KR101808474B1 - 임프린트 방법 - Google Patents

임프린트 방법 Download PDF

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Publication number
KR101808474B1
KR101808474B1 KR1020167017546A KR20167017546A KR101808474B1 KR 101808474 B1 KR101808474 B1 KR 101808474B1 KR 1020167017546 A KR1020167017546 A KR 1020167017546A KR 20167017546 A KR20167017546 A KR 20167017546A KR 101808474 B1 KR101808474 B1 KR 101808474B1
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South Korea
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transfer
template
clean air
air
resin
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Korean (ko)
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KR20160084483A (ko
Inventor
히로카즈 오다
다카하루 나가이
사부로 하라다
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다이니폰 인사츠 가부시키가이샤
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002Component parts, details or accessories; Auxiliary operations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020167017546A 2012-10-04 2013-10-03 임프린트 방법 Active KR101808474B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-221893 2012-10-04
JP2012221893 2012-10-04
PCT/JP2013/076973 WO2014054749A1 (ja) 2012-10-04 2013-10-03 インプリント方法およびインプリント装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020157007709A Division KR101911588B1 (ko) 2012-10-04 2013-10-03 임프린트 방법 및 임프린트 장치

Publications (2)

Publication Number Publication Date
KR20160084483A KR20160084483A (ko) 2016-07-13
KR101808474B1 true KR101808474B1 (ko) 2017-12-12

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KR1020167017546A Active KR101808474B1 (ko) 2012-10-04 2013-10-03 임프린트 방법
KR1020157007709A Active KR101911588B1 (ko) 2012-10-04 2013-10-03 임프린트 방법 및 임프린트 장치

Family Applications After (1)

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KR1020157007709A Active KR101911588B1 (ko) 2012-10-04 2013-10-03 임프린트 방법 및 임프린트 장치

Country Status (5)

Country Link
US (2) US10279538B2 (https=)
JP (2) JP5716876B2 (https=)
KR (2) KR101808474B1 (https=)
TW (3) TWI609763B (https=)
WO (1) WO2014054749A1 (https=)

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TWI609763B (zh) * 2012-10-04 2018-01-01 大日本印刷股份有限公司 壓印方法及壓印裝置
JP5804160B2 (ja) * 2013-09-19 2015-11-04 大日本印刷株式会社 インプリント方法およびインプリントモールドの製造方法
CN112445066A (zh) * 2014-04-22 2021-03-05 Ev 集团 E·索尔纳有限责任公司 用于压印纳米结构的方法和装置
JP6420571B2 (ja) * 2014-06-13 2018-11-07 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
WO2016052345A1 (ja) * 2014-10-01 2016-04-07 大日本印刷株式会社 インプリント装置、インプリント方法およびインプリント装置の制御方法
JP5954644B2 (ja) * 2014-10-01 2016-07-20 大日本印刷株式会社 インプリント装置、インプリント方法およびインプリント装置の制御方法
JP6025079B2 (ja) * 2014-10-07 2016-11-16 大日本印刷株式会社 インプリント装置およびその制御方法
JP6525572B2 (ja) * 2014-12-05 2019-06-05 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6628491B2 (ja) 2015-04-13 2020-01-08 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6768368B2 (ja) * 2015-09-08 2020-10-14 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6566843B2 (ja) * 2015-11-12 2019-08-28 キヤノン株式会社 パターン形成方法、インプリントシステムおよび物品製造方法
US11104057B2 (en) * 2015-12-11 2021-08-31 Canon Kabushiki Kaisha Imprint apparatus and method of imprinting a partial field
JP6700771B2 (ja) * 2015-12-16 2020-05-27 キヤノン株式会社 インプリント装置、及び物品の製造方法
JP6655988B2 (ja) * 2015-12-25 2020-03-04 キヤノン株式会社 インプリント装置の調整方法、インプリント方法および物品製造方法
JP6702753B2 (ja) * 2016-02-17 2020-06-03 キヤノン株式会社 リソグラフィ装置、及び物品の製造方法
JP6643135B2 (ja) * 2016-02-17 2020-02-12 キヤノン株式会社 リソグラフィ装置および物品製造方法
JP6808386B2 (ja) * 2016-07-12 2021-01-06 キヤノン株式会社 インプリント装置および物品製造方法
JP6742189B2 (ja) * 2016-08-04 2020-08-19 キヤノン株式会社 インプリント装置、及び物品製造方法
JP2018163946A (ja) * 2017-03-24 2018-10-18 東芝メモリ株式会社 インプリント装置およびインプリント方法
US11681216B2 (en) * 2017-08-25 2023-06-20 Canon Kabushiki Kaisha Imprint apparatus, imprint method, article manufacturing method, molding apparatus, and molding method
US10895806B2 (en) * 2017-09-29 2021-01-19 Canon Kabushiki Kaisha Imprinting method and apparatus
JP7476197B2 (ja) * 2018-12-11 2024-04-30 アイオー テック グループ リミテッド 均一平面表面を使用する3dプリンティングシステムにおける光開始重合反応の酸素阻害を防止するためのシステム及び方法
CN113665118B (zh) * 2021-07-19 2023-10-20 广州黑格智造信息科技有限公司 一种树脂清除装置及其清除方法

