KR101776829B1 - 스펙트럼 퓨리티 필터 - Google Patents

스펙트럼 퓨리티 필터 Download PDF

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Publication number
KR101776829B1
KR101776829B1 KR1020127030943A KR20127030943A KR101776829B1 KR 101776829 B1 KR101776829 B1 KR 101776829B1 KR 1020127030943 A KR1020127030943 A KR 1020127030943A KR 20127030943 A KR20127030943 A KR 20127030943A KR 101776829 B1 KR101776829 B1 KR 101776829B1
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South Korea
Prior art keywords
radiation
spectral purity
purity filter
wavelength
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Korean (ko)
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KR20130105292A (ko
Inventor
보우터 소어
바딤 바니네
에릭 루프스트라
안드레이 야쿠닌
마르틴 야크
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Optical Filters (AREA)
KR1020127030943A 2010-04-27 2011-02-22 스펙트럼 퓨리티 필터 Active KR101776829B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32842610P 2010-04-27 2010-04-27
US61/328,426 2010-04-27
PCT/EP2011/052573 WO2011134692A1 (en) 2010-04-27 2011-02-22 Spectral purity filter

Publications (2)

Publication Number Publication Date
KR20130105292A KR20130105292A (ko) 2013-09-25
KR101776829B1 true KR101776829B1 (ko) 2017-09-08

Family

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Application Number Title Priority Date Filing Date
KR1020127030943A Active KR101776829B1 (ko) 2010-04-27 2011-02-22 스펙트럼 퓨리티 필터

Country Status (8)

