WO2013031753A1 - Composition de résine colorée et substrat de matrice noire en résine - Google Patents

Composition de résine colorée et substrat de matrice noire en résine Download PDF

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Publication number
WO2013031753A1
WO2013031753A1 PCT/JP2012/071651 JP2012071651W WO2013031753A1 WO 2013031753 A1 WO2013031753 A1 WO 2013031753A1 JP 2012071651 W JP2012071651 W JP 2012071651W WO 2013031753 A1 WO2013031753 A1 WO 2013031753A1
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Prior art keywords
resin composition
black
pigment
black matrix
colored resin
Prior art date
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PCT/JP2012/071651
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English (en)
Japanese (ja)
Inventor
井上欣彦
相原涼介
岡沢徹
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東レ株式会社
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Application filed by 東レ株式会社 filed Critical 東レ株式会社
Priority to CN201280042371.5A priority Critical patent/CN103765254B/zh
Priority to JP2012540196A priority patent/JP5234230B1/ja
Priority to KR1020147000842A priority patent/KR101846977B1/ko
Publication of WO2013031753A1 publication Critical patent/WO2013031753A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/04—Carbon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5455—Silicon-containing compounds containing nitrogen containing at least one group
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/28—Adhesive materials or arrangements

Definitions

  • the present invention relates to a colored resin composition and a resin black matrix substrate using the same.
  • light-shielding materials are used for various purposes, and in flat panel displays (FPD) such as liquid crystal displays (hereinafter abbreviated as LCD) and plasma display panels (hereinafter abbreviated as PDP), in order to improve display characteristics, It is used for providing a light-shielded image on the interval portion of the coloring pattern, the edge of the peripheral portion of the display area, and the outside light side of the TFT.
  • FPD flat panel displays
  • LCD liquid crystal displays
  • PDP plasma display panels
  • color filters for LCD usually, a different color of red, green, and blue is sequentially formed in a striped or mosaic color pattern on the surface of a transparent substrate such as glass or plastic sheet on which a black matrix is formed. It is manufactured.
  • the black matrix used as the light-shielding film plays a role of preventing a decrease in contrast and color purity due to light leakage between pixels.
  • a black matrix is similarly formed as a light shielding film, and it is generally formed by printing ink on a cover glass or a cover film facing the sensor substrate.
  • a cover glass is formed by printing ink on a cover glass or a cover film facing the sensor substrate.
  • there is an increasing demand for weight reduction of the touch panel and technological development for simultaneously forming a light-shielding film and a touch sensor on a cover glass is progressing.
  • high adhesion and chemical resistance are required in addition to high insulation.
  • non-alkali glass is used as a glass substrate in color filter applications, whereas a soda glass substrate containing a large amount of ionic impurities is generally used as a glass substrate in touch panel applications. Higher adhesion is required.
  • Patent Document 2 a technique of adding at least one selected from an amine-based silane compound, a ketimine-based silane compound and an isocyanate-based silane compound (Patent Document 2), and a ureido group A technique for adding a silane coupling agent is known (Patent Document 3).
  • soda glass is used as the substrate, sufficient adhesion cannot be obtained, and there is a problem that peeling occurs due to high-temperature and high-humidity treatment of the black matrix substrate or chemical treatment such as aqua regia or amine-based stripping solution. It was.
  • silane coupling agents having an imide group Patent Documents 4 and 5 have been proposed to improve adhesion in hard coating agents that do not contain color pigments. In terms of sex, the effect was insufficient.
  • the present invention was devised in view of the drawbacks of the prior art, and the object of the invention is a black matrix that has excellent adhesion to the substrate surface made of metal or inorganic material and has high chemical resistance. It is in providing the colored resin composition which can form easily. By using such a colored resin composition, a resin black matrix and a touch panel substrate excellent in reliability can be obtained.
  • the problems of the present invention can be solved by using a silane coupling agent having a specific structure as described below as an adhesion improving agent. I found it.
  • Each R 1 may be the same or different and represents an alkyl group having 1 to 6 carbon atoms.
  • the alkyl group may further have a substituent.
  • N represents 0 or 1.
  • R 2 represents carbon.
  • R 3 may be the same or different and each represents an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a phenyl group, a hydroxyl group, or a phenoxy group.
  • a group other than the hydroxyl group may further have a substituent.
  • the colored resin composition of the present invention By using the colored resin composition of the present invention, a resin black matrix having high adhesion and high chemical resistance can be easily obtained, and a black matrix substrate having excellent reliability can be obtained.
  • the colored resin composition of the present invention comprises at least (A) a color pigment, (B) an alkali-soluble resin, (C) an adhesion improver and (D) an organic solvent, and (C) has at least a specific structure as the adhesion improver. It contains the silane coupling agent which has.
  • the silane coupling agent has a structure represented by the following general formula (1).
  • Each R 1 may be the same or different and represents an alkyl group having 1 to 6 carbon atoms.
  • the alkyl group may further have a substituent.
  • N represents 0 or 1.
  • R 2 represents carbon.
  • R 3 s may be the same or different and each represents an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a phenyl group, a hydroxyl group, or a phenoxy group.
  • those other than the hydroxyl group may further have a substituent.
  • R 1 a methyl group, an ethyl group, and a butyl group are preferable, and a methyl group and an ethyl group are particularly preferable from the viewpoint of obtaining raw materials.
  • R 1 may have a substituent such as an alkoxy group, an aryl group, a phenoxy group, or a halogen group.
  • R 2 is more preferably a trivalent organic group having 3 to 10 carbon atoms from the viewpoint of solubility in an organic solvent.
  • Examples of the silane coupling agent represented by the general formula (1) include 3- (tert-butylcarbamoyl) -6- (trimethoxysilyl) hexanoic acid, 2- (2- (tert-butylamino) -2-oxoethyl) -5- (trimethoxysilyl) pentanoic acid, 3- (isopropylcarbamoyl) -6- (trimethoxysilyl) hexanoic acid, 2- (2- (isopropylamino) -2-oxoethyl) -5 -(Trimethoxysilyl) pentanoic acid, 3- (isobutylcarbamoyl) -6- (trimethoxysilyl) hexanoic acid, 2- (2- (isoptylamino) -2-oxoethyl) -5- (trimethoxysilyl) Pentanoic acid, 3- (tert-pentyl
  • the silane coupling agent having these specific structures When the silane coupling agent having these specific structures is added to the colored resin composition as the (C) adhesion improver, it may be used alone, but a known silane coupling agent may be used in combination. preferable. In order to improve the adhesion of the coating film to the base substrate and the chemical resistance, it can be achieved by increasing the amount of the silane coupling agent described above. Problems such as missing patterns and reduced resolution are likely to occur. Therefore, it is preferable to use two or more silane coupling agents in combination from the viewpoint of improving adhesion to the base during development.
  • the silane coupling agent used in combination is not particularly limited, and examples include silane coupling agents having a functional group such as a vinyl group, an epoxy group, a styryl group, a methacryloxy group, an acryloxy group, and an amino group. It is not limited to these.
  • silane coupling agents As a method for producing these silane coupling agents, a method of producing by reacting a silane coupling agent containing an acid anhydride with an alkylamine is preferable from the viewpoint of ease of production.
  • a silane coupling agent containing an acid anhydride two types of silane coupling agents are generated simultaneously. However, it is possible to use them as a mixture without separation and purification.
  • oligomer or the like can be replicated in this synthesis method, it does not significantly affect the adhesion improving effect and need not be considered.
  • the addition amount is preferably 1 to 15% by weight, more preferably 2 to 10% by weight, based on the total amount of solid components of the colored resin composition, that is, the total of (A) the color pigment and (B) the alkali-soluble resin. If the amount is less than 1% by weight, the effect of improving the adhesion is not sufficient. If the amount is more than 15% by weight, a fine pattern is lost in alkali development and the resolution is lowered.
  • a black resin composition using a black light shielding material as a coloring pigment is a printing ink, inkjet ink, photomask preparation material, printing proof preparation material, etching resist, solder resist, It can be used for production of PDP partition walls, dielectric patterns, electrode (conductor circuit) patterns, wiring patterns of electronic components, light-shielding images such as conductive pastes, conductive films, and black matrices.
  • a light-shielded image (including a black matrix) is provided on the interval portion of the coloring pattern, the peripheral portion, and the outside light side of the TFT. It can be suitably used for a light shielding film for a touch panel.