Citations (4)

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JP2006352121A (ja) * 2005-06-13 2006-12-28 Asml Netherlands Bv インプリント・リソグラフィ
US20110272838A1 (en) 2010-05-06 2011-11-10 Matt Malloy Apparatus, System, and Method for Nanoimprint Template with a Backside Recess Having Tapered Sidewalls
JP2012098337A (ja) * 2010-10-29 2012-05-24 Shibaura Mechatronics Corp 液滴塗布装置及び液滴塗布方法
US20120228789A1 (en) 2011-03-07 2012-09-13 Canon Kabushiki Kaisha Imprint apparatus and article manufacturing method

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KR20020057749A (ko) * 2001-01-06 2002-07-12 윤종용 필터 미디엄과 필터 그리고 필터를 갖는 공기 제공 장치및 케미컬 제공 장치
JP2002359180A (ja) * 2001-06-01 2002-12-13 Toshiba Corp ガス循環システム
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
JP2006013401A (ja) * 2004-06-29 2006-01-12 Canon Inc 微細加工装置
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
JP5121549B2 (ja) 2008-04-21 2013-01-16 株式会社東芝 ナノインプリント方法
US8105522B2 (en) * 2008-10-29 2012-01-31 Eaton Corporation Compression mold and molding process
NL2004932A (en) * 2009-07-27 2011-01-31 Asml Netherlands Bv Imprint lithography template.
NL2004685A (en) 2009-07-27 2011-01-31 Asml Netherlands Bv Imprint lithography apparatus and method.
US20110038977A1 (en) * 2009-08-13 2011-02-17 Yong Zheng Vertical Molding Machine
JP5364533B2 (ja) 2009-10-28 2013-12-11 株式会社東芝 インプリントシステムおよびインプリント方法
JP5189114B2 (ja) * 2010-01-29 2013-04-24 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP5489887B2 (ja) * 2010-06-30 2014-05-14 富士フイルム株式会社 液体塗布装置及び液体塗布方法並びにナノインプリントシステム
JP5539113B2 (ja) * 2010-08-30 2014-07-02 キヤノン株式会社 インプリント装置及び物品の製造方法
JP2012099729A (ja) * 2010-11-04 2012-05-24 Toshiba Corp テンプレート、テンプレートの形成方法及び半導体装置の製造方法
JP2013251462A (ja) * 2012-06-01 2013-12-12 Canon Inc インプリント装置、および、物品の製造方法
TWI609763B (zh) * 2012-10-04 2018-01-01 大日本印刷股份有限公司 壓印方法及壓印裝置
JP2015179771A (ja) * 2014-03-19 2015-10-08 キヤノン株式会社 インプリント装置、および物品の製造方法

Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
JP2006352121A (ja) * 2005-06-13 2006-12-28 Asml Netherlands Bv インプリント・リソグラフィ
US20110272838A1 (en) 2010-05-06 2011-11-10 Matt Malloy Apparatus, System, and Method for Nanoimprint Template with a Backside Recess Having Tapered Sidewalls
JP2012098337A (ja) * 2010-10-29 2012-05-24 Shibaura Mechatronics Corp 液滴塗布装置及び液滴塗布方法
US20120228789A1 (en) 2011-03-07 2012-09-13 Canon Kabushiki Kaisha Imprint apparatus and article manufacturing method

Also Published As

Publication number Publication date
US10960598B2 (en) 2021-03-30
TWI667146B (zh) 2019-08-01
TW201726430A (zh) 2017-08-01
US20190210269A1 (en) 2019-07-11
US20150224703A1 (en) 2015-08-13
JP6115538B2 (ja) 2017-04-19
TWI609763B (zh) 2018-01-01
JP2015046605A (ja) 2015-03-12
KR20160084483A (ko) 2016-07-13
KR101911588B1 (ko) 2018-10-24
WO2014054749A1 (ja) 2014-04-10
TW201836861A (zh) 2018-10-16
TWI628081B (zh) 2018-07-01
KR20150065685A (ko) 2015-06-15
US10279538B2 (en) 2019-05-07
JPWO2014054749A1 (ja) 2016-08-25
JP5716876B2 (ja) 2015-05-13
TW201420363A (zh) 2014-06-01

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