Country Link
US (1) US9726989B2 (https=)
EP (1) EP2564273A1 (https=)
JP (1) JP5727590B2 (https=)
KR (1) KR101776829B1 (https=)
CN (1) CN102859444B (https=)
SG (1) SG184557A1 (https=)
TW (1) TWI528117B (https=)
WO (1) WO2011134692A1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011098170A1 (en) * 2010-02-12 2011-08-18 Asml Netherlands B.V. Spectral purity filter
US9407997B2 (en) * 2010-10-12 2016-08-02 Invensense, Inc. Microphone package with embedded ASIC
TWI596384B (zh) * 2012-01-18 2017-08-21 Ａｓｍｌ荷蘭公司 光源收集器元件、微影裝置及元件製造方法
DE102012215698A1 (de) * 2012-09-05 2013-08-29 Carl Zeiss Smt Gmbh Überwachungseinrichtung für eine Projektonsbelichtungsanlage und Verfahren zu deren Betrieb
DE102012216502A1 (de) * 2012-09-17 2014-03-20 Carl Zeiss Smt Gmbh Spiegel
US9244368B2 (en) 2012-09-26 2016-01-26 Kla-Tencor Corporation Particle control near reticle and optics using showerhead
DE102013213842A1 (de) * 2013-07-16 2015-01-22 Carl Zeiss Smt Gmbh Optisches Bauelement
NL2013700A (en) * 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
KR102604554B1 (ko) * 2014-07-04 2023-11-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 내에서 사용하는 멤브레인 및 이러한멤브레인을 포함한 리소그래피 장치
US9664907B2 (en) * 2014-07-21 2017-05-30 Applied Materials Israel Ltd. Optical element for spatial beam shaping
CN105573065B (zh) * 2015-12-21 2017-12-26 中国科学院长春光学精密机械与物理研究所 用于极紫外光刻装置中的锆膜置换机构
NL2023932B1 (en) * 2018-10-15 2020-08-19 Asml Netherlands Bv Method of manufacturing a membrane assembly
EP4208755A1 (en) * 2020-09-03 2023-07-12 ASML Netherlands B.V. Pellicle membrane for a lithographic apparatus
CN117999857A (zh) * 2021-09-15 2024-05-07 Asml荷兰有限公司 用于主动加热euv光源中的基板的装置和方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009531854A (ja) * 2006-03-29 2009-09-03 エーエスエムエル ネザーランズ ビー．ブイ． 汚染バリア及び汚染バリアを備えるリソグラフィ装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6014251A (en) * 1997-04-08 2000-01-11 The United States Of America As Represented By The Secretary Of The Navy Optical filters based on uniform arrays of metallic waveguides
US5973316A (en) 1997-07-08 1999-10-26 Nec Research Institute, Inc. Sub-wavelength aperture arrays with enhanced light transmission
GB0108129D0 (en) 2001-03-31 2001-05-23 Bookham Technology Plc Optoelectronic filters
DE10127537C1 (de) 2001-05-31 2002-11-14 Apsys Advanced Particle System Trägersubstrat für die Abscheidung, automatisierte Erkennung und spektroskopische Identifizierung von Partikeln
US6522465B1 (en) * 2001-09-27 2003-02-18 Intel Corporation Transmitting spectral filtering of high power extreme ultra-violet radiation
JP4229103B2 (ja) * 2001-10-29 2009-02-25 住友電気工業株式会社 金属微細構造体の製造方法
TWI227380B (en) * 2002-06-06 2005-02-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2004103773A (ja) 2002-09-09 2004-04-02 Nikon Corp Ｘ線発生装置、ｘ線露光装置及びｘ線フィルター
US7453645B2 (en) * 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
US7372623B2 (en) * 2005-03-29 2008-05-13 Asml Netherlands B.V. Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
DE102005020521B4 (de) * 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas
JP2007227532A (ja) * 2006-02-22 2007-09-06 Dainippon Printing Co Ltd 電磁波遮蔽シート
US8536551B2 (en) * 2008-06-12 2013-09-17 Gigaphoton Inc. Extreme ultra violet light source apparatus
JP5511818B2 (ja) 2008-08-06 2014-06-04 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用の光学素子、かかる光学素子を含むリソグラフィ装置、およびかかる光学素子を製造する方法
KR101607228B1 (ko) * 2008-08-14 2016-03-29 에이에스엠엘 네델란즈 비.브이. 방사선 소스, 리소그래피 장치 및 디바이스 제조 방법
KR20110063789A (ko) * 2008-08-29 2011-06-14 에이에스엠엘 네델란즈 비.브이. 스펙트럼 퓨리티 필터, 이러한 스펙트럼 퓨리티 필터를 포함하는 리소그래피 장치 및 디바이스 제조 방법
WO2010034385A1 (en) * 2008-09-26 2010-04-01 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
KR20120101983A (ko) * 2009-06-30 2012-09-17 에이에스엠엘 네델란즈 비.브이. 스펙트럼 퓨리티 필터, 리소그래피 장치, 및 스펙트럼 퓨리티 필터를 제조하는 방법
US8817237B2 (en) 2009-08-27 2014-08-26 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
US20120170015A1 (en) * 2009-09-16 2012-07-05 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
JP2013505593A (ja) * 2009-09-23 2013-02-14 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタ、リソグラフィ装置、及びデバイス製造方法
WO2011098170A1 (en) * 2010-02-12 2011-08-18 Asml Netherlands B.V. Spectral purity filter
US8298729B2 (en) * 2010-03-18 2012-10-30 Micron Technology, Inc. Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009531854A (ja) * 2006-03-29 2009-09-03 エーエスエムエル ネザーランズ ビー．ブイ． 汚染バリア及び汚染バリアを備えるリソグラフィ装置

Also Published As

Publication number Publication date
US20130038926A1 (en) 2013-02-14
CN102859444B (zh) 2015-04-08
SG184557A1 (en) 2012-11-29
JP2013526044A (ja) 2013-06-20
US9726989B2 (en) 2017-08-08
WO2011134692A1 (en) 2011-11-03
CN102859444A (zh) 2013-01-02
EP2564273A1 (en) 2013-03-06
TWI528117B (zh) 2016-04-01
TW201142541A (en) 2011-12-01
KR20130105292A (ko) 2013-09-25
JP5727590B2 (ja) 2015-06-03

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