KR101754260B1 - 건조 장치 및 건조 처리 방법 - Google Patents

건조 장치 및 건조 처리 방법 Download PDF

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Publication number
KR101754260B1
KR101754260B1 KR1020140028390A KR20140028390A KR101754260B1 KR 101754260 B1 KR101754260 B1 KR 101754260B1 KR 1020140028390 A KR1020140028390 A KR 1020140028390A KR 20140028390 A KR20140028390 A KR 20140028390A KR 101754260 B1 KR101754260 B1 KR 101754260B1
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KR
South Korea
Prior art keywords
gas
drying
substrate
nozzles
organic material
Prior art date
Application number
KR1020140028390A
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English (en)
Korean (ko)
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KR20140113399A (ko
Inventor
아키노리 시마무라
테루유키 하야시
유 콘타
테츠야 사다
준 니시야마
히로미 사이토
츠카사 오타
세이이치 타나베
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from JP2014016006A external-priority patent/JP6454470B2/ja
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20140113399A publication Critical patent/KR20140113399A/ko
Application granted granted Critical
Publication of KR101754260B1 publication Critical patent/KR101754260B1/ko

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
KR1020140028390A 2013-03-14 2014-03-11 건조 장치 및 건조 처리 방법 KR101754260B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2013-051226 2013-03-14
JP2013051226 2013-03-14
JPJP-P-2014-016006 2014-01-30
JP2014016006A JP6454470B2 (ja) 2013-03-14 2014-01-30 乾燥装置及び乾燥処理方法

Publications (2)

Publication Number Publication Date
KR20140113399A KR20140113399A (ko) 2014-09-24
KR101754260B1 true KR101754260B1 (ko) 2017-07-06

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Application Number Title Priority Date Filing Date
KR1020140028390A KR101754260B1 (ko) 2013-03-14 2014-03-11 건조 장치 및 건조 처리 방법

Country Status (2)

Country Link
KR (1) KR101754260B1 (zh)
CN (1) CN104043573B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102560313B1 (ko) * 2016-01-19 2023-07-27 삼성디스플레이 주식회사 감압 장치 및 이를 이용한 발광 표시 장치의 제조 방법
KR102525361B1 (ko) * 2016-04-27 2023-04-25 삼성디스플레이 주식회사 감압 건조 장치 및 이를 이용한 막 제조 방법
US10615378B2 (en) * 2016-09-30 2020-04-07 Tokyo Electron Limited Reduced-pressure drying apparatus
CN109200736B (zh) 2017-06-30 2021-01-08 京东方科技集团股份有限公司 冷凝板、真空干燥设备以及真空干燥方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004311206A (ja) * 2003-04-07 2004-11-04 Seiko Epson Corp 乾燥装置及び方法、ｅｌ表示デバイスの製造装置及び製造方法、ｅｌ表示デバイス並びに電子機器
JP2005283371A (ja) * 2004-03-30 2005-10-13 Sumitomo Chemical Co Ltd 引火点測定装置
JP2010067430A (ja) * 2008-09-10 2010-03-25 Seiko Epson Corp 薄膜形成装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5349289B2 (ja) * 2007-02-27 2013-11-20 株式会社東芝 塗布装置
KR101085182B1 (ko) * 2009-05-06 2011-11-18 한국기계연구원 플라즈마를 이용하는 처치장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004311206A (ja) * 2003-04-07 2004-11-04 Seiko Epson Corp 乾燥装置及び方法、ｅｌ表示デバイスの製造装置及び製造方法、ｅｌ表示デバイス並びに電子機器
JP2005283371A (ja) * 2004-03-30 2005-10-13 Sumitomo Chemical Co Ltd 引火点測定装置
JP2010067430A (ja) * 2008-09-10 2010-03-25 Seiko Epson Corp 薄膜形成装置

Also Published As

Publication number Publication date
CN104043573A (zh) 2014-09-17
CN104043573B (zh) 2018-01-16
KR20140113399A (ko) 2014-09-24

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