  • a liquid crystal display device a plasma display device, an EL display device equipped with an inorganic EL, a CRT display device, a black edge provided at the periphery of a display device equipped with a touch panel, red, blue, green It is suitably used as a black matrix formed in a lattice-like or striped black portion between colored pixels, more preferably in a color filter for a liquid crystal display device, or on a cover glass for a touch panel.
  • the black matrix that is formed on the cover glass for touch panels has a role as a frame that shields light leaking from the LCD panel, but in order to improve the design, a colored matrix formed by a colored resin composition other than black is used.
  • a frame may be formed, and the colored resin composition of the present invention can be suitably used.
  • the (A) colored pigment of the colored resin composition of the present invention either an organic pigment or an inorganic pigment can be suitably used.
  • the pigments those having strong coloring power and excellent light resistance, heat resistance, and chemical resistance are particularly preferable.
  • color index (CI) numbers the following are preferably used, but they are not limited to these.
  • red pigments examples include Pigment Red (hereinafter abbreviated as PR) 9, PR48, PR97, PR122, PR123, PR144, PR149, PR166, PR168, PR177, PR179, PR180, PR192, PR209, PR215, PR216, PR217, PR220. , PR223, PR224, PR226, PR227, PR228, PR240, PR254, etc. are used.
  • PR Pigment Red
  • orange pigments examples include pigment orange (hereinafter abbreviated as PO) 13, PO36, PO38, PO43, PO51, PO55, PO59, PO61, PO64, PO65, PO71, and the like.
  • yellow pigments examples include pigment yellow (hereinafter abbreviated as PY) PY12, PY13, PY17, PY20, PY24, PY83, PY86, PY93, PY95, PY109, PY110, PY117, PY125, PY129, PY137, PY138, PY139, PY147. , PY148, PY150, PY153, PY154, PY166, PY168, PY185, etc. are used.
  • PY pigment yellow
  • pigment violet (hereinafter abbreviated as PV) 19, PV23, PV29, PV30, PV32, PV37, PV40, PV50, and the like are used.
  • pigment blue (hereinafter abbreviated as PB) 15, PB15: 3, PB15: 4, PB15: 6, PB22, PB60, PB64 and the like are used.
  • pigment green hereinafter abbreviated as PG 7
  • PG10 PG36
  • PG58 PG58
  • black pigments black organic pigments, mixed color organic pigments, inorganic pigments, and the like can be used.
  • Carbon black, perylene black, aniline black, etc. are used as black organic pigments, and at least two kinds of pigments selected from red, blue, green, purple, yellow, magenta, cyan, etc. are mixed as mixed color organic pigments.
  • Pseudo-blackened as inorganic pigments include graphite and fine metal particles such as titanium, copper, iron, manganese, cobalt, chromium, nickel, zinc, calcium, silver, metal oxide, composite oxide, metal sulfide Products, metal nitrides, metal oxynitrides and the like. These may be used alone or in combination of two or more.
  • carbon black and titanium nitride are preferably used because of their high light shielding properties.
  • white pigments include titanium dioxide, barium carbonate, zirconium oxide, calcium carbonate, barium sulfate, alumina white, silicon dioxide and the like.
  • the titanium nitride includes titanium nitride as a main component, and usually includes titanium oxide TiO 2 , Ti n O 2n-1 (1 ⁇ n ⁇ 20) as subcomponents, and low-order titanium oxide and TiN x O. It contains titanium oxynitride represented by y (0 ⁇ x ⁇ 2.0, 0.1 ⁇ y ⁇ 2.0).
  • the peak diffraction angle 2 ⁇ derived from the (200) plane when the CuK ⁇ ray of titanium nitride used in the present invention is an X-ray source is preferably 42.5 ° to 43.2 °, Further, it is preferably 42.5 ° to 42.8 °, more preferably 42.5 ° to 42.7 °.
  • a titanium compound having a crystal structure having nitrogen atoms and oxygen atoms has the strongest peak in the diffraction angle 2 ⁇ range of 42.5 ° to 43.4 °, and is in a crystalline state containing a large amount of oxygen atoms. The more the peak position is shifted to the higher angle side with respect to 42.5 °.
  • titanium oxynitride with insufficient nitriding reduction obtained by nitriding titanium oxide the strongest peak is confirmed at a diffraction angle 2 ⁇ of 42.9 ° to 43.2 ° (Japanese Patent Laid-Open No. 2006-209102). Publication).
  • the crystallite size constituting the titanium nitride particles can be obtained from the half width of the X-ray diffraction peak, and is calculated using the Scherrer equation shown in the following equations (2) and (3).
  • K 0.9
  • ⁇ wavelength of X-ray (0.15418 nm)
  • ⁇ e half width of diffraction peak
  • ⁇ o correction value of half width (0.12 °).
  • ⁇ , ⁇ e and ⁇ o are calculated in radians.
  • the crystallite size is preferably 10 nm or more, further preferably 10 to 50 nm, and more preferably 10 to 30 nm.
  • titanium nitride particles having a crystallite size of less than 10 nm are used, there arises a problem that the light blocking property of the black matrix is lowered and further the dispersibility is deteriorated.
  • the thickness exceeds 50 nm, the light shielding property is lowered, and further, sedimentation is likely to occur, and the storage stability is deteriorated.
  • the smaller the crystallite size the lower the light-shielding property, but the reflection color approaches an achromatic color. Therefore, in the present invention, a reasonably small one is preferable.
  • the specific surface area of the titanium nitride particles used in the present invention can be determined by the BET method, and the value is preferably 5 to 100 m 2 / g, more preferably 10 to 100 m 2 / g, more preferably 30. ⁇ 100 m 2 / g. Further, from the specific surface area obtained by the BET method, the particle diameter when the particles are assumed to be perfect spheres and the particle diameter is uniform can be obtained by the following equation (4).
  • BET equivalent average particle diameter (nm) 6 / (S ⁇ d ⁇ 1000) (4)
  • S specific surface area (m 2 / g)
  • d density (g / cm 3 )
  • d 5.24 (g / cm 3 ) for titanium nitride
  • d 4 for titanium oxynitride .3 (g / cm 3 ).
  • the specific surface area is small, that is, when the primary particle size is large, it is difficult to finely disperse the particles, the particles settle during storage, the flatness of the resin black matrix decreases, or the glass adheres closely. There arises a problem that the performance is lowered.
  • the specific surface area is large, that is, when the primary particle size is small, the particles are likely to re-aggregate during dispersion, so that the dispersion stability tends to deteriorate, or when the resin black matrix is used, there is sufficient concealment as a light shielding material. This is not preferable because the OD value is lowered without being obtained.
  • the primary particles of the particles are a collection of several crystallites
  • the primary particles are preferably composed of a single crystallite. That is, the relationship between the crystallite size obtained from the half width of the X-ray diffraction peak and the particle diameter obtained from the specific surface area is preferably in the range of the following formula (5).
  • the titanium nitride particles used in the present invention contain TiN as a main component, and are usually noticeable when oxygen is mixed during synthesis, especially when the particle size is small, but partly due to oxidation of the particle surface, etc. Contains oxygen atoms. A smaller amount of oxygen is preferable because a higher OD value can be obtained, and it is particularly preferable not to contain TiO 2 as a subcomponent. However, the smaller the oxygen content, the red the color of the reflection, and therefore it is preferable that oxygen atoms are appropriately contained.
  • the oxygen atom content is 5 to 20% by weight, more preferably 8 to 20% by weight.
  • Titanium atom content is analyzed by ICP emission spectroscopy, nitrogen atom content is analyzed by inert gas melting-thermal conductivity method, and oxygen atom content is analyzed by inert gas melting-infrared absorption method. can do.
  • a gas phase reaction method is generally used to synthesize titanium nitride, and examples include an electric furnace method and a thermal plasma method, but thermal plasma with little contamination, easy particle size, and high productivity. Synthesis by the method is preferred. Specifically, the primary particles of titanium nitride synthesized by the thermal plasma method are formed from almost single crystallites, and are lower by using titanium nitride synthesized by the thermal plasma method. This is preferable because a black matrix having a dielectric constant can be formed.
  • Examples of the method for generating thermal plasma include direct current arc discharge, multiphase arc discharge, radio frequency (RF) plasma, hybrid plasma, and the like, and high frequency plasma in which impurities from the electrode are less mixed is more preferable.
  • Specific methods for producing titanium nitride fine particles by the thermal plasma method include a method in which titanium tetrachloride and ammonia gas are reacted in a plasma flame (Japanese Patent Laid-Open No. 2-22110), or titanium powder is evaporated by high-frequency thermal plasma.
