KR101846977B1 - 착색 수지 조성물 및 수지 블랙 매트릭스 기판 - Google Patents

착색 수지 조성물 및 수지 블랙 매트릭스 기판 Download PDF

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Publication number
KR101846977B1
KR101846977B1 KR1020147000842A KR20147000842A KR101846977B1 KR 101846977 B1 KR101846977 B1 KR 101846977B1 KR 1020147000842 A KR1020147000842 A KR 1020147000842A KR 20147000842 A KR20147000842 A KR 20147000842A KR 101846977 B1 KR101846977 B1 KR 101846977B1
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KR
South Korea
Prior art keywords
resin composition
black
black matrix
pigment
silane coupling
Prior art date
Application number
KR1020147000842A
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English (en)
Korean (ko)
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KR20140061346A (ko
Inventor
요시히코 이노우에
료스케 아이하라
토루 오카자와
Original Assignee
도레이 카부시키가이샤
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Application filed by 도레이 카부시키가이샤 filed Critical 도레이 카부시키가이샤
Publication of KR20140061346A publication Critical patent/KR20140061346A/ko
Application granted granted Critical
Publication of KR101846977B1 publication Critical patent/KR101846977B1/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/04—Carbon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5455—Silicon-containing compounds containing nitrogen containing at least one group
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/28—Adhesive materials or arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
KR1020147000842A 2011-08-29 2012-08-28 착색 수지 조성물 및 수지 블랙 매트릭스 기판 KR101846977B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011185668 2011-08-29
JPJP-P-2011-185668 2011-08-29
PCT/JP2012/071651 WO2013031753A1 (fr) 2011-08-29 2012-08-28 Composition de résine colorée et substrat de matrice noire en résine

Publications (2)

Publication Number Publication Date
KR20140061346A KR20140061346A (ko) 2014-05-21
KR101846977B1 true KR101846977B1 (ko) 2018-04-09

Family

ID=47756238

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147000842A KR101846977B1 (ko) 2011-08-29 2012-08-28 착색 수지 조성물 및 수지 블랙 매트릭스 기판

Country Status (5)

Country Link
JP (1) JP5234230B1 (fr)
KR (1) KR101846977B1 (fr)
CN (1) CN103765254B (fr)
TW (1) TWI512403B (fr)
WO (1) WO2013031753A1 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5327345B2 (ja) * 2012-02-23 2013-10-30 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材。
JP6182999B2 (ja) * 2013-06-25 2017-08-23 日油株式会社 カラーフィルター保護膜用熱硬化性樹脂組成物、及びその硬化膜を備えるカラーフィルター
CN105378615B (zh) * 2013-07-25 2019-05-31 东丽株式会社 触控面板用负型感光性白色组合物、触控面板及触控面板的制造方法
JP6373571B2 (ja) * 2013-11-14 2018-08-15 東京応化工業株式会社 ブラックカラムスペーサ形成用感光性樹脂組成物
KR20160071994A (ko) 2014-12-12 2016-06-22 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용한 블랙매트릭스 및 이를 구비한 화상 표시 장치
CN107111206A (zh) 2014-12-15 2017-08-29 默克专利股份有限公司 偏振光发射器件
KR20160078540A (ko) 2014-12-24 2016-07-05 세명일렉트로닉스 주식회사 잉크젯 프린팅용 도료 조성물
KR20180030644A (ko) 2015-07-17 2018-03-23 메르크 파텐트 게엠베하 발광성 입자, 잉크 제제, 중합체 조성물, 광학 디바이스, 이들의 제조 및 발광성 입자의 이용
CN108139666B (zh) 2015-09-29 2021-09-07 默克专利有限公司 光敏组合物和色彩转换膜
KR20180132733A (ko) 2016-03-31 2018-12-12 메르크 파텐트 게엠베하 컬러 변환 시트 및 광학 디바이스
JP6694513B2 (ja) * 2016-08-22 2020-05-13 富士フイルム株式会社 遮光性組成物、遮光膜、固体撮像素子、カラーフィルタ、及び、液晶表示装置
KR20190100279A (ko) 2016-12-20 2019-08-28 메르크 파텐트 게엠베하 광학 매체 및 광학 디바이스
WO2021152411A1 (fr) * 2020-01-29 2021-08-05 3M Innovative Properties Company Élément rétroréfléchissant et film rétroréfléchissant

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010102086A (ja) 2008-10-23 2010-05-06 Nippon Steel Chem Co Ltd ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜

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* Cited by examiner, † Cited by third party
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JP2003165867A (ja) * 2001-11-28 2003-06-10 Hitachi Chemical Dupont Microsystems Ltd シランカップリング剤
JP2006265349A (ja) * 2005-03-23 2006-10-05 Lintec Corp 感圧接着剤組成物及び光学部材
JP4817710B2 (ja) * 2005-05-16 2011-11-16 旭化成イーマテリアルズ株式会社 シランカップリング剤
KR101408725B1 (ko) * 2006-11-30 2014-06-17 도레이 카부시키가이샤 감광성 실록산 조성물, 그것으로부터 형성된 경화막, 및 경화막을 갖는 소자
DE102008057684A1 (de) * 2008-11-17 2010-05-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Dialkoxy- oder Dihydroxyphenylreste enthaltende Silane, daraus hergestellte Klebstoffe sowie Verfahren zur Herstellung der Silane und der Klebstoffe
JP5623886B2 (ja) * 2009-12-09 2014-11-12 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置
KR101839397B1 (ko) * 2010-03-17 2018-03-16 도레이 카부시키가이샤 실란커플링제, 네거티브형 감광성 수지 조성물, 경화막, 및 터치 패널용 부재

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010102086A (ja) 2008-10-23 2010-05-06 Nippon Steel Chem Co Ltd ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜

Also Published As

Publication number Publication date
JP5234230B1 (ja) 2013-07-10
JPWO2013031753A1 (ja) 2015-03-23
CN103765254B (zh) 2016-04-06
TWI512403B (zh) 2015-12-11
WO2013031753A1 (fr) 2013-03-07
KR20140061346A (ko) 2014-05-21
CN103765254A (zh) 2014-04-30
TW201319753A (zh) 2013-05-16

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