JP2013526044A5 - - Google Patents

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Publication number
JP2013526044A5
JP2013526044A5 JP2013506551A JP2013506551A JP2013526044A5 JP 2013526044 A5 JP2013526044 A5 JP 2013526044A5 JP 2013506551 A JP2013506551 A JP 2013506551A JP 2013506551 A JP2013506551 A JP 2013506551A JP 2013526044 A5 JP2013526044 A5 JP 2013526044A5
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JP
Japan
Prior art keywords
radiation
spectral purity
purity filter
wavelength
mass
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Application number
JP2013506551A
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English (en)
Japanese (ja)
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JP2013526044A (ja
JP5727590B2 (ja
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Priority claimed from PCT/EP2011/052573 external-priority patent/WO2011134692A1/en
Publication of JP2013526044A publication Critical patent/JP2013526044A/ja
Publication of JP2013526044A5 publication Critical patent/JP2013526044A5/ja
Application granted granted Critical
Publication of JP5727590B2 publication Critical patent/JP5727590B2/ja
Active legal-status Critical Current
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JP2013506551A 2010-04-27 2011-02-22 スペクトル純度フィルタ Active JP5727590B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32842610P 2010-04-27 2010-04-27
US61/328,426 2010-04-27
PCT/EP2011/052573 WO2011134692A1 (en) 2010-04-27 2011-02-22 Spectral purity filter

Publications (3)

Publication Number Publication Date
JP2013526044A JP2013526044A (ja) 2013-06-20
JP2013526044A5 true JP2013526044A5 (https=) 2014-04-10
JP5727590B2 JP5727590B2 (ja) 2015-06-03

Family

ID=43837934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013506551A Active JP5727590B2 (ja) 2010-04-27 2011-02-22 スペクトル純度フィルタ

Country Status (8)

Country Link
US (1) US9726989B2 (https=)
EP (1) EP2564273A1 (https=)
JP (1) JP5727590B2 (https=)
KR (1) KR101776829B1 (https=)
CN (1) CN102859444B (https=)
SG (1) SG184557A1 (https=)
TW (1) TWI528117B (https=)
WO (1) WO2011134692A1 (https=)

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DE102012215698A1 (de) * 2012-09-05 2013-08-29 Carl Zeiss Smt Gmbh Überwachungseinrichtung für eine Projektonsbelichtungsanlage und Verfahren zu deren Betrieb
DE102012216502A1 (de) * 2012-09-17 2014-03-20 Carl Zeiss Smt Gmbh Spiegel
US9244368B2 (en) 2012-09-26 2016-01-26 Kla-Tencor Corporation Particle control near reticle and optics using showerhead
DE102013213842A1 (de) * 2013-07-16 2015-01-22 Carl Zeiss Smt Gmbh Optisches Bauelement
NL2013700A (en) * 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
KR102604554B1 (ko) * 2014-07-04 2023-11-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 내에서 사용하는 멤브레인 및 이러한멤브레인을 포함한 리소그래피 장치
US9664907B2 (en) * 2014-07-21 2017-05-30 Applied Materials Israel Ltd. Optical element for spatial beam shaping
CN105573065B (zh) * 2015-12-21 2017-12-26 中国科学院长春光学精密机械与物理研究所 用于极紫外光刻装置中的锆膜置换机构
NL2023932B1 (en) * 2018-10-15 2020-08-19 Asml Netherlands Bv Method of manufacturing a membrane assembly
EP4208755A1 (en) * 2020-09-03 2023-07-12 ASML Netherlands B.V. Pellicle membrane for a lithographic apparatus
CN117999857A (zh) * 2021-09-15 2024-05-07 Asml荷兰有限公司 用于主动加热euv光源中的基板的装置和方法

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US6014251A (en) * 1997-04-08 2000-01-11 The United States Of America As Represented By The Secretary Of The Navy Optical filters based on uniform arrays of metallic waveguides
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US7372623B2 (en) * 2005-03-29 2008-05-13 Asml Netherlands B.V. Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
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WO2010034385A1 (en) * 2008-09-26 2010-04-01 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
KR20120101983A (ko) * 2009-06-30 2012-09-17 에이에스엠엘 네델란즈 비.브이. 스펙트럼 퓨리티 필터, 리소그래피 장치, 및 스펙트럼 퓨리티 필터를 제조하는 방법
US8817237B2 (en) 2009-08-27 2014-08-26 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
US20120170015A1 (en) * 2009-09-16 2012-07-05 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
JP2013505593A (ja) * 2009-09-23 2013-02-14 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタ、リソグラフィ装置、及びデバイス製造方法
WO2011098170A1 (en) * 2010-02-12 2011-08-18 Asml Netherlands B.V. Spectral purity filter
US8298729B2 (en) * 2010-03-18 2012-10-30 Micron Technology, Inc. Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks

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