  • a method of introducing nitrogen as a carrier gas and nitriding and synthesizing it in the cooling process Japanese Patent Laid-Open No.
  • the present invention is not limited to these, and the production method is not limited as long as titanium nitride particles having desired physical properties can be obtained.
  • Various titanium nitride particles are commercially available, and a plurality of particles satisfying the diffraction angle and the oxygen atom amount defined in the present invention, and further satisfying the preferred crystallite size and specific surface area described above are also commercially available. ing. In the present invention, those commercially available products can be preferably used.
  • the carbon black used in the present invention it is preferable to use carbon black that has been surface-treated in order to improve insulation.
  • No. 249678 wet oxidation treatment on the surface (Japanese Patent No. 4464081), surface modification with an organic group composed of a non-polymer group (Japanese Patent Publication No. 2008-517330), and the like are known.
  • it is particularly preferable to use carbon black whose surface is modified with an organic group composed of a non-polymer group because a resin black matrix having high insulation can be obtained even after high-temperature heat treatment.
  • it is preferable to use carbon black whose surface is modified with an organic compound having a sulfonic acid group since it is possible to suppress a decrease in insulation properties due to high insulation properties and high-temperature treatment.
  • the carbon atom ratio must be 95% or less, the sulfur atom ratio must be 0.5% or more, and the carbon atom ratio is 95% or less.
  • the sulfur atom ratio is preferably 1.0% or more, more preferably the carbon atom ratio is 90% or less, and the sulfur atom ratio is 1.0% or more. The higher the proportion of sulfur atoms in the carbon black surface, the more effectively the binder resin is adsorbed to the carbon black, thereby making it possible to suppress contact between the carbon blacks due to steric hindrance and improving the insulation of the resin black matrix. To do.
  • the sulfur atom component present on the surface of the carbon black used in the present invention exists in the form of disulfide, carbon disulfide, and oxide, but in order to obtain higher insulation properties, It is desirable to exist in a state, specifically, it is desirable to exist in a state of SO and SOx (2 ⁇ x ⁇ 4).
  • the state of S atoms on the surface of carbon black can be confirmed by X-ray photoelectron spectroscopy (XPS), and the S2p peak component is assigned to components belonging to CS and SS, SO and SOx (2 ⁇ x ⁇
  • the abundance ratio can also be confirmed by dividing into the components belonging to 4).
  • the ratio of the sulfur atom component present on the surface to a component derived from SO and SOx is preferably 70% or more, and more preferably 80% or more. More preferred.
  • the mechanism by which higher insulation and thermal stability are obtained due to the large amount of components derived from SO and SOx is unknown, but it is presumed that the adsorption of the binder resin to carbon black becomes stronger.
  • the ratio of the sulfur atom component existing on the surface to a component derived from SO and SOx is 70% or less, and the surface state is It can be said that it is completely different.
  • the specific surface area of the carbon black used in the present invention is not particularly limited, it is preferable that the value measured at the BET method of nitrogen adsorption, is 10 ⁇ 600m 2 / g, more 20 ⁇ 200m 2 / g is preferable, and 20 to 100 m 2 / g is more preferable.
  • the specific surface area is large, that is, when the primary particle size is small, the particles are likely to aggregate, so that it becomes difficult to stabilize the dispersion and storage stability is deteriorated.
  • the specific surface area is small, that is, when the primary particle diameter is large, the light shielding property is lowered, or the carbon blacks are in contact with each other in the resin coating film.
  • titanium nitride and / or carbon black as the color pigment (A), and (A) ratio of titanium nitride in the total weight of the light shielding material Is preferably 20 to 80% by weight, more preferably 30 to 70% by weight.
  • the proportion of titanium nitride is small, the reflection color is achromatic, but in order to obtain a desired light-shielding property, it is necessary to increase the proportion of the pigment in the resin composition, resulting in a decrease in adhesion. And further, the insulating property is lowered, which is not preferable.
  • the decrease in insulation due to high-temperature heat history becomes significant, and the dielectric constant also increases, which is not preferable.
  • the greater the proportion of titanium nitride the higher the insulation and light shielding properties.
  • the reflection color is reddish, the above range is preferable.
  • an alkali-soluble resin is an essential component, but it acts as a binder for the pigment and is soluble in an alkali developer during the development process when forming a pattern such as a black matrix. If it is, it will not specifically limit. Either photosensitive or non-photosensitive can be used. Specifically, an epoxy resin, an acrylic resin, a siloxane polymer resin, a polyimide resin, or the like is preferably used. In particular, an acrylic resin or a polyimide resin is excellent in terms of the heat resistance of the coating film and the storage stability of the colored resin composition, and is preferably used. Furthermore, in forming a pattern such as a black matrix, a photosensitive alkali-soluble resin is preferably used because the process of forming the pattern becomes simpler by using a photosensitive resin.
  • photosensitive alkali-soluble resin examples include but are not limited thereto.
  • the photosensitive alkali-soluble resin is composed of at least an alkali-soluble polymer, a reactive monomer, and a photopolymerization initiator. These quantitative ratios are usually 10/90 to 90/10 as the weight composition ratio of the alkali-soluble polymer and the reactive monomer, and the addition amount of the photopolymerization initiator is 1 to 20 with respect to the total weight of the polymer and the monomer. It is about wt%.
  • An alkali-soluble polymer having a carboxyl group is preferred, and a copolymer of an unsaturated carboxylic acid and an ethylenically unsaturated compound can be preferably used.
  • the unsaturated carboxylic acid include monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid and vinyl acetic acid, dicarboxylic acids such as itaconic acid, maleic acid and fumaric acid, or acid anhydrides thereof, phthalic acid mono (2 And (meth) acryloyloxyethyl) polycarboxylic acid monoesters.
  • an acrylic polymer containing a structural unit derived from (meth) acrylic acid is preferable, and a carboxylic acid contained in the structural unit is reacted with a compound containing an ethylenically unsaturated group and an epoxy group.
  • a carboxylic acid contained in the structural unit is reacted with a compound containing an ethylenically unsaturated group and an epoxy group.
  • an ethylenically unsaturated group an acryl group and a methacryl group are preferable.
  • copolymerizable ethylenically unsaturated compounds examples include methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, isopropyl acrylate, n-propyl methacrylate, methacrylic acid.
  • an acrylic polymer containing (meth) acrylic acid and benzyl (meth) acrylate is particularly preferable from the viewpoints of dispersion stability and pattern processability.
  • the acrylic polymer When the acrylic polymer is added in an amount of 5 to 50%, preferably 7 to 40%, based on the pigment at the time of dispersing the pigment, a highly disperse pigment dispersion can be obtained.
  • the side chain is ethylenic.
  • An acrylic polymer having an unsaturated group can be preferably used. Specific examples include a copolymer described in Japanese Patent No. 3120476 and JP-A-8-262221, or a photocurable resin “Cyclomer (registered trademark) P” (Daicel), which is a commercially available acrylic polymer. Chemical Industry Co., Ltd.), alkali-soluble cardo resin and the like.
  • the weight average molecular weight (Mw) of the alkali-soluble polymer is preferably 5,000 to 40,000 (measured by gel permeation chromatography using tetrahydrofuran as a carrier and converted using a standard polystyrene calibration curve). Furthermore, a polymer having a weight average molecular weight of 8,000 to 40,000 and an acid value of 60 to 150 (mgKOH / g) has a photosensitive property, solubility in an ester solvent, solubility in an alkali developer, and residue control. Most preferable from the viewpoint.
  • a polyfunctional or monofunctional acrylic monomer or oligomer can be used as the reactive monomer.
  • the polyfunctional monomer include bisphenol A diglycidyl ether (meth) acrylate, poly (meth) acrylate carbamate, modified bisphenol A epoxy (meth) acrylate, adipic acid 1,6-hexanediol (meth) acrylic acid ester, anhydrous Phthalic acid propylene oxide (meth) acrylic acid ester, trimellitic acid diethylene glycol (meth) acrylic acid ester, rosin-modified epoxy di (meth) acrylate, alkyd-modified (meth) acrylate, Japanese Patent No. 3621533 and Japanese Patent Laid-Open No.
  • a compound having a functional group of 3 or more, more preferably 5 or more dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate and acid-modified products thereof are used. preferable.
  • an unsaturated group-containing alkali-soluble monomer obtained by reacting a polybasic carboxylic acid or its acid anhydride with a reaction product of an epoxy compound having two glycidyl ether groups and methacrylic acid is also developable and processed.
  • (meth) acrylate having a fluorene ring having a large amount of aromatic rings and high water repellency in the molecule is preferable because the pattern can be controlled to a desired shape during development.
  • the photopolymerization initiator is not particularly limited, but preferably contains an alkylphenone-based and / or oxime ester-based photopolymerization initiator.
  • alkylphenone photopolymerization initiator examples include ⁇ -aminoalkylphenone and ⁇ -hydroxyalkylphenone, and ⁇ -aminoalkylphenone is particularly preferred from the viewpoint of high sensitivity.
  • ⁇ -aminoalkylphenone is particularly preferred from the viewpoint of high sensitivity.
  • “Irgacure (registered trademark)” 369 A 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, Ciba Specialty Chemicals Co., Ltd.
  • 1,2-octanedione 1- [4- (phenylthio) -2- (O, which is Ciba Specialty Chemical Co., Ltd. “Irgacure (registered trademark)” OXE01 -Benzoyloxime)], an etanone that is “Irgacure®” OXE02, Ciba Specialty Chemicals Co., Ltd., 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] -, 1- (0-acetyloxime), “Adeka (registered trademark) Optomer” N-1818, N-1919, “Adeka Cruz” NCI-831 manufactured by Asahi Denka Kogyo Co., Ltd.
  • photopolymerization initiators inorganic compounds such as benzophenone compounds, oxanthone compounds, imidazole compounds, benzothiazole compounds, benzoxazole compounds, carbazole compounds, triazine compounds, phosphorus compounds or titanates
  • Known photopolymerization initiators such as system photopolymerization initiators can also be used in combination.
  • benzophenone N, N′-tetraethyl-4,4′-diaminobenzophenone, 4-methoxy-4′-dimethylaminobenzophenone, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, ⁇ -hydroxyisobutylphenone, Thioxanthone, 2-chlorothioxanthone, t-butylanthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone, 3-chloro-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 9,10-phenanthate Laquinone, 1,2-benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, 2- (o-chlorophenyl
  • the organic solvent used in the colored resin composition of the present invention is not particularly limited, and esters, aliphatic alcohols, ketones and the like can be used.
  • esters include benzyl acetate (boiling point 214 ° C.), ethyl benzoate (boiling point 213 ° C.), ⁇ -butyrolactone (boiling point 204 ° C.), methyl benzoate (boiling point 200 ° C.), diethyl malonate (boiling point 199 ° C.), 2-ethylhexyl acetate (bp 199 ° C.), 2-butoxyethyl acetate (bp 192 ° C.), 3-methoxy-3-methyl-butyl acetate (bp 188 ° C.), diethyl oxalate (bp 185 ° C.), ethyl acetoacetate ( Boiling point 181 ° C.), cyclohexyl acetate (bp 174 ° C.), 3-methoxy-butyl acetate (bp 173 ° C.), methyl ace
  • acetate-type or propionate-type solvents are 3-methoxy-3-methyl-butyl acetate, propylene glycol monoethyl ether acetate, propylene glycol monomethyl ether propionate, 3-methoxy-butyl. Particularly preferred are acetate and propylene glycol monomethyl ether acetate.
  • propylene glycol monomethyl ether (boiling point 120 ° C.), propylene glycol monoethyl ether (boiling point 133 ° C.), propylene glycol tertiary butyl ether (boiling point 153 ° C.), dipropylene glycol monomethyl ether (boiling point 188 ° C.)
  • Aliphatic ethers such as propylene glycol derivatives, etc., aliphatic esters other than those described above, for example, ethyl acetate (boiling point 77 ° C.), butyl acetate (boiling point 126 ° C.), isopentyl acetate (boiling point 142 ° C.), or butanol ( 118 ° C.), aliphatic alcohols such as 3-methyl-2-butanol (bp 112 ° C.), 3-methyl-3-methoxybutanol (bp 174
  • a mixed solvent of two or more components in order to achieve appropriate volatility and drying properties.
  • the boiling points of all the solvents constituting the mixed solvent are 150 ° C. or less, the film thickness uniformity cannot be obtained, the film thickness of the coating end part is increased, the pigment is applied to the base part for discharging the coating liquid from the slit. Aggregates are formed, causing many problems that streaks occur in the coating film.
  • the mixed solvent contains a large amount of solvent having a boiling point of 200 ° C. or higher, the surface of the coating film becomes sticky and sticking occurs. Accordingly, a mixed solvent containing 30 to 75% by weight of a solvent having a boiling point of 150 to 200 ° C. is desirable.
  • pigment dispersants include polyester polymer pigment dispersants, acrylic polymer pigment dispersants, polyurethane polymer pigment dispersants, polyallylamine polymer dispersants, pigment derivatives, cationic surfactants, and nonionic interfaces.
  • pigment dispersants include an activator, an anionic surfactant, and a carbodiimide pigment dispersant. These pigment dispersants are appropriately selected and used according to the type of pigment.
  • these pigment dispersants may be used alone or in combination of two or more. Since these polymer dispersants do not have photosensitivity, there is a concern that the photosensitivity of the target color resist may be deteriorated if added in a large amount. Therefore, an appropriate addition amount considering dispersion stability and photosensitivity is required. Is desirable. Addition of 1 to 50 (% by weight), more preferably 3 to 30 (% by weight) with respect to the pigment is even more preferable because it has the effect of highly stabilizing dispersion without deteriorating the photosensitive performance.
  • a surfactant may be added to the colored resin composition of the present invention for the purpose of preventing the coating property, the smoothness of the colored coating, and Benard cell.
  • the addition amount of the surfactant is usually 0.001 to 10% by weight of the pigment, preferably 0.01 to 1% by weight. If the amount added is too small, the coating properties, smoothness of the colored coating and Benard cell are not effective, and if too large, the physical properties of the coating film may be poor.
  • the surfactant examples include anionic surfactants such as ammonium lauryl sulfate and polyoxyethylene alkyl ether sulfate triethanolamine, cationic surfactants such as stearylamine acetate and lauryltrimethylammonium chloride, lauryldimethylamine oxide, Amphoteric surfactants such as lauryl carboxymethyl hydroxyethyl imidazolium betaine, nonionic surfactants such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, sorbitan monostearate, and silicones based on polydimethylsiloxane Surfactants, fluorosurfactants and the like can be mentioned. In this invention, it is not limited to these, Surfactant can use 1 type (s) or 2 or more types.
  • the pigment composition / resin component weight composition ratio is preferably in the range of 80/20 to 40/60 in order to obtain a coating having a high OD value.
  • the pigment component is (A) the sum of the light shielding material and the color pigment for adjusting chromaticity
  • the resin component is (B) an alkali-soluble resin composed of a polymer, a monomer, etc., and an oligomer or photopolymerization is started. It is the total of additives such as additives and polymer dispersants. If the amount of the resin component is too small, the adhesion of the black film to the substrate becomes poor. On the other hand, if the amount of the pigment component is too small, the optical density per unit thickness (OD value / ⁇ m) becomes low, causing a problem.
  • the solid content concentration of the resin component and the pigment component is preferably 2 to 30%, more preferably 5 to 20%, from the viewpoints of coating properties and drying properties.
  • the colored resin composition of the present invention preferably consists essentially of a solvent, a resin component and a pigment component, and the total amount of the resin component and the colored pigment is preferably 2 to 30%, more preferably 5%. ⁇ 20% with the balance being solvent.
  • a surfactant may be further contained at the concentration described above.
  • a method of dispersing a pigment directly in a resin solution using a disperser a pigment dispersion is prepared by dispersing a pigment in water or an organic solvent using a disperser, Thereafter, it is manufactured by a method of mixing with a resin solution.
  • a method for dispersing the pigment there are no particular limitations on the method for dispersing the pigment, and various methods such as a ball mill, a sand grinder, a three-roll mill, and a high-speed impact mill can be used, but a bead mill is preferred from the viewpoint of dispersion efficiency and fine dispersion.
  • a coball mill, a basket mill, a pin mill, a dyno mill or the like can be used.
  • the beads of the bead mill titania beads, zirconia beads, zircon beads and the like are preferably used.
  • the bead diameter used for dispersion is preferably 0.01 to 5.0 mm, more preferably 0.03 to 1.0 mm.
  • the primary particle diameter of the pigment and the secondary particles formed by aggregating the primary particles are small, it is preferable to use fine dispersed beads of 0.03 to 0.10 mm.
  • dispersing a pigment containing coarse particles of about submicron it is preferable to use dispersed beads of 0.10 mm or more because sufficient pulverization force can be obtained and the pigment can be finely dispersed.
  • a method for producing a resin black matrix substrate by a die coating apparatus using the colored resin composition of the present invention will be described.
  • a transparent substrate such as soda glass, non-alkali glass, or quartz glass is usually used, but is not particularly limited thereto.
  • the die coating apparatus include a single wafer coating apparatus disclosed in Japanese Patent No. 3139358 and Japanese Patent No. 3139359. By this apparatus, the colored resin composition (coating liquid) of the present invention is discharged from the die and the substrate is moved, whereby the colored resin composition can be applied onto the substrate.
  • the coating defects are eliminated and the base is removed.
  • the rate is improved.
  • a solvent is removed by air drying, reduced pressure drying, heat drying, etc., and the coating film of a colored resin composition is formed.
  • additional heating and drying in an oven or a hot plate eliminates coating defects caused by convection and improves the yield.
  • the drying under reduced pressure is preferably carried out in the range of room temperature to 100 ° C., 5 seconds to 10 minutes, and a degree of vacuum of 500 to 10 (Pa), more preferably 150 to 50 (Pa).
  • the drying by heating is preferably carried out in the range of 50 to 120 ° C. for 10 seconds to 30 minutes using an oven or a hot plate.
  • an alkaline developer it is preferable to use an alkaline developer to which a surfactant such as a nonionic surfactant is added in an amount of 0.1 to 5% because a better pattern can be obtained.
  • the alkaline substance used in the alkaline developer is not particularly limited.
  • inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium silicate, sodium metasilicate, aqueous ammonia, ethylamine, n- Primary amines such as propylamine, secondary amines such as diethylamine and di-n-propylamine, tertiary amines such as triethylamine and methyldiethylamine, and tetraalkylammonium hydroxides such as tetramethylammonium hydroxide (TMAH) , Quaternary ammonium salts such as choline, alcoholic amines such as triethanolamine, diethanolamine, monoethanolamine, dimethylaminoethanol, diethylaminoethanol, pyrrole, piperidine, 1,8-dia Bicyclo [5,4,0] -7-undecene, 1,5-diazabicyclo [4,3,0] -5-nonane, organic alkalis such as
  • the concentration of the alkaline substance is 0.01 to 50% by weight.
  • the amount is preferably 0.02 to 10% by weight, more preferably 0.02 to 1% by weight.
  • a water-soluble organic solvent such as ethanol, ⁇ -butyrolactone, dimethylformamide, N-methyl-2-pyrrolidone and the like may be appropriately added to the developer.
  • an aqueous developer of an alkaline aqueous solution is preferable from the viewpoint of working environment and waste developer treatment.
  • the development method is not particularly limited, although an immersion method, a spray method, a paddle method, or the like is used. After the development, a washing process with pure water or the like is added.
  • the coating pattern of the obtained colored resin composition is then patterned by heat treatment (post-bake).
  • the heat treatment is usually performed continuously or stepwise for 0.25 to 5 hours at a temperature of 150 to 300 ° C., preferably 180 to 250 ° C. in air, in a nitrogen atmosphere, or in a vacuum. Is called.
  • the optical density (Optical Density, OD value) of the resin black matrix obtained from the colored resin composition of the present invention is 2.5 or more per 1.0 ⁇ m thickness in the visible light range of 380 to 700 nm. More preferably, it is preferably 3.0 or more, and more preferably 4.0 or more.
  • OD value can be calculated
  • I OD value log 10 (I 0 / I) (6)
  • I 0 incident light intensity
  • I transmitted light intensity
  • the reflection chromaticity of the resin black matrix is measured from the surface of the transparent substrate, and is calculated by the CIE L * a * b * color system using the reflection spectrum for the standard C light source according to the method of JIS Z8729.
  • the chromaticity values (a *, b *) are both preferably ⁇ 2.0 to 2.0, and more preferably ⁇ 1.0 to 1.0.
  • the chromaticity value (a *, b *) is smaller than ⁇ 2.0, the image on the film surface is colored blue and green when the resin black matrix is viewed through the transparent substrate. If the value exceeds 2.0, there is a problem that an image reflected on the film surface is colored red and yellow and is visually recognized.
  • the surface resistance value ⁇ s ( ⁇ / ⁇ ) of the resin black matrix is preferably 10 10 ( ⁇ / ⁇ ) or more, and more preferably 10 12 ( ⁇ / ⁇ ) or more.
  • the surface resistance value can be obtained by measuring according to the method of JIS K6911.
  • the relative dielectric constant ⁇ r of the resin black matrix is preferably 10 or less at 1 MHz, more preferably 8 or less, and even more preferably 6 or less. If the relative dielectric constant of the resin black matrix is greater than 10, the electric field in the touch panel may become non-uniform and the sensitivity of the sensor electrode may be reduced.
  • the relative dielectric constant of the resin black matrix is preferably as small as possible, and the lower limit thereof is not particularly limited, but is usually 2 or more at 1 MHz.
  • the specific surface area of the particles is the adsorption isotherm at a liquid nitrogen temperature (77 K) of N 2 gas after vacuum degassing at 100 ° C. using a high precision fully automatic gas adsorption device (“BELSORP” 36) manufactured by Nippon Bell Co., Ltd.
  • BELSORP fully automatic gas adsorption device
  • the isotherm was analyzed by the BET method to determine the specific surface area.
  • the BET conversion particle diameter was calculated
  • X-ray diffraction X-ray diffraction was measured by a wide-angle X-ray diffraction method (RU-200R manufactured by Rigaku Corporation) with a powder sample packed in an aluminum standard sample holder.
  • the X-ray source is CuK ⁇ ray
  • the output is 50 kV / 200 mA
  • the slit system is 1 ° -1 ° -0.15 mm-0.45 mm
  • the measurement step (2 ⁇ ) is 0.02 °
  • the scan speed is It was 2 ° / min.
  • the crystallite size constituting the particles was determined using the Scherrer formulas of the above formulas (2) and (3).
  • composition analysis The content of titanium atoms was measured by ICP emission spectroscopic analysis (ICP emission spectroscopic analyzer SPS3000 manufactured by Seiko Instruments Inc.). The content of oxygen and nitrogen atoms is measured using an oxygen / nitrogen analyzer EMGA-620W / C manufactured by Horiba, Ltd., and the oxygen atoms are converted into inert gases by the infrared absorption method. The nitrogen atom was determined by the method.
  • Adhesion test A resin black matrix having a film thickness of 1.0 ⁇ m was formed on the soda glass, and the adhesion between the soda glass and the cured film was evaluated according to the JIS K5400 8.5.2 (1990) cross-cut tape method. On the surface of the cured film on the glass substrate, 11 parallel straight lines of 11 vertical and horizontal directions were drawn at 1 mm intervals so as to reach the substrate of the glass plate with a cutter knife, and 100 squares of 1 mm ⁇ 1 mm were produced. .
  • the adhesion was also evaluated in the same manner as described above for the black matrix substrate treated with PCT (Pressure Cooker Test).
  • the conditions for the PCT treatment were a temperature of 121 ° C., a humidity of 100%, 2 atmospheres, and 12 hours.
  • the surface resistivity was measured in the same manner after the black matrix was heat-treated in an oven at 250 ° C. for 30 minutes.
  • a resin black matrix with a film thickness of 1.0 ⁇ m is formed on a soda glass with a thickness of 1.1 mm, and reflected from the glass surface using an ultraviolet / visible / near infrared spectrophotometer (Shimadzu spectrophotometer UV-2500PC).
  • the chromaticity was measured (measurement conditions were a measurement wavelength region; 300 to 780 nm, a sampling pitch: 1.0 nm, a scan speed; a low speed, a slit width; 2.0 nm).
  • Synthesis Example 1 Synthesis of Silane Coupling Agent Mixed Solution (a-1) To 200 g of propylene glycol monomethyl ether acetate, 41.97 g (160 mmol) of 3-trimethoxysilylpropyl succinic anhydride and 11.70 g (160 mmol) of t-butylamine were added. In addition, after stirring at room temperature for a while, the mixture was stirred at 40 ° C. for 2 hours. Then, it heated up to 80 degreeC and made it react for 6 hours.
  • the obtained solution was diluted with propylene glycol monomethyl ether acetate so that the solid concentration was 20%, and 3- (tert-butylcarbamoyl) -6- (trimethoxysilyl) hexanoic acid, 2- (2- ( A mixed solution (a-1) of tert-butylamino) -2-oxoethyl) -5- (trimethoxysilyl) pentanoic acid was obtained.
  • Synthesis Example 2 Synthesis of silane coupling agent mixed solution (a-2) 200 g of propylene glycol monomethyl ether acetate, 41.97 g (160 mmol) of 3-trimethoxysilylpropyl succinic anhydride and 9.45 g (160 mmol) of t-pentylamine was added and stirred at room temperature for a while, and then stirred at 40 ° C. for 2 hours. Then, it heated up to 80 degreeC and made it react for 6 hours.
  • silane coupling agent mixed solution (a-2) 200 g of propylene glycol monomethyl ether acetate, 41.97 g (160 mmol) of 3-trimethoxysilylpropyl succinic anhydride and 9.45 g (160 mmol) of t-pentylamine was added and stirred at room temperature for a while, and then stirred at 40 ° C. for 2 hours. Then, it heated up to 80 degreeC and made it react for 6 hours.
  • the resulting solution was diluted with propylene glycol monomethyl ether acetate so that the solid content concentration was 20%, and 2- (2- (t-pentylamino) -2-oxoethyl) -5- (trimethoxysilyl) pentanoic acid was obtained. , 3- (tert-pentylcarbamoyl) -6- (trimethoxysilyl) hexanoic acid mixed solution (a-2) was obtained.
  • Synthesis Example 3 Synthesis of Silane Coupling Agent Mixed Solution (a-3) To 200 g of propylene glycol monomethyl ether acetate was added 41.97 g (160 mmol) of 3-trimethoxysilylpropyl succinic anhydride and 9.45 g (160 mmol) of isopropylamine. The mixture was stirred at room temperature for a while and then stirred at 40 ° C. for 2 hours. Then, it heated up to 80 degreeC and made it react for 6 hours.
  • the resulting solution was diluted with propylene glycol monomethyl ether acetate so that the solid concentration was 20%, and 2- (2- (isopropylamino) -2-oxoethyl) -5- (trimethoxysilyl) pentanoic acid, 3
  • a mixed solution (a-3) of-(tert-isopropylcarbamoyl) -6- (trimethoxysilyl) hexanoic acid was obtained.
  • Synthesis Example 4 Synthesis of Silane Coupling Agent Mixed Solution (a-4) 200 g of propylene glycol monomethyl ether acetate, 41.97 g (160 mmol) of 3-trimethoxysilylpropyl succinic anhydride and 9.45 g (160 mmol) of n-propylamine was added and stirred at room temperature for a while, and then stirred at 40 ° C. for 2 hours. Then, it heated up to 80 degreeC and made it react for 6 hours.
  • the resulting solution was diluted with propylene glycol monomethyl ether acetate so that the solid content concentration was 20%, and 2- (2-oxo-2- (propylamino) ethyl) -5- (trimethoxysilyl) pentanoic acid, A mixed solution (a-4) of 3- (propylcarbamoyl) -6- (trimethoxysilyl) hexanoic acid was obtained.
  • Synthesis Example 5 Synthesis of Silane Coupling Agent Mixed Solution (a-5) To 200 g of propylene glycol monomethyl ether acetate was added 41.97 g (160 mmol) of 3-trimethoxysilylpropyl succinic anhydride and 14.90 g (160 mmol) of aniline. After stirring at room temperature for a while, the mixture was stirred at 40 ° C. for 2 hours. Then, it heated up to 80 degreeC and made it react for 6 hours.
  • the resulting solution was diluted with propylene glycol monomethyl ether acetate so that the solid concentration was 20%, and 2- (2-oxo-2- (phenylamino) ethyl) -5- (trimethoxysilyl) pentanoic acid, A mixed solution (a-5) of 3- (phenylcarbamoyl) -6- (trimethoxysilyl) hexanoic acid was obtained.
  • Synthesis Example 6 Synthesis of Silane Coupling Agent Mixed Solution (a-6) To 200 g of propylene glycol monomethyl ether acetate was added 41.97 g (160 mmol) of 3-trimethoxysilylpropyl succinic anhydride and 7.37 g (160 mmol) of ethanol. After stirring at room temperature for a while, the mixture was stirred at 40 ° C. for 2 hours. Then, it heated up to 80 degreeC and made it react for 6 hours.
  • the resulting solution was diluted with propylene glycol monomethyl ether acetate so that the solid content concentration was 20%, and 4-ethoxy-4-oxo-2- (trimethoxysilyl) butanoic acid, 4-ethoxy-4-oxo- A mixed solution (a-6) of 3- (trimethoxysilyl) butanoic acid was obtained.
  • Synthesis Example 7 Synthesis of Silane Coupling Agent Solution (a-7) To 400 g of propylene glycol monomethyl ether acetate was added 41.97 g (160 mmol) of 3-trimethoxysilylpropyl succinic anhydride and 11.70 g (160 mmol) of t-butylamine. The mixture was stirred at room temperature for a while and then stirred at 60 ° C. for 2 hours. Then, it heated up to 140 degreeC and made it react for 6 hours, azeotropically propylene glycol monomethyl ether acetate and water.
  • the resulting solution was diluted with propylene glycol monomethyl ether acetate so that the solid content concentration was 20%, and a 1- (tert-butyl) -3-trimethoxysilylpyrrolidine-2,5-dione solution (a-7) Got.
  • Synthesis Example 8 Synthesis of acrylic polymer (P-1) After synthesis of methyl methacrylate / methacrylic acid / styrene copolymer (weight composition ratio 30/40/30) by the method described in Example 1 of Japanese Patent No. 3120476 An acrylic polymer having an average molecular weight (Mw) of 15,000 and an acid value of 110 (mgKOH / g) was added by adding 40 parts by weight of glycidyl methacrylate, reprecipitation with purified water, filtration and drying (P-1 ) A powder was obtained.
  • Mw average molecular weight
  • mgKOH / g acid value of 110
  • This carbon black CB-Bk1 200 g
  • propylene glycol monomethyl ether acetate 40 wt% solution 94 g
  • acrylic polymer P-1
  • Big Chemie Japan LPN21116 as a polymer dispersant
  • 40 wt% solution 31 g
  • Propylene glycol monomethyl ether acetate 675 g was charged into a tank and stirred with a homomixer (manufactured by Tokushu Kika) for 1 hour to obtain a preliminary dispersion.
  • the preliminary dispersion was supplied to an ultra apex mill (manufactured by Kotobuki Kogyo) equipped with a centrifugal separator filled with 70% 0.05 mm ⁇ zirconia beads (manufactured by Nikkato, YTZ ball), and dispersed for 2 hours at a rotational speed of 8 m / s.
  • Titanium Black Dispersion Peak derived from the (200) plane of titanium nitride particles (Ti-BK1, manufactured by Nisshin Engineering Co., Ltd., TiN UFP Lot 13209010202) produced by the thermal plasma method
  • the diffraction angle 2 ⁇ was 42.62 °
  • the crystallite size determined from the half width of this peak was 21.9 nm
  • the BET specific surface area was 85.0 m 2 / g.
  • the titanium content was 70.4% by weight
  • the nitrogen content was 19.9% by weight
  • the oxygen content was 8.86% by weight.
  • no X-ray diffraction peak attributed to TiO 2 was observed.
  • Titanium nitride Ti-Bk1 200 g
  • propylene glycol monomethyl ether acetate 40 wt% solution 94 g
  • acrylic polymer P-1
  • Big Chemie Japan LPN21116 as polymer dispersant
  • 40 wt% solution 31 g
  • propylene Glycol monomethyl ether acetate 675 g was charged into a tank and stirred for 1 hour with a homomixer (manufactured by Tokushu Kika) to obtain Preliminary dispersion 1.
  • the pre-dispersed liquid was supplied to an ultra apex mill (manufactured by Kotobuki Industries) equipped with a centrifugal separator filled with 75% 0.05 mm ⁇ zirconia beads (manufactured by Neturen, YTZ balls), and dispersed for 3 hours at a rotational speed of 8 m / s.
  • an ultra apex mill manufactured by Kotobuki Industries
  • a centrifugal separator filled with 75% 0.05 mm ⁇ zirconia beads manufactured by Neturen, YTZ balls
  • Yellow Pigment Dispersion (Y-1) Yellow Pigment Dispersion was conducted in the same manner as Red Pigment Dispersion R-1, except that organic pigment organic pigment PY139 (Y-1, manufactured by Clariant) was used as the pigment. Liquid Y-1 was obtained.
  • Example 1 Carbon Black Dispersion CB-1 (267.9 g) and Titanium Black Dispersion TB-1 (267.9 g) were mixed, and a 40 wt% solution of acrylic polymer (P-1) in propylene glycol monomethyl ether acetate (122.1 g) ), 50% by weight propylene glycol monomethyl ether acetate solution (94.6 g) of dipentaerythritol hexaacrylate (DPHA manufactured by Nippon Kayaku Co., Ltd.) as a polyfunctional monomer, and ADEKA Co., Ltd.
  • “Adeka Cruz” as a photopolymerization initiator NCI-831 (11.8 g), silane coupling agent mixed solution (a-1) (37.5 g) as an adhesion improver, 10% by weight solution of propylene glycol monomethyl ether acetate (4.0 g) of silicone surfactant A propylene glycol monomethyl ether It was added a solution of the acetate (194.0 g), total solid concentration of 25 wt%, the black resin composition 1 the pigment / resin (weight ratio) 45/55 was obtained.
  • This black resin composition 1 was applied onto a soda glass substrate with a spinner 1H-DS manufactured by Mikasa Co., Ltd., and prebaked at 100 ° C. for 10 minutes to prepare a coating film.
  • a mask aligner PEM-6M manufactured by Union Optical Co., Ltd. exposure (200 mJ / cm 2 ) through a photomask, development using a 0.045 wt% KOH aqueous solution, and subsequent pure water cleaning, A patterned substrate was obtained. Furthermore, it was cured at 230 ° C. for 30 minutes. In this way, a black matrix 1 having a thickness of 1.00 ⁇ m was prepared.
  • Example 2 A black resin composition 2 was obtained in the same manner as in Example 1 except that the silane coupling agent mixed solution (a-2) was used instead of the silane coupling agent mixed solution (a-1).
  • a black matrix 2 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 2 in the same manner as in Example 1.
  • Example 3 A black resin composition 3 was obtained in the same manner as in Example 1 except that the silane coupling agent mixed solution (a-3) was used instead of the silane coupling agent mixed solution (a-1).
  • a black matrix 3 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 3 in the same manner as in Example 1.
  • Example 4 A black resin composition 4 was prepared in the same manner as in Example 1, except that the addition amount of the silane coupling agent mixed solution (a-1) was 6.3 g, and the addition amount of propylene glycol monomethyl ether acetate was 225.2 g. Got.
  • a black matrix 4 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 4 in the same manner as in Example 1.
  • Example 5 The black resin composition 5 was prepared in the same manner as in Example 1 except that the addition amount of the silane coupling agent mixture (a-1) was 12.5 g and the addition amount of propylene glycol monomethyl ether acetate was 219.0 g. Got.
  • a black matrix 5 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 5 in the same manner as in Example 1.
  • Example 6 A black resin composition 6 was prepared in the same manner as in Example 1 except that the addition amount of the silane coupling agent mixture (a-1) was 62.5 g and the addition amount of propylene glycol monomethyl ether acetate was 169.0 g. Got.
  • a black matrix 6 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 6 in the same manner as in Example 1.
  • Example 7 A black resin composition 7 was prepared in the same manner as in Example 1 except that the addition amount of the silane coupling agent mixture (a-1) was 187.5 g and the addition amount of propylene glycol monomethyl ether acetate was 44.0 g. Got.
  • a black matrix 7 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 7 in the same manner as in Example 1.
  • Example 8 Other than adding 7.5 g of 3-methacryloxypropyltrimethoxysilane (a-8) in addition to the silane coupling agent mixture (a-1), and the addition amount of propylene glycol monomethyl ether acetate being 186.5 g Obtained a black resin composition 8 in the same manner as in Example 1.
  • a black matrix 8 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 8 in the same manner as in Example 1.
  • Example 9 A black resin composition 9 was prepared in the same manner as in Example 8, except that the addition amount of the silane coupling agent mixture (a-1) was 12.5 g and the addition amount of propylene glycol monomethyl ether acetate was 211.5 g. Got.
  • a black matrix 9 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 9 in the same manner as in Example 1.
  • Example 10 A black resin composition 10 was prepared in the same manner as in Example 8 except that the addition amount of the silane coupling agent mixture (a-1) was 62.5 g and the addition amount of propylene glycol monomethyl ether acetate was 161.5 g. Got.
  • a black matrix 10 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 10 in the same manner as in Example 1.
  • Example 11 A black resin composition 11 was obtained in the same manner as in Example 8, except that the addition amount of the carbon black dispersion CB-1 was 0 g and the addition amount of the titanium black dispersion TB-1 was 534.8 g.
  • a black matrix 11 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 11 in the same manner as in Example 1.
  • Example 12 A black resin composition 12 was obtained in the same manner as in Example 8, except that the amount of carbon black dispersion CB-1 added was 134.0 g and the amount of titanium black dispersion TB-1 added was 401.9 g.
  • a black matrix 12 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 12 in the same manner as in Example 1.
  • Example 13 A black resin composition 13 was obtained in the same manner as in Example 8, except that the addition amount of the carbon black dispersion CB-1 was 401.9 g and the addition amount of the titanium black dispersion TB-1 was 134.0 g.
  • a black matrix 13 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 13 in the same manner as in Example 1.
  • Example 14 A black resin composition 14 was obtained in the same manner as in Example 8, except that the addition amount of the carbon black dispersion CB-1 was 534.8 g and the addition amount of the titanium black dispersion TB-1 was 0 g.
  • a black matrix 14 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 14 in the same manner as in Example 1.
  • Example 15 The red pigment dispersion R-1 (160.2 g), the blue pigment dispersion B-1 (320.4 g) and the yellow pigment dispersion Y-1 (320.4 g) were mixed, and the acrylic polymer (P-1) Propylene glycol monomethyl ether acetate 40 wt% solution (64.8 g), dipentaerythritol hexaacrylate (Nippon Kayaku Co., Ltd. DPHA) as a polyfunctional monomer 50 wt% solution (38.7 g), ADEKA Co., Ltd.
  • P-1 Propylene glycol monomethyl ether acetate 40 wt% solution (64.8 g), dipentaerythritol hexaacrylate (Nippon Kayaku Co., Ltd. DPHA) as a polyfunctional monomer 50 wt% solution (38.7 g), ADEKA Co., Ltd.
  • a pseudo black resin composition 15 was obtained.
  • a black matrix 15 having a thickness of 1.00 ⁇ m was prepared using the pseudo black resin composition 15 in the same manner as in Example 1.
  • a black matrix 16 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 16 in the same manner as in Example 1.
  • Comparative Example 2 A black resin composition 17 was obtained in the same manner as in Example 1 except that the silane coupling agent mixed solution (a-4) was used instead of the silane coupling agent mixed solution (a-1).
  • a black matrix 17 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 17 in the same manner as in Example 1.
  • Comparative Example 3 A black resin composition 18 was obtained in the same manner as in Example 1 except that the silane coupling agent mixed solution (a-5) was used instead of the silane coupling agent mixed solution (a-1).
  • a black matrix 18 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 18 in the same manner as in Example 1.
  • Comparative Example 4 A black resin composition 19 was obtained in the same manner as in Example 1 except that the silane coupling agent mixed solution (a-6) was used instead of the silane coupling agent mixed solution (a-1).
  • a black matrix 19 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 19 in the same manner as in Example 1.
  • Comparative Example 5 A black resin composition 20 was obtained in the same manner as in Example 1 except that the silane coupling agent mixed solution (a-7) was used instead of the silane coupling agent mixed solution (a-1).
  • a black matrix 20 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 20 in the same manner as in Example 1.
  • a black matrix 21 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 21 in the same manner as in Example 1.
  • Comparative Example 7 Except for adding 7.5 g of 3-aminopropyltriethoxysilane (a-10) instead of the silane coupling agent mixed solution (a-1) and changing the addition amount of propylene glycol monomethyl ether acetate to 224.0 g In the same manner as in Example 1, a black resin composition 22 was obtained.
  • a black matrix 22 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 22 in the same manner as in Example 1.
  • Comparative Example 8 Except for adding 7.5 g of 3-ureidopropyltriethoxysilane (a-11) in place of the silane coupling agent mixture (a-1) and adding 224.0 g of propylene glycol monomethyl ether acetate. In the same manner as in Example 1, a black resin composition 23 was obtained.
  • a black matrix 23 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 23 in the same manner as in Example 1.
  • a black matrix 24 having a thickness of 1.00 ⁇ m was prepared using the black resin composition 24 in the same manner as in Example 1.
