and the stage device performs step movement and positioning.

A shutter 4 for controlling the exposure time is provided upstream of the original M, and a driving device 4a for the shutter 4 is provided.
Is controlled by the shutter controller 4b. A beryllium film (not shown) is provided between the mirror 2 and the shutter 4, and the mirror side is controlled to an ultra-high vacuum, and the shutter side is controlled to a reduced pressure atmosphere of helium gas.

Next, an embodiment of a method of manufacturing a semiconductor device using the above-described exposure apparatus will be described. FIG. 13 shows a flow of manufacturing a semiconductor device (a semiconductor chip such as an IC or an LSI, or a liquid crystal panel or a CCD). In step 1 (circuit design), the circuit of the semiconductor device is designed. Step 2 is a process for making a mask on the basis of the circuit pattern design. In step 3 (wafer manufacture), a wafer is manufactured using a material such as silicon.
Step 4 (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer. Step 5
(Assembly) is called a post-process, and is a process of forming a semiconductor chip using the wafer produced in Step 4, and includes processes such as an assembly process (dicing and bonding) and a packaging process (chip encapsulation). In step 6 (inspection), inspections such as an operation confirmation test and a durability test of the semiconductor device manufactured in step 5 are performed. Through these steps, a semiconductor device is completed and shipped (step 7).

FIG. 14 shows a detailed flow of the wafer process. Step 11 (oxidation) oxidizes the wafer's surface. Step 12 (CVD) forms an insulating film on the wafer surface. Step 13 (electrode formation) forms electrodes on the wafer by vapor deposition. In step 14 (ion implantation), ions are implanted into the wafer. Step 1
In 5 (resist processing), a photosensitive agent is applied to the wafer. Step 16 (exposure) uses the above-described exposure apparatus to print and expose the circuit pattern of the mask onto the wafer. Step 17 (development) develops the exposed wafer. In step 18 (etching), portions other than the developed resist image are removed. In step 19 (resist stripping), unnecessary resist after etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer. By using the manufacturing method of this embodiment, it is possible to manufacture a highly integrated semiconductor device, which has been conventionally difficult to manufacture.

[0066]

Since the present invention is configured as described above, it has the following effects.

When the work stage is moved, the natural vibration of the counterweight for self-weight compensation is effectively suppressed,
It prevents the vibration of the counter mass from propagating to the stage and deteriorating the dynamic characteristics and the like.

By improving the dynamic characteristics of the stage in this manner, it is possible to improve the positioning accuracy and promote the speeding up of the stage.

By using this stage apparatus for an exposure apparatus, it is possible to greatly promote higher definition and lower cost of semiconductor devices and the like.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a stage device according to a first embodiment.

FIG. 2 is a view for explaining a Y guide and the like of the apparatus of FIG. 1;
(A) is a figure explaining the bearing rigidity of a Y guide etc., (b) is a figure which shows the cross section of a Y guide.

FIG. 3 is a perspective view of the apparatus of FIG. 1 as viewed from the back side.

FIG. 4 is a diagram illustrating a bellofram used as an actuator.

FIG. 5 is a diagram illustrating an air cylinder used as an actuator.

FIG. 6 is a diagram illustrating a linear motor used as an actuator.

FIG. 7 is a diagram illustrating a piezoelectric element used as an actuator.

FIG. 8 is a block diagram showing a control system of the actuator.

FIG. 9 is a block diagram illustrating a control system of a linear motor that drives a counter mass.

FIG. 10 is a perspective view showing a second embodiment.

FIG. 11 is a diagram illustrating the actuator of FIG. 10;

FIG. 12 is a diagram illustrating an X-ray exposure apparatus.

FIG. 13 is a flowchart showing a semiconductor manufacturing process.

FIG. 14 is a flowchart showing a wafer process.

FIG. 15 is a side view showing a vertical stage according to a conventional example.

FIG. 16 is an elevational view showing the device of FIG.

[Explanation of symbols]

 10 Surface Plate 11 Y Guide 20 Y Stage 23 Connecting Plate 30 X Stage 40 Y Linear Motor 50 X Linear Motor 60 Counter Mass Mechanism 61 Counter Mass 62 Belt 63 Pulley 70,90 Actuator 70a Controller 71,91 Belofram 72 Air Cylinder 73,80 Linear motor 74 Piezoelectric element 81 Linear motor mover 82 Linear motor stator

──────────────────────────────────────────────────の Continuation of the front page (51) Int.Cl. ⁶ Identification code FI H01L 21/30 515G B23Q 1/14 B (72) Inventor Tadayuki Kubo 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. Inside

Claims (17)

[Claims] 1. A work stage which is movable two-dimensionally along a reference plane, first driving means for moving the work stage in a vertical direction or a first direction close to the work stage, and The second to move in the second direction
A driving means, a counter mass that balances the weight of the work stage, a connecting member that connects the counter mass to the work stage, and a third member that moves the counter mass in a direction opposite to the first direction. A stage device having a driving unit. 2. A control system for controlling a third drive unit such that an absolute value of an acceleration of a work stage in a first direction is equal to an absolute value of an acceleration of a counter mass. The described stage device. 3. A plurality of connecting members are provided, and an actuator for adjusting a tension or an effective length of each connecting member, and control means for controlling the actuator based on position information of a work stage are provided. The stage device according to claim 1, wherein: 4. The stage apparatus according to claim 1, wherein each drive means is a linear motor. 5. The stage device according to claim 3, wherein the actuator is provided at a connecting portion between each connecting member and the work stage. 6. The stage device according to claim 3, wherein the actuator is provided at a connecting portion between each connecting member and the counter mass. 7. The stage device according to claim 3, wherein the actuator is provided on a support portion of a pulley that winds and supports each connecting member. 8. The stage device according to claim 3, wherein the actuator has an air spring. 9. The stage device according to claim 3, wherein the actuator has an air cylinder. 10. The stage device according to claim 3, wherein the actuator has a linear motor. 11. The stage device according to claim 3, wherein the actuator has a piezoelectric element. 12. The stage device according to claim 1, further comprising a hydrostatic bearing device for keeping the work stage out of contact with the reference plane. 13. A yaw guide for guiding a work stage in a first direction, and a yaw guide hydrostatic bearing device for keeping the work stage out of contact with the yaw guide are provided. 13. The stage device according to any one of 12. 14. A counter mass yaw guide for guiding the counter mass in a first direction, and a counter mass yaw guide hydrostatic bearing device for keeping the counter mass in non-contact with the counter mass yaw guide. The stage device according to any one of claims 1 to 13, wherein: 15. An exposure apparatus comprising: the stage device according to claim 1; and an exposure optical system for exposing a work held by the stage device. 16. The exposure apparatus according to claim 15, wherein the exposure light is an X-ray. 17. A device manufacturing method comprising a step of exposing a wafer by the exposure apparatus according to claim 15.