KR101852236B1 - 노광 장치, 정렬 방법 및 디바이스 제조 방법 - Google Patents

노광 장치, 정렬 방법 및 디바이스 제조 방법 Download PDF

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Publication number
KR101852236B1
KR101852236B1 KR1020150065297A KR20150065297A KR101852236B1 KR 101852236 B1 KR101852236 B1 KR 101852236B1 KR 1020150065297 A KR1020150065297 A KR 1020150065297A KR 20150065297 A KR20150065297 A KR 20150065297A KR 101852236 B1 KR101852236 B1 KR 101852236B1
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KR
South Korea
Prior art keywords
alignment
substrate
condition
mark
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020150065297A
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English (en)
Korean (ko)
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KR20150133130A (ko
Inventor
다카시 오구라
Original Assignee
캐논 가부시끼가이샤
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Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20150133130A publication Critical patent/KR20150133130A/ko
Application granted granted Critical
Publication of KR101852236B1 publication Critical patent/KR101852236B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • H01L21/0274—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020150065297A 2014-05-19 2015-05-11 노광 장치, 정렬 방법 및 디바이스 제조 방법 Expired - Fee Related KR101852236B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-103097 2014-05-19
JP2014103097A JP6465565B2 (ja) 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20150133130A KR20150133130A (ko) 2015-11-27
KR101852236B1 true KR101852236B1 (ko) 2018-04-25

Family

ID=54538405

Family Applications (1)

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KR1020150065297A Expired - Fee Related KR101852236B1 (ko) 2014-05-19 2015-05-11 노광 장치, 정렬 방법 및 디바이스 제조 방법

Country Status (3)

Country Link
US (1) US9594314B2 (https=)
JP (1) JP6465565B2 (https=)
KR (1) KR101852236B1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240066039A (ko) 2022-11-07 2024-05-14 (주) 오로스테크놀로지 이미지 획득 방법 및 장치
US12483765B2 (en) 2022-11-07 2025-11-25 Auros Technology, Inc. Image acquisition method and device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040189995A1 (en) * 2003-03-27 2004-09-30 Canon Kabushiki Kaisha Position detection apparatus
KR101400615B1 (ko) 2006-08-31 2014-05-27 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101558445B1 (ko) 2011-08-30 2015-10-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 시스템, 리소그래피 장치의 제어 방법 및 디바이스 제조 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0530304A (ja) 1991-07-22 1993-02-05 Ricoh Co Ltd スキヤナのキヤリツジ固定装置
JP3590916B2 (ja) * 1995-12-28 2004-11-17 株式会社ニコン 位置決め方法
US6225012B1 (en) * 1994-02-22 2001-05-01 Nikon Corporation Method for positioning substrate
JP2000250232A (ja) * 1999-02-25 2000-09-14 Ono Sokki Co Ltd パターン形成装置
JP2003092248A (ja) * 2001-09-17 2003-03-28 Canon Inc 位置検出装置、位置決め装置及びそれらの方法並びに露光装置及びデバイスの製造方法
IL156589A0 (en) * 2003-06-23 2004-01-04 Nova Measuring Instr Ltd Method and system for automatic target finding
JP4289961B2 (ja) * 2003-09-26 2009-07-01 キヤノン株式会社 位置決め装置
JP2005167002A (ja) 2003-12-03 2005-06-23 Nikon Corp マーク検出方法とその装置、及び、露光方法とその装置
JP5096965B2 (ja) * 2008-02-29 2012-12-12 キヤノン株式会社 位置合わせ方法、位置合わせ装置、露光方法及びデバイス製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040189995A1 (en) * 2003-03-27 2004-09-30 Canon Kabushiki Kaisha Position detection apparatus
KR101400615B1 (ko) 2006-08-31 2014-05-27 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101558445B1 (ko) 2011-08-30 2015-10-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 시스템, 리소그래피 장치의 제어 방법 및 디바이스 제조 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240066039A (ko) 2022-11-07 2024-05-14 (주) 오로스테크놀로지 이미지 획득 방법 및 장치
US12483765B2 (en) 2022-11-07 2025-11-25 Auros Technology, Inc. Image acquisition method and device

Also Published As

Publication number Publication date
KR20150133130A (ko) 2015-11-27
US9594314B2 (en) 2017-03-14
JP2015220351A (ja) 2015-12-07
US20150331329A1 (en) 2015-11-19
JP6465565B2 (ja) 2019-02-06

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