  • Evaluation results are shown in Table 1. It can be seen that the black matrix formed using the resin composition shown in the examples has high adhesion and excellent chemical resistance, and does not easily peel off even after wet heat treatment or chemical immersion.
  • the colored resin composition of the present invention can be used for a black matrix of a color filter substrate for a liquid crystal display device.

Abstract

L'invention concerne une composition de résine colorée avec laquelle il est possible de former facilement une matrice noire en résine ayant une forte adhésivité et une bonne résistance chimique. Il est possible d'obtenir un substrat de matrice noire ayant une excellente fiabilité en utilisant la composition de résine colorée selon la présente invention. La présente invention concerne une composition de résine colorée comprenant au moins (A) un pigment colorant, (B) une résine soluble dans les alcalis, (C) un agent pour améliorer l'adhésivité, et (D) un solvant organique, la composition de résine colorée contenant un agent de couplage au silane prédéterminé comme agent d'amélioration de l'adhésivité (C).
PCT/JP2012/071651 2011-08-29 2012-08-28 Composition de résine colorée et substrat de matrice noire en résine WO2013031753A1 (fr)

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JP2012540196A JP5234230B1 (ja) 2011-08-29 2012-08-28 着色樹脂組成物及び樹脂ブラックマトリクス基板
KR1020147000842A KR101846977B1 (ko) 2011-08-29 2012-08-28 착색 수지 조성물 및 수지 블랙 매트릭스 기판

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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015007687A (ja) * 2013-06-25 2015-01-15 日油株式会社 カラーフィルター保護膜用熱硬化性樹脂組成物、及びその硬化膜を備えるカラーフィルター
WO2015012228A1 (fr) * 2013-07-25 2015-01-29 東レ株式会社 Composition blanche photosensible de type négatif pour panneau tactile, et panneau tactile ainsi que procédé de fabrication de celui-ci
JP2015093986A (ja) * 2013-11-14 2015-05-18 東京応化工業株式会社 ブラックカラムスペーサ形成用感光性樹脂組成物
KR20160071994A (ko) 2014-12-12 2016-06-22 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용한 블랙매트릭스 및 이를 구비한 화상 표시 장치
WO2016096073A1 (fr) 2014-12-15 2016-06-23 Merck Patent Gmbh Dispositif électroluminescent polarisé
WO2017012688A1 (fr) 2015-07-17 2017-01-26 Merck Patent Gmbh Particule luminescente, formulation d'encre, composition polymère, dispositif optique, fabrication de ceux-ci, et utilisation de la particule luminescente
WO2017054898A1 (fr) 2015-09-29 2017-04-06 Merck Patent Gmbh Composition photosensible et film de conversion de couleur
WO2017167779A1 (fr) 2016-03-31 2017-10-05 Merck Patent Gmbh Feuille de conversion de couleurs et dispositif optique
WO2018114761A1 (fr) 2016-12-20 2018-06-28 Merck Patent Gmbh Milieu optique et dispositif optique
JPWO2018037913A1 (ja) * 2016-08-22 2019-06-20 富士フイルム株式会社 遮光性組成物、遮光膜、固体撮像素子、カラーフィルタ、及び、液晶表示装置
WO2021152411A1 (fr) * 2020-01-29 2021-08-05 3M Innovative Properties Company Élément rétroréfléchissant et film rétroréfléchissant

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5327345B2 (ja) * 2012-02-23 2013-10-30 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材。
KR20160078540A (ko) 2014-12-24 2016-07-05 세명일렉트로닉스 주식회사 잉크젯 프린팅용 도료 조성물

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003165867A (ja) * 2001-11-28 2003-06-10 Hitachi Chemical Dupont Microsystems Ltd シランカップリング剤
JP2006265349A (ja) * 2005-03-23 2006-10-05 Lintec Corp 感圧接着剤組成物及び光学部材
JP2006316032A (ja) * 2005-05-16 2006-11-24 Asahi Kasei Electronics Co Ltd シランカップリング剤
WO2008065944A1 (fr) * 2006-11-30 2008-06-05 Toray Industries, Inc. Composition de siloxane photosensible, film durci formé à partir de celle-ci et dispositif ayant le film durci
WO2010055154A1 (fr) * 2008-11-17 2010-05-20 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Silanes contenant des restes dialcoxy- ou dihydroxyphényle, colles fabriquées à partir de ceux-ci ainsi que procédé de fabrication des silanes et des colles
WO2011114995A1 (fr) * 2010-03-17 2011-09-22 東レ株式会社 Agent de couplage de type silane, composition de résine photosensible de type négatif, pellicule durcissable et composant d'écran tactile

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5281357B2 (ja) 2008-10-23 2013-09-04 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜
JP5623886B2 (ja) * 2009-12-09 2014-11-12 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003165867A (ja) * 2001-11-28 2003-06-10 Hitachi Chemical Dupont Microsystems Ltd シランカップリング剤
JP2006265349A (ja) * 2005-03-23 2006-10-05 Lintec Corp 感圧接着剤組成物及び光学部材
JP2006316032A (ja) * 2005-05-16 2006-11-24 Asahi Kasei Electronics Co Ltd シランカップリング剤
WO2008065944A1 (fr) * 2006-11-30 2008-06-05 Toray Industries, Inc. Composition de siloxane photosensible, film durci formé à partir de celle-ci et dispositif ayant le film durci
WO2010055154A1 (fr) * 2008-11-17 2010-05-20 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Silanes contenant des restes dialcoxy- ou dihydroxyphényle, colles fabriquées à partir de ceux-ci ainsi que procédé de fabrication des silanes et des colles
WO2011114995A1 (fr) * 2010-03-17 2011-09-22 東レ株式会社 Agent de couplage de type silane, composition de résine photosensible de type négatif, pellicule durcissable et composant d'écran tactile

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015007687A (ja) * 2013-06-25 2015-01-15 日油株式会社 カラーフィルター保護膜用熱硬化性樹脂組成物、及びその硬化膜を備えるカラーフィルター
JPWO2015012228A1 (ja) * 2013-07-25 2017-03-02 東レ株式会社 タッチパネル用ネガ型感光性白色組成物、タッチパネル及びタッチパネルの製造方法
KR102082722B1 (ko) * 2013-07-25 2020-02-28 도레이 카부시키가이샤 터치 패널용 네거티브형 감광성 백색 조성물, 터치 패널 및 터치 패널의 제조 방법
KR20160034907A (ko) * 2013-07-25 2016-03-30 도레이 카부시키가이샤 터치 패널용 네거티브형 감광성 백색 조성물, 터치 패널 및 터치 패널의 제조 방법
WO2015012228A1 (fr) * 2013-07-25 2015-01-29 東レ株式会社 Composition blanche photosensible de type négatif pour panneau tactile, et panneau tactile ainsi que procédé de fabrication de celui-ci
US9690197B2 (en) 2013-07-25 2017-06-27 Toray Industries, Inc. Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method
CN104635423A (zh) * 2013-11-14 2015-05-20 东京应化工业株式会社 黑色柱状间隔件形成用感光性树脂组合物
JP2015093986A (ja) * 2013-11-14 2015-05-18 東京応化工業株式会社 ブラックカラムスペーサ形成用感光性樹脂組成物
KR20160071994A (ko) 2014-12-12 2016-06-22 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용한 블랙매트릭스 및 이를 구비한 화상 표시 장치
WO2016096073A1 (fr) 2014-12-15 2016-06-23 Merck Patent Gmbh Dispositif électroluminescent polarisé
WO2017012688A1 (fr) 2015-07-17 2017-01-26 Merck Patent Gmbh Particule luminescente, formulation d'encre, composition polymère, dispositif optique, fabrication de ceux-ci, et utilisation de la particule luminescente
WO2017054898A1 (fr) 2015-09-29 2017-04-06 Merck Patent Gmbh Composition photosensible et film de conversion de couleur
WO2017167779A1 (fr) 2016-03-31 2017-10-05 Merck Patent Gmbh Feuille de conversion de couleurs et dispositif optique
JPWO2018037913A1 (ja) * 2016-08-22 2019-06-20 富士フイルム株式会社 遮光性組成物、遮光膜、固体撮像素子、カラーフィルタ、及び、液晶表示装置
WO2018114761A1 (fr) 2016-12-20 2018-06-28 Merck Patent Gmbh Milieu optique et dispositif optique
WO2021152411A1 (fr) * 2020-01-29 2021-08-05 3M Innovative Properties Company Élément rétroréfléchissant et film rétroréfléchissant

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