KR101813911B1 - 네가티브형 감광성 수지 조성물 - Google Patents

네가티브형 감광성 수지 조성물 Download PDF

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Publication number
KR101813911B1
KR101813911B1 KR1020150030976A KR20150030976A KR101813911B1 KR 101813911 B1 KR101813911 B1 KR 101813911B1 KR 1020150030976 A KR1020150030976 A KR 1020150030976A KR 20150030976 A KR20150030976 A KR 20150030976A KR 101813911 B1 KR101813911 B1 KR 101813911B1
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KR
South Korea
Prior art keywords
meth
group
acrylate
pattern
photosensitive resin
Prior art date
Application number
KR1020150030976A
Other languages
English (en)
Korean (ko)
Other versions
KR20160107754A (ko
Inventor
전지민
김성빈
양돈식
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020150030976A priority Critical patent/KR101813911B1/ko
Priority to JP2016028893A priority patent/JP2016161939A/ja
Priority to TW105105100A priority patent/TWI676650B/zh
Priority to CN201610122336.4A priority patent/CN105938294B/zh
Publication of KR20160107754A publication Critical patent/KR20160107754A/ko
Application granted granted Critical
Publication of KR101813911B1 publication Critical patent/KR101813911B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
KR1020150030976A 2015-03-05 2015-03-05 네가티브형 감광성 수지 조성물 KR101813911B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020150030976A KR101813911B1 (ko) 2015-03-05 2015-03-05 네가티브형 감광성 수지 조성물
JP2016028893A JP2016161939A (ja) 2015-03-05 2016-02-18 ネガティブ型感光性樹脂組成物、それから形成された光硬化パターン、及びそれを含む画像表示装置
TW105105100A TWI676650B (zh) 2015-03-05 2016-02-22 負型感光性樹脂組成物
CN201610122336.4A CN105938294B (zh) 2015-03-05 2016-03-03 负型感光性树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150030976A KR101813911B1 (ko) 2015-03-05 2015-03-05 네가티브형 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
KR20160107754A KR20160107754A (ko) 2016-09-19
KR101813911B1 true KR101813911B1 (ko) 2018-01-02

Family

ID=56845116

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150030976A KR101813911B1 (ko) 2015-03-05 2015-03-05 네가티브형 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP2016161939A (zh)
KR (1) KR101813911B1 (zh)
CN (1) CN105938294B (zh)
TW (1) TWI676650B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI724029B (zh) * 2016-09-28 2021-04-11 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物、附有鑄模的基板的製造方法以及電鍍成形體的製造方法
KR102383697B1 (ko) * 2018-03-26 2022-04-05 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
CN110412829A (zh) * 2018-04-26 2019-11-05 东友精细化工有限公司 负型感光性树脂组合物、光固化图案及图像显示装置
KR20210104956A (ko) * 2020-02-17 2021-08-26 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스를 포함하는 컬러필터 및 상기 컬러필터를 포함하는 표시장치
KR20210111492A (ko) * 2020-03-03 2021-09-13 동우 화인켐 주식회사 경화성 수지 조성물, 패턴 및 표시장치
CN113448164A (zh) * 2020-03-26 2021-09-28 台湾永光化学工业股份有限公司 负型感旋光性树脂组成物及其用途

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101302508B1 (ko) 2006-02-03 2013-09-02 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물, 그 경화물을 갖는 액정표시장치, 그를 사용한 액정표시장치의 패턴형성방법
KR101401763B1 (ko) * 2007-12-28 2014-05-30 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용한 컬러필터 및 상기 컬러필터를 포함하는 평판표시장치
KR101339626B1 (ko) * 2008-09-08 2013-12-09 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
JP2010107755A (ja) * 2008-10-30 2010-05-13 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP5338352B2 (ja) * 2009-02-09 2013-11-13 日油株式会社 ポジ型感光性樹脂組成物
TWI605063B (zh) * 2009-11-25 2017-11-11 住友化學股份有限公司 Resin composition and display device
JP2013171101A (ja) * 2012-02-20 2013-09-02 Fujifilm Corp ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP6094587B2 (ja) * 2012-09-10 2017-03-22 Jsr株式会社 レジスト下層膜形成用組成物及びパターン形成方法

Also Published As

Publication number Publication date
CN105938294A (zh) 2016-09-14
TWI676650B (zh) 2019-11-11
CN105938294B (zh) 2019-10-11
TW201632578A (zh) 2016-09-16
KR20160107754A (ko) 2016-09-19
JP2016161939A (ja) 2016-09